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8951710 Chemically amplified negative resist composition and patterning process  
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a...
8951716 Surface modification, functionalization and integration of microfluidics and biosensor to form a biochip  
The present disclosure provides methods of fabricating a biochip. The biochip includes a fluidic part, having through-substrate holes as inlets and outlets, and a sensing part bonded together using...
8951706 Electrostatic image developing toner, electrostatic developer, toner cartridge, process cartridge, image forming apparatus, and image forming method  
An electrostatic image developing toner contains toner particles containing a polyester resin having a repeating unit deriving from a dicarboxylic acid and a repeating unit deriving from a rosin...
8951714 Relief printing plate manufacturing method, relief printing plate creating apparatus, and recording medium  
A relief printing plate manufacturing method includes: generating binary image data based on multivalued image data representing a printing image; generating, from the binary image data, target...
8951083 Method for manufacturing an organic light emitting diode display  
The present invention relates to an organic light emitting device and a manufacturing method thereof. The present invention discloses an organic light emitting device including: a plurality of...
8951704 Toner, liquid developer, dry developer, developer cartridge, process cartridge, image forming apparatus, and image forming method  
A toner includes a crystalline polyester resin having an unsaturated double bond, a thiol compound having a bi- or more-functional thiol group, and a photopolymerization initiator.
8951700 Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters  
A method of manufacturing an optical filter includes preparing a substrate having a panel region, a peripheral region, and an alignment region, forming an outer black matrix on the substrate, such...
8951715 Method of forming patterned film on a bottom and a top-surface of a deep trench  
A method of forming a patterned film on both a bottom and a top-surface of a deep trench is disclosed. The method includes the steps of: 1) providing a substrate having a deep trench formed...
8951702 Charge transport material that is an ethylene compound, electrophotographic photoreceptor containing the charge transport material, and process for producing the electrophotographic photoreceptor  
A charge transport material having reduced photodeterioration is disclosed to be an ethylene compound having an ethylene double bond site, having a structure in which four different substituents...
8954900 Multi-patterning mask decomposition method and system  
A portion of a layout of a single layer of an integrated circuit is to be multi-patterned. The patterns are divided into first and second groups, to be patterned on the single layer by a first mask...
8951703 Wear resistant urethane hexaacrylate materials for photoconductor overcoats  
An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from a curable composition including a urethane resin...
8951711 Patterning process and composition for forming silicon-containing film usable therefor  
The invention provides a patterning process for forming a negative pattern by lithography, comprising at least the steps of: using a composition for forming silicon-containing film, containing...
8951705 Development agent and image forming apparatus employing same  
A development agent containing toner that contains a binder resin having a crystalline resin that has a urethane and/or urea bond in its main chain, a coloring agent, and an organically modified...
8951698 Method for forming pattern and method for producing original lithography mask  
A method forming a pattern includes a process in which self-assembly material is formed on the substrate where on which a fiducial mark is formed, and the self-assembly material is separated in...
8951718 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method  
A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer...
8951707 Toner, developer and image forming apparatus  
A toner, including: a crystalline resin containing a urethane bond, a urea bond, or both thereof; and a compound represented by the following General Formula (1), wherein an amount of the compound...
8951713 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same  
An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a...
8951699 Adjustable photo-mask  
An adjustable photo-mask for providing variable properties includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the...
8951708 Method of making toners  
The present embodiments relate to methods of making a toner composition. More specifically, the present embodiments relate to methods of including a functional material into a toner composition.
8951425 Curved plate and method of forming the same  
A method of forming at least one curved plate having first and second layers, the first layer being formed of a first material and the second layer being formed of a second material, the method...
8951709 Resist composition and method for producing resist pattern  
A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents...
8945809 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process  
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1...
8945804 Treated metal oxide particles and toner compositions  
Treated metal oxide particles include metal oxide particles treated with at least a charge modifying agent. The charge modifying agent is represented by the following formula: An-Zc—Yb—Ar(EW)a whe...
