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7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
A method of generating a mask is provided that optimizes the placement and shape of optical proximity correction (OPC) features such as scattering bars. According to some aspects, the method...
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7618754 |
Pattern formation method
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting...
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7618753 |
Photomask blank, photomask and method for producing those
A metal film is provided as a light shielding layer on one principle surface of a photomask substrate. The metal film cannot be substantially etched by chlorine-based dry etching containing oxygen...
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7618752 |
Deformation-based contact lithography systems, apparatus and methods
One or more of a contact lithography module, a pattern tool and a substrate include a strain control region to prevent deformation-related misalignment.
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7618751 |
RET for optical maskless lithography
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
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7617473 |
Differential alternating phase shift mask optimization
A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width....
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7615837 |
Lithography device for semiconductor circuit pattern generation
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and...
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7615336 |
Method of fabricating a display device by using a stepped halftone mask to form a three-step photoresist pattern on a material layer for etching and ashing
The present application relates to a method of fabricating a display device, including the steps of forming at least one to-be-patterned material layer on a substrate and forming a photo-resist...
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7615319 |
Quick and accurate modeling of transmitted field
Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections,...
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7615318 |
Printing of design features using alternating PSM technology with double mask exposure strategy
For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the...
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7614034 |
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology
A method of applying optical proximity correction features to a mask having a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be...
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7614031 |
Drawing apparatus with drawing data correction function
A data correcting apparatus is for correcting drawing data representing a drawing pattern included in a quadrangular drawing area of a drawing subject. The correction process is based on an ideal...
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7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more...
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7611809 |
Multi-layer, attenuated phase-shifting mask
The present invention provides an attenuated phase shift mask (“APSM”) that, in each embodiment, includes completely transmissive regions sized and shaped to define desired semiconductor device...
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7611808 |
Halftone type phase shift mask blank and halftone type phase shift mask
A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of...
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7611807 |
Method for forming poly-silicon film
In the present invention, a method is used for forming a poly-silicon film that uses sequential lateral solidification (SLS) with two laser irradiations using a mask for patterning the laser beam...
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7611806 |
Sub-wavelength diffractive elements to reduce corner rounding
The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first...
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7609805 |
Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process
A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method...
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7608370 |
Exposure mask and method for manufacturing semiconductor device using the same
An exposure mask of a semiconductor device comprises a substrate. Recesses are etched on a surface of the substrate to change a refractive index of an incident light. The changed refractive index...
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7608369 |
Photomask to which phase shift is applied and exposure apparatus
A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an...
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7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including...
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7608367 |
Vitreous carbon mask substrate for X-ray lithography
The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask...
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7605908 |
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field...
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7605906 |
Patterning systems using photomasks including shadowing elements therein
A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking...
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7605390 |
Programmable photolithographic mask based on semiconductor nano-particle optical modulators
Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used...
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7605350 |
System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing
In general, the system provides for soft baking a semiconductor wafer so that photoresist layers on the wafer are free of surface voids or craters. In particular, the system provides for...
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7604925 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7604912 |
Local flare correction
A correction of a local flare generated at a time of exposure when manufacturing a semiconductor device, wherein a substantial numerical aperture to a pattern in a region to be exposed is...
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7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern
An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions...
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7604909 |
Method for improved manufacturability and patterning of sub-wavelength contact hole mask
A method of applying optical proximity correction features to a mask having a target pattern comprising a plurality of features to be imaged. The method includes the steps of defining a set of...
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7604908 |
Fine pattern forming method
A fine pattern forming method includes the first step of depositing a plasma reaction products on a sidewall of a patterned mask layer to increase a pattern width thereof, the second step of...
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7604907 |
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
Mask sets are provided which may be used to define a first pattern region that has a first pitch pattern and a second pattern region that has a second pitch pattern during the fabrication of a...
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7604906 |
Films for prevention of crystal growth on fused silica substrates for semiconductor lithography
Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask...
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7604905 |
Photomasks
Photomasks are disclosed. A disclosed example photomask comprises: a first pattern located along an axis of the photomask; at least one second pattern located a distance from and a predetermined...
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7604904 |
Pellicle for lithography
There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle...
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7604903 |
Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK)
A mask is provided to be used with nanoprint lithography processes to facilitate reproduction of small features required for the production of integrated circuits. A translucent substrate is...
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7603648 |
Mask design using library of corrections
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a...
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7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask ( 11 ) are calculated by first calculation unit ( 12 ) based on the relationship with...
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7601469 |
Plasma etching chamber and method for manufacturing photomask using the same
A plasma etching chamber of a plasma etching apparatus used in an etching process for manufacturing a photomask and a method for manufacturing a photomask using the same. The plasma etching chamber...
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7601468 |
Process for manufacturing half-tone phase shifting mask blanks
For efficiently manufacturing half-tone phase shifting mask blanks having uniform product qualities, which enables the prevention of optical property variations when the blanks are mass-produced,...
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7601467 |
Method of manufacturing EUVL alternating phase-shift mask
A method of manufacturing an extreme ultra-violet lithography (EUVL) alternating phase-shift mask comprises preparing a substrate having a reflective layer, forming a light-shielding layer pattern...
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7601466 |
System and method for photolithography in semiconductor manufacturing
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer...
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7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a...
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7599064 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between...
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7598020 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7598007 |
Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method
A reticle of the present invention has a main pattern ( 11 ) and a monitor pattern ( 12 ) each having a different thickness of a light-shielding film ( 4 ), the light-shielding film ( 4 ) of the...
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7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer
A method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer is described. An in-situ interferometer is encoded, or augmented, with special or missing...
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7598005 |
Photomask and manufacturing method of the same, and pattern forming method
Data (pattern data) ( 21 ) of a mask data ( 2 ) to form a mask pattern is made into an octagon. An electron-beam lithography system has a high resolution, and it requires a polygonal pattern data...
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7598004 |
Film-depositing target and preparation of phase shift mask blank
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one...
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7596420 |
Device manufacturing method and computer program product
A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose...
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