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6426177 |
Single component developer for use with ghost exposure
A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl...
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6423456 |
Method for manufacture of electronic parts
A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by patternwise delivery of heat, comprises a...
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6420085 |
Resist compositions and patterning process
A resist composition contains a base resin, a photoacid generator, and a solvent. The photoacid generator is a sulfonium salt of formula (1). R 1 is hydroxyl, nitro, or straight, branched or...
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6420101 |
Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure
In the exposure and development of available deep ultraviolet (DUV) sensitive photoresist it has been observed that following the standard prior art methods of exposure and development results in a...
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6420084 |
Mask-making using resist having SIO bond-containing polymer
The invention provides improved resist compositions and lithographic methods using the resist compositions of the invention. The resist compositions of the invention are acid-catalyzed resists...
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6416925 |
Positive working photosensitive composition
A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of...
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6410209 |
Methods utilizing antireflective coating compositions with exposure under 200 nm
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as...
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6406827 |
Positive photoresist composition and process for forming resist pattern
A positive photoresist composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of, e.g., bis[ 2,5 -dimethyl- 3 -( 2 -hydroxy- 5 -methylbenzyl)- 4 -hydroxyphenyl]methane and/or ...
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6407865 |
Method for fabricating a lenticular plate
An apparatus for fabricating a lenticular plate by irradiating with laser light a plate to which a photosensitive material is deposited. The apparatus for fabricating a lenticular plate comprises a...
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6403288 |
Resist pattern formation method
A method of forming a resist pattern from a chemically amplified positive radiation sensitive resin composition. The film thickness of an unexposed portion of a resist film formed from the...
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6399258 |
Method for patterning thin films
Patterned articles, such as RFID antenna, are made by subablation, a process comprising the steps of: A. providing a substrate having a coating, such as a metal or metal oxide, and an interface...
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6399274 |
Resist composition and patterning process
A resist composition contains as a base resin a polymer comprising recurring units of the formula (1-1) or (1-2) and having a Mw of 1,000-500,000. R 1 is H, methyl or CO 2 R 2 , R 2 is a...
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6399273 |
Water-processable photoresist compositions
Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an...
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6399267 |
Radiation sensitive resin composition and use of the same in an interlaminar insulating film
A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an...
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6395446 |
Resist compositions and patterning process
A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of the formula (1): wherein R 1 is C 1-10 alkyl or C 6-14 aryl, R 2 is C...
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6395450 |
Positive working photoresist composition
A positive working photoresist composition includes at least one thermally cross-linkable photoacid generator, a binder polymer, and a solvent in which the binder polymer and photoacid generator...
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6395453 |
Photoresist compositions and patterning method
There are disclosed a photoresist composition containing at least an α,β-unsaturated ketone compound, and a patterning method comprising a step of application of a photoresist composition...
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6395451 |
Photoresist composition containing photo base generator with photo acid generator
The present invention relates to a photoresist composition containing Photo Base Generator (PBG), more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) photo...
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6391518 |
Polymers and photoresist compositions using the same
The present invention provides a photoresist monomer represented by the following formula 2; a photoresist copolymer represented by the following formula 100; and a photoresist composition...
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6391514 |
Mixed solvent system for positive photoresists
A photosensitive positive working composition suitable for use as a photoresist, which comprises an admixture of at least one film forming resin; at least one photosensitizer; and a photoresist...
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6391520 |
Compounds for photoresist and resin composition for photoresist
The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R 1 represents a hydrogen atom...
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6391521 |
Resist compositions containing bulky anhydride additives
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and are developable to form resist structures of high resolution and high etch resistance are enabled by the...
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6387598 |
Pattern forming material and pattern forming method
A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with...
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6387578 |
Post-exposure heat treatment to reduce surface roughness of PMMA surfaces formed by radiation lithography
A method to decrease the surface roughness of exposed PMMA surfaces has been discovered. PMMA surface roughness was decreased by a post-exposure heat treatment of less than 70° C. The optimum...
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6379861 |
Polymers and photoresist compositions comprising same
The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly...
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6376151 |
Positive resist composition
A positive resist composition comprising a hydroxypolyamide represented by the following general formula (I) and a photoactive component: (wherein R 1 and R 3 may be the same or different and...
