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7611828 |
Photoactive adhesion promoter
An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with...
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7611825 |
Photolithography method to prevent photoresist pattern collapse
A method comprises forming a BARC layer on a substrate, treating the BARC layer to make its surface hydrophilic, forming a photoresist layer on the treated BARC layer, exposing the photoresist...
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7608388 |
Inkjet-imageable lithographic printing members and methods of preparing and imaging them
Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical or masking agent onto the plate surface. In some embodiments, the chemical inhibits a photoreaction in...
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7604928 |
Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas...
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7595146 |
Method of creating a graded anti-reflective coating
A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and...
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7563563 |
Wet developable bottom antireflective coating composition and method for use thereof
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is...
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7550249 |
Base soluble polymers for photoresist compositions
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl...
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7547561 |
Advanced process control model incorporating a target offset term
An advanced process control (APC) architecture comprising a process model that incorporates a target offset term is provided. The APC architecture may be applied to a so-called develop inspect...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7517620 |
Method for fabricating array substrate having color filter on thin film transistor structure for liquid crystal display device
A method for fabricating an array substrate having a color filter on a thin film transistor structure for a liquid crystal display device is disclosed in the present invention. The method for...
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7507526 |
Developer regenerators
The present invention provides an aqueous regenerator for addition to an aqueous developer that contains an organic solvent, a dispersing agent and a weak base, and has a pH of between about 8 and...
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7501230 |
Photoactive adhesion promoter
An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with...
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7482112 |
Pattern forming method
A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a...
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7416821 |
Thermally cured undercoat for lithographic application
Thermally curable undercoat composition comprising for producing a bilayer relief image comprising:
a) a polymer of Structure I comprising repeating units of Structure II, III, and IV
...
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7407739 |
Resist developer and resist pattern formation method using same
A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer....
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7396621 |
Exposure control method and method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device includes preparing a projection exposure apparatus and a photomask, the photomask having a transparent substrate and a light shield film arranged in...
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7396620 |
Exposure method and exposure management system
There is provided an exposure method for exposing a pattern on an original form onto an object through a projection optical system. The exposure method includes the steps of obtaining, for each...
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7384730 |
Top coating composition for photoresist and method of forming photoresist pattern using same
Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a...
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7378222 |
Antihalation compositions
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a...
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7374864 |
Combined nanoimprinting and photolithography for micro and nano devices fabrication
A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a...
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7371510 |
Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following...
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7365115 |
Composition for antireflection coating and method for forming pattern
An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an...
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7364833 |
Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same
The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the...
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7358036 |
Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer...
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7348130 |
Electron exposure to reduce line edge roughness
The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to...
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7335464 |
Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The...
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7326526 |
Films with photoresponsive wettability
In various aspects, the present invention provides substantially monolayer thick molecular films with photoresponsive wettability, the molecules of said films comprising a photochromic molecule...
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7312018 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port...
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7300728 |
Processor unit with provision for automated control of processing parameters
An imaging device for preparing a printing surface for a printing operation transfers information related to how the printing precursor should be processed to a processor. The processor is...
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7279254 |
Method of making an article bearing a relief image using a removable film
The invention is directed to methods of making an article bearing a relief image using a removable film. First, an imageable film that contains at least a mask substrate and an imageable material...
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7264918 |
Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i)...
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7241537 |
Method for producing an exposed substrate
Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image...
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7226709 |
Digital mask-forming film and method of use
A masking film has a unique polymeric binder in the imageable layer that enables the imaged film to be readily solubilized in non-chlorinated developers when it is used to form a relief image in a...
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7224050 |
Plastic materials including dendrimers or hyperbranched polymers for integrated circuit packaging
Integrated circuit packages and their manufacture are described, wherein the packages comprise dendrimers or hyperbranched polymers. In some implementations, the dendrimers or hyperbranched...
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7223527 |
Immersion lithography process, and structure used for the same and patterning process
An immersion lithography process is described. First, a photoresist layer on a material layer is formed. Then, an acid compensation layer is formed on the photoresist layer. An immersion exposure...
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7205093 |
Topcoats for use in immersion lithography
A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the...
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7205089 |
Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light...
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7202011 |
Photosensitive polymer including fluorine and resist composition containing the same
Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula:
wherein R may be an alkoxy carbonyl, alkylsilane, a fluorine-substituted or...
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7195863 |
Development defect preventing process and material
A composition for reducing development defects comprising an acidic composition containing, for example, a surfactant applied onto a chemically amplified photoresist coating formed on a substrate...
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7192684 |
Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
Polymerizable silicon-containing compounds of formula (1) wherein R 1 is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as...
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7186497 |
Developer composition for lithographic printing plate
A developer composition for a lithographic printing plate comprising on an aluminum plate support a photosensitive layer which comprises an ethylenically unsaturated monomer, a photopolymerization...
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7175967 |
Heat treatment of multilayer imageable elements
Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed...
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7166414 |
Radiation sensitive compositions and methods
The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a...
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7157207 |
Polymer, resist material and patterning processing
Provided is a polymer useful as a base resin of a resist material featuring a high resolution, patterns with less sidewall roughness, practically acceptable etching resistance, and a substantial...
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7153443 |
Microelectromechanical structure and a method for making the same
A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a...
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7147994 |
Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same
Disclosed herein are a top anti-reflective coating polymer used in a photolithography process, a method for preparing the anti-reflective coating polymer, and an anti-reflective coating composition...
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7141177 |
Etching method and composition for forming etching protective layer
This invention offers a method to improve-etching resistance of etching mask upon etching comprising steps of forming a pattern on a substrate by using photoresist, applying a composition for...
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7135270 |
Resist polymer, resist composition and patterning process
A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid.
R 1 , R 2 , R 3 and R 6 are H or CH 3 ,...
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7132215 |
Ester compounds, polymers, resist compositions and patterning process
Novel ester compounds having formula (1) wherein A 1 is a polymerizable functional group having a double bond, A 2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R 1 and R 2 each are a...
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7129028 |
Method of forming holographic grating
In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a...
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