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7622240 |
Low blur molecular resist
A molecular resist composition and method of use is disclosed wherein the composition includes no silicon containing material, no polymeric material, and a substituted oligosaccharide, wherein the...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about...
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7582414 |
Method and system for drying a substrate
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior...
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7560202 |
Method for manufacturing image sensor
A method for manufacturing an image sensor is provided. The method includes forming a metal pad on a pad region of a semiconductor substrate having an active region and the pad region, forming a...
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7556898 |
Overlay target for polarized light lithography
A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second...
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7553606 |
Methods of forming patterns in semiconductor devices using photo resist patterns
Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are...
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7550394 |
Semiconductor device and fabrication process thereof
A method of fabricating a semiconductor device includes a dry etching process of a silicon surface. The dry etching process is conducted by an etching gas containing at least one gas species...
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7494749 |
Photolithography using interdependent binary masks
The invention, in its various aspects, is an interdependent binary photomask for use in a photolithography operation in a semiconductor fabrication process, a method for fabricating these...
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7479364 |
Copolymer for use in chemical amplification resists
A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent...
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7470503 |
Method for reducing lithography pattern defects
A preferred embodiment of the invention provides a semiconductor fabrication process. Embodiments include a method for removing contaminating particles from the surface of the wafer, such as in...
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7452660 |
Method for resist strip in presence of low K dielectric material and apparatus for performing the same
A method and apparatus is provided for using a plasma generated from a processing gas mixture including H 2 O to efficiently strip photoresist material without causing significant damage to...
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7452659 |
Methods of patterning a surface using single and multilayer molecular films
Surface features are fabricated using a single layer or multi-layer molecular resist. The resist is preferably a selective adsorption resist. Selective adsorption resist is a resist that allows a...
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7448396 |
Apparatus and method of removing particles
An impurities elimination apparatus including a base plate, a first nozzle for removing impurities on the base plate using air suction, a glass substrate disposed on the base plate, and a second...
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7432209 |
Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
A plasma etch process with in-situ backside polymer removal begins with a workpiece having a porous or non-porous carbon-doped silicon oxide dielectric layer and a photoresist mask on a surface of...
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7427466 |
Anti-reflection optical data storage disk master
Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques described herein can improve resolution of the...
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7427360 |
Process and ink for making electronic devices
A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non-aqueous etch-resistant ink by ink...
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7419760 |
Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern
Disclosed herein is a top anti-reflective coating composition comprising a bissulfone compound, as a photoacid generator, represented by Formula 1 below:
wherein R 1 and R 2 are...
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7413848 |
Method of removing photoresist and photoresist rework method
A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist...
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7399582 |
Material for forming fine pattern and method for forming fine pattern using the same
In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer...
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7387868 |
Treatment of a dielectric layer using supercritical CO2
A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably...
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7371507 |
Methods for fabricating semiconductor devices
Methods for fabricating semiconductor devices are disclosed. A disclosed method comprises: forming a conductive layer, depositing a interlayer dielectric layer, forming an anti-reflective coating...
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7364837 |
Method for pattern formation using photoresist cleaning solution
Photoresist cleaning solutions are used to clean semiconductor substrates before or after an exposing step when photoresist patterns are formed. The cleaning solutions include H 2 O and a nonionic...
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7351514 |
Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases...
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7338751 |
Process for producing printed wiring board and photosensitive resin composition used in the same
An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring...
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7324264 |
Electro-optical modulating display and method of making the same
This invention relates to a method of manufacturing micro-cell arrays. Such an array may find use in a number of applications such as, for example, a video display, electronic paper, and signage....
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7291565 |
Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid...
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7270941 |
Method of passivating of low dielectric materials in wafer processing
A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably...
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7241541 |
Method of the adjustable matching map system in lithography
A method is provided for improving layer to layer overlay of a second layer pattern on a first layer pattern formed in a substrate. A plurality of first reference marks is placed inside a pattern...
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7238454 |
Method and apparatus for producing a photomask blank, and apparatus for removing an unnecessary portion of a film
In a method of producing a photomask blank, comprising a thin film forming step of forming, on a rectangular substrate, a thin film for causing an optical change in exposure light, a resist...
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7235479 |
Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials
A method of fabricating a semiconductor device. The method comprises creating a via in a dielectric layer that is formed on a substrate, filling the via, and optionally, the surface of the...
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7226705 |
Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
In a method of removing a useless film formed along a circumferential portion of a substrate, so as to provide a removed portion, a cover member is covered over the substrate to supply a solvent to...
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7223519 |
Imaging compositions and methods
Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the...
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7214473 |
Method for removing patterned layer from lower layer through reflow
A photo-resist mask of organic compound is stripped off after the pattern transfer to a layer thereunder, wherein the photo-resist mask is firstly exposed to vapor of organic solvent for reducing...
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7202175 |
Method and apparatus for treating a substrate surface by bubbling
The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates...
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7199060 |
Method for patterning dielectric layers on semiconductor substrates
The invention relates to a process for patterning dielectric layers. A photoresist layer is applied to the dielectric layer and patterned. Then, the pattern which has been predetermined by the...
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7169540 |
Method of treatment of porous dielectric films to reduce damage during cleaning
A device, method, and system for treating low-k dielectric material films to reduce damage during microelectronic component cleaning processes is disclosed. The current invention cleans porous...
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7166419 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7144676 |
Imaging compositions and methods
Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the...
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7144673 |
Effective photoresist stripping process for high dosage and high energy ion implantation
The present subject matter relates to a method of stripping a photoresist after the photoresist film has been subjected to a high dose and high energy ion implant process. The method involves...
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7141513 |
Integrated ashing and implant annealing method using ozone
After ion implantation, thermal ashing is performed using ozone at a pressure of between about 0.01 to about 1000 Torr at below 1000° C. to remove the resist. Since the process includes a...
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7129029 |
Compositions substrate for removing etching residue and use thereof
Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
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7129028 |
Method of forming holographic grating
In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a...
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7091255 |
Multiphoton photosensitization system
A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby...
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7090965 |
Method for enhancing adhesion between reworked photoresist and underlying oxynitride film
A method for enhancing adhesion between a reworked photoresist and an underlying oxynitride film. A photoresist pattern layer is formed on an oxynitride layer overlying a substrate. The photoresist...
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7083903 |
Methods of etching photoresist on substrates
Methods of etching a carbon-rich layer on organic photoresist overlying an inorganic layer can utilize a process gas including C x H y F z , where y≧x and z≧0, and one or more optional...
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7078161 |
Plasma ashing process for removing photoresist and residues during ferroelectric device fabrication
A low temperature plasma ashing process for use with substrates comprising a ferroelectric material. The process generally includes plasma ashing the photoresist and residues at a temperature of...
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7078157 |
Photosensitive composition and use thereof
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide...
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7074726 |
Substrate treating method and substrate treating apparatus
In a substrate treating unit, a removal liquid supplying mechanism supplies a removal liquid to the surface of a substrate. In order to retain the removal liquid on the surface of the substrate for...
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7070915 |
Method and system for drying a substrate
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior...
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