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7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7562337 |
OPC verification using auto-windowed regions
A method is provided for performing optical proximity correction (“OPC”) verification in which features of concern of a photomask are identified using data relating to shapes of the photomask,...
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7560199 |
Polarizing photolithography system
A polarizing photolithography reticle system is provided including providing a reticle substrate, forming polarization structures on the reticle substrate, and etching circuit patterns on the...
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7562334 |
Method for manufacturing a photomask
A method for manufacturing a photomask based on design data includes the steps of forming a figure element group including a figure element in a layout pattern on the photomask and a figure element...
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7560198 |
Photo-mask having exposure blocking region and methods of designing and fabricating the same
A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density...
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7562336 |
Contrast based resolution enhancement for photolithographic processing
A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to...
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7562333 |
Method and process for generating an optical proximity correction model based on layout density
A method ( 300 ) for generating an optical proximity correction model for a mask layout having an asymmetric feature structure includes fabricating a mask ( 310 ) having a plurality of symmetric...
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7560196 |
Mask for exposing an alignment mark, and method and computer program for designing the mask
A mask provided with an alignment mark is presented. That mask includes at least one relatively high reflectance area(s) for reflecting radiation of an alignment beam of radiation, and relatively...
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7560197 |
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
A mask pattern data producing method is disclosed, which comprises preparing design pattern data in which contact holes are arranged on part of the grid points in matrix, preparing first mask...
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7560200 |
Mask data generation method
In the mask data generation method, optical simulation is performed on a dual gate including a first gate portion doped with an impurity of a first conductivity type and a second gate portion doped...
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7556893 |
Self-compensating mark design for stepper alignment
A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a...
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7556894 |
Mask with minimum reflectivity over absorber layer
A reflective mask may include an anti-reflective (AR) coating on an absorber layer to improve inspection contrast in an inspection system using deep ultraviolet (DUV) light. A silicon nitride (Si 3...
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7556892 |
Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
In a halftone phase shift mask blank comprising a substrate, a light absorbing film, and a phase shifter film, the light absorbing film contains a metal element of Group 4A in a distribution having...
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7556895 |
Mask, method of producing mask, and method of producing semiconductor device
To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns...
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7556897 |
Methods of forming reticles
The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a...
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7556900 |
Measuring the effect of flare on line width
In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a...
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7556891 |
Method and apparatus for contact hole unit cell formation
A method for forming a contact hole unit cell is provided. A light transparent contact hole region of a first phase is positioned at a first plane. A light transparent phase-shifting region of a...
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7556915 |
Process to form an isolated trench image in photoresist
An isolated hole in a photoresist layer is formed by surrounding it with additional, somewhat narrower, dummy hole features. The ratio of feature width to resist thickness is adjusted so that,...
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7556896 |
Inspection method and photomask
An inspection method, includes obtaining a first optical characteristic of a projection optical system by transferring an image of an aberration measurement unit of a photomask on a first resist...
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7553611 |
Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure
In formation of monolithic three dimensional memory arrays, a photomask may be used more than once. Reuse of a photomask creates second, third or more instances of reference marks used by the...
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7553678 |
Method for detecting semiconductor manufacturing conditions
A method for detecting semiconductor-manufacturing conditions includes providing a photomask with a plurality of pattern areas each having a plurality of test lines with different pitches, exposing...
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7550235 |
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged...
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7550392 |
Semiconductor device and method of manufacturing the same
A semiconductor device manufacturing method, includes a step of forming a first alumina film (underlying insulating film) 37 on a semiconductor substrate 20 , a step of forming a first...
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7550237 |
Systems and methods for determining width/space limits for mask layout
Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a...
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7550236 |
Multi wavelength mask for multi layer printing on a process substrate
A mask for exposing a first layer and a second layer on a process substrate, where the first and second layers are two separate layers of an integrated circuit. The mask includes a mask substrate...
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7549140 |
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate...
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7549143 |
Method and device for checking lithography data
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7547502 |
Exposure method
An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural...
