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7618769 |
Textured chamber surface
A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is...
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7608390 |
Top antireflective coating composition containing hydrophobic and acidic groups
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base...
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7608387 |
Method for fabricating mold core
An exemplary method for fabricating a mold core includes the following steps. First, a substrate is provided. Second, a photo resist layer is formed on the substrate, the photo resist layer has a...
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7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including...
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7604926 |
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device, comprises forming a first mask pattern on an under-layer region, forming a plurality of dummy-line patterns on the under-layer region, the...
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7592105 |
Methods for converting reticle configurations and methods for modifying reticles
The invention includes methods of converting reticles from configurations suitable for utilization with later generation (shorter wavelength) stepper radiations to configurations suitable for...
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7592093 |
Method for manufacturing a flat panel direct methanol fuel cell
A novel flat panel DMFC (direct methanol fuel cell) includes an integrated cathode electrode plate, a membrane electrode assembly (MEA) unit, an intermediate bonding layer, an integrated anode...
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7588870 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
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7575855 |
Method of forming pattern
Disclosed is a method of forming a pattern. A first organic polymer layer is formed on a substrate on which an underlying layer, and then a second organic polymer layer, which has an opening...
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7573052 |
Exposure apparatus, exposure method, and device manufacturing method
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is...
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7569333 |
Wiring line structure and method for forming the same
The wiring line structure comprises a transparent substrate, a barrier layer, a metal layer, and a photosensitive protecting layer. The barrier layer and a metal layer are successively disposed on...
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7566527 |
Fused aromatic structures and methods for photolithographic applications
A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base...
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7566525 |
Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing...
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7563563 |
Wet developable bottom antireflective coating composition and method for use thereof
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is...
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7560225 |
Method of forming uniform features using photoresist
A process for ion milling using photoresist as a mask is described. In a preferred embodiment the invention is used in the fabricating air-bearing features on sliders for use in magnetic storage...
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7560224 |
Method of manufacturing liquid discharge head, and liquid discharge head
According to the present invention, there are provided an ink jet recording head capable of performing high-precision printing and recording and having a high reliability, and a method of...
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7560222 |
Si-containing polymers for nano-pattern device fabrication
A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially...
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7553215 |
Process of forming a deflection mirror in a light waveguide
A process of forming a deflection mirror in a light waveguide with a use of a dicing blade having a cutting end with a flat top cutting face and at least one slanted side cutting face. The process...
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7550394 |
Semiconductor device and fabrication process thereof
A method of fabricating a semiconductor device includes a dry etching process of a silicon surface. The dry etching process is conducted by an etching gas containing at least one gas species...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7531294 |
Method for forming film pattern, method for manufacturing semiconductor device, liquid crystal television, and EL television
An object of the invention is to provide a method for manufacturing a semiconductor device having a semiconductor element with a minute structure, which can reduce a cost and improve throughput due...
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7531293 |
Radiation sensitive self-assembled monolayers and uses thereof
The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group...
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7527918 |
Pattern forming method and method for manufacturing a semiconductor device
A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the...
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7517638 |
Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line width
When a hole pattern is formed on a film to be processed, a matching deviation margin at a lithography step is reserved by making a diameter of a bottom of a hole substantially equal to a diameter...
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7517633 |
Composition for forming gap-filling material for lithography
A composition for forming a gap-filling material for lithography which, as a gap-filling material for lithography superior in planarization ability on a substrate having irregularities such as...
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7514202 |
Thermal acid generator, resist undercoat material and patterning process
A thermal acid generator of generating an acid on heating above 100° C. has formula: CF 3 CH(OCOR)CF 2 SO 3 − (R 1 ) 4 N + wherein R is alkyl or aryl, R 1 is hydrogen, alkyl, alkenyl,...
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7510820 |
Resist undercoat-forming material and patterning process
In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The...
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7507505 |
Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography
The present invention relates to a method for manufacturing a reflective multi-layered thin film mirror for an extreme ultraviolet radiation (EUV) exposure process that is one of the next...
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7501224 |
Compositions for use in forming a pattern and methods of forming a pattern
In a composition for forming an interfacial layer on a photoresist pattern, and a method of forming a pattern using the composition, the composition includes a water-soluble polymer, a...
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7494749 |
Photolithography using interdependent binary masks
The invention, in its various aspects, is an interdependent binary photomask for use in a photolithography operation in a semiconductor fabrication process, a method for fabricating these...
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7488569 |
Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1):
is contained in a structure of the...
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7488507 |
Capacitor with plasma deposited dielectric
A capacitor is formed utilizing a plasma deposited capacitor dielectric wherein the plasma deposition is a two-component reaction comprising a silicon donor, which is non-carbon containing and...
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7465531 |
Polymer for forming anti-reflective coating layer
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition...
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7459265 |
Pattern forming method, semiconductor device manufacturing method and exposure mask set
First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed...
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7449285 |
Method for forming pattern
A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion ...
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7435537 |
Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base...
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7432026 |
Method of manufacturing dichroic filter array
A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the...
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7425403 |
Composition for forming anti-reflective coating for use in lithography
A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a...
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7419768 |
Methods of fabricating integrated circuitry
The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated...
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7419759 |
Photoresist composition and method of forming a pattern using the same
The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether...
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7413846 |
Fabrication methods and structures for micro-reservoir devices
Methods are provided for making a multi-reservoir device comprising (i) patterning one or more photoresist layers on a substrate; (ii) depositing onto the substrate at least one metal layer by a...
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7399979 |
Exposure method, exposure apparatus, and method for producing device
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also...
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7387869 |
Method of forming pattern for semiconductor device
A method of forming a pattern for a semiconductor device is disclosed. According to the method, a lower photoresist layer is formed on a lower layer and an upper photoresist pattern including a...
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7381943 |
Neutral particle beam processing apparatus
The present invention relates to a neutral particle beam processing apparatus. More specifically, the present invention relates to a neutral particle beam processing apparatus comprising a plasma...
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7371485 |
Multi-step process for etching photomasks
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic...
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7361455 |
Anti-reflective coatings
Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam...
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7361454 |
Method of forming contact hole and method of manufacturing semiconductor device
A method of forming a contact hole according to an embodiment of the present invention comprises exposing a resist film formed on a semiconductor substrate to a light using a first photomask in...
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7361448 |
Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during...
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7354695 |
Producing a substrate having high surface-area texturing
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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7348133 |
Method of manufacturing solid-state image sensing device
The invention provides a manufacturing method of a solid-state image sensing device where light-receiving sensitivity is improved. The manufacturing method of the solid-state image sensing device...
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