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7504195 |
Photosensitive polymer and photoresist composition
A photosensitive polymer which can form a fine circuit pattern by exacting with extreme UV and deep UV, and can improve a line width stability of a pattern by significantly reducing line edge...
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7504193 |
Positive resist composition and pattern forming method using the same
A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the resist composition are provided,...
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7501222 |
Photoresist monomer polymer thereof and photoresist composition including the same
A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution...
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7501224 |
Compositions for use in forming a pattern and methods of forming a pattern
In a composition for forming an interfacial layer on a photoresist pattern, and a method of forming a pattern using the composition, the composition includes a water-soluble polymer, a...
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7501223 |
Polymer, resist composition and patterning process using the same
There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to...
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7498126 |
Photoacid generators, chemically amplified resist compositions, and patterning process
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED...
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7498116 |
Resist composition and pattern formation method using the same
A resist composition includes: (A) a resin that includes: a repeating unit represented by a following formula (I), and a repeating unit represented by a following formula (II); and (B) a compound...
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7494762 |
Positive resist composition for immersion lithography and method for forming resist pattern
Provided are a positive resist composition for immersion lithography, and a method for forming a resist pattern using the same, wherein the positive resist composition comprises a resin component...
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7494761 |
Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition
A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a...
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7491484 |
Photoresist compositions and methods of forming a pattern using the same
In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a...
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7491485 |
Resist composition and method of forming resist pattern
This resist composition according to the present invention includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid...
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7491483 |
Polymers, positive resist compositions and patterning process
A polymer is composed of recurring units of hydroxyvinylnaphthalene, (meth)acrylic units having a lactone ring fused to a bridged ring, and (meth)acrylic units having acid labile groups. A positive...
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7488569 |
Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1):
is contained in a structure of the...
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7488568 |
Resist composition, method of forming resist pattern, compound and acid generator
A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by...
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7485409 |
Planographic printing plate precursor
The present invention provides a planographic printing plate precursor including a support and a positive recording layer formed on the support and containing: (A) a polymer having a structural...
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7485408 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Fluorine-containing silicon compounds having the general formula (1):
wherein X 1 , X 2 , and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6...
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7485413 |
Photosensitive composition and method for forming pattern using same
The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating...
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7485407 |
Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition
Disclosed are a siloxane compound, a photoresist composition using the same, and a method of forming a pattern, wherein the siloxane compound is having a general formula:
wherein R1 is a...
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7476492 |
Low activation energy photoresist composition and process for its use
The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable...
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7470499 |
Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R 1 and R 2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the...
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7465529 |
Radiation sensitive material and method for forming pattern
A copolymer expressed by the following structural formula
was obtained by loading adamantyl methacrylate monomer and t-butyl acrylate monomer by 1:1, then conducting polymerization, adding AIBN...
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7465528 |
Positive-working photosensitive composition and pattern forming method using the same
A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase...
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7462436 |
Positive photoresist composition and method of forming resist pattern
There is provided a positive photoresist composition capable of forming a pattern with excellent resolution, excellent resistance to reflection off the substrate, and excellent perpendicularity....
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7462442 |
Biocompatible microchip and a method for producing the same
The invention relates to a process for the production of biocompatible structures. For this purpose, a chemically amplified photoresist is applied to a substrate and is structured. The photoresist...
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7459262 |
Photoimageable, thermosettable fluorinated resists
The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as...
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7452657 |
Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof
The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a...
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7442490 |
Positive resist composition and pattern formation method using the positive resist composition
A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure...
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7439005 |
Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern
There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous...
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7439010 |
Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive...
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7435536 |
Method to align mask patterns
Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the...
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7435525 |
Positive photosensitive resin composition, method for forming pattern, and electronic part
Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the...
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7425402 |
Heat-sensitive lithographic printing plate precursor
A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble...
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7425404 |
Chemical amplification resist composition and pattern-forming method using the same
A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon...
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7422839 |
Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern
The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer...
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7419761 |
Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the...
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7416830 |
Photosensitive resin compositions
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound...
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7416822 |
Resin and resin composition
Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and...
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7416832 |
Positive resist composition
A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an...
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7416836 |
Developing solution for lithographic printing plate precursor and method for making lithographic printing plate
An alkaline developing solution for development of a presensitized plate for use in making a lithographic printing plate, which developing solution comprises a polyoxyalkylene adduct of alkylene...
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7407733 |
Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition
A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I);
wherein R a is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6...
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7407739 |
Resist developer and resist pattern formation method using same
A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer....
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7399572 |
Pretreatment compositions
A pretreatment composition of:
(a) at least one compound having structure VI
V 1 —Y—V 2 VI
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7399578 |
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
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7399815 |
Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers
The invention relates to a fluorine-containing allyl ether compound represented by the formula 1,
wherein R represents an organic group containing at least one fluorine atom and an alicyclic...
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7399576 |
Positive-working radiation-sensitive composition and elements
Radiation-sensitive compositions can be used to prepare imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble...
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7399581 |
Photoresist topcoat for a photolithographic process
A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T m R3 where m is equal to 8, 10 or 12 and Q n M n R1,R2,R3 where n is equal to 8, 10...
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7396482 |
Post exposure resist bake
A preferred embodiment of the invention provides a method for forming an integrated circuit. The method comprises forming a resist layer on a substrate. Preferably, the photoresist layer comprises...
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7393627 |
Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition...
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7390609 |
Polymers and photoresists comprising same
New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more...
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7390608 |
Photoresists containing Si-polymers
In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of...
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