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7371484 |
Photomask blank and method of fabricating a photomask from the same
A photomask blank includes a hard mask having an excellent etch selectivity with respect to an opaque layer. The photomask blank includes a light-transmissive substrate, an opaque chromium layer...
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7371485 |
Multi-step process for etching photomasks
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic...
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7369213 |
Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region...
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7368208 |
Measuring phase errors on phase shift masks
Methods and apparatus for producing a semiconductor. A production reticle having a pattern that includes circuit features, phase shift target structures and overlay target structures is provided....
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7368204 |
Mask for laser crystallization and crystallization method using the same
A mask for laser crystallization includes a transmissive portion defining a crystallization pattern and an alignment pattern. The alignment pattern includes a first pattern group having a size...
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7369215 |
Laser crystallization apparatus
A laser crystallization apparatus has a light source, a phase shifter which modulates a laser light from the light source, an illumination system which is provided between the light source and the...
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7367010 |
Designing method and device for phase shift mask
The work load spent on designing a trench-type, Levenson-type phase shift mask is lightened and the working time for the designing process is shortened. A pattern 11 , having a plurality of...
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7365827 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the...
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7364821 |
Laser mask and method of crystallization using the same
Provided is a method for crystallizing using a laser mask for selectively crystallizing active regions without a laser shot mark, including: providing an array substrate in which N×M active...
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7364822 |
Photomask, method for forming the same, and method for forming pattern using the photomask
A mask pattern 40 including a light-shielding portion 41 constituted by a light-shielding film made of a chromium film or the like and phase shifters 42 and 43 is formed on a transparent...
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7361433 |
Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same
A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has...
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7361909 |
Method and apparatus for correcting drift during automated FIB processing
A method and apparatus for correcting drift of the beam irradiation position during automated FIB (focused ion beam) processing with a reference image-setting unit, an image read-in unit for...
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7361435 |
Method of creating a layout of a set of masks
A method of creating a layout of a set of masks including an alternating phase shifting mask (APSM) and a halftone phase shifting trim mask (HPSTM) is provided. The APSM includes first and second...
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7362417 |
Pellicle frame and pellicle for photolithography using the same
A frame that prevents the decrease in the exposure area by preventing the frame from curving inward by the tensile force of the pellicle membrane and makes it possible to obtain a pellicle having...
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7361530 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having...
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7361434 |
Phase shift mask
Semitransparent and trenchlike, absorber-free structure elements are formed jointly on a photomask formed using phase mask technology. The trenchlike structure elements are formed as trench or mesa...
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7358512 |
Dynamic pattern generator for controllably reflecting charged-particles
One embodiment relates to a dynamic pattern generator for controllably reflecting charged particles. The generator includes at least a controllable light emitter array, an optical lens, and an...
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7355680 |
Method for adjusting lithographic mask flatness using thermally induced pellicle stress
A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness,...
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7354682 |
Chromeless mask for contact holes
A chromeless phase-shift mask (CPM) for imaging sub-100 nm contact holes and a method of making the same are disclosed. The CPM includes a plurality of features formed on a substrate and a...
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7355681 |
Optical proximity correction using chamfers and rounding at corners
Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of...
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7354683 |
Lithography mask for imaging of convex structures
A lithography mask has an angled structure element (O) formed by a first opaque segment (O 1 ) and by a second opaque segment (O 2 ). The structure element has at least one reflex angle (α). The...
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7354681 |
Scattering bar OPC application method for sub-half wavelength lithography patterning
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding the width of the features to be...
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7351518 |
Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer
A composition is specified which forms an electrically conductive resist layer and comprises a resin that can be crosslinked to form a base polymer, an organic compound that can be crosslinked to...
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7351505 |
Phase shift mask blank, phase shift mask, and pattern transfer method
In a phase shift mask blank comprising a phase shift multilayer film on a substrate, the phase shift multilayer film consists of at least one layer of light absorption function film and at least...
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7351503 |
Fused silica pellicle in intimate contact with the surface of a photomask
A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the...
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7351504 |
Photomask blank substrate, photomask blank and photomask
In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing...
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7353145 |
Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device
A computer implemented method for correcting a mask pattern, includes: preparing a designed mask pattern; obtaining a rough corrected mask pattern from the designed mask pattern by applying a rough...
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7348105 |
Reflective maskblanks
A reflective mask and a reflective mask blank that can form a fine mask pattern with high accuracy in shape, achieve a sufficient contrast in a pattern inspection, and enable a pattern transfer...
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7348109 |
Reticle, semiconductor die and method of manufacturing semiconductor device
The invention is directed to increasing the number of semiconductor dice obtained from one semiconductor wafer and enhancing the reliability and yield of the semiconductor dice when the...
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7350183 |
Method for improving optical proximity correction
A method for performing model based optical proximity correction (MBOPC) and a system for performing MBOPC is described, wherein the process model is decomposed into a constant process model term...
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7350182 |
Methods of forming patterned reticles
The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a...
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7348107 |
Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method
The invention disclosed herein concerns technology that ensures, in a projection exposure process using a transmission type reticle, exposure with an even finish size throughout the entire exposure...
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7348106 |
Method for repairing a phase shift mask
A method is disclosed for repairing an attenuated phase shift mask. The mask initially has a mask substrate coated with a predetermined shift layer material, a mask pattern layer, and an energy...
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7344805 |
Mask and method for producing thereof and a semiconductor device using the same
A mask is provided wherein the mask has: a plate-like member having a mask pattern area and at least one pn junction; and a current supplying area which supplies a current to the pn junction, and a...
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7344807 |
Gassing-free exposure mask
The present invention relates to an exposure mask for structuring a photoresist layer on a substrate wafer, in which an inorganic adhesive is used as an adhesive device for connecting a reticle...
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7344806 |
Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering...
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7344808 |
Method of making photomask blank substrates
A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate...
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7341809 |
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
Provided are a photomask, a method for manufacturing the photomask and a method for measuring optical characteristics of a wafer exposure system, the measuring method using the photomask during...
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7341808 |
Method and system for contiguous proximity correction for semiconductor masks
According to one embodiment, a method for patterning a set of features for a semiconductor device includes providing a mask including a substrate and at least one pair of first and second main...
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7339282 |
Topographically indexed support substrates
The present invention provides an indexed support substrate. The support substrate comprises at least one set of indexing features that are distinguishable from one another and from the surrounding...
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7339653 |
System for a pellicle frame with heightened bonding surfaces
A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing...
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7338736 |
Method of fabricating a phase shift mask
A phase shift mask includes a first non-phase shift region, a first phase shift region adjacent the first non-phase shift region, a second non-phase shift region, a second phase shift region...
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7338609 |
Partial edge bead removal to allow improved grounding during e-beam mask writing
A method to provide a ground point for second, or subsequent, e-beam mask-writing steps by selectively removing the photoresist edge bead of a photomask substrate to expose the underlying chrome...
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7339247 |
Semiconductor device manufacturing method and semiconductor manufacturing apparatus
A method of manufacturing a semiconductor device is disclosed, which comprises setting a stencil mask above a substrate to be processed in confronting to the substrate, the stencil mask having an...
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7335449 |
Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same
A mask and a method of forming the mask obviate optical proximity effects. The mask includes a light-shielding layer on a transparent substrate. The light-shielding layer is patterned to form a...
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7334212 |
Method for interlayer and yield based optical proximity correction
An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based...
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7331283 |
Method and apparatus for imprint pattern replication
Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a...
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RE40084 |
Optical proximity correction
Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask...
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7332251 |
Pattern decomposition and optical proximity correction method for double exposure when forming photomasks
A pattern decomposition and optical proximity correction method for double exposure comprises defining second exposure patterns by performing a logical operation on target patterns and first...
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7332252 |
Method of forming a mask layout and layout formed by the same
A mask layout forming method includes designing an original layout in which a diagonal pattern of a first polygon is repeatedly arranged in a diagonal direction relative to a vertical-axis...
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