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5952150 |
Radiation sensitive resin composition
A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution...
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5948596 |
Digital printing plate comprising a thermal mask
Presensitized lithographic plates are prepared which permit direct formation of printable images on plates by digital computerization without the intervening formation of a photographic image with...
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5932396 |
Method for forming magnetic poles in thin film magnetic heads
A resist composition is used to form a plating frame including a space having a section of up to 2 μm in width and at least 4 μm in depth. The resist composition contains as an alkali-soluble...
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5928840 |
Patterning material and patterning method
A patterning material includes a polymer represented by a general formula: ##STR1## wherein R 1 indicates a hydrogen atom or an alkyl group; R 2 indicates a hydrophobic protecting group which is...
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5928841 |
Method of photoetching at 180 to 220
Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the...
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5922513 |
Illumination method and apparatus for the formation of micro patterns
The illumination method and apparatus used to form micro patterns, which can determine an ellipticity exhibiting optimum contrast gap and contrast by deriving a polarization distribution function...
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5919596 |
Toughened photosensitive polycyanurate resist, and structure made therefrom and process of making
Disclosed is an admixture which is curable to form a crack resistant, photosensitive polycyanurate resist. Also disclosed is a structure for its use and process of making. The resist can be...
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5914354 |
Radiation-sensitive resin composition
A photosensitive resin composition comprising; (A) a polyimide precursor containing an acrylic or methacrylic group; (B) a tertiary amine compound represented by the general formula: ##STR1##...
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5910392 |
Resist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor device
The present invention discloses a chemically amplified resist composition that is able to form a resist pattern that can be exposed in short wavelength regions, has good transparency, sensitivity,...
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5908734 |
Image formation method with a post exposure heating step
An image formation method which comprises: (a) selectively exposing a photosensitive layer with a visible laser beam, (b) heating the exposed photosensitive layer at a temperature of from 36 to...
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5900350 |
Molding methods, molds and products
A method of manufacturing plates assembleable in a stack to provide a mold to form fastener elements includes applying a photoresist material to at least one side of the plate. The photoresist...
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5897985 |
Potassium silicate developing composition and method of use to process lithographic printing plates
An alkaline developing composition for processing a lithographic printing plate includes an alkali metal silicate present in an amount to provide at least about 42 g SiO 2 per 1000 g of...
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5892095 |
Cyano group-containing oxime sulfonate compounds
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices....
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5885755 |
Developing treatment apparatus used in the process for manufacturing a semiconductor device, and method for the developing treatment
A developing treatment apparatus has a spin chuck for supporting a semiconductor wafer on which a photoresist to be developed is formed by suction and rotating it at least two rotating speeds...
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5885754 |
Method of forming a pattern
A method of forming a pattern includes the steps of forming a first layer by applying an organic material on a layer to be processed, forming a second layer which can be treated with an organic...
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5885753 |
Polymeric self-assembled mono- and multilayers and their use in photolithography
A self-assembled multilayer and in particular polymeric self-assembled multilayer can be effectively produced from two or more self-assembled monolayers on a substrate where each of the...
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5882967 |
Process for buried diode formation in CMOS
According to the present invention, an improved method for buried diode formation in CMOS processing is disclosed. Using a hybrid photoresist process, a self-aligning Zener diode is created using a...
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5879863 |
Pattern forming method
Disclosed is a method of forming a pattern, comprising the steps of forming an underlying film on a semiconductor substrate, bringing a vapor of a neutralizer, which generates an acid upon exposure...
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5879859 |
Strippable photoimageable compositions
Strippable photoimageable compositions are provided that include a cycloaliphatic diepoxide and a photoactive compound. The compositions are especially useful for patterning a substrate.
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5866299 |
Negative photoresist composition
A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes...
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5866304 |
Photosensitive resin and method for patterning by use of the same
The invention provides a photosensitive resin which includes polymer including a group which reacts with an acid to thereby convert a polarity thereof, a photo acid generator which is responsive to...
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5866307 |
Resist processing method and resist processing system
A resist processing method for introducing a pressurized gas into a vessel storing a solution, sending the solution from the vessel to a nozzle by way of a supply line by means of the pressurized...
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5863679 |
Method for forming thin film pattern
The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of: (a) exposing a polysilane layer formed...
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5863710 |
Developer solution for photolithographic patterning
Proposed is an aqueous alkaline developer solution used in the development treatment of a photoresist layer, especially, formed on an aluminum surface of a substrate. Different from conventional...
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5861235 |
Ultraviolet-curable composition and method for patterning the cured product therefrom
This invention pertains to a curable composition comprising a N-substituted 4-(o-nitrophenyl)dihydropyridine (a compound that generates base under the action of ultraviolet radiation) and a...
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5858591 |
Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging
Improvement in the quality of photoresist images has been achieved. The data file in which the full description of the photoresist image, including Optical Proximity Corrections, has been stored is...
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5858621 |
Bi-layer silylation process using anti-reflective-coatings (ARC) for making distortion-free submicrometer photoresist patterns
A novel bi-layer using a silylation process and anti-reflective coatings are employed for making distortion-free submicrometer photoresist patterns. The method involves forming a multilayer...
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5856065 |
Negative working photoresist composition based on polyimide primers
Negative working photoresist compositions containing: a) a polyimide primer containing recurring structural units of formula (I) in the specification as well as b) a photoinitiator for...
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5853961 |
Method of processing substrate and apparatus for processing substrate
A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at...
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5851738 |
Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units
Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a...
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5851736 |
Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern
A heat-resistant photoresist composition comprising a polyimide precursor having a structural unit represented by formula (I): ##STR1## wherein the arrows, R 1 , and R 2 are the same as defined...
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5851737 |
Spatially varied interfaces for composite materials
A method for controlling the interface in a composite between the matrix material and reinforcing filaments or fibers in a composite structure which comprises the application of a patterned coating...
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5849465 |
Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same
A photosensitive liquid precursor solution including titanium carboxyketoesters or titanium carboxydiketonates polymerizes upon exposure to ultraviolet radiation. The solution is applied to an...
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5849602 |
Resist processing process
The substrate unloaded from the exposure device is received at the interface unit, and then carried by the substrate carrying means to the heat treatment unit, where a heat treatment is carried out...
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5846695 |
Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit
A removing agent composition for a photoresist comprising 0.01 to 20% by weight of a quaternary ammonium hydroxide, 1 to 80% by weight of a nucleophilic amine having an oxidation-reduction...
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5846690 |
Radiation-sensitive composition containing plasticizer
A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor...
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5843627 |
Method for forming fine patterns of semiconductor device
There is provided a method for forming fine patterns in a semiconductor device without the falling down of the patterns, comprising the steps of: coating a photosensitive film on a wafer;...
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5840451 |
Individually controllable radiation sources for providing an image pattern in a photolithographic system
A photolithographic system includes individually controllable radiation sources for forming an image pattern on an image plane without using a reticle or mask during fabrication of an integrated...
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5830624 |
Method for forming resist patterns comprising two photoresist layers and an intermediate layer
A method for forming a resist pattern by coating a primary photoresist pattern having a small thickness and then coating a secondary photoresist pattern over the primary photoresist pattern....
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5824456 |
Composition for forming metal oxide thin film pattern and method for forming metal oxide thin film pattern
A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic...
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5824452 |
Resist compositions and process for the formation of resist patterns
The negative-working resist composition which comprises a (meth)acrylate copolymer comprising (a) a vinyl monomer unit which contains in a side chain thereof at least one carbon--carbon double bond...
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5814431 |
Photosensitive composition and lithographic printing plate
A photosensitive composition comprising (a) a resin selected from the group consisting of novolak resins and polyvinylphenol resins; (b) an amino compound derivative capable of curing the...
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5814433 |
Use of mixtures of ethyl lactate and N-methyl pyrollidone as an edge bead remover for photoresists
The invention provides a process for removing unwanted photoresist material from the periphery of a photoresist-coated substrate using a solvent composition of ethyl lactate and N-methyl...
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5807657 |
Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same
A polyvinyl alcohol base photosensitive resin comprised of a polyvinyl alcohol base polymer compound with the structural units of formulae (I) and (II) ##STR1## as well as a photosensitive resin...
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5804354 |
Composition for forming conductivity imparting agent and pattern forming method
A composition for forming a conductivity imparting agent comprising: (a) 0.1 to 20 parts by weight of sulfonated polyaniline having a content of a sulfonic acid group of 20 to 80% with respect...
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5800967 |
Method for fabricating a planar thin film structure
A method is disclosed for fabricating a substantially planar photoimageable layer atop a first thin film member situated on a substrate. The substrate and first thin film member are covered with a...
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5798203 |
Method of making a negative photoresist image
In a method of making a negative photoresist image as for lithography, a positive resist is exposed by a light radiation through a phase shift mask as a first exposing step. Next, the positive...
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5795700 |
Method for forming resist pattern with enhanced contrast film
A resist pattern is formed on a substrate by forming a water-soluble resist film on the substrate, forming a contrast enhancing film on the resist film from a contrast enhancing composition...
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5795699 |
Langmuir-blodgett (LB) films as ARC and adhesion promoters for patterning of semiconductor devices
A method for forming upon a reflective layer, such as a reflective conducting layer, within an integrated circuit an Anti-Reflective Coating (ARC) which simultaneously possesses adhesion promotion...
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5795701 |
Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound
Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in...
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