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6896997 |
Method for forming resist pattern
A method of forming a resist pattern on a semiconductor substrate, includes forming a resist film on the semiconductor substrate, and supplying a developing solution on the resist film to remove...
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6893804 |
Surface smoothing of stereolithographically formed 3-D objects
A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a...
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6893805 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus provided with: a coating processing section for supplying a coating solution to a substrate; a pressure processing section for pressurizing a coating film formed on...
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6890689 |
Method for fabricating a mask configuration
During the fabrication of a mask, to substantially avoid systematic deviations from a desired configuration of recesses that will be formed in the mask, the patterning of the mask substrate is...
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6887627 |
Method of fabricating phase shift mask
A method of fabricating a phase shift mask (PSM) is described. A patterned photoresist layer is formed on an opaque layer over a transparent plate. A thin mask layer is formed on the sidewalls of...
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6887653 |
Method for structuring a photoresist layer
A method for structuring a photoresist layer is described. A substrate has a photoresist layer containing a film-forming polymer that has a photo acid generator that liberates an acid on exposure...
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6884550 |
Semiconductor device manufacturing mask substrate and semiconductor device manufacturing method
A semiconductor device manufacturing method and a semiconductor device manufacturing mask both of which make it possible to suppress a semiconductor-device global step and simply manufacture a...
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6881524 |
Photolithography method including a double exposure/double bake
A photoresist exposure process is disclosed which produces features which are substantially smaller than the aperture dimension of the mask used to make the feature. The smaller feature size...
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6881530 |
Thin film sol-gel derived glass
Thermally-assisted organometallic sol-gel derived glasses have been found to permit fabrication of thin films sufficiently thin for telecom components. Inclusion of a photosensitizer in the film...
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6875544 |
Method for the fabrication of three-dimensional microstructures by deep X-ray lithography
A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal...
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6875542 |
Mask and method of manufacturing the same, electroluminescence device and method of manufacturing the same, and electronic instrument
A method of manufacturing a mask includes attaching to a first substrate formed with an opening a second substrate formed with a plurality of penetrating holes. The plurality of penetrating holes...
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6872496 |
AlSixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography
A bi-layer attenuating phase shifting film and method of forming the film are described. The bi-layer film has a first layer of AlSi x1 O y1 and a second layer of AlSi x2 O y2 . The first layer of...
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6872512 |
Method of forming resist pattern
A method of forming a resist pattern effectively controls the manner/style and the amount of modification of a resist pattern in its reflowing process, realizing a desired resist pattern with a...
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6869753 |
Screen printing process for light emitting base layer
The present invention provides a method and system for selectively depositing light emitting film on a light emitting base layer, such as phosphors in a silicon gel carrier on a light emitting...
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6869750 |
Structure and method for forming a multilayered structure
Improved methods for forming multilayer circuit structures are disclosed. In some embodiments, conductive layers, dielectric layers and conductive posts can be formed on both sides of a circuitized...
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6866986 |
Method of 193 NM photoresist stabilization by the use of ion implantation
A method of forming a photoresist includes forming a photoresist and patterning/developing it according to conventional methods. The photoresist is then subjected to ion implantation. The ions may...
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6864043 |
Apodized micro-lenses for Hartmann wavefront sensing and method for fabricating desired profiles
An optical element which controls both the phase and irradiance distribution, thereby completely specifying the E-field, of light, allowing completely arbitrary control of the light at any plane....
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6864042 |
Patterning longitudinal magnetic recording media with ion implantation
A magnetic recording medium is formed with a distribution of low coercivity regions functioning as a transition pattern for servo information capable of being sensed by a read/write head by...
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6864185 |
Fine line printing by trimming the sidewalls of pre-developed resist image
A method of forming a feature pattern in a photosensitive layer includes forming the photosensitive layer on a substrate, providing a first mask having a first opaque area thereon, and performing a...
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6861183 |
Scatter dots
A mask used for imaging nearly dense features in a substrate. Scatter dots are disposed on the mask in proximity to the nearly dense features, where the scatter dots adjust photon levels of the...
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6861208 |
Fullerene addition in photoresist via incorporation in the developer
A lithographic imaging method of the present invention includes the initial step of providing a substrate made from Mercury, Cadmium and Telluride materials (HgCdTe). The HgCdTe substrate is coated...
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6861205 |
Three dimensional microstructures and method of making
A method of forming complex three-dimensional microstructures wherein an external stimulus is applied to a first layer of a photosensitive material, thereby creating voids in the first layer, and...
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6861273 |
Method of fabricating reflection-mode EUV diffusers
Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a...
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6861198 |
Negative resist material and pattern formation method using the same
A negative resist material, which comprises at least a high polymer containing repeating units represented by the following general formula (1) and having a weight average molecular weight of 1,000...
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6858354 |
Method to prevent side lobe on seal ring
A new method is provided for the creation of a seal ring or fuse ring over the surface of a Phase Shift Mask. A seal ring pattern is created over the surface of a phase shift mask through a layer...
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6858760 |
Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
A fluorine-containing cyclic compound is represented by the formula 1:
wherein each of R 1 , R 2 and R 3 independently represents a hydrogen, alkyl group, fluorine, fluoroalkyl group or...
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6855486 |
Lithographic method and apparatus
A method of imaging a pattern in a microlithographic exposure apparatus includes performing two exposures, each with a different mask, the superposition of the images defined by the two masks...
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6855483 |
Method for pattern formation and process for preparing semiconductor device
A negative pattern is formed to be transparent in the far ultraviolet region including the wavelength 193 nm of an ArF excimer laser and, despite its chemical structure having high dry etching,...
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6852563 |
Process of fabricating electro-optic polymer devices with polymer sustained microelectrodes
A process for fabricating an electro-optic device is decribed that includes: a) providing a substrate comprising at least two polymer micro-ridges, where each polymer micro-ridge comprises an upper...
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6852472 |
Polysilicon hard mask etch defect particle removal
The removal of defect particles that may be created during polysilicon hard mask etching, and that are embedded within the polysilicon layer, is disclosed. Oxide is first grown in the polysilicon...
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6852475 |
Method for making a forming structure
A method for making a forming structure. The method comprises the steps of applying a coating of a liquid photosensitive resin to a foraminous element and juxtaposing thereto a first mask...
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6852454 |
Multi-tiered lithographic template and method of formation and use
This invention relates to semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, photonic devices, and more particularly to a multi-tiered...
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6852524 |
Probe carrier, probe fixing carrier and method of manufacturing the same
A carrier having indexes in a probe non-fixing region is used and solutions containing probes are applied to respective specific positions on the carrier by referring to said indexes and fixed. The...
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6849364 |
Mask for fabricating semiconductor components
A mask for fabricating semiconductor components contains first transparent regions and second transparent regions. The second regions are laid out such that they do not act on the regions of the...
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6849373 |
Antireflective coating compositions comprising photoacid generators
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the...
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6841332 |
Photoresist compound and method for structuring a photoresist layer
A photoresist compound or composition achieves a uniform volume growth in a chemical expansion on a chemically expandable photomask during a method for structuring a layer of the photoresist...
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6841338 |
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio
A photoresist composition may include formulas 1 and 2:
where R is an acetal group or a ter-butyloxy carbonyl (t-BOC) group, n and m are integers, n/(m+n) is 0.01−0.8, and m/(m+n) is...
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6841314 |
Method of manufacturing a photomask
Photomask blanks are fabricated by forming half-tone film over quartz substrate and causing a half-tone phase shift film to contain impurity becoming a color center by implanting ion at a...
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6838228 |
System to enable photolithography on severe structure topologies
A system and related process to enable control of photolithographic pattern features on a structure having one or more severe non-flat topologies. The system includes an analysis of the Depth of...
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6838215 |
Graytone mask producing method, graytone mask and pattern transfer method
A method for producing a graytone mask capable of satisfying a dimensional accuracy of a predetermined graytone pattern, on a graytone mask having, at least in a part, a predetermined graytone...
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6835524 |
Polymers, chemical amplification resist compositions and patterning process
Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R 1 , R 2 and R 3 are independently H, F, C 1-20 alkyl or...
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6835534 |
Chemical functionalization nanolithography
The present invention discloses devices and methods relating to patterning substrates using chemical functionalization. The methods include covering the surface of a substrate with a first...
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6833949 |
Film coated optical lithography elements and method of making
The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical...
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6834158 |
Pinhole defect repair by resist flow
According to one aspect of the present invention, pinhole defects in resist coatings are repaired by heating the resist briefly to induce the resist to flow and fill pinholes. The resist is brought...
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6830876 |
Acoustic resistor for hearing improvement and audiometric applications, and method of making same
