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7608390 |
Top antireflective coating composition containing hydrophobic and acidic groups
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7608380 |
Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred...
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7604919 |
Monomer, polymer and composition for photoresist
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
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7604917 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a...
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7601483 |
Anti-reflective coatings using vinyl ether crosslinkers
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups...
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7601482 |
Negative photoresist compositions
The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1,
where, R′...
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7598017 |
Negative resist composition and method of forming resist pattern
A negative resist composition including:
a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural...
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7597491 |
Apparatus for and method of processing substrate
A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle...
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7592129 |
Method for forming photoresist pattern and method for manufacturing semiconductor device
With the objective of suppressing resist pattern collapse generated at dry etching, energy rays are applied to a photoresist structure including an antireflection film provided on a base and a...
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7592119 |
Photosensitive polyimide resin composition
The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even...
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7591601 |
Coater/developer, coating/developing method, and storage medium
A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each...
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7591600 |
Method and system for monitoring photolithography processing based on a batch change in light sensitive material
A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of...
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7585615 |
Composite photoresist for modifying die-side bumps
A composite photoresist comprises a photoresist material and a filler material dispersed within the photoresist material, wherein the filler material includes a plurality of nanoparticles. The...
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7582409 |
Negative resist composition and method of forming resist pattern
A negative resist composition that includes an alkali-soluble resin component, an acid generator component that generates acid upon exposure, and a cross-linker component, wherein the...
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7582360 |
Coating compositions for use with an overcoated photoresist
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating...
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7579138 |
Method for forming micropattern
The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be...
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7575851 |
Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member
A cationic photopolymerizable epoxy resin composition includes an epoxy resin, a cationic photopolymerization initiator, an inhibitor of cationic polymerization and a compound that has a...
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7571424 |
Diffused aerial image model semiconductor device fabrication
A lithography method has a simulation method for mathematically approximating a photoresist film pattern with a Diffused Aerial Image Model (“DAIM”) for semiconductor device fabrication. The...
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7569327 |
Curable polymer compound
This invention relates to a novel polymer compound, and a process for preparing the same and a radical polymerizable, curable composition using the same. The polymer of the invention has in the...
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7569326 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically...
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7560222 |
Si-containing polymers for nano-pattern device fabrication
A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially...
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7550254 |
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a...
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7550247 |
Resist composition and patterning process
A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7547501 |
Photoactive compounds
The present application relates to photoactive materials having the formula
wherein C1 + is a cation; each of R 30 , R 31 , R 32 , R 33 , R 34 , R 35 , R 36 , R 37 , R 38 , R 39 , R 40 , and R...
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7541137 |
Resist resolution using anisotropic acid diffusion
Methods for increasing the resolution capability and line edge roughness of resists, including chemically amplified resists are disclosed. In order to improve upon the resolution, dipolar species...
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7541131 |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or...
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7534554 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the...
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7534547 |
Optically active compound and photosensitive resin composition
A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):
A-[(J) m -(X-Pro)] n ...
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7531297 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating...
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7524614 |
Negative-working radiation-sensitive compositions and imageable materials
A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of...
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7524613 |
Material for the treatment of lithographic substrates and lithographic printing plates
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first...
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7524610 |
Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound
An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization...
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7524432 |
Metal pattern forming method
A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a...
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7521168 |
Resist composition for electron beam, EUV or X-ray
A resist composition for an electron beam, EUV or X-ray comprising (A1) a compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation...
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7517641 |
High performance curable polymers and processes for the preparation thereof
Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the...
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7517640 |
Method for removing photoresist using a thermal bake in the presence of hydrogen and a semiconductor device manufactured using the same
The present invention provides a method for removing photoresist, and a method for manufacturing a semiconductor device. The method for removing photoresist, without limitation, may include...
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7517637 |
Method of producing self-aligned mask in conjunction with blocking mask, articles produced by same and composition for same
A method of forming a self aligned pattern on an existing pattern on a substrate including applying a coating of a solution containing a masking material in a carrier, the masking material being...
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7517636 |
Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
A photosensitive resin composition is here disclosed which satisfies the following (1) and (2):
(1) when a 1.0 wt % aqueous sodium carbonate solution is sprayed by a spray on a layer of the...
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7517620 |
Method for fabricating array substrate having color filter on thin film transistor structure for liquid crystal display device
A method for fabricating an array substrate having a color filter on a thin film transistor structure for a liquid crystal display device is disclosed in the present invention. The method for...
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7514197 |
Resist and method of forming resist pattern
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of...
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7510822 |
Stimulation sensitive composition and compound
A stimulation sensitive composition comprising:
(A) a compound represented by the specific formula which is capable of generating an acid or a radical by stimulation from the external.
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7510816 |
Silicon-containing resist composition and patterning process
A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution...
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7507518 |
Photosensitive resin precursor composition
The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises...
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7501229 |
Anti-reflective coating containing sulfur atom
There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The...
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7501222 |
Photoresist monomer polymer thereof and photoresist composition including the same
A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution...
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7498126 |
Photoacid generators, chemically amplified resist compositions, and patterning process
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED...
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7498119 |
Process for forming a feature by undercutting a printed mask
A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask,...
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7494764 |
Negative photosensitive resin composition
A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink...
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