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7534531 |
Full phase shifting mask in damascene process
A full phase shifting mask (FPSM) can be advantageously used in a damascene process for hard-to-etch metal layers. Because the FPSM can be used with a positive photoresist, features on an original...
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7531275 |
Photomask assembly and method for protecting the same from contaminants generated during a lithography process
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly...
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7532307 |
Focus determination method, device manufacturing method, and mask
One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings and using a scatterometer, e.g. off-line, to...
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7531293 |
Radiation sensitive self-assembled monolayers and uses thereof
The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group...
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7533363 |
System for integrated circuit layout partition and extraction for independent layout processing
A system and method for integrated circuit design layout processing are disclosed to partition and extract the layout and optimize settings individually for an optimal solution to provide...
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7527901 |
Method of repairing phase shift mask
A method of repairing a phase shift mask includes exposing upper and side surfaces of the phase shift pattern of the mask, selectively forming a passivation layer on the surfaces of the exposed...
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7527900 |
Reticle and optical proximity correction method
An OPC method includes providing a primary mask having a primary pattern, forming an assist mask having a correction pattern substantially complementary to the primary pattern, and forming a...
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7527918 |
Pattern forming method and method for manufacturing a semiconductor device
A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the...
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7524593 |
Exposure mask
An exposure mask provided with a semi-transparent film, capable of forming a resist in which a convex portion is not formed in an end portion and the end portion has gentle shape. In an exposure...
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7524592 |
Optical proximity correction mask and method of fabricating color filter
An optical proximity correction mask used for fabricating a color filter includes a substrate, a mask pattern and a mending pattern. Wherein, the mask pattern is disposed on the substrate. The mask...
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7524591 |
Photomask and manufacturing method thereof, fabrication process of an electron device
A photomask made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip...
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7524764 |
Method of forming film pattern, device, method of manufacturing the same, electro-optical apparatus, and electronic apparatus
A method of forming a film pattern by disposing a functional liquid on a substrate, includes: forming banks on the substrate; disposing the functional liquid in areas partitioned by the banks; and...
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7521157 |
Cross-shaped sub-resolution assist feature
Cross-shaped sub-resolution assist features may be utilized to print lithographic patterns in semiconductor fabrication processes. The crosses may be isolated structures or may be part of a grid...
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7521156 |
Photo mask and method of correcting the transmissivity of a photo mask
A photo mask for use in forming a pattern, such as a photoresist pattern, is corrected to compensate for discrepancies in the transmissivity of the photo mask which results in the pattern having a...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7522263 |
Lithographic apparatus and method
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the...
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7523438 |
Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of...
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7517642 |
Plane waves to control critical dimension
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings...
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7517618 |
Mask, exposure method and production method of semiconductor device
A mask capable of improving accuracy of transferring a pattern by making the configuration of a beam portion regular and simple, an exposure method using the mask and a production method of a...
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7517617 |
Mask blank for use in EUV lithography and method for its production
This invention relates to a mask blank for use in EUV lithography and a method for its production. The mask blank comprises a substrate with a front side and a rear side whereby a coating is...
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7514345 |
Electroactive polymers for lithography
Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate.
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7514185 |
Preparation of photomask blank and photomask
A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40...
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7514184 |
Reticle with antistatic coating
A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R 4 N) + Cl − . A pellicle structure comprising an...
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7514186 |
System for electrically connecting a mask to earth, a mask
A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the...
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7514183 |
Method for performing transmission tuning of a mask pattern to improve process latitude
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an...
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7511282 |
Sample preparation
Methods of extracting a TEM sample from a substrate include milling a hole on the sample and inserting a probe into the hole. The sample adheres to the probe, and can be processed on transferred...
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7512926 |
Phase-shifting masks with sub-wavelength diffractive optical elements
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a...
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7510980 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist...
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7512928 |
Sub-resolution assist feature to improve symmetry for contact hole lithography
A method of making a mask design having optical proximity correction features is provided. The method can include obtaining a target pattern comprising a plurality of target pattern features...
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7512927 |
Printability verification by progressive modeling accuracy
A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively...
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7507661 |
Method of forming narrowly spaced flash memory contact openings and lithography masks
A method is provided for creating optical features on a lithography mask for use in patterning a series of openings of an etch mask on a semiconductor device wafer, comprising creating a series of...
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7507960 |
Apparatus and method for controlled particle beam manufacturing
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream...
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7509621 |
Method and apparatus for placing assist features by identifying locations of constructive and destructive interference
One embodiment of the present invention provides a system that determines a location in a layout to place an assist feature. During operation, the system receives a layout of an integrated circuit....
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7508051 |
Wafer with optical control modules in dicing paths
In a wafer ( 1 ) with a number of exposure fields ( 2 ), each of which exposure fields ( 2 ) comprises a number of lattice fields ( 3 ) with an IC ( 4 ) located therein, two groups ( 5, 7 ) of...
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7507505 |
Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography
The present invention relates to a method for manufacturing a reflective multi-layered thin film mirror for an extreme ultraviolet radiation (EUV) exposure process that is one of the next...
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7509623 |
Manufacturing method of semiconductor device
A pattern correction method executed by a computer includes a first correction and a second correction. The first correction is executed by calculating a correction value, in consideration for an...
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7509620 |
Dual phase shift photolithography masks for logic patterning
A pair of phase shift photolithography masks and a process for deriving them is described. In one embodiment, the invention includes deriving a complex electric field estimate for an intended...
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7507506 |
Method and structure for creating a multilayer mask (MLM or MLR) using multiple write tools to minimize mask write and substrate costs
A method of printing multi-layer masks includes analyzing masking requirements of the photomask includes creating pairings of all masking layers requiring substantially similar processing, wherein...
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7504185 |
Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
A method for depositing, by ion beam sputtering, a multilayer reflective coating of a reflective mask blank for EUV lithography on a substrate having a concave defect formed thereon, characterized...
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7504183 |
Chromeless phase-shifting mask for equal line/space dense line patterns
A phase-shifting mask suited for equal line/space, small pitched, dense line pattern is disclosed. The phase-shifting mask includes a transparent substrate, a partially shielded mesa line pattern...
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7504182 |
Photolithography mask repair
Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting...
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7504186 |
Photomask, method for producing the same, and method for forming pattern using the photomask
A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned...
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7504184 |
Phase-shifting mask for equal line/space dense line patterns
A phase-shifting mask suited for equal line/space, small pitched, dense line pattern is disclosed. The phase-shifting mask includes a transparent substrate, a partially shielded mesa line pattern...
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7501211 |
Laser mask and crystallization method using the same
A crystallization method includes providing a substrate having a silicon thin film; positioning a laser mask having first to fourth blocks on the substrate, each block having a periodic pattern...
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7501156 |
Pattern formation substrate and method for pattern formation
A pattern formation substrate comprising a substrate having thereon a hydrophobic region exhibiting repellency to liquid drops and a hydrophilic line exhibiting affinity with liquid drops. The...
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7502103 |
Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table...
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7501213 |
Method for forming generating mask data
A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion ...
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7501212 |
Method for generating design rules for a lithographic mask design that includes long range flare effects
A method is described for computing distance based and pattern density based design rules for the mask layout design of a VLSI chip so that the design satisfying the above design rules when...
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7503030 |
Correcting 3D effects in phase shifting masks using sub-resolution features
Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an...
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7498104 |
Phase shift photomask
A phase shift photomask is described, including a transparent substrate, and at least one isolated linear pattern, dense linear patterns and a transparent phase-shift region on the substrate. The...
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