|
Match
|
Document |
Document Title |
|
|
6830871 |
Chemical amplification type resist composition
A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility...
|
|
|
6830870 |
Acetal protected polymers and photoresists compositions thereof
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: wherein R...
|
|
|
6828080 |
Pattern forming method and method of fabricating device
The inventive pattern forming method for transferring a bright line pattern to a photoresist material with a photomask having the bright line pattern includes a step of transferring the bright line...
|
|
|
6828085 |
Exposure method and device manufacturing method using the same
A method of producing a semiconductor chip includes (1) a first exposure step for exposing a device range inside a chip on a substrate, to a repetition pattern including a line and a space, wherein...
|
|
|
6824957 |
Resin useful for resist, resist composition and pattern forming process using the same
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using...
|
|
|
6821687 |
Photo mask for fabricating semiconductor device having dual damascene structure
A photo mask for fabricating a semiconductor device having a dual damascene structure which has a via coupled with a lower wiring layer and has an upper wiring layer coupled with the via. The via...
|
|
|
6818387 |
Method of forming a pattern
There is disclosed, as an aspect, a method of forming a pattern which comprising coating a photosensitive resist film on a surface of substrate, subjecting the photosensitive resist film to an...
|
|
|
6817602 |
Manufacturing system method for processing a lithography mask container
An electronic device ( 205 ) is attached to a container ( 200 ) that carries a lithography mask ( 201 ) through a semiconductor factory ( 100 ) form a first station ( 110 ) to a second station (...
|
|
|
6818384 |
Methods of fabricating microelectronic features by forming intermixed layers of water-soluble resins and resist materials
A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern,...
|
|
|
6815151 |
Rinsing solution for lithography and method for processing substrate with the use of the same
The present invention provides a rinsing solution for lithography with which finely processed parts of a resist pattern can be well rinsed without corroding a metallic film made of Al, Al—Si,...
|
|
|
6815142 |
Method for forming resist pattern, and overlying layer material and semiconductor device used for forming resist pattern
A method for forming resist patterns, and an overlying layer material and a semiconductor device used in the method for forming resist patterns, which can improve the dimensional uniformity of...
|
|
|
6811945 |
Method of producing pattern-formed structure and photomask used in the same
A method of producing a pattern-formed structure, comprising: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof...
|
|
|
6811960 |
Partially crosslinked polymer for bilayer photoresist
The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such...
|
|
|
6811954 |
Semiconductor integrated circuit device and method of manufacturing the same, and method of manufacturing masks
In forming linear circuit patterns running in vertical and horizontal directions, phases are arranged such that phases between proximate opening patterns are reversed. Type A phase conflict...
|
|
|
6806027 |
CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES
Chemically amplified photoresists exhibit increased transparency at a wavelength of 157 nm. The chemically amplified photoresist includes a polymer containing first repeating units derived from a...
|
|
|
6806038 |
Plasma passivation
A method for forming a conductive trace on a substrate. The conductive trace is patterned with a photoresist mask and etched, thereby forming a polymer layer on a top surface and sidewalls of the...
|
|
|
6806005 |
Method and apparatus for forming resist pattern
A method of forming a resist pattern on a substrate, comprises the steps of: forming a resist film on the substrate, supplying a developing solution onto the resist film, submerging the substrate...
|
|
|
6803154 |
Two-dimensional phase element and method of manufacturing the same
Disclosed is a method of manufacturing a two-dimensional phase type element, which includes the steps of forming, on a substrate, a first etching mask in a checkered pattern, forming segments of...
|
|
|
6803176 |
Methods for forming line patterns in semiconductor substrates
A method for forming a fine pattern in a semiconductor substrate, by coating a target layer to be etched on a semiconductor substrate with a resist composition including at least one compound...
|
|
|
6800426 |
Process for making a two layer thermal negative plate
A process for forming a negative image useful as a printing plate is disclosed. A photosensitive assembly that comprises (a) a hydrophilic support, (b) a first layer that comprises a polymer that...
|
|
|
6800423 |
Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices
There is provided a negative radiation-sensitive composition, which is suitable for exposure of a far ultraviolet light comprising a wavelength 193 nm of ArF excimer-laser, freed from causes of...
|
|
|
6800422 |
Thick film photoresists and methods for use thereof
New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns....
|
|
|
6797456 |
Dual-layer deep ultraviolet photoresist process and structure
A method for forming a photoresist structure that does not have swelling defects. A layer of low activation energy deep ultraviolet photoresist is disposed over a layer that is to be patterned. A...
|
|
|
6794119 |
Method for fabricating a structure for a microelectromechanical systems (MEMS) device
The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an...
|
|
|
6794111 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
A polymer comprising recurring units of formula (1-1) or (1-2) wherein R 1 , R 2 , R 3 and R 4 are H or alkyl, or R 1 and R 2 , and R 3 and R 4 taken together may form a ring with each pair...
|
|
|
6790599 |
Microfluidic devices and manufacture thereof
Planar microfluidic devices are laminate structures having a matrix layer at an upper side laminated at an interface to a lower substrate layer. The structure has one or more cavities extending...
|
|
|
6790564 |
Photomask and manufacturing method of an electronic device therewith
In the step of manufacturing a photomask, an opaque pattern is formed by using a photosensitive resin composition containing a specified light absorbent, which then used to manufacture a photomask...
|
|
|
6783920 |
Photosensitive glass variable laser exposure patterning method
The direct-write pulsed UV laser technique combined with the variable laser exposure fabrication method entails the precise variation of the laser irradiance during pattern formation in the...
|
|
|
6783921 |
Method for etching laminated assembly including polyimide layer
Disclosed is an etching method of a laminated assembly having a metal layer and a non-thermoplastic polyimide layer bonded together via thermoplastic polyimide, which comprises using an etchant at...
|
|
|
6782526 |
Photomask designing method, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element
A photomask designing method and apparatus, a computer readable storing medium, a photomask, a photoresist, a photosensitive resin, a base plate, a microlens, and an optical element. In the method,...
|
|
|
6780568 |
Phase-shift photomask for patterning high density features
A method for forming a photomask includes providing a transparent substrate and forming an opaque layer over at least a first portion of the transparent substrate. The opaque layer is patterned to...
|
|
|
6780572 |
Optical lithography
In an optical lithography using a mask pattern, or producing a large quantity of three-dimensional articles rapidly with high precision, a predetermined mask pattern is drawn directly on the...
|
|
|
6777171 |
Fluorine-containing layers for damascene structures
A method of forming a silicon carbide layer, a silicon nitride layer, an organosilicate layer is disclosed. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon...
|
|
|
6777172 |
Method and apparatus for using an excimer laser to pattern electrodeposited photoresist
A method for using an excimer laser to pattern electrodeposited photoresist on a sloped surface of a wafer substrate includes depositing a layer of photoresist on top of a substrate that includes a...
|
|
|
6777166 |
Particle-optical lens arrangement and method employing such a lens arrangement
The present invention discloses a lens arrangement for the particle-optical imaging of an object to be imaged and positionable in an object plane into an image area. In one embodiment, the lens...
|
|
|
6777169 |
Method of forming emitter tips for use in a field emission display
A method of forming emitter tips for use in a field emission display. A dielectric layer, an insulating layer, and a conductor layer are formed on a substrate in sequence. An annular groove is...
|
|
|
6773865 |
Anti-charging layer for beam lithography and mask fabrication
This invention discloses an anti-charging layer for beam lithography and mask fabrication. This invention reduces beam displacement and increases pattern placement accuracy. The process will be...
|
|
|
6774340 |
Shape of microdot mark formed by laser beam and microdot marking method
A dot mark forming method for obtaining a dot mark includes a liquid crystal mask in which the maximum length of each pixel is 50 to 2,000 μm and is irradiated with a homogenized laser beam. The...
|
|
|
6767692 |
Process for inhibiting edge peeling of coating on semiconductor substrate during formation of integrated circuit structure thereon
A photoresist-free and ARC-free lip on the periphery of the upper surface of a semiconductor substrate adjacent the end edge of the substrate is formed by the steps of: forming an ARC layer on one...
|
|
|
6767682 |
Method for producing quadratic contact holes utilizing side lobe formation
An array of small square contact holes, on the order of magnitude of the exposing light wavelength, are formed by selecting the partial coherence and numerical aperture of the exposing light source...
|
|
|
6767693 |
Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices
An integrated circuit fabrication process including exposing a photoresist layer and providing a hydrophilic layer above the photoresist layer. The photoresist layer is exposed to a pattern of...
|
|
|
6764809 |
CO2-processes photoresists, polymers, and photoactive compounds for microlithography
A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from...
|
|
|
6759328 |
Masks and method for contact hole exposure
A mask and method for contact hole exposure. First, a mask including a transparent substrate, a phase shift layer installed on the transparent substrate to define a series of patterns having...
|
|
|
6759175 |
Method for on-site preparation of a relief image
An method is disclosed for on-site preparation of a relief image comprising the following steps: (a) laminating a material comprising, in the order given, a first peelable support ( 1 ), an image...
|
|
|
6759184 |
Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers
A process for the post-exposure amplification of resist structures uses amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical...
|
|
|
6756185 |
Method for making integrated optical waveguides and micromachined features
The same mask pattern is used as an etching mask in defining the horizontal location of micro-machined (etched) features at the substrate surface of an optical device relative to the waveguide...
|
|
|
6756184 |
Method of making tall flip chip bumps
A method of making electrically conductive bumps of improved height on a semiconductor device. The method includes steps of depositing an under bump metallurgy over a semiconductor device onto a...
|
|
|
6756158 |
Thermal generation of mask pattern
A mask having a first region and a second region; the first region having a multilayer mirror over a substrate, the multilayer mirror having alternating layers of a first material and a second...
|
|
|
6753127 |
Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same
Disclosed is an norbornene-based copolymer for photoresist, a preparation method thereof, and a photoresist composition comprising the same. The copolymer of the present invention exhibits high...
|
|
|
6753131 |
Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive...
|