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7384730 |
Top coating composition for photoresist and method of forming photoresist pattern using same
Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a...
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7378230 |
Photoresist composition for multi-micro nozzle head coater
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular...
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7374860 |
Positive resist composition and pattern forming method using the same
The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the...
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7371505 |
Photosensitive composition and method for forming pattern using the same
A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads,...
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7371510 |
Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following...
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7371501 |
Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same
A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C).
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7371499 |
Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same
A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight...
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7368205 |
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure...
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7368216 |
Photosensitive resin composition and manufacturing method of semiconductor device using the same
A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor...
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7364829 |
Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern,...
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7361455 |
Anti-reflective coatings
Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam...
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7361444 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose...
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7361445 |
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH 2 OH group but not a phenolic...
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7361446 |
Positive resist composition
A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group...
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7358035 |
Topcoat compositions and methods of use thereof
A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene,...
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7358028 |
Chemically amplified positive photo resist composition and method for forming resist pattern
The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a...
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7358029 |
Low activation energy dissolution modification agents for photoresist applications
A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution...
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7358037 |
Binder diffusion transfer patterning of a thick film paste layer
The present invention concerns a process for the fabrication of electrical and electronic devices. A polymer film is patterned on a substrate. A thick film paste is deposited over the patterned...
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7358036 |
Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer...
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7351515 |
Positive resist composition and pattern-forming method using the same
A positive resist composition includes:
(A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid...
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7351521 |
Photoresist composition for deep ultraviolet lithography
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1,
The invention also...
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7348122 |
Photosensitive resin composition and method for manufacturing semiconductor device using the same
A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole...
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7344821 |
Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same
A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment...
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7341818 |
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent...
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7338744 |
Positive resist composition and pattern forming method using the same
The invention provides a positive resist composition suitably usable at the time of using an ArF excimer laser light as the exposure light source, assured of excellent performance in view of resist...
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7338737 |
Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl...
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7338745 |
Multilayer imageable element with improved chemical resistance
Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material...
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7338751 |
Process for producing printed wiring board and photosensitive resin composition used in the same
An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring...
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7335458 |
Chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a...
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7332254 |
Positive photosensitive insulating resin composition, cured product thereof, and electronic component
Disclosed is a positive photosensitive insulating resin composition including:
(A) an alkali soluble resin, (B) a compound having a quinonediazide group, and (C) an epoxy resin having a...
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7332258 |
Positive resist composition and process for forming pattern using the same
A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined...
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7329478 |
Chemical amplified positive photo resist composition and method for forming resist pattern
To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an...
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7326525 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Disclosed herein are top anti-reflective coating polymers used in a photolithography process, methods for preparing the anti-reflective coating polymer, and anti-reflective coating compositions...
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7326520 |
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in...
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7326518 |
Photoresist compositions
Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced...
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7323286 |
Photosensitive composition, compound used in the same, and patterning method using the same
A photosensitive composition, comprises (A) a sulfonium salt represented by formula (I);
wherein Y 1 , Y 2 and Y 3 each independently represents a nitrogen-containing heteroaryl group, an...
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7323289 |
Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties
Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one...
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7320855 |
Silicon containing TARC/barrier layer
A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion...
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7316885 |
Method of forming resist pattern, positive resist composition, and layered product
There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the...
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7316884 |
5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is...
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7314700 |
High sensitivity resist compositions for electron-based lithography
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the...
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7314701 |
Radiation-sensitive resin composition
A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or...
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7312016 |
Chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline...
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7300726 |
Multi-layer imageable element with improved properties
Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a combination of two...
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7297465 |
Heat-sensitive lithographic printing plate precursor
According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a...
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7291441 |
Positive resist composition and pattern forming method utilizing the same
A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon...
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7288359 |
Radiation-sensitive resin composition
A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which...
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7288362 |
Immersion topcoat materials with improved performance
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000...
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7285369 |
Positive resist composition and pattern formation method using the same
A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by...
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7282316 |
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular,...
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