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7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R 1 to R 5 are selected from the group consisting of...
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7615331 |
Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device
A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a...
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7615330 |
Positive resist composition and pattern formation method using the same
A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which...
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7615324 |
Photosensitive composition, and cured relief pattern production method and semiconductor device using the same
A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a...
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7615322 |
Photoresist composition and method of manufacturing a color filter substrate by using the same
A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7608381 |
Polymer compound, positive resist composition and process for forming resist pattern
The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by...
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7608380 |
Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred...
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7604920 |
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:
wherein R 1 represents a...
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7604919 |
Monomer, polymer and composition for photoresist
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
...
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7604917 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a...
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7601483 |
Anti-reflective coatings using vinyl ether crosslinkers
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups...
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7601480 |
Photoactive compounds
The present application relates to a compound of formula
where X is selected from the group CF 3 SO 3 , C 4 F 9 SO 3 , N(SO 2 C 2 F 5 ) 2 , N(SO 2 CF 3 SO 2 C 4 F 9 ), N(SO 2 C 3 F 7 ) 2 , N(SO...
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7601479 |
Polymer, resist composition and patterning process
A polymer comprising recurring units of formulae (1) to (4) wherein R 1 , R 3 , R 4 and R 7 are hydrogen or methyl, R 2 is an acid labile group, R 5 and R 6 are hydrogen or hydroxyl, and R 8 ...
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7598016 |
Resist composition and patterning process
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic...
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7598015 |
Polymer, resist composition and patterning process
A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A...
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7598009 |
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at...
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7595144 |
Sulfonate-containing anti-reflective coating forming composition for lithography
There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent....
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7592126 |
Positive resist composition and pattern forming method using the resist composition
A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali...
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7592125 |
Photoresist compositions comprising resin blends
New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero...
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7592123 |
Resin for photoresist composition, photoresist composition and method for forming resist pattern
A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a...
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7592122 |
Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition
A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen...
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7592118 |
Positive resist composition and pattern forming method using the same
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to...
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7588876 |
Resist material and pattern formation method
A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1:
wherein R 1 , R 2 and R 3 are the same or...
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7582406 |
Resist composition and method for forming resist pattern
A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound...
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7579131 |
Positive resist composition and method of forming resist pattern using the same
A positive resist composition comprising:
(A) a fluorine atom-containing resin; (B) a compound generating an acid upon irradiation with an actinic ray; and (C) a non-polymer dissolution...
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7575846 |
Resist polymer and resist composition
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit...
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7569326 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically...
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7569325 |
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
...
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7569323 |
Resist protective coating material and patterning process
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the...
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7566527 |
Fused aromatic structures and methods for photolithographic applications
A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base...
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7563563 |
Wet developable bottom antireflective coating composition and method for use thereof
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is...
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7560222 |
Si-containing polymers for nano-pattern device fabrication
A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially...
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7550254 |
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a...
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7550249 |
Base soluble polymers for photoresist compositions
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl...
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7550247 |
Resist composition and patterning process
A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7547501 |
Photoactive compounds
The present application relates to photoactive materials having the formula
wherein C1 + is a cation; each of R 30 , R 31 , R 32 , R 33 , R 34 , R 35 , R 36 , R 37 , R 38 , R 39 , R 40 , and R...
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7544460 |
Resist composition, multilayer body, and method for forming resist pattern
A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is...
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7541138 |
Resist composition
A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist...
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7541133 |
Positive resist composition and patterning process
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer...
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7541132 |
Chemically amplified resist material, topcoat film material and pattern formation method using the same
A resist film made of a chemically amplified resist material including a polymer; a photo-acid generator and carbamoyl oxime is formed on a substrate. Subsequently, pattern exposure is performed by...
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7541131 |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or...
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7537880 |
Polymer, resist composition, and patterning process
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film...
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7537879 |
Photoresist composition for deep UV and process thereof
The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group...
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7534554 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the...
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7534550 |
Positive resist composition and process for formation of resist patterns
A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an...
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7534549 |
Photoresist polymer, and photoresist composition
A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing...
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7531297 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating...
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