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8182969 |
Lithographic processing method, and device manufactured thereby
A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test...
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8183544 |
Correcting substrate for charged particle beam lithography apparatus
A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon...
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8183123 |
Method of forming mark in IC-fabricating process
A method of forming a mark in an IC fabricating process is described. Two parts of the mark each including a plurality of linear patterns are respectively defined by two exposure steps that either...
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8181126 |
Differential alternating phase shift mask optimization
A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width....
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8178281 |
Method for improving sensitivity of resist
It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The...
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8179523 |
Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion...
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8181127 |
Standardization of assist pattern inserted into outermost pattern for enhancing depth of focus margin
A method for processing optical proximity correction is disclosed which eliminates a need for repeated implementation of experiments and result in a reducing the processing time as compared to...
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8173333 |
Reduced lens heating methods, apparatus, and systems
In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque...
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8173544 |
Integrated circuit having interleaved gridded features, mask set and method for printing
A method (300) for fabricating an integrated circuit includes the step of providing a substrate having a semiconductor surface (305). For at least one masking level (e.g. gate electrode, contact or...
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8173331 |
Method and apparatus for sub-pellicle defect reduction on photomasks
In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a...
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8173357 |
Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method
The method of forming an etching mask includes: forming a mask layer on an object layer that is to be etched, to form an etching mask used in etching the object layer; forming a first mask layer on...
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8175737 |
Method and apparatus for designing and integrated circuit
Method and apparatus for designing an integrated circuit by adding a plurality of control points to an integrated circuit wafer design. Each control point has at least one attribute. Then, an...
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8173332 |
Reflection-type exposure mask and method of manufacturing a semiconductor device
A reflection-type exposure mask includes a multilayer reflective film in a main surface and serving as a high reflective region to an exposure light, and an absorber pattern on the multilayer...
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8168352 |
Reflective mask blank for EUV lithography and mask for EUV lithography
Provision of an EUV mask whereby an influence of reflected light from a region outside a mask pattern region is suppressed, and an EUV mask blank to be employed for production of such an EUV mask....
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8171433 |
Method of calculating pattern-failure-occurrence-region, computer program product, pattern-layout evaluating method, and semiconductor-device manufacturing method
Method of calculating pattern-failure-occurrence-region comprising calculating a pattern failure occurrence region using relation information and a layout used for forming a convex section, the...
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8168351 |
Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank
A photomask blank which is manufactured by depositing a phase shift film on a substrate and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment...
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8163467 |
Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method
A dummy light-exposed substrate used for dummy light-exposure in an immersion exposure apparatus which exposes a substrate to light via a projection optical system and a liquid, comprises a...
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8163444 |
Mask for crystallizing a semiconductor layer and method of crystallizing a semiconductor layer using the same
A mask for crystallizing a semiconductor layer includes a plurality of first main-slit portions, a plurality of second main-slit portions, upper slit portion and lower slit portion. The first...
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8163445 |
Extreme ultraviolet mask and method for fabricating the same
An EUV mask comprises a multi-reflecting layer is formed over a substrate and reflecting EUV light; an absorber layer pattern defining a sidewall formed over the multi-reflecting layer formed and...
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8163446 |
Method for manufacturing photomask using self-assembled molecule layer
A method for fabricating a photomask using a self-assembled molecule layer, comprising: forming, on a transparent substrate, a stacked structure of a phase shift pattern and a light shielding...
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8159649 |
Exposure method, exposure apparatus, photomask and method for manufacturing photomask
There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each...
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8158311 |
Method for managing light exposure mask and light exposure mask
An object of the present invention is to provide a method for managing a light exposure mask wherein: a mask inspection or a wafer inspection, in order to manage a contamination of a light exposure...
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8158306 |
Method and system for combining photomasks to form semiconductor devices
A photomask set includes at least two masks that combine to form a device pattern in a semiconductor device. Orthogonal corners may be produced in a semiconductor device pattern to include one edge...
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8159654 |
Pressure body and pellicle mounting apparatus
A pressure body comprises: three or more pressure pins 40 that come into contact with a photomask 70 at downward positions in a pressure direction D; a main body 10 provided with an opening 16, the...
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8158305 |
Photomask for extreme ultraviolet lithography and method for fabricating the same
A method for fabricating a photomask for extreme ultraviolet lithography is provided. A reflection layer reflecting extreme ultraviolet light is formed over a transparent substrate having a main...
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8161425 |
Method and system for implementing timing aware metal fill
An improved approach for implementing metal fill on an electrical device without causing creating cross-coupling capacitance problems is disclosed. Timing aware metal fill insertion is performed to...
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8153337 |
Photomask and method for fabricating source/drain electrode of thin film transistor
A photomask for fabricating a thin film transistor (TFT) is disclosed. The photomask includes a translucent layer disposed on a transparent substrate and covering U-shaped and rectangular...
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8153338 |
Apparatus and method for repairing photo mask
An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron...
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8153339 |
Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the...
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8153522 |
Patterning mask and method of formation of mask using step double patterning
A method of forming a mask for use in fabricating an integrated circuit includes forming first non-removable portions of a photoresist material through a mask having a plurality of apertures,...
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8156450 |
Method and system for mask optimization
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include...
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8153334 |
Method for stripping pellicle and stripping apparatus used therein
A method for stripping a pellicle from an exposure master plate is provided, the pellicle being a lithographic pellicle that includes a pellicle frame, a pellicle film stretched over one end face...
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8153336 |
Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask
A photomask substrate with a substantially uniform thickness comprises: a first surface, which is a continuous curved surface whereon a mask pattern is to be formed; and a second surface. The first...
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8153335 |
Lithography masks, systems, and manufacturing methods
Lithography masks, lithography systems, methods of manufacturing lithography masks, methods of altering material layers of semiconductor devices, and methods of manufacturing semiconductor devices...
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8151222 |
Method for decomposing designed pattern layout and method for fabricating exposure mask using the same
A method for decomposing a designed pattern layout and a method for fabricating an exposure mask using the same. After the designed pattern layout is automatically decomposed to obtain a plurality...
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8151225 |
Pattern layout designing method, semiconductor device manufacturing method, and computer program product
A graph is created in which mask patterns adjacent to one another at a distance in which desired printing resolution cannot be obtained in a lithography process among mask patterns generated based...
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8148037 |
Optical component for EUVL and smoothing method thereof
The present invention is to provide a method for smoothing the optical surface having a concave defect of an optical component for EUVL. The present invention relates to a method for smoothing the...
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8148036 |
Photomask blank and photomask
A photomask blank comprises a transparent substrate, a light-shielding film of an optionally transition metal-containing silicon material, and an etching mask film of a chromium compound base...
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8151223 |
Source mask optimization for microcircuit design
A method and apparatus for generating a source illuminator profile and a mask design, subsequently optimizing the source illuminator profile and mask design based upon a set of target intensity...
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8142963 |
Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
A before-chucking main surface shape is measured in an actual measurement region of a main surface of a substrate which has been precision-polished and, based on the before-chucking main surface...
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8144967 |
Mask data generation method, mask fabrication method, exposure method, device fabrication method, and storage medium
The invention provides a generation method of generating data of a mask, comprising a calculation step of calculating an aerial image formed on an image plane of a projection optical system, an...
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8146024 |
Method and system for process optimization
A method and apparatus for process optimization is provided. Process optimization improves parametric and functional yield post mask manufacturing.
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8145337 |
Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment
A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a...
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8142961 |
Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design...
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8142959 |
Method and apparatus for gating photomask contamination
A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to...
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8142958 |
EUV mask and method for repairing an EUV mask
An EUV mask comprises a substrate, a reflective multilayer on the substrate, a phase-shifting material disposed above the multilayer in at least one first portion of the substrate, and a masking...
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8142962 |
Reflective photomask and method of fabricating the same
A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the...
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8142960 |
Exposure method, mask data producing method, and semiconductor device manufacturing method
An exposure method has irradiating a mask with light based on an exposure performing condition, a first mask pattern and a second mask pattern being formed in the mask, and projecting images of the...
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8141009 |
Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process
A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the...
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8141007 |
Method and apparatus for identifying and correcting phase conflicts
One embodiment of the present invention provides a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the layout phase-assignable....
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