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5786131 |
Process for use of photoresist composition with deep ultraviolet radiation
The present invention relates to a process for generating a resist image on a substrate utilizing a resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted...
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5783367 |
Process for production of semiconductor device and resist developing apparatus used therein
In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an...
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5783365 |
Manufacturing method of semiconductor device
To present a manufacturing method of semiconductor device capable of preventing deactivation phenomenon of acid of chemically amplified resist when the foundation layer is a silicon nitride film,...
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5780206 |
Fine pattern forming process using a resist composition sensitive to deep ultraviolet light
A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the...
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5773191 |
Radiation-sensitive composition
A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R 1 is a hydrogen atom or a methyl group, R 2 is a...
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5770350 |
Method for forming pattern using multilayer resist
A method for forming a pattern using a multilayer resist including the steps of: coating a first lower resist layer on a substrate having a lower level region and an upper level region; selectively...
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5759751 |
Method of peeling photo-resist layer without damage to metal wiring
A semiconductor manufacturer peels a photo-resist mask off by using organic alkaline solvent, and the residual alkaline solvent is neutralized with acid before a rinse in pure water so as to...
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5759748 |
Method for forming photoresist pattern
A method for forming photoresist patterns, comprising the steps of: coating a chemically enhanced photoresist film on a lower layer; forming a silicon monomer layer on the chemically enhanced...
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5756267 |
Developing solution for negative type photosensitive resin compositions
A developing solution for negative type photo-sensitive resin compositions which comprises an aqueous solution containing 0.01 to 1.5% by weight of at least one compound selected from quaternary...
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5756266 |
Process for manufacturing devices using maleimide containing resist polymers
A lithographic process for fabricating a device is disclosed. An area of radiation sensitive material is formed on a substrate. The radiation sensitive material contains a polymeric component The...
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5753403 |
Diazo based imaging element containing hydrolysed polyvinyl alcohol and metal-free phthalocyanine
The present invention provides an imaging element comprising on a hydrophilic base a light-sensitive layer containing polyvinyl alcohol hydrolyzed to at least an extent of 95% by weight, a cationic...
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5753421 |
Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
Stock developer solutions for photoresists contain an organic base free from metal ions and at least one compound having a specified weight average molecular weight that is selected from among...
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5753404 |
Photosensitive recording material containing negative working diazonium salt layer and discontinuous top layer
A photosensitive recording material is described which has a layer base, a negative-working photosensitive layer containing a diazonium salt and a water-insoluble polymeric binder which is soluble...
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5753415 |
Apparatus for piece-by-piece development corresponding to large scale substrates
A piece-by-piece, passing type development apparatus corresponding to large scale substrates comprises a pipe for ejecting a developing solution and means for applying the developing solution...
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5744280 |
Storage-stable photoimageable deutero leuco dye/photooxidation compositions with improved leuco dye
Storage-stable photoimageable leuco dye/photooxidant compositions and imaging processes utilizing these compositions are disclosed. These compositions comprise deuterated leuco compounds, e.g.,...
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5743998 |
Process for transferring microminiature patterns using spin-on glass resist media
A process is provided for altering the susceptibility of a portion of a Spin-On Glass layer to etching. The process includes taking a substrate including a layer of positive or negative resist...
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5744285 |
Composition and process for filling vias
Electrolytic and electroless processes which use a solid plug of polymer thick film composition to fill throughholes and composition therefor. The composition comprises a trimodal conductive...
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5741621 |
Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions
A process for preparing an image on a substrate by applying a photoimageable composition on a first substrate, wherein the photoimageable composition, having a solids content from 25 to 60 weight...
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5741619 |
Negative image-recording material comprising an acrylic resin, a diazo compound and carbon black
A negative-working image-recording material containing both a substance which absorbs light and generates heat and a diazonium compound having two or more diazohio groups in the molecule and a...
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5741620 |
Reactive polymeric dyes
Reactive polymeric dyes are provided comprising a chromophoric moiety derived from at least one free radically polymerizable dye and an azlactone moiety derived from 2-alkenylazlactone such that...
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5741628 |
Method of forming micropatterns by having a resist film absorb water
A resist film is formed on a semiconductor substrate by using a chemical amplification resist which generates an acid in response to the radiation of KrF excimer laser light and which reacts with...
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5741629 |
Resist materials and related processes
Polymers suitable for chemically amplified resists based on styrene chemistry are advantageously formed with a meta substituent on the phenyl ring of the styrene moiety. Additionally, polymers for...
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5736301 |
Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used
A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography...
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5736279 |
Accurate drilling of probe holes in the insulating plate of an electrical test head
A method for manufacturing insulating plates with accurately located holes in patterns suitable for bed of nails type test heads. An optically aligned drilling machine is used to form holes in the...
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5733714 |
Antireflective coating for photoresist compositions
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic...
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5728506 |
Lithographic processes employing radiation sensitive polymers and photosensitive acid generators
The use of a terpolymer significantly enhances the properties of resists suitable for deep UV lithography in the manufacture of semiconductor devices. This terpolymer is one represented by the...
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5725994 |
Negative type photosensitive compositions comprising a hydroxyimide compound
Disclosed are a novel photosensitive composition which can form a sharp negative image, a photosensitive composition recordable independently of the emission wavelength of an exposure light source,...
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5725997 |
Method for preparing a resist pattern of t-shaped cross section
A resist pattern formed on a substrate has a T-shaped cross section including a stem portion extending from the substrate surface and a cap portion connected to the stem portion and spaced from the...
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5721091 |
Composition for forming an electrically conductive layer to be used in patterning
A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises: (a) 0.1 to 20 parts by weight of sulfonated...
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5707784 |
Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern
A chemically amplified resist pattern is formed by applying chemically amplified resist, forming thereafter a layer of an amorphous polyolefines substance thereon, then exposing the chemically...
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5705322 |
Method of providing an image using a negative-working infrared photosensitive element
An infrared imaging composition contains two essential components, namely an infrared radiation absorbing compound, and a phenolic resin that is either mixed or reacted with an...
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5702872 |
Process for resist pattern formation using positive electrodeposition photoresist compositions
A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per...
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5702820 |
Photo-imaging resist ink and cured product thereof
There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive...
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5700628 |
Dry microlithography process
An all-dry microlithography process, where a fluorinated layer 30 is deposited on a processable layer 18 of a semiconductor wafer, and regions of the fluorinated layer 30 are exposed to a masked...
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5700629 |
Developing process
A resist pattern good in resolution and image precision can be obtained by a developing process characterized by jetting a gas on a developing surface during development or after development.
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5698376 |
Method of producing a resist pattern by contact imaging a photoimageable composition providing a tack-free surface
In a method of providing a resist pattern on a substrate surface, a layer of photoimageable composition is applied to a substrate, which photoimageable composition provides a tack-free surface. The...
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5698377 |
Method of forming a resist pattern
To provide a method of forming a resist pattern in a readily controllable manner and at low costs, in a first exposure step, a resist layer is subject to exposure through a mask. In the next, first...
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5695903 |
Process for developing irradiated radiation-sensitive recording materials
A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) ##STR1## wherein A is H, Na, K, NH 4 or...
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5686226 |
Method of forming an applicator for applying tacking media to a circuit substrate
An applicator (300) provides a tool for depositing processing media (510), such as a tacky flux agent, on predetermined surface areas (715) of a circuit substrate (705). The applicator (300) has a...
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5679497 |
Resist material and method for forming resist pattern
A resist material and a method for forming a resist pattern can be obtained which can improve throughput of pattern formation using both EB lithography and optical beam lithography and which does...
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5677111 |
Process for production of micropattern utilizing antireflection film
A process for production of a micropattern, comprised of a step for forming an antireflection film comprised of an inorganic film on an underlying substrate, a step for forming a resist film on...
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5677112 |
Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition
A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these...
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5674663 |
Method of applying a photosensitive resin to a substrate for use in papermaking
The invention comprises a method for applying a curable resin, such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a...
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5667942 |
Resist pattern forming method
A resist pattern forming method which includes: an application step of applying a photoresist onto a semiconductor substrate, a prebake step of prebaking the photoresist in an atmosphere...
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5665527 |
Process for generating negative tone resist images utilizing carbon dioxide critical fluid
The invention relates to a process for generating a negative tone resist image comprising the steps of (1) coating a substrate with a film of a polymeric composition comprising (i) a polymer, (ii)...
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5658711 |
Method of forming micropatterns
A relatively thick metal oxide film of 100 nm or more is formed in the exposed portion of a resist film by supplying water and a metal alkoxide thereto, and then evaporating the alcohol generated...
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5658712 |
(Meth)acrylates containing urethane groups
Novel (meth)acrylates which also contain urethane groups and other polymerizable groups in one and the same molecule and can be polymerized either by means of free radicals and/or cationically are...
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5656413 |
Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
The present invention provides methods for producing TPPA having low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition...
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5656414 |
Methods of forming tall, high-aspect ratio vias and trenches in photo-imageable materials, photoresist materials, and the like
Simple and cost-effective methods for forming tall, high-aspect ratio structures in a material layer comprising a first layer of a image-reversal-type photo-sensitive material and a second layer of...
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5652938 |
Method and apparatus for developing resist
A resist developing apparatus has a plurality of developing solution containers each provided with a temperature regulator, a mixture tank connected to the plurality of developing solution...
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