8945697 Optical recording medium  
An optical recording medium is provided having a recording layer that absorbs light with a wavelength of 350 nm to 500 nm, the optical recording medium having good recording playback properties...
8945812 Resist composition and method of forming resist pattern  
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon...
8945798 Near-field exposure mask and pattern forming method  
A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field...
8947641 Lithographic apparatus and method  
In a lithographic apparatus, a slip of a patterning device relative to a support, the support constructed to support the patterning device, may be provided by measuring a position of the support...
8945800 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program  
In a multiple patterning techniques, where two or more exposures are used to form a single layer of a device, the splitting of features in a single layer between the multiple exposures is carried...
8946089 Methods of forming contact holes  
Methods of forming contact holes include forming a first guide pattern over an etching target layer. The first guide pattern has first openings each extending in a first direction and each first...
8945810 Positive resist composition and pattern-forming method  
A positive resist composition comprises: (A) a resin that has a repeating unit represented by general formula (a1) and increases its solubility in an alkali developer by action of an acid; (B) a...
8945803 Smart subfield method for E-beam lithography  
The present disclosure provides a method of improving a layer to layer overlay error by an electron beam lithography system. The method includes generating a smart boundary of two subfields at the...
8945806 Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, developer cartridge, process cartridge, image forming apparatus, and image forming method  
An electrostatic charge image developing toner includes toner particles that contain a colorant, a binder resin and a release agent, and an external additive, in which the external additive...
8945799 Pellicle and mask adhesive agent for use in same  
A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive...
8945820 Silicon-containing resist underlayer film-forming composition and patterning process  
The present invention is a silicon-containing resist underlayer film-forming composition containing a condensation product and/or a hydrolysis condensation product of a mixture comprising: one or...
8945802 Flare-measuring mask, flare-measuring method, and exposure method  
A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a...
8945816 Method for forming resist pattern, semiconductor device and production method thereof  
A method for producing a semiconductor device includes forming a resist pattern by coating a resist pattern thickening material to cover the surface of the resist pattern, baking the resist pattern...
8945811 Miniaturized microparticles  
A system and method for forming encoded microparticles is described. One embodiment includes an encoded microparticle, the microparticle comprising a plurality of segments aligned along an axis,...
8945797 Mask, pattern disposing method thereof and exposing method thereof  
A mask, a pattern disposing method thereof and an exposing method thereof are provided. A plurality of geometric patterns are arranged on the mask along a plurality of columns. The arrangement of...
8946631 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching...
8945815 Alkaline soluble resin and light sensible resin composition comprising same and use thereof  
An embodiment of the invention discloses an alkaline soluble resin and a method for preparing the same. The chemical formula of this alkaline soluble resin is shown in Formula I: wherein a is an...
8945818 Method of manufacturing liquid ejection head  
A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and...
8945805 Magnetic carrier and two-components developer  
The present invention provides an image of high image quality by using a magnetic carrier coated with a novel coating resin composition. Further, the present invention stably provides a good image...
8949750 Method and system for forming a diagonal pattern using charged particle beam lithography  
A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and...
8946068 Patterned doping of semiconductor substrates using photosensitive monolayers  
A semiconductor device and a method of fabricating a semiconductor device are disclosed. Embodiments of the invention use a photosensitive self-assembled monolayer to pattern the surface of a...
8945814 Acid generators and photoresists comprising same  
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently...
8945822 Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same  
The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened, e.g., in form of lines and...
8946852 Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or photosensitive resin composition film  
A photosensitive resin composition contains: (a) an alkali-soluble polyimide; (b) a compound which has two or more epoxy groups and/or oxetanyl groups in each molecule; and (c) a quinonediazide...
8945813 Mask forming imageable material and use  
An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent...
8945821 Method for patterning flexible substrate  
The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier...
8945808 Self-topcoating resist for photolithography  
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid...