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7629109 |
Exposure control for phase shifting photolithographic masks
Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined...
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7625677 |
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
A half-tone stacked film is designed so as to have a stacked structure of a first half-tone film and a second half-tone film, and the film thickness d, the refractive index n to exposure light and...
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7622245 |
Manufacturing data-storage media using light-curable material
Instances of data-storage media having pits and lands, such as individual DVDs or CDs, are manufactured by selectively illuminating a light-curable material to form cured regions corresponding to...
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7618751 |
RET for optical maskless lithography
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
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7615320 |
Method for fabricating color filler substrate
A method for fabricating a color filter substrate is disclosed, to realize the simplified fabrication process by forming a film-type color filter layer, which includes preparing a mask having...
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7615318 |
Printing of design features using alternating PSM technology with double mask exposure strategy
For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the...
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7604907 |
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
Mask sets are provided which may be used to define a first pattern region that has a first pitch pattern and a second pattern region that has a second pitch pattern during the fabrication of a...
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7604925 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7604926 |
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device, comprises forming a first mask pattern on an under-layer region, forming a plurality of dummy-line patterns on the under-layer region, the...
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7604908 |
Fine pattern forming method
A fine pattern forming method includes the first step of depositing a plasma reaction products on a sidewall of a patterned mask layer to increase a pattern width thereof, the second step of...
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7601466 |
System and method for photolithography in semiconductor manufacturing
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer...
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7601485 |
Exposure method
An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the...
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7603648 |
Mask design using library of corrections
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a...
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7598019 |
Method for cleavage of labile functional groups from chemical compounds
The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical...
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7595858 |
Method of fabricating liquid crystal display device including main exposure process and edge exposure process
A method of fabricating a LCD device comprises preparing a substrate having a plurality of LCD panel regions within main exposure regions, performing a main exposure process at the LCD panel...
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7595136 |
Method of fabricating chrome-less phase shift mask
An embodiment of a method of fabricating a chrome-less phase shift mask includes forming a hard mask film on a surface of a mask body having a trench circuit area and a mesa circuit area. The hard...
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7594216 |
Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
A method of forming a mask pattern comprises the following steps. A second cell library is prepared by making process proximity effect correction with respect to cell patterns stored in a first...
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7588866 |
Filter arrays for liquid crystal displays and methods of making the same
In general, in one aspect, the invention features methods that include forming a first lithography mask including a pattern corresponding to an array of filters for a liquid crystal display, using...
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7588863 |
Hologram recording method and hologram recording material
To provide a hologram recording method capable of satisfying high sensitivity and at the same time, satisfying high diffraction efficiency, good preservability, low shrinkage percentage, dry...
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7588869 |
Divided exposure method for making a liquid crystal display
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first...
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7588882 |
Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first...
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7582413 |
Substrate, method of exposing a substrate, machine readable medium
A double exposure method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a desired pattern to be printed on the substrate into...
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7582396 |
Hybrid phase-shift mask and manufacturing method thereof
This invention discloses a hybrid phase-shift mask (PSM) having multi-film structure that from bottom to top is transparent film, attenuate film, and opaque film. By using several exposure and...
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7579137 |
Method for fabricating dual damascene structures
A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist...
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7575854 |
Method for manufacturing microlens
A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is...
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7569308 |
Rectangular contact lithography for circuit performance improvement and manufacture cost reduction
An optical lithography method is disclosed that uses double exposure of a reusable template mask and a trim mask to fabricate regularly-placed rectangular contacts in standard cells of...
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7569842 |
Method for correcting electron beam exposure data
First, electron beam exposure data identifiable for each type of pattern of a semiconductor device is inputted (S 601 ). Then, electron beam exposure data on a first type of pattern is not...
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7569311 |
Method of forming a pattern using a polarized reticle in conjunction with polarized light
Polarized reticles, photolithography systems utilizing a polarized reticle, and methods of using such a system are disclosed. A polarized reticle is formed having a reticle containing at least one...
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7566526 |
Method of exposure for lithography process and mask therefor
An improved photolithography method and mask are disclosed. The method exposes a substrate coated with a photosensitive material using a first mask. The photosensitive material after said first...
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7560197 |
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
A mask pattern data producing method is disclosed, which comprises preparing design pattern data in which contact holes are arranged on part of the grid points in matrix, preparing first mask...
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7553611 |
Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure
In formation of monolithic three dimensional memory arrays, a photomask may be used more than once. Reuse of a photomask creates second, third or more instances of reference marks used by the...
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7541115 |
Use of calcium fluoride substrate for lithography masks
Photolithographic masks and nano-imprint lithography masks with calcium fluoride substrates are disclosed. A photolithographic mask has a calcium fluoride substrate having a surface, a patterned...
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7541120 |
Manufacturing method of semiconductor device
After forming a resist film on a Si substrate, a circuit pattern for a semiconductor integrated circuit, a first L-shaped length measuring pattern and a cross-shaped monitor pattern for alignment...
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7538853 |
Exposure process and apparatus using glass photomasks
An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the...
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7534533 |
Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
A polarization analyzing system includes a data collector collecting information on resist patterns formed over step patterns by first and second lights, the first and second lights being polarized...
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7527917 |
Exposure method and exposure apparatus
For each of pattern projection regions, a mask and a substrate are moved in synchronization with each other in an X direction while projecting a portion of a mask pattern through an optical...
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7527918 |
Pattern forming method and method for manufacturing a semiconductor device
A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the...
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7517642 |
Plane waves to control critical dimension
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings...
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7510980 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist...
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7507506 |
Method and structure for creating a multilayer mask (MLM or MLR) using multiple write tools to minimize mask write and substrate costs
A method of printing multi-layer masks includes analyzing masking requirements of the photomask includes creating pairings of all masking layers requiring substantially similar processing, wherein...
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7501227 |
System and method for photolithography in semiconductor manufacturing
A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at...
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7501213 |
Method for forming generating mask data
A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion ...
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7494766 |
Method of manufacturing liquid crystal display device
A method of manufacturing a liquid crystal display device is provided. The method of manufacturing a liquid crystal display device includes performing an overlapping partitioned exposure process in...
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7494749 |
Photolithography using interdependent binary masks
The invention, in its various aspects, is an interdependent binary photomask for use in a photolithography operation in a semiconductor fabrication process, a method for fabricating these...
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7491474 |
Masks for lithographic imagings and methods for fabricating the same
Masks having various types of structures, such as CPL, HTPSM, or CoG structures, are without positional error with respect to one another by defining positions of the structures on the mask by a...
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7473494 |
Exposure mask and mask pattern production method
An exposure mask in the form of a binary mask for intensity modulating 0th order diffracted light and a mask pattern production method using the exposure mask are disclosed on which a mask...
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7473523 |
Systems and methods for modifying features in a semi-conductor device
Systems and methods for modifying features of a semiconductor device. The systems and methods of the invention modify features of a semiconductor device according to the amount of exposure dose of...
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7462426 |
Method for producing a phase mask
A first and a second phase-shifting, semitransparent layer are formed on a substrate. The layers are patterned lithographically to form first elevated structure elements on the substrate with a...
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7459265 |
Pattern forming method, semiconductor device manufacturing method and exposure mask set
First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed...
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7442477 |
Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to...
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