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8758974 Photoresist-free micropatterning on polymer surfaces  
A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional...
8760628 Filter, exposure apparatus, and method of manufacturing device  
A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members...
8758981 Photoresist underlayer composition and method of manufacturing semiconductor device by using the same  
A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f. [Chemical Formula 1]
8753792 Positive photosensitive composition and pattern forming method using the same  
A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali...
8753797 Surface-modified middle layers  
Methods and materials for making a semiconductor device are described. The method includes providing a substrate, forming a surface-modified middle layer (SM-ML) that includes a fluorine-containing...
8756536 Generation method, storage medium, and information processing apparatus  
The present invention provides a generation method of generating data for a mask pattern to be used for an exposure apparatus including a projection optical system for projecting a mask pattern...
8754350 Laser processing apparatus, exposure apparatus and exposure method  
An exposure apparatus includes a stage 10 for holding a substrate 8 to be exposed; a direct writing mask 6 arranged above the substrate 8 to be exposed held by the stage 10; a repeated opening...
8755698 System and methods for using toner shape factor to control toner concentration  
System and methods for controlling toner properties in a two component development system through the toner shape factor. In particular, the present embodiments provide a method for controlling...
8753787 Light pattern exposure method, photomask, and photomask blank  
A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a photomask. The photomask includes a transparent substrate and a pattern of optical film of a...
8753798 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head  
A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic...
8754852 Light guide plate for system inputting coordinate contactlessly, a system comprising the same and a method for inputting coordinate contactlessly using the same  
Disclosed are a light guide plate for a non-contact type coordinate input system, a system including the same, and a non-contact type coordinate input method using the same. More particularly, the...
8753789 Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of manufacturing electrophotographic photosensitive member  
An electrophotographic photosensitive member comprises a charge-transporting layer which is a surface layer of the electrophotographic photosensitive member; wherein the charge-transporting layer...
8753799 Method for fabricating LCD  
The present invention relates to a method for fabricating an LCD. The method includes fabricating a MAV layer on a glass substrate. The step of fabricating the MAV layer on the glass substrate...
8753803 Pattern forming method  
According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the...
8753791 Laser-markable compositions  
A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.
8753800 Process for producing ejection orifice forming member and liquid ejection head  
A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator,...
8753802 Pattern forming method, chemical amplification resist composition and resist film  
A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film...
8753788 Apparatus of repairing a mask and a method for the same  
An apparatus includes a probe tip configured to contact the mask, a cantilever configured to mount the probe tip wherein the cantilever includes a mirror, an optical unit having a light source...
8753793 Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method  
Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution c...
8753794 N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition  
Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is ...
8753796 Photoresist composition  
The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl...
8753801 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same  
A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound...
8753795 Photoresist composition  
The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly...
8753790 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom  
Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone...
8756550 Method to ensure double patterning technology compliance in standard cells  
An integrated circuit with standard cells with top and bottom metal-1 and metal-2 power rails and with lateral standard cell borders that lie between an outermost vertical dummy poly lead from one...
8753786 Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank  
A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a halftone phase shift mask. The mask includes a transparent substrate and a pattern of halftone...
8753805 Patterning process and resist composition  
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic...
8753804 Line width roughness improvement with noble gas plasma  
A method for forming a photoresist mask may comprise providing a ultra-violet (UV) producing gas to a vacuum chamber having a substrate, ionizing the UV producing gas to produce UV rays to...
8748076 Resist composition and patterning process using the same  
There is disclosed a resist composition comprising at least: (A) a polymer containing one or more repeating units having a structure shown by the following general formula (1) and/or (2), an...
8748072 Method and apparatus for producing toner  
A method for producing a toner, including ejecting a toner composition liquid containing at least a resin and a colorant periodically from a plurality of nozzles into a chamber using a vibration...
8750762 Charging member with vulcanized rubber, and electrophotographic apparatus including the charging member  
To provide a charging member that can have a uniform electrical resistance, can not easily change in electrical resistance even by any long-term continuous electrification and, as a result thereof,...
8748073 Toner, manufacturing method thereof and image forming method  
A toner comprising a modified polyester resin containing a structure represented by Formula (1a) or (1b), wherein, in Formula (1a) and (1b), R1 represents a hydrogen atom, a methyl group, or an...
8751975 RC corner solutions for double patterning technology  
A method includes determining model parameters for forming an integrated circuit, and generating a techfile using the model parameters. The techfile includes at least two of a C_worst table, a...
8748082 Laser engravable flexographic printing articles based on millable polyurethanes, and method  
A flexographic printing sleeve or plate is made by a method that includes providing a millable polyurethane, crosslinking the millable polyurethane, and forming a relief by at least laser engraving...
8750760 Image forming apparatus and image forming method  
An image forming apparatus including a latent electrostatic image bearing member, a latent electrostatic image forming unit, a developing unit, a transfer unit and a fixing unit, wherein the fixing...
8748074 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom  
Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic...
8747984 Optical recording medium  
An object of the present invention is to provide a recordable optical recording medium whose characteristics do not deteriorate when recording is conducted in a high-temperature environment. The...
8748081 Organic anti reflective layer composition  
Disclosed is an organic antireflective film composition which includes a monomer containing two or more thiol groups and a monomer containing two or more vinyl groups, as crosslinking agents. When...
8748060 Fluorinated coating and phototools made therewith  
A coating including an oligomer is disclosed, the oligomer being the reaction product of an epoxy silane, a multifunctional (meth)acrylate; and a polymerizable fluorochemical. The polymerizable...
8748080 Compositions and processes for photolithography  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
8748083 Method for forming wires with narrow spacing  
A method for forming wires with a narrow spacing is provided. The method includes the steps of: sequentially forming a first metal layer and a protective layer on a substrate; using a first...
8748062 Method of cleaning substrate  
The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or...
8748078 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern  
A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly s...
8748064 Charged particle beam drawing method and charged particle beam drawing apparatus  
A charged particle beam drawing method according to an embodiment is a method including forming a first measurement pattern in a first measurement pattern area; in succession with processing of...
8747983 Optical recording medium  
An object of the present invention is to provide a recordable optical recording medium whose characteristics do not deteriorate when recording is conducted in a high-temperature environment. The...
8748066 Method for forming photomasks  
A method for forming photomasks includes the following steps. A first photomask including a first target pattern and a first unprintable dummy pattern is provided. A second photomask including a...
8749734 Liquid crystal display device with layers of different color filters covering light shielding films  
Unevenness due to the influence of a mesh when a sealing material for bonding a TFT substrate and a counter substrate together is formed on the counter substrate by screen printing is prevented....
8748069 Electrophotographic photoconductor and method for producing same  
Provided are an electrophotographic photoconductor that satisfies sufficient wear resistance as well as various characteristics as a photoconductor, and that is little affected by harmful gas or...
8748077 Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device  
To provide a resist pattern improving material, containing: water; and benzalkonium chloride represented by the following general formula (1): where n is an integer of 8 to 18.
8748061 Method of fabricating wave-shaped mask for photolithography and exposure method of fabricating nano-scaled structure using the wave-shaped mask  
A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface...