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6100010 |
Photoresist film and method for forming pattern thereof
A photoresist includes a three-layer structure of a lower layer, a middle layer and an upper layer, wherein the lower and upper layers are photoresist layers, the lower layer is sensitive to a...
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6096484 |
Pattern forming method using chemically amplified resist and apparatus for treating chemically amplified resist
A chemically amplified resist is applied to a semiconductor substrate and subjected to post-apply bake, and exposed to light, then, the resist is treated with a vapor of an organic solvent such as...
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6096483 |
Radiation-curable composition and method for manufacturing cured-product patterns therefrom
The present invention provides a curable composition which comprises (A) a base-generating substance which generates a base when exposed to the action of ultraviolet light, (B) a siloxane polymer...
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6093520 |
High aspect ratio microstructures and methods for manufacturing microstructures
A method is disclosed for the manufacture of microstructures and devices. The method is relatively easy to implement, and has the capability to produce features having a resolution of ten microns...
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6093518 |
Visible laser-curable composition
The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light...
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6090531 |
Compostion for anti-reflective coating material
A composition for anti-reflective coating material is disclosed, comprising a polymer compound having repeating units having specific structure, and optionally a melamine, guanamine, urea, phenol,...
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6087070 |
Photoactivatable nitrogen-containing bases based on α-amino alkenes
The invention relates to organic compounds having a molecular weight of less than 1000 comprising at least one structural unit of the formula (I) ##STR1## in which R 1 is an aromatic or...
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6083665 |
Photoresist laminate and method for patterning using the same
A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus,...
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6080530 |
Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage,...
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6071670 |
Transparent resin, photosensitive composition, and method of forming a pattern
A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being...
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6066438 |
Method for fixing functional material and patterned functional material
A method for fixing, on a substrate, functional material such as proteins, enzymes, polysaccharides, nucleic acids, microorganisms, viruses and cultured cells, includes the steps of (i) forming on...
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6066431 |
Photosensitive resin film and use thereof
There are provided a photosensitive resin film which can eliminate the step of development and the like, that is, can simplify the process, and in addition can form an even fluorescent substance...
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6063543 |
Radiation-sensitive mixture and its use
A radiation-sensitive mixture contains the following components: a film-forming polymer which has an acid-labile, hydrolysis-stable polymer unit and at least one thermally stable polymer unit; ...
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6063549 |
Wet-chemical, developable, etch-stable photoresist for UV radiation with a wavelength below 200 nm
Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical...
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6063545 |
Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture
A negative-working radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least two groups...
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6054254 |
Composition for underlying film and method of forming a pattern using the film
A method of forming a pattern which comprises the steps of forming an underlying film on a work film, forming a resist film on the underlying film, exposing the underlying film and the resist film...
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6054251 |
Photopolymerizable composition
The present invention provides a visible laser-curable resist composition which contains at least one radical-protecting compound selected from a phosphorous acid ester compound and an aromatic...
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6048663 |
Negative-working photoresist compositions and and use thereof
A negative-working photoresist composition comprising 1,4-dihydropyridine derivative as a photosensitive material and a polyamic acid, a heat-resisting photoresist composition comprising a...
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6048660 |
Non-volatile phenylglyoxalic esters
Compounds of the formula I ##STR1## in which R 1 and R 2 independently of one another are, for example, a group of the formula II ##STR2## R 3 , R 4 , R 5 , R 6 and R 7 independently of one...
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6045972 |
Coating method using aqueous photopolymerizable compositions
The claimed invention relates to a method for coating a substrate, preferably a printed circuit board, comprising the step of applying to said substrate surface a photopolymerizable water-borne...
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6042992 |
Bottom antireflective coatings through refractive index modification by anomalous dispersion
The invention provides a process for the generation of an antireflective bottom layer with effective reduction of substrate reflectivity and swing curve effects in lithographic applications. It...
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6037101 |
Photosensitive mixture and recording material produced therefrom
A photosensitive recording material having a dimensionally stable substrate and a photosensitive layer which is applied thereon and contains A) an elastomeric block copolymer as a binder, B)...
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6033830 |
Antireflective coating compositions
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in...
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6027854 |
Polymers chemically amplified positive resist compositions, and patterning method
A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups and/or carboxyl groups are replaced by acid...
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6027856 |
Negative-type resist composition and process for forming resist patterns
A negative-type resist composition which is developable in a basic aqueous solution, which comprises a film-formable, basic aqueous solution-soluble polymer with an alkali-soluble group, a compound...
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6022672 |
Method of manufacturing semiconductors having improved temperature control
A method, system or device for forming a resist pattern applied to fine processing, such as that for preparation of a semiconductor device. The wafer transportation system for the process affected...
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6020093 |
Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin...
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6017682 |
Solid state extension method
A solid state chain extension method provides for the formation of a solid state film comprised of a high molecular weight polymer by chain extending a deblocked Lewis base with Lewis acid...
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6015651 |
Solder resist ink composition of a novolak-epoxy resin
The photo-curable liquid solder resist ink composition of the present invention mainly comprises a photo-polymerizable resin having sufficient molecular weight and (meth)acryloyl groups which are...
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6013419 |
Process for using photosensitive, heat-resistant resin composition to form patterns
A method for forming a photosensitive, heat-resistant resin composition film including the step of coating a base material with a varnish made up of a polyimide precursor having no...
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6013418 |
Method for developing images in energy sensitive materials
A lithographic process for device fabrication is disclosed in which a hydrogen fluoride vapor is used to develop a pattern from an image introduced into an energy sensitive resist material. A class...
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6010825 |
Negatively acting photoresist composition based on polyimide precursors
A negatively operating photoresist composition comprising: (a) a polyimide precursor containing repeating structural units of formula (1) ##STR1## the composition comprises in all as many...
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6007970 |
Lithographic developer containing surfactant
Provided is a lithographic developer used to develop a resist pattern having regions with different sizes and shapes, by dissolving and removing a resist region of a resist layer formed in the...
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6004730 |
Method of forming an insulating film pattern and photosensitive composition
There is proposed a method of forming an insulating film pattern, which enables an insulating pattern of high precision and low dielectric constant to be easily obtained by means of an alkali...
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6001533 |
Composition for forming non-conductive light-shielding layer, and non-conductive light-shielding layer containing same
A composition for forming a non-conductive light-shielding layer, comprising an alkali-soluble binder, a pigment, a photopolymerizable monomer, a photo-polymerization initiator and a solvent,...
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5998102 |
Etch inhibitors in developer for lithographic printing plates
A developer composition for photosensitive elements including lithographic printing plates, color proofing films, positive and negative working lithographic plates and thermally sensitive plates...
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5990338 |
Negative-working chemical-sensitization photoresist composition
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices....
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5989781 |
Method for producing printing plates
In accordance with the present invention, there are provided methods for producing printing plates comprising rapid, efficient drying of solvent-containing resin compositions of the printing plates...
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5976284 |
Patterned conducting polymer surfaces and process for preparing the same and devices containing the same
Patterned conducting polymer surfaces exhibiting excellent properties may be prepared by: (a) forming a surface of a conducting polymer on a surface of a substrate; (b) forming a surface of a...
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5976395 |
Selective etching method for stacked organic film
A selective etching method for a stacked organic film which is capable of effectively removing an organic anti-reflection layer without a loss of a photoresist film before etching a base layer such...
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5973187 |
Positive-working chemical-sensitization photoresist composition
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices....
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5972571 |
Negative resist composition and use thereof
Negative lithographic patterns are produced by imagewise exposing to electromagnetic radiation compositions comprising a polymer having pendant recurring ester groups or carbonate groups or both...
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5972540 |
Phase-shifting mask and a manufacturing method thereof
A phase-shifting mask has a phase shifter formed by thermal deformation of an organic photoresist followed by a CMP (Chemical Mechanical Polishing) process to prevent occurrence of pattern errors...
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5965310 |
Process of patterning photo resist layer extending over step of underlying layer without deformation of pattern
When an underlying layer with a step is covered with a photo resist layer, the photo resist layer has a thick portion and a thin portion, and the difference in thickness causes a pattern extending...
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5965320 |
Positive photoresist composition containing phenol ester of 1,2-napthoquinone-(2)-diazide-6-sulfonic acid and pattern formation method using the composition
A positive photoresist composition including an alkali-soluble resin and a photosensitive agent including 1,2-naphthoquinone-diazide group. A first composition wherein the photosensitive agent is...
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5965329 |
Method of manufacturing a developing agent bearing member
A developing agent bearing member is manufactured such that a base is prepared, and a photosensitive layer is formed on the base. Then, the photosensitive resist layer is exposed with a pattern,...
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5958653 |
Method of forming resin film of desired pattern on semiconductor substrate, semiconductor chip, semiconductor package
A method of forming a resin film pattern, comprising the steps of (A) producing a resin film layer soluble in an organic solvent, on a substrate such as silicon wafer, even engineering plastics...
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5952150 |
Radiation sensitive resin composition
A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution...
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5948596 |
Digital printing plate comprising a thermal mask
Presensitized lithographic plates are prepared which permit direct formation of printable images on plates by digital computerization without the intervening formation of a photographic image with...
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5932396 |
Method for forming magnetic poles in thin film magnetic heads
A resist composition is used to form a plating frame including a space having a section of up to 2 μm in width and at least 4 μm in depth. The resist composition contains as an alkali-soluble...
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