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6746828 |
Process for structuring a photoresist layer
A method for structuring a photoresist layer includes the steps of providing a substrate on which a photoresist layer has been applied at least in some areas. The photoresist layer includes a...
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6743566 |
Cyclic acetal compound, polymer, resist composition and patterning process
Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition...
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6740474 |
Technique for making deep microstructures in photoresist
A method is disclosed for making deep microstructures in photoresist. The method utilizes a pool of photoresist on top of a transparent substrate and the laser is located below the substrate....
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6741377 |
Device having a light-absorbing mask and a method for fabricating same
The invention provides a method for fabricating an optical device comprising at least one optical component formed on a transparent substrate. The method comprises determining an area of the...
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6737221 |
Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device
In order to prevent the contamination of wafers made of a transition metal in a semiconductor mass production process, the mass production method of a semiconductor integrated circuit device of the...
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6737219 |
Photopolymer sachet
The invention provides a photopolymer package for use in making a hand stamp plate, the package consisting of a sachet containing a photocurable liquid polymer, the walls of the sachet being formed...
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6737224 |
Method of preparing thin supported films by vacuum deposition
A method for preparing thin supported films by vacuum is disclosed. The method results in a substrate with windows. The windows are cutout (etched) areas that are covered by a thin film. The method...
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6727048 |
Method for photo-imageable lacquer deposition for a display device
A method for photo-imageable lacquer deposition for a display device. In one embodiment, a layer of photo-imageable lacquer is deposited on top of a faceplate of a display device. Portions of the...
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6723495 |
Water-developable negative-working ultraviolet and infrared imageable element
Negative-working, water-developable imageable elements, useful as printing plate precursors, and methods for their use, are disclosed. The elements can be imaged with ultraviolet radiation, with...
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6723494 |
Conductor pattern and electronic component having the same
A conductor pattern is constructed to prevent corners from peeling and raising off a substrate. The conductor pattern has a spiral configuration and includes straight lines and corners connected to...
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6721040 |
Exposure method and apparatus using near field light
There is provided an exposure method including the steps for arranging an object to be exposed and a transparent plate that includes a thin film, within such a range that near field light from the...
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6716570 |
Low temperature resist trimming process
A process is described for trimming photoresist patterns during the fabrication of integrated circuits for semiconductor devices and MEMS devices. A combination of a low temperature (<20° C.),...
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6716092 |
Apparatus for making a polishing pad with a partial adhesive coating
A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the...
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6713236 |
Lithography method for preventing lithographic exposure of peripheral region of semiconductor wafer
A lithography method for use in the manufacture of semiconductor devices, which prevents lithographic exposure of a periphery region or edge region of a semiconductor wafer and which prevents the...
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6709803 |
Process for producing printed wiring board
After forming first catalyst cores on the surfaces of adhesive layers of an insulating substrate, a plating resist is patterned. The insulating substrate is treated with an aqueous solution...
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6709807 |
Process for reducing edge roughness in patterned photoresist
A process for reducing roughness from a surface of a patterned photoresist. The process includes exposing a substrate having the patterned photoresist thereon to a vapor, wherein the vapor...
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6709806 |
Method of forming composite member
Disclosed is a method of manufacturing a composite member in which a conductive portion is selectively formed in an insulator. The method comprises the steps of forming a photosensitive composition...
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6703626 |
Mask defect repair method
First, a region including the defect is observed with the atomic force microscope (AFM) and a pattern putting together the shape and position of the defect is extracted from and AFM image. The...
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6703187 |
Method of forming a self-aligned twin well structure with a single mask
An improved method for forming a self-aligned twin well structure for use in a CMOS semiconductor device including providing a substrate for forming a twin well structure therein; forming an...
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6703189 |
Chemical modification of substrates by photo-ablation under different local atmospheres and chemical environments for the fabrication of microstructures
A method for simultaneously forming microstructures in substrates and altering their chemical character. The method involves exposing a surface portion of a substrate to light source, which is...
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6699644 |
Process for forming a photoresist pattern comprising alkaline treatment
The present invention provides a method for reducing or eliminating a poor pattern formation on a photoresist film by contacting the photoresist film with an alkaline solution prior to its exposure...
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6699645 |
Method for the formation of resist patterns
Method for the formation of resist patterns by using a chemically amplified resist which comprises an alkali-insoluble base polymer or copolymer and an acid generator, in which the patternwise...
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6696223 |
Method for performing photolithography
A method for generating a photoresist pattern on top of an object that includes a layer of material that is opaque to light of a predetermined wavelength. The object is first covered with a layer...
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6696227 |
Shift multi-exposure method
The present invention provides a shift multi-exposure method for defining a regular pattern by a photomask. The method comprises the following steps. First, a photoresist layer comprising a first...
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6692902 |
Manufacturing method and structure of slanting diffusive reflector
A manufacturing method and structure of slanting diffusive reflectors simplifies their manufacturing process and reduces cost. A photo mask comprising a plurality of half-tone exposure units is...
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6692892 |
Composition for antireflection coating
A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b)...
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6686122 |
Production of photoresist coatings
Process for the production of a resist coating, in which (a) a substrate is coated with a resist composition which comprises at least one component which absorbs radiation in the near infrared...
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6686128 |
Method of fabricating patterned layers of material upon a substrate
A method for fabricating patterned layers of a desired material in a desired, design pattern upon a substrate, which method may be used in circumstances where the removal of photo-resist material...
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6686130 |
Pattern forming method using photolithography
In the light exposure step of the device pattern, the monitor region is exposed to light together with the device region for every chip, and chip {circle around (4)} within the wafer, the chip...
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6686131 |
Method of producing biocompatible structures and biocompatible microchip
A biocompatible structure is produced by first applying a chemically amplified photoresist to a substrate and structuring the photoresist. The photoresist comprises a polymer with anchor groups for...
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6686102 |
Two-exposure phase shift photolithography with improved inter-feature separation
A method of double-exposure photolithography of a semiconductor wafer in the manufacture of integrated circuits is disclosed. The two exposures of the same positive photoresist layer are carried...
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6682871 |
Microelectromechanical optical switch and method of manufacture thereof
A MEMS-based optical switch having improved characteristics and methods for manufacturing the same are provided. In accordance with one embodiment, an optical switch includes a single comb drive...
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6680150 |
Suppression of side-lobe printing by shape engineering
Sidelobe formation in photolithographic patterns is suppressed by non-rectangular, non-circular contact openings formed in attenuated phase shift photomasks. The contact openings may be...
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6677108 |
Method for light exposure
A light exposure method in which, when a resist layer is selectively exposed to one of X-rays containing soft X-rays, vacuum ultraviolet light rays and ultraviolet rays containing extreme...
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6673520 |
Method of making an integrated circuit using a reflective mask
A desired pattern is formed in a photoresist layer that overlies a semiconductor wafer using a reflective mask. This mask is formed by consecutively depositing a reflective layer, an absorber layer...
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6673525 |
Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths
A method for patterning of resist surfaces which is particularly advantageous for systems having low photon flux and highly energetic, strongly attenuated radiation. A thin imaging layer is created...
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6673523 |
Pattern formation method
A resist film is formed by applying, on a semiconductor substrate, a resist material including at least one atom or group selected from the group consisting of a halogen atom, a cyano group, a...
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6673524 |
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method
An exemplary method of forming an attenuating extreme ultraviolet (EUV) phase-shifting mask is described. This method can include providing a multi-layer mirror over an integrated circuit substrate...
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6670106 |
Formation method of pattern
A pattern formation method includes: forming a photoresist layer of a positive type on a substrate; exposing to light and developing the photoresist layer using an inversion mask having an opening...
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6664030 |
System for and method of constructing an alternating phase-shifting mask
An exemplary method of constructing an alternating phase-shifting mask is described. This method can include providing a vapor in a vapor chamber containing a mask blank, and applying a laser to...
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6664031 |
Process for forming photoresist pattern by using gas phase amine treatment
A process for producing a photoresist pattern is disclosed. In particular, the disclosed process for forming a photoresist pattern reduces or prevents poor quality photoresist patterns formation,...
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6664029 |
Method of forming pattern
A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating...
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6660448 |
Polymer, resist composition and patterning process
The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone...
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6660649 |
In-situ balancing for phase-shifting mask
The present invention describes a method of forming a mask comprising: providing a substrate, the substrate having a first thickness; forming a balancing layer over the substrate, the balancing...
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6656667 |
Multiple resist layer photolithographic process
A multiple resist layer photolithographic process. A substrate having an insulation layer and a first photoresist layer sequentially stacked thereon is provided. A first light-exposure is conducted...
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6656666 |
Topcoat process to prevent image collapse
The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of...
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6656665 |
Method for producing a pattern on a transparent substrate
The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one...
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6653054 |
Resin, a double resin layer for extreme ultraviolet light (EUV) photolithography, and an extreme ultraviolet light (EUV) photolithography process
A semiconductor substrate etching masking layer onto which the pattern to be etched can be transferred by photolithography at extreme ultraviolet light wavelengths from 10 to 100 nm and which is...
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6653053 |
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
A desirable pattern is formed in a photoresist layer that overlies a semiconductor wafer using an attenuating phase shift reflective mask. This mask is formed by consecutively depositing an...
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6653644 |
Pattern exposure method and apparatus
In a pattern exposure method and apparatus for projecting a circuit pattern on a circuit member by an electron beam passing through a pattern exposure mask having a number of exposure regions...
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