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7427457 |
Methods for designing grating structures for use in situ scatterometry to detect photoresist defects
The present invention discloses a system and method for designing grating structures for use in situ scatterometry during the photolithography process to detect a photoresist defect (e.g.,...
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7427456 |
Layout of a vertical pattern used in dipole exposure apparatus
A layout of vertical patterns in a mask used in a dipole exposure apparatus employing a dipole as an aperture, including the vertical patterns disposed vertically to the dipole, and tabs, having...
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7427458 |
System and method for critical dimension reduction and pitch reduction
A method of forming a feature includes forming a mask of a first material on an underlying layer, the mask having an incorrect profile. The profile of the mask is corrected and a feature is formed...
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7425393 |
Phase shift photomask and method for improving printability of a structure on a wafer
A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface...
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7425390 |
Preparation of halftone phase shift mask blank
In preparing a halftone phase shift mask blank, a metal and silicon-containing compound film serving as a halftone phase shift film is formed on a transparent substrate by a co-sputtering process...
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7426712 |
Lithography simulation method and recording medium
A lithography simulation method includes: taking in design data of a pattern to be formed on a substrate and mask data to prepare a mask pattern used in forming a latent image of the pattern on the...
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7425392 |
Lithographic template and method of formation and use
A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template ( 10 ) and the method...
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7425389 |
Line photo masks and methods of forming semiconductor devices using the same
According to various embodiments of the invention, there are provided line photo masks having a plurality of line patterns. These masks, which are suitable for preventing electric shorts between...
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7425391 |
Highly-corrected mask
The present invention discloses a pattern-distributed mask. It comprises a plurality of mask regions whose images will be merged into a single image (e.g. by interleaving) on an image-carrier (e.g....
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7424699 |
Modifying sub-resolution assist features according to rule-based and model-based techniques
Modifying sub-resolution assist features includes receiving a mask pattern for a photolithographic mask. The mask pattern includes main features, and the photolithographic mask is operable to...
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7424700 |
Method and system for selective optical pattern compensation
A method and system for making a photographic mask. The method includes determining a first contact area, processing information associated with the first contact area, and determining whether a...
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7422841 |
Exposure control for phase shifting photolithographic masks
Mask and integrated circuit fabrication approaches are described to facilitate use of masks where substantially all of a layout is defined using phase shifting. Exposure settings including relative...
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7422828 |
Mask CD measurement monitor outside of the pellicle area
A method of fabricating a photomask having a pellicle on a photomask substrate that facilitates accurate measurement of a critical dimension on the photomask, without requiring removal of the...
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7422830 |
Method for detecting failure of database patterns of photo mask
A method for detecting failure of database patterns of a photo mask including designing the database patterns of the photo mask according to a design rule of a semiconductor element; performing...
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7422829 |
Optical proximity correction (OPC) technique to compensate for flare
A method of adjusting a reticle layout to correct for flare can include determining a localized reticle pattern density across the reticle layout and determining a relationship between reticle...
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7423733 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device
The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection...
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7419912 |
Laser patterning of light emitting devices
Light extraction features are provided for a light emitting device having a substrate and a semiconductor light emitting element on the substrate by shaping a surface of a layer of semiconductor...
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7419767 |
Phase-shifting mask and method of forming pattern using the same
A phase-shifting mask suppresses increase of the minimum pattern-element size due to optical proximity effect. The mask a first pattern region formed on a transparent substrate, including a first...
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7419749 |
Halftone phase shift mask blank, halftone phase shift mask and their preparation
In a halftone phase shift mask blank comprising a halftone phase shift film on a substrate which is transparent to exposure light, the halftone phase shift film comprises a metal, silicon, and...
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7419748 |
Photomask with reduced electrostatic discharge defects
A photomask and a method for forming a photomask are disclosed in which the photomask pattern is modified to bridge features that are likely to produce electrostatic discharge related defects. In...
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7420190 |
Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device
A length measurement pattern is used for forming a contact and a via on a diffusion layer and on a lower layer interconnect, respectively, with a photoresist. The length measurement pattern...
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7416819 |
Test mask for optical and electron optical systems
A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4 , which are implemented such that each sub-mask 4 ...
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7418682 |
Method and mechanism for performing DRC processing with reduced passes through an IC design
A method and mechanism is disclosed for performing a spacing rule DRC check that does not require an excessive number of passes through the IC design. In one approach, a two-pass approach is...
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7418694 |
Method for generating test patterns utilized in manufacturing semiconductor device
A method for generating test patterns utilized in manufacturing a semiconductor device includes creating mini-data concerning a partial area pattern used in designing the semiconductor device,...
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7417715 |
Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices
In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance...
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7416820 |
Pellicle film optimized for immersion lithography systems with NA>1
An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle...
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7413834 |
Photomask with alignment marks for the current layer
A photomask with alignment marks for the current layer is provided with four edges. The photomask includes main patterns, an inter-scribe lane pattern sited between the main patterns, an...
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7413832 |
Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask
In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid having a pH value between 7.0 and 7.6 that contains...
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7414713 |
Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device
A shape value of a pattern having a pivotal characteristic is measured (step S 1 ), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of...
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7413831 |
Reflective exposure mask, and method for producing and using the same
When producing an exposure mask including a stack of reflective layers for reflecting extreme ultraviolet light, an absorber film for covering a light reflection plane of the stack of reflective...
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7415694 |
Graph based phase shift lithography mapping method and apparatus
For phase-shifting micro lithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first...
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7413833 |
Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask
An active area pattern is formed atop a deep trench pattern with a single exposure using an alternative phase-shift mask. To prevent adjacent spaces of opposite phase from intersecting one another...
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7410732 |
Process for producing a mask
In a process for producing a mask, layout data is provided for a semiconductor layout. The layout data is fractionated to create control data for a pattern generator. Slivers are identified slivers...
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7410733 |
Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel
A composite extreme ultraviolet light (EUV) mask absorber structure and method are disclosed to address the structural and processing requirements of EUV lithography. A first mask absorber layer...
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7407729 |
EUV magnetic contrast lithography mask and manufacture thereof
An EUV Lithography mask, a fabrication method, and use method thereof is provided. A preferred embodiment comprises a substrate, a Bragg reflector disposed upon the substrate, a buffer disposed...
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7407730 |
Exposure pattern or mask and inspection method and manufacture method for the same
An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a...
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7405025 |
Reticle and method of fabricating semiconductor device
Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask. Critical-dimension patterns are formed in the dicing lines so as...
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7405031 |
Lithographic apparatus and device manufacturing method
A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a...
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7405414 |
Method and apparatus for patterning a workpiece
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle...
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7405024 |
Lithographic mask, and method for covering a mask layer
A lithographic mask having a mask substrate ( 3 ) and a patterned mask layer ( 4 ) which includes mask structures ( 5 ) and can be transferred by lithography to a further substrate is disclosed....
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7402363 |
Pattern forming method and system, and method of manufacturing a semiconductor device
A pattern forming method of forming a desired pattern on a semiconductor substrate is disclosed, which comprises extracting a first pattern of a layer, extracting a second pattern of one or more...
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7404173 |
Intermediate layout for resolution enhancement in semiconductor fabrication
Intermediate resolution-enhancement state layouts are generated based upon an original non-resolution enhanced layout of an integrated circuit and an associated resolution-enhanced layout. The...
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7403276 |
Photomask for measuring lens aberration, method of its manufacture, and method of its use
A photomask for measuring lens aberration, a method of manufacturing the photomask, and a method of measuring lens aberration using the photomask are provided. In an embodiment, the photomask...
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7404167 |
Method for improving design window
A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes...
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7402364 |
Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same
An alternating phase shift mask with dark loops thereon, a memory array fabricated with the alternating phase shift mask, and a method of fabricating the memory. The dark loops in the mask always...
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7402362 |
Method and system for reducing and monitoring precipitated defects on masking reticles
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing...
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7399558 |
Mask and manufacturing method thereof and exposure method
A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are...
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7399560 |
Method for manufacturing mask, method for manufacturing wiring pattern, and method for manufacturing plasma display
A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the...
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7399557 |
Photomask correcting method and manufacturing method of semiconductor device
A writing pattern data generating method for, in order to form a first photomask for use in a manufacturing method of a semiconductor device which including forming a first resist pattern on a mask...
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7401010 |
Methods of forming radiation-patterning tools; carrier waves and computer readable media
The invention includes a method for placement of sidelobe inhibitors on a radiation-patterning tool. Elements of the tool are represented by design features in a modeling domain. The modeling...
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