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6372412 |
Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby
A photoresist composition is disclosed having both negative tone and positive tone responses, giving rise to spaces being formed in the areas of diffraction which are exposed to intermediate...
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6372413 |
Method for cleaning the surface of substrate to which residues of resist stick
A TMAH developer is applied to a to-be-processed substrate that has an organic resist film formed thereon and having an LSI pattern created by exposure, thereby developing the resist pattern,...
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6372414 |
Lift-off process for patterning fine metal lines
The present invention relates to a process for providing a pattern on a substrate for use in a metal lift-off process, the process comprising: 1) coating a substrate with a liquid positive...
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6372406 |
Deactivated aromatic amines as additives in acid-catalyzed resists
Deactivated aromatic amines are useful to improve shelf life and performance of acid-catalyzed photoresist compositions without adverse interaction with radiation-sensitive acid generator...
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6368775 |
3-D photo-patterning of refractive index structures in photosensitive thin film materials
A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in...
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6368770 |
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
The present invention provides a novel photoresist monomer, photoresist copolymer derived from the same, and the photoresist composition comprising the same. In particular, the present invention...
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6365322 |
Photoresist composition for deep UV radiation
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region, where the photoresist performance is not adversely impacted by basic contaminants in the...
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6361925 |
Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides
Compounds of the formula I in which R 1 is C 1 -C 4 alkyl, R 2 is hydrogen, C 1 -C 4 alkyl or C 1 -C 4 alkoxy and R 3 , R 4 , R 5 , R 6 and R 7 independently of one another are hydrogen,...
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6358675 |
Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom
The polymers of the invention are characterized by having at least one pendent ester group having a tertiary carbon atom attached to the ester oxygen atom in which at least one substituent of the...
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6352818 |
Photoresist development method employing multiple photoresist developer rinse
A method for forming within a deep ultraviolet (DUV) sensitive photosensitive layer formed upon a substrate employed within a microelectronics fabrication a pattern with attenuated defects and...
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6352814 |
Method of forming a desired pattern
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to heat of a composition which comprises a...
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6348299 |
RIE etch resistant nonchemically amplified resist composition and use thereof
Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The...
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6340545 |
Photosensitive resin composition, method of forming patterns, photosensitive liquid for forming colored images, and color filter
A photosensitive resin composition and a photosensitive liquid for forming colored images are produced from (1) a resin comprising molecules having carboxyl groups and (2) an arene compound, ...
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6340556 |
Tailoring of linewidth through electron beam post exposure
A process for decreasing the linewidth of photoresist images which are suitable for use in the production of microelectronic devices such as integrated circuits. A photosensitive composition is...
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6340546 |
Positive photosensitive resin composition, method of forming relief pattern, and electronic part
Positive photosensitive resin compositions, which comprise (A) a polyamidate having repetitive units of general formula (I) wherein R 1 is a tetravalent organic group, R 2 is a divalent...
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6340552 |
Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms...
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6338931 |
Resist compositions and patterning process
A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of the formula (1): wherein R 1 is C 1-10 alkyl or C 6-14 aryl, R 2 is C...
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6338930 |
Positive photoresist layer and a method for using the same
A method for preparing a positive photoresist layer is provided. In this method, a photoresist composition is drop-wise applied on an insulator layer or a conductive metal layer formed on a...
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6335141 |
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule...
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6334244 |
Method for producing ink-jet recording head
In a method of making an ink jet recording head, oxide films are formed on both surfaces of a silicon substrate, followed by a first metal film, a piezoelectric film, and a second metal film. A...
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6333133 |
Positive planographic printing material
A positive planographic printing material which is capable of recording a digital data from a computer and the like, using a solid laser or a semiconductor laser emitting infrared rays. The...
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6331378 |
Pattern forming method
A substrate is coated with a chemically amplified negative resist, thereby forming a resist film on the substrate. The chemically amplified negative resist includes: a polymer containing an acrylic...
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6329126 |
Developer solution for acitinic ray sensitive resist
Disclosed is a novel aqueous developer solution used in the development treatment of an actinic ray-sensitive resist for the manufacture of, for example, semiconductor devices, which is capable of...
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6329125 |
Chemically amplified resist compositions and process for the formation of resist patterns
Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble compound having a structural unit containing a protected alkali-soluble group in which unit a...
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