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7618751 |
RET for optical maskless lithography
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
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7612864 |
Exposure apparatus and method
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first...
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7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more...
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7605908 |
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field...
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7601485 |
Exposure method
An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the...
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7598020 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7585601 |
Method to optimize grating test pattern for lithography monitoring and control
A method of making a process monitor grating pattern for use in a lithographic imaging system comprises determining minimum resolvable pitch of a plurality of spaced, adjacent line elements, and...
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7579136 |
Microfluidic device and method of manufacturing the same
Provided is a method of manufacturing a microfluidic device in which coating film patterns made of a coupling agent are formed in microchannels. The method includes: forming the coating film...
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7568492 |
Custom camouflage hunting blind
A realistic appearing camouflage hunting blind that incorporates a photographic image of a hunting location. The visual appearance of the hunting blind mimics the actual environment so that from a...
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7553609 |
Manufacturing method of piezoelectric vibrating piece, piezoelectric vibrating piece, piezoelectric vibrator, oscillator, electronic equipment and radio-controlled timepiece
There are provided a piezoelectric vibrating piece, which has been more miniaturized and whose efficiency has been more increased, by easily and certainly electrode-dividing an exciting electrode,...
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7541117 |
Mask pattern generating method
Disclosed herein is a mask pattern generating method for generating a mask pattern to be formed in a Levenson phase shift mask used in a light exposure process for exposing a photoresist film...
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7537869 |
Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
A method for evaluating a pattern formation process includes applying a photoresist on a substrate, transferring a first pattern and a second pattern adjacent to or at least partly overlapped with...
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7527920 |
Active hardmask for lithographic patterning
In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the...
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7527917 |
Exposure method and exposure apparatus
For each of pattern projection regions, a mask and a substrate are moved in synchronization with each other in an X direction while projecting a portion of a mask pattern through an optical...
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7514115 |
Method of forming thin film of organometallic compound, thin film of organometallic compound, method of manufacturing organoelectronic device equipped with the same, organoelectronic device, method of manufacturing organic electroluminescence, organic electroluminescence, and electronic apparatus
Aspects of the invention can provide a method of fabricating an organometallic compound film capable, by stably forming a film with the organometallic compound, of increasing bonding forces of...
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7504186 |
Photomask, method for producing the same, and method for forming pattern using the photomask
A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned...
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7491479 |
Compensating for effects of topography variation by using a variable intensity-threshold
One embodiment of the present invention provides a system that accurately determines a critical dimension of a feature in a layout by compensating for the effects of topography variation on the...
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7476471 |
Method for correcting mask pattern, exposure mask, and mask producing method
A method for correcting an exposure mask including a film of mask blank having reflex function for an EUV and an absorber film patterned on the film of mask blank for absorbing the EUV, the present...
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7473523 |
Systems and methods for modifying features in a semi-conductor device
Systems and methods for modifying features of a semiconductor device. The systems and methods of the invention modify features of a semiconductor device according to the amount of exposure dose of...
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7473519 |
Method for manufacturing electrodes of a plasma display panel
A method for manufacturing electrodes of a plasma display panel includes providing a front transparent substrate including transparent electrodes on the front transparent substrate, coating a black...
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7469058 |
Method and system for a maskless lithography rasterization technique based on global optimization
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining...
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7468239 |
Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device
A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for...
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7460282 |
Dynamic pattern generation for optical signal processing
A processor such as a digital signal processor (DSP) is used to dynamically generate patterns and/or sequences of patterns for a spatial light modulator (SLM), such as a micromirror device, for the...
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7455939 |
Method of improving grating test pattern for lithography monitoring and controlling
A method of making a process monitor grating pattern for use in a lithographic imaging system comprises determining minimum resolvable pitch of a plurality of spaced, adjacent line elements, and...
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7449284 |
Method and structure for fabricating mechanical mirror structures using backside alignment techniques
A method for fabricating mechanical structures from bonding substrates. The method includes providing a bonded substrate structure, which includes a first substrate having a first thickness of...
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7442477 |
Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to...
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7439001 |
Focus blur measurement and control method
A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system is disclosed. The method includes correlating the dimensions of a first set of...
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7435535 |
Method for forming patterned insulating elements and methods for making electron source and image display device
A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask...
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7415694 |
Graph based phase shift lithography mapping method and apparatus
For phase-shifting micro lithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first...
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7410736 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in...
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7402378 |
Exposure method and apparatus
There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the...
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7399559 |
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to...
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7389930 |
Mask management method and bar code reading apparatus thereof
A mask management and bar code reading apparatus thereof are disclosed. The mask management method comprises providing a bar code reading apparatus, scanning a mask bar code on the mask by the bar...
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7388216 |
Pattern writing and forming method
A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam...
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7385209 |
Micromachining process, system and product
Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy...
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7382959 |
Optically oriented three-dimensional polymer microstructures
A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at...
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7374866 |
System and method for exposure of partial edge die
According to one embodiment of the present invention, a method of forming a semiconductor device includes forming a photoresist layer on a surface of a wafer. The wafer includes an array of die...
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7371510 |
Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following...
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7358035 |
Topcoat compositions and methods of use thereof
A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene,...
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7354695 |
Producing a substrate having high surface-area texturing
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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7351523 |
Photographic materials having improved keeping properties
The use of a red-sensitising trinuclear merocyanine dye and an osmium dopant according to formula (I): [Os(NZ)L 5 ] r wherein Z is sulphur or oxygen, L is a ligand and r is 0, −1, −2 or −3,...
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7329481 |
Substrate optical waveguides having fiber-like shape and methods of making the same
Substrate optical waveguides having curved major surfaces and methods for making the same are disclosed. In one exemplary embodiment, a photosensitive cladding layer is pattern exposed to actinic...
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7326442 |
Antireflective composition and process of making a lithographic structure
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer...
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7320856 |
Manufacturing method of pattern formed body
A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously...
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7312020 |
Lithography method
A lithography method for forming a plurality of patterns in a photoresist layer. A phase shift mask including a plurality of transparent main features, a plurality of first phase shift transparent...
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7288366 |
Method for dual damascene patterning with single exposure using tri-tone phase shift mask
A reticle structure and a method of forming a photoresist profile on a substrate using the reticle having a multi-level profile. The reticle comprises (1) a transparent substrate, (2) a partially...
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7279253 |
Near-field light generating structure, near-field exposure mask, and near-field generating method
A near-field exposure mask includes a mask base material and a light blocking layer formed on the base material, the light blocking layer includes a fine metal structure or fine opening formed in...
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7267930 |
Techniques for manufacturing a waveguide with a three-dimensional lens
Optical transmission structures include a waveguide and an optical lens wherein the optical lens has a sufficiently large thickness to allow the formation of a curved front lens surface that...
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7264918 |
Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i)...
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7264909 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
An exposure parameter obtaining method comprising forming a charged reference pattern and a plurality of charged exposure patterns at a surface region of a to-be-exposed insulation substrate by...
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