|
Match
|
Document |
Document Title |
|
|
7416822 |
Resin and resin composition
Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and...
|
|
|
7410746 |
Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical...
|
|
|
7407739 |
Resist developer and resist pattern formation method using same
A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer....
|
|
|
7407733 |
Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition
A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I);
wherein R a is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6...
|
|
|
7407731 |
Photosensitive resin compositions
A photosensitive resin composition comprising:
(a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI
wherein, V is CH or N, Y is...
|
|
|
7399581 |
Photoresist topcoat for a photolithographic process
A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T m R3 where m is equal to 8, 10 or 12 and Q n M n R1,R2,R3 where n is equal to 8, 10...
|
|
|
7399573 |
Method for using negative tone silicon-containing resist for e-beam lithography
The negative resist compositions especially suitable for electron beam-based lithographic processes are obtained by using a polymeric component containing first silsesquioxane moieties...
|
|
|
7396633 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the...
|
|
|
7393627 |
Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition...
|
|
|
7384730 |
Top coating composition for photoresist and method of forming photoresist pattern using same
Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a...
|
|
|
7378223 |
Photoresist resin composition
The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane...
|
|
|
7378222 |
Antihalation compositions
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a...
|
|
|
7374864 |
Combined nanoimprinting and photolithography for micro and nano devices fabrication
A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a...
|
|
|
7368219 |
Polymer for forming anti-reflective coating layer
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition...
|
|
|
7364829 |
Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern,...
|
|
|
7361444 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose...
|
|
|
7358037 |
Binder diffusion transfer patterning of a thick film paste layer
The present invention concerns a process for the fabrication of electrical and electronic devices. A polymer film is patterned on a substrate. A thick film paste is deposited over the patterned...
|
|
|
7358036 |
Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer...
|
|
|
7358027 |
Copolymer for use in chemical amplification resists
A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent...
|
|
|
7358026 |
Method for thermal development of a photosensitive element using a development medium having a support
This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of...
|
|
|
7348126 |
Negative working, heat-sensitive lithographic printing plate precursor
A negative-working lithographic printing plate precursor is disclosed comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an...
|
|
|
7348123 |
Process for preparing a flexographic printing plate
A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and...
|
|
|
7338751 |
Process for producing printed wiring board and photosensitive resin composition used in the same
An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring...
|
|
|
7338750 |
Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof
A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for...
|
|
|
7338748 |
Polymerizable composition and planographic printing plate precursor
The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer...
|
|
|
7338743 |
Resist material and pattern formation method
A resist material includes a first polymer in which part of alkali-soluble groups are protected by an acid labile group labilized by an acid; a second polymer in which substantially all...
|
|
|
7335461 |
Method of structuring of a subtrate
The invention relates to a method of structuring of a substrate by providing a polymerization starter layer on the substrate, applying a radiation field on the polymerization starter layer for...
|
|
|
7332253 |
Negative-working radiation-sensitive compositions and imageable materials
A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed...
|
|
|
7326523 |
Low refractive index polymers as underlayers for silicon-containing photoresists
A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a...
|
|
|
7326521 |
Method of imaging and developing negative-working elements
Negative-working imageable elements can be imaged and then developed using a lower pH organic-based single-phase developer that is less toxic and corrosive and that can be more readily disposed of...
|
|
|
7326520 |
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in...
|
|
|
7323292 |
Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same
A process and related structure are disclosed for using photo-definable layers that may be selectively converted to insulative materials in the manufacture of semiconductor devices, including for...
|
|
|
7323289 |
Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties
Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one...
|
|
|
7320855 |
Silicon containing TARC/barrier layer
A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion...
|
|
|
7316884 |
5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is...
|
|
|
7314701 |
Radiation-sensitive resin composition
A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or...
|
|
|
7314700 |
High sensitivity resist compositions for electron-based lithography
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the...
|
|
|
7309561 |
Polymer for forming anti-reflective coating layer
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition...
|
|
|
7306899 |
Method for manufacturing photoresist having nanoparticles
An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions ( 211 ); adding a sulfide...
|
|
|
7306892 |
Multilayer photoresist system
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing...
|
|
|
7303856 |
Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer
A light-sensitive sheet comprises a support, a first light-sensitive layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently...
|
|
|
7303855 |
Photoresist undercoat-forming material and patterning process
An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with...
|
|
|
7300746 |
Photomask for forming small contact hole array and methods of fabricating and using the same
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type...
|
|
|
7300730 |
Creating an optically tunable anti-reflective coating
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the...
|
|
|
7297467 |
Method of making a heat-sensitive lithographic printing plate
A method of making a lithographic printing plate is disclosed which comprises the steps of
(1) providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic...
|
|
|
7297464 |
Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component...
|
|
|
7291443 |
Polymerizable composition and image-recording material using the same
A polymerizable composition contains (A) a dye which is soluble in an organic solvent and in an alkaline aqueous solution and has an absorption in 700 to 1200 nm, (B) a radical polymerization...
|
|
|
7288362 |
Immersion topcoat materials with improved performance
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000...
|
|
|
7282323 |
Highly heat-resistant, negative-type photosensitive resin composition
Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated...
|
|
|
7279255 |
Negative-working radiation-sensitive compositions and imageable materials
A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the...
|