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7560222 |
Si-containing polymers for nano-pattern device fabrication
A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially...
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7550249 |
Base soluble polymers for photoresist compositions
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl...
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7550247 |
Resist composition and patterning process
A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic...
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7550254 |
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a...
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7547501 |
Photoactive compounds
The present application relates to photoactive materials having the formula
wherein C1 + is a cation; each of R 30 , R 31 , R 32 , R 33 , R 34 , R 35 , R 36 , R 37 , R 38 , R 39 , R 40 , and R...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7544460 |
Resist composition, multilayer body, and method for forming resist pattern
A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is...
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7541131 |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or...
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7541133 |
Positive resist composition and patterning process
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer...
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7541132 |
Chemically amplified resist material, topcoat film material and pattern formation method using the same
A resist film made of a chemically amplified resist material including a polymer; a photo-acid generator and carbamoyl oxime is formed on a substrate. Subsequently, pattern exposure is performed by...
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7541138 |
Resist composition
A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist...
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7537880 |
Polymer, resist composition, and patterning process
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film...
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7537879 |
Photoresist composition for deep UV and process thereof
The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group...
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7534554 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the...
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7534550 |
Positive resist composition and process for formation of resist patterns
A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an...
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7534549 |
Photoresist polymer, and photoresist composition
A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing...
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7531289 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Cyclic structure-bearing fluorinated monomers having formula (1) wherein Z is a divalent organic group containing a polymerizable unsaturated group are useful to produce polymers for the...
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7531286 |
Radiation-sensitive resin composition
1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator. The...
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7531297 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating...
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7527911 |
Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition
A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation:
wherein Z...
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7527912 |
Photoacid generators, resist compositions, and patterning process
Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation.
RC(═O)R 1 —COOCH(CF 3 )CF 2 SO 3...
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7528205 |
Photo radical generator, photo sensitive resin composition and article
A photoradical generator which produces no low-molecular decomposition material but a radical during a photoradical generating process, does not generate a radical during a heating process, exists...
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7527913 |
Photoacid generators, photoresist composition including the same and method of forming pattern using the same
A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a...
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7524613 |
Material for the treatment of lithographic substrates and lithographic printing plates
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first...
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7524594 |
Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films...
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7524604 |
Positive resist composition and method of formation of resist patterns
The invention provides a positive resist composition which has high etching resistance and attains high resolution, and a method of forming patterns by using the positive resist composition. The...
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7524610 |
Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound
An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization...
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7524609 |
Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition
A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation:
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7521171 |
Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin
The positive photosensitive resin of the present invention has an acid-labile protecting group and the structure represented by the following general formula (1):
(wherein X 1 and X 2 may be...
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7521168 |
Resist composition for electron beam, EUV or X-ray
A resist composition for an electron beam, EUV or X-ray comprising (A1) a compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation...
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7521167 |
Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition
Provided are an ester group-containing poly(imide-azomethine)copolymer having low linear thermal expansion coefficient; a production method thereof; an ester group-containing poly(amide...
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7520284 |
Apparatus for developing photoresist and method for operating the same
A first proximity head is configured to define a meniscus of a photoresist developer solution on a substrate. The meniscus is to be defined between a bottom of the first proximity head and the...
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7514205 |
Composition for forming antireflection film, laminate, and method for forming resist pattern
An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a...
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7514203 |
Positive photoresist composition
Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a...
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7514197 |
Resist and method of forming resist pattern
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of...
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7514204 |
Resist composition and patterning process
A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid...
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7510816 |
Silicon-containing resist composition and patterning process
A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution...
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7510822 |
Stimulation sensitive composition and compound
A stimulation sensitive composition comprising:
(A) a compound represented by the specific formula which is capable of generating an acid or a radical by stimulation from the external.
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7507518 |
Photosensitive resin precursor composition
The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises...
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7504196 |
Positive resist composition, method for resist pattern formation and compound
A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action...
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7504195 |
Photosensitive polymer and photoresist composition
A photosensitive polymer which can form a fine circuit pattern by exacting with extreme UV and deep UV, and can improve a line width stability of a pattern by significantly reducing line edge...
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7504193 |
Positive resist composition and pattern forming method using the same
A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the resist composition are provided,...
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7501222 |
Photoresist monomer polymer thereof and photoresist composition including the same
A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution...
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7501224 |
Compositions for use in forming a pattern and methods of forming a pattern
In a composition for forming an interfacial layer on a photoresist pattern, and a method of forming a pattern using the composition, the composition includes a water-soluble polymer, a...
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7501223 |
Polymer, resist composition and patterning process using the same
There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to...
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7498126 |
Photoacid generators, chemically amplified resist compositions, and patterning process
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED...
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7498116 |
Resist composition and pattern formation method using the same
A resist composition includes: (A) a resin that includes: a repeating unit represented by a following formula (I), and a repeating unit represented by a following formula (II); and (B) a compound...
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7494762 |
Positive resist composition for immersion lithography and method for forming resist pattern
Provided are a positive resist composition for immersion lithography, and a method for forming a resist pattern using the same, wherein the positive resist composition comprises a resin component...
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7494761 |
Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition
A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a...
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7491484 |
Photoresist compositions and methods of forming a pattern using the same
In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a...
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