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8841056 Toner and process for producing toner  
A toner is provided which has toner particles and an inorganic fine powder; the toner particles being obtained by suspension polymerization using a specific polar resin. The toner is a toner in...
8841051 Full color image forming method using two cyan toners  
Provided is a full color image forming method wherein high color reproducibility especially on a blue system and a green system can be obtained and an excellent gradation property can be obtained...
8841066 Photoresist stripping technique  
Photoresist stripping solutions are disclosed. An exemplary solution includes an organic solvent and an organic base, wherein the organic base is represented by the formula: wherein R1—Z1, R...
8842144 Laser induced thermal imaging apparatus and method for manufacturing organic light emitting diode (OLED) display device using the same  
A laser induced thermal imaging (LITI) apparatus and a method of manufacturing an organic light emitting diode (OLED) display device using the LITI apparatus. The method of manufacturing the OLED...
8841064 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film  
Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6;...
8841047 Extreme ultraviolet lithography process and mask  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
8841050 Photosensitive resin composition and applications thereof  
A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a silsesquioxane having at least two thiol groups in a molecule; and a solvent....
8841054 Image-forming method, magnetic toner, and process unit  
An image-forming method is provided which can provide stable image density irrespective of use environments and does not cause image defects such as fogging, tailing, or transfer voids, even when...
8840769 Resin composition containing catalyst precursor for electroless plating in forming electro-magnetic shielding layer, method of forming metallic pattern using the same, and metallic pattern formed by the same method  
A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator;...
8841065 Manufacturing method of exposure apparatus and device manufacturing method  
A manufacturing method of an exposure apparatus includes adjusting a positioning device that determines a positional relation at the time of docking between a body and a stage module such that a...
8841049 Electron beam data storage system and method for high volume manufacturing  
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality...
8842257 Substrate treatment method, substrate treatment apparatus, and non-transitory computer storage medium  
A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes...
8841062 Positive working photosensitive material  
Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
8841053 Organic photoconductors with latex polymer overcoat layers  
An organic photoconductor includes: a conductive substrate; a charge generation layer on the conductive substrate; and a charge transport layer on the charge generation layer. An overcoat layer is...
8841061 Positive resist composition and patterning process  
A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and...
8835093 Resist underlayer film forming composition containing silicon having anion group  
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition...
8835215 Method for forming superior local conductivity in self-organized nanodots of transparent conductive film by femtosecond laser  
A simple method is developed in the present invention for fabricating periodic ripple microstructures on the surface of an ITO film by using single-beam femtosecond laser pulses. The periodic...
8835100 Double patterning by PTD and NTD process  
A method of manufacturing using a double patterning method is provided. The double patterning method uses a first developer and a second developer that are different. For example, the first...
8835868 Multi charged particle beam writing apparatus  
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a...
8835099 Lithographic printing plate precursor  
The present invention provides a lithographic printing plate precursor which exhibits satisfactory ink cleanup and restart toning characteristics during printing. Disclosed is a lithographic...
8835090 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Developing apparatus and developing method
 
An object of the present invention is to provide a developing apparatus which is less affected by usage environments, has high development efficiency for long term use and can provide a high...
8835096 Chemically amplified negative resist composition and patterning process  
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a...
8835091 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition  
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a...
8835092 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative  
There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile...
8835881 Drift correction method and pattern writing data generation method  
A writing area of a sample is divided into a plurality of stripes having a width corresponding to an area density of a pattern to be written on the sample with a charged-particle beam. The writing...
8835589 Synthesis of abietic acid-based macromer for polyester resin process  
An improved polycondensation method for bio-based polyesters synthesized from pre-formed macromers and the corresponding compositions, which are useful for producing binder polymers for imaging...
8835084 Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using same  
An electrophotographic photoreceptor including an electroconductive substrate, a charge generation layer located overlying the electroconductive substrate, a hole transport layer located on the...
8835845 In-situ STEM sample preparation  
A method for TEM/STEM sample preparation and analysis that can be used in a FIB-electron microscope system without a flip stage. The method allows a dual beam FIB electron microscope system with a...
8834749 Photosensitive resin composition and light blocking layer using the same  
Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a...
8835102 Patterning process and composition for forming silicon-containing film usable therefor  
The invention provides a patterning process for forming a negative pattern by lithography, comprising at least the steps of: using a composition for forming silicon-containing film, containing...
8835098 Method of forming pattern  
Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an...
8832964 System and method for recovering turpentine during wood material processing  
A system, method and configuration for recovering turpentine during the manufacturing of wood chips, wood pellets or other substances that may include turpentine. In general, a turpentine recovery...
8835087 Polyester for toner  
A polyester for a toner obtained by polycondensing an aliphatic hydroxycarboxylic acid compound having a total number of hydroxy group or groups and carboxyl group or groups of 4 or more; an...
8835082 Method and system for E-beam lithography with multi-exposure  
The present disclosure provides a method for electron-beam (e-beam) lithography patterning. The method includes forming a resist layer on a substrate; performing a first e-beam exposure process to...
8835085 Low strain anti-curl back coating for flexible imaging members  
Present embodiments relate generally to the flexible electrostatographic imaging members prepared to comprise a plasticized charge transport layer, plasticized ground strip layer, and a novel...
8835101 Method for fabricating a circuit  
A method for fabricating a circuit, by defining a first set of resist features on a substrate and corresponding to a first mask layout, followed by defining a second set of resist features on the...
8835095 Resist composition and method for producing resist pattern  
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble...
8835094 Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process  
Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having...
8835522 Polyurethane polymer having bisphenol group and photoimageable composition containing the same  
The present invention provides a polymer having the structure of formula (I) wherein n, R1, R2, R3, R4, R5, R6, a, b and c are as defined in the specification. The present invention also provides a...
8835081 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor  
The present invention provides a polymerizable composition including (A) a photoradical polymerization initiator represented by following Formula (1), the photoradical polymerization initiator...
8835097 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process  
There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate...
8835103 Lithography process and structures  
A photo resist layer includes a first region and a second region. A treatment layer is applied to the photo resist layer.
8835086 Electrostatic image developing toner  
An electrostatic image developing toner including: a binder resin; a colorant; and a wax, wherein the intensity ratio of an absorbance at 2,850 cm−1 derived from the wax to an absorbance at 828 c...
8838306 Method and device for operating a drive unit  
In a method and a device for operating a drive unit, a first output variable of the drive unit is restricted; a setpoint value of a second output variable of the drive unit is specified; and an...
8835083 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device  
A manufacturing method of a photomask by which a resist pattern corresponding to a pattern with designed values can be formed, a method for optical proximity correction, and a manufacturing method...
8835089 Toner and method for producing the same, and two-component type developer  
A toner containing toner base particles and an external additive, wherein regions with different tribocharging polarities with respect to a magnetic carrier are present in a domain-matrix structure...
8836089 Positive photosensitive resin composition, method of creating resist pattern, and electronic component  
The positive-type photosensitive resin composition according to the present invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound that produces an acid by light,...
8835088 Recycled polyethylene terephthalate-based toner  
The present disclosure describes toner comprising a portion of resin comprising a polyethylene terephthalate oligomer.
8828644 Compound, photosensitive composition comprising the same and photosensitive material  
The present application relates to a novel compound, a photosensitive composition comprising the same and a photosensitive material.
8828645 Negative resist composition and patterning process  
There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C)...