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7544447 |
Method of forming a mask pattern for a semiconductor device
A method of forming a mask pattern from a design pattern. A method may effectively compensate for pattern distortion resulting from an optical proximity effect (OPE). A method may obtain a precise...
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7546397 |
Systems and methods for allowing multiple devices to share the same serial lines
Methods and systems for allowing multiple devices to share the same serial lines (e.g., SDIO, SEN and SCLK) are provided. Such devices can be located, e.g., on an optical pick-up unit. Each device...
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7544960 |
Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film...
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7544446 |
Masks of semiconductor devices and methods of forming patterns thereof
Disclosed are a mask of a semiconductor device and a method for forming a pattern thereof, which is capable of correcting a line width bias between a long line width and a short line width when a...
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7540921 |
Crystallization apparatus, crystallization method, phase modulation element, device and display apparatus
A phase modulation element according to the present invention has a first area having a first phase value based on a phase modulation unit having a predetermined size and a second area having a...
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7541116 |
Mask at frequency domain and method for preparing the same and exposing system using the same
A mask at frequency domain comprises a plurality of amplitude patterns positioned on a first surface of the mask and a plurality of phase patterns positioned on a second surface of the mask. The...
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7541117 |
Mask pattern generating method
Disclosed herein is a mask pattern generating method for generating a mask pattern to be formed in a Levenson phase shift mask used in a light exposure process for exposing a photoresist film...
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7543252 |
Migration of integrated circuit layout for alternating phase shift masks
Method, system and program product for migrating an integrated circuit (IC) layout for, for example, alternating aperture phase shift masks (AltPSM), are disclosed. In order to migrate a layout to...
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7541115 |
Use of calcium fluoride substrate for lithography masks
Photolithographic masks and nano-imprint lithography masks with calcium fluoride substrates are disclosed. A photolithographic mask has a calcium fluoride substrate having a surface, a patterned...
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7541118 |
Phase shift mask
A phase shift mask includes a first non-phase shift region, a first phase shift region adjacent the first non-phase shift region, a second non-phase shift region, a second phase shift region...
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7541121 |
Calibration of optical line shortening measurements
A system and method of calibrating optical line shortening measurements, and lithography mask for same. The lithography mask comprises a plurality of gratings, with a calibration marker disposed...
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7539970 |
Method of manufacturing mask
A method of manufacturing a mask includes designing a second mask data pattern for forming a first mask data pattern, creating a first emulation pattern, which is determined from the second mask...
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7538344 |
Overlay and CD process window structure
The present invention provides photolithographic device and method for photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy...
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7537865 |
Method of adjusting size of photomask pattern
A method of adjusting the size of a photomask pattern is provided. First, the original coordinate is converted. Then the length and width of the original pattern are converted. Next, the size...
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7537871 |
Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device using immersion exposure in which exposure is carried out with an immersion exposure liquid interposed between a projection lens and a substrate,...
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7537866 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7537114 |
System and method for storing and transporting photomasks in fluid
An apparatus for and method of storing and transporting a photomask. A photomask storage container has fluid-tight walls, an opening for moving the photomask into and out of the container, and a...
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7537864 |
Hole pattern design method and photomask
A method of designing hole patterns for arranging hole patterns on a pattern drawing of a photomask used during an exposure process in semiconductor integrated circuit manufacturing, wherein a grid...
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7537870 |
Lithography process optimization and system
The first and second example embodiments are Pattern Fidelity Optimization Procedures for a Multiple Exposure Scheme. In the third example embodiment, the aperatures from the multiple exposure...
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7536671 |
Mask for forming fine pattern and method of forming the same
In a mask for forming a fine pattern to completely transfer a first and a second pattern from the mask onto a receiving object, and a method of forming the mask, the mask includes a first pattern,...
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7534532 |
Method to correct EUVL mask substrate non-flatness
Methods to correct a non-flatness of a mask substrate are described. At least a pair of correction layers are formed on the substrate over a non-flat region of a front surface of a substrate. A...
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