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7622239 |
Micro-patterned SiO2/TiO2 films through photo and chemical reactions
A method for making a patterned SiO 2 films over TiO 2 (Si0 2 /Ti0 2 ) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is...
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7618903 |
Soft mold, method of manufacturing the same, and patterning method using the same
The patterning method includes forming a synthetic resin layer on a substrate, providing a mold in which a predetermined pattern is formed and metal particles are distributed on the surface of the...
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7618769 |
Textured chamber surface
A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is...
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7618768 |
Method of forming micropattern, method of manufacturing optical recording medium master copy, optical recording medium master copy, optical recording medium stamper, and optical recording medium
By using an existing, relatively inexpensive manufacturing device, micropatterns (e.g. guiding grooves, prepits) having such track pitch and pit pitch that are smaller than the diameter of a light...
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7615338 |
Photoresist coating composition and method for forming fine pattern using the same
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist...
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7615337 |
Photoactive resist capping layer
A cap may be formed anisotropically over a photoresist feature. For example, a material, such as a polymer, may be coated over the photoresist feature. If the coated material is photoactive, the...
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7612865 |
Pattern writing apparatus and pattern writing method
Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror...
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7611825 |
Photolithography method to prevent photoresist pattern collapse
A method comprises forming a BARC layer on a substrate, treating the BARC layer to make its surface hydrophilic, forming a photoresist layer on the treated BARC layer, exposing the photoresist...
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7608386 |
Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
The present invention can provide a resist cover film-forming material which is suitably used for a resist cover film for liquid immersion exposure and can transmit ArF excimer laser lights and...
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7604928 |
Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas...
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7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern
An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions...
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7604906 |
Films for prevention of crystal growth on fused silica substrates for semiconductor lithography
Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask...
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7598022 |
Positive and negative dual function magnetic resist lithography
The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist...
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7598021 |
High resolution printing technique
A pattern having exceptionally small features is printed on a partially fabricated integrated circuit during integrated circuit fabrication. The pattern is printed using an array of probes, each...
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7595146 |
Method of creating a graded anti-reflective coating
A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and...
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7592130 |
Exposure method
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern...
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7592124 |
Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the...
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7592108 |
Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member...
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7591270 |
Process solutions containing surfactants
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of...
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7588884 |
Method for enhancing wafer alignment marks
A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for...
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7588883 |
Method for forming a gate and etching a conductive layer
A method for forming a gate and a method for etching a conductive layer are provided. First, a substrate is provided, including a dielectric layer and a conductive layer on its surface in order....
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7588870 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
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7588865 |
Photo mask and method for manufacturing patterns using the same
A photo mask, which has subsidiary patterns added into holes formed through a plurality of ring gate patterns having vertically symmetrical structures used in a semiconductor exposure step, such...
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7585615 |
Composite photoresist for modifying die-side bumps
A composite photoresist comprises a photoresist material and a filler material dispersed within the photoresist material, wherein the filler material includes a plurality of nanoparticles. The...
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7582414 |
Method and system for drying a substrate
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior...
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7582413 |
Substrate, method of exposing a substrate, machine readable medium
A double exposure method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a desired pattern to be printed on the substrate into...
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7582412 |
Multilayer photoresist systems
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing...
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7579278 |
Topography directed patterning
A pattern having exceptionally small features is formed on a partially fabricated integrated circuit during integrated circuit fabrication. The pattern comprises features formed by self-organizing...
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7579135 |
Lithography apparatus for manufacture of integrated circuits
An immersion lithographic system 10 comprises an optical surface 51 , an immersion fluid 60 contacting at least a portion of the optical surface, and a semiconductor structure 80 having a...
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7575855 |
Method of forming pattern
Disclosed is a method of forming a pattern. A first organic polymer layer is formed on a substrate on which an underlying layer, and then a second organic polymer layer, which has an opening...
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7575853 |
Method of forming thin film pattern and method of forming magnetoresistive element
The present invention provides a thin film pattern forming method capable of forming a thin film pattern having small dimensions at higher precision. A thin film pattern forming method of the...
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7572573 |
Maskless photolithography for etching and deposition
The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using etching and deposition techniques. In an embodiment,...
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7569334 |
Method of manufacturing for conductive pattern substrate
In the present invention, the problem of stability deterioration of the obtained conductive pattern substrate at the time of forming a conductive pattern by an additive method when a layer having...
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7569331 |
Conductive patterning
Various embodiments of a method, coating and system for conductive patterning are disclosed.
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7569330 |
Method for manufacturing pattern of light shielding layer and pattern forming body of light shielding layer
A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base...
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7569308 |
Rectangular contact lithography for circuit performance improvement and manufacture cost reduction
An optical lithography method is disclosed that uses double exposure of a reusable template mask and a trim mask to fabricate regularly-placed rectangular contacts in standard cells of...
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7567030 |
Organic electroluminescent device, method of manufacturing organic electroluminescent device, and electronic apparatus
An organic electroluminescent device includes, on a substrate, a pixel having a luminescent functional layer which is sandwiched by a first electrode and a second electrode, and a unit pixel group...
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7566526 |
Method of exposure for lithography process and mask therefor
An improved photolithography method and mask are disclosed. The method exposes a substrate coated with a photosensitive material using a first mask. The photosensitive material after said first...
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7566525 |
Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing...
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7563560 |
Solution and method for manufacturing an integrated circuit
A polyelectrolyte solution for tuning a surface energy and a method for using the polyelectrolyte solution to manufacture an integrated circuit. A substrate is provided and a photosensitive...
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7560225 |
Method of forming uniform features using photoresist
A process for ion milling using photoresist as a mask is described. In a preferred embodiment the invention is used in the fabricating air-bearing features on sliders for use in magnetic storage...
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7556913 |
Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern
The present invention is to provide a method for forming various patterns such as a metal or metal compound pattern, in which the amounts of the materials constituting the pattern which are removed...
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7553610 |
Method of forming fine patterns
It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause...
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7550253 |
Barrier film material and pattern formation method using the same
A resist film made of a chemically amplified resist is formed on a substrate. Subsequently, a barrier film for preventing a component of the resist film from eluting into an immersion liquid or...
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7547504 |
Pattern reversal employing thick residual layers
The present invention features a method of patterning a substrate that includes forming, on the substrate, a first layer having a first pattern and selectively shifting in tone, as well as along a...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7547502 |
Exposure method
An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural...
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7541137 |
Resist resolution using anisotropic acid diffusion
Methods for increasing the resolution capability and line edge roughness of resists, including chemically amplified resists are disclosed. In order to improve upon the resolution, dipolar species...
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7540931 |
Method of producing ceramic green sheet and method of producing electronic component using this ceramic green sheet
An object of the invention is to provide a flat ceramic sheet including an internal electrode used for manufacturing a multilayer ceramic electronic part. Specifically, an electrode portion is...
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7537884 |
Method for forming self-synthesizing conductive or conjugated polymer film and application
The present invention discloses a method by utilizing chemical reaction or specific attractive forces (complexation or hydrogen bonding) for forming self-synthesizing conductive or conjugated...
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