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8758984 Method of forming gate conductor structures  
A method of forming gate conductor structures. A substrate having thereon a gate electrode layer is provided. A multi-layer hard mask is formed overlying the gate electrode layer. The multi-layer...
8758986 Printed wiring board and method for producing the same  
A method produces an undercoat-covered smoothed printed wiring board, requiring no step of polishing the surface of the printed wiring board. A method for producing a solder-resist-covered printed...
8758864 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same  
An organic-inorganic hybrid electroluminescent device having a semiconductor nanocrystal pattern prepared by producing a semiconductor nanocrystal film using semiconductor nanocrystals, where the...
8758987 Methods of forming a reversed pattern in a substrate  
A method of forming a reversed pattern in a substrate. A resist on a substrate is exposed and developed to form a pattern therein, the patterned resist having a first polarity. The polarity of the...
8758968 Toner, production method thereof, developer and image forming method  
To provide a toner, containing: a binder resin; a crystalline polyester resin; a colorant; and wax, wherein the toner has a fluidized powder characteristic value of 35% to 45%, and a BET specific...
8758971 Image-forming method  
An image-forming method uses an electrophotographic photosensitive member having a surface layer formed of a hydrogenated amorphous silicon carbide in which a ratio of the number of carbon atoms to...
8758967 Transparent toner and toner image using the same, electrostatic latent image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method  
A transparent toner for developing an electrostatic latent image includes toner particles containing a binder resin; and an external additive containing cerium oxide, in which a content of cerium...
8758962 Method and apparatus for sub-pellicle defect reduction on photomasks  
In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a...
8762897 Semiconductor device design system and method of using the same  
A circuit design system includes a schematic design tool configured to generate schematic information and pre-coloring information for a circuit. The circuit design system also includes a netlist...
8758977 Negative-type photosensitive resin composition, pattern forming method and electronic parts  
A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali...
8758972 Toner, method of producing toner, and image forming method  
A toner produced by a method including dissolving or dispersing toner components comprising a resin, a colorant, and a release agent in a solvent to prepare a toner components liquid, discharging...
8758970 Deinking a print  
A method of deinking an image-bearing member using an organic solvent includes receiving the image-bearing member. The member has thereon a continuous or discontinuous image layer formed of toner...
8758973 Method and apparatus for producing toner  
An apparatus for producing a toner, including a liquid droplet-forming unit configured to discharge a toner composition liquid containing at least a resin and a colorant at a uniform discharge...
8758963 Holographic reticle and patterning method  
A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is...
8758965 Apparatus and method for manufacturing color filter adsorbing toner nano particles by using electrostatic force  
Provided is an apparatus and method of manufacturing a color filter adsorbing toner nano-particles by using electrostatic force. In the apparatus for manufacturing the color filter, a laser driver...
8758976 Positive photosensitive polyimide composition  
The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic...
8758654 Photosensitive resin composition for color filter and color filter using the same  
A photosensitive resin composition for a color filter includes (A) a binder resin including a cardo-based resin represented by the following Chemical Formula 1, (B) a photopolymerization initiator...
8759741 Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element  
A titanium black dispersion includes titanium black particles, a dispersant, and an organic solvent. When the titanium black dispersion is for a wafer level lens, 90% or more of dispersed objects...
8758975 Lithographic printing plate precursor and method of preparing lithographic printing plate  
A lithographic printing plate precursor includes a support and one or more layers, one of the one or more layers is a photosensitive layer containing an initiator compound, a polymerizable compound...
8758964 LCD panel photolithography process and mask  
Disclosed is an LCD panel photolithography process, employed in a lithography system for manufacturing a plurality of LCD panel, comprising steps of: performing photolithography to a glass...
8758978 Radiation-sensitive resin composition, resist pattern formation method, and polymer  
A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer includes a repeating unit (I) shown by the following...
8761803 Privacy control of location information  
One embodiment of the present is a method of implementing privacy control of location information. Such a method comprises defining a geographic zone for which pseudo-location information is to be...
8758983 Method of patterning an electronic of photonic material  
The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and...
8758974 Photoresist-free micropatterning on polymer surfaces  
A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional...
8760628 Filter, exposure apparatus, and method of manufacturing device  
A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members...
8758981 Photoresist underlayer composition and method of manufacturing semiconductor device by using the same  
A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: {(SiO1.5—Y—SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f. [Chemical Formula 1]
8753792 Positive photosensitive composition and pattern forming method using the same  
A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali...
8753797 Surface-modified middle layers  
Methods and materials for making a semiconductor device are described. The method includes providing a substrate, forming a surface-modified middle layer (SM-ML) that includes a fluorine-containing...
8756536 Generation method, storage medium, and information processing apparatus  
The present invention provides a generation method of generating data for a mask pattern to be used for an exposure apparatus including a projection optical system for projecting a mask pattern...
8754350 Laser processing apparatus, exposure apparatus and exposure method  
An exposure apparatus includes a stage 10 for holding a substrate 8 to be exposed; a direct writing mask 6 arranged above the substrate 8 to be exposed held by the stage 10; a repeated opening...
8755698 System and methods for using toner shape factor to control toner concentration  
System and methods for controlling toner properties in a two component development system through the toner shape factor. In particular, the present embodiments provide a method for controlling...
8753787 Light pattern exposure method, photomask, and photomask blank  
A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a photomask. The photomask includes a transparent substrate and a pattern of optical film of a...
8753798 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head  
A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic...
8754852 Light guide plate for system inputting coordinate contactlessly, a system comprising the same and a method for inputting coordinate contactlessly using the same  
Disclosed are a light guide plate for a non-contact type coordinate input system, a system including the same, and a non-contact type coordinate input method using the same. More particularly, the...
8753789 Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of manufacturing electrophotographic photosensitive member  
An electrophotographic photosensitive member comprises a charge-transporting layer which is a surface layer of the electrophotographic photosensitive member; wherein the charge-transporting layer...
8753799 Method for fabricating LCD  
The present invention relates to a method for fabricating an LCD. The method includes fabricating a MAV layer on a glass substrate. The step of fabricating the MAV layer on the glass substrate...
8753803 Pattern forming method  
According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the...
8753791 Laser-markable compositions  
A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.
8753800 Process for producing ejection orifice forming member and liquid ejection head  
A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator,...
8753802 Pattern forming method, chemical amplification resist composition and resist film  
A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film...
8753788 Apparatus of repairing a mask and a method for the same  
An apparatus includes a probe tip configured to contact the mask, a cantilever configured to mount the probe tip wherein the cantilever includes a mirror, an optical unit having a light source...
8753793 Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method  
Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution c...
8753794 N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition  
Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is ...
8753796 Photoresist composition  
The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl...
8753801 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same  
A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound...
8753795 Photoresist composition  
The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly...
8753790 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom  
Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone...
8756550 Method to ensure double patterning technology compliance in standard cells  
An integrated circuit with standard cells with top and bottom metal-1 and metal-2 power rails and with lateral standard cell borders that lie between an outermost vertical dummy poly lead from one...
8753786 Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank  
A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a halftone phase shift mask. The mask includes a transparent substrate and a pattern of halftone...
8753805 Patterning process and resist composition  
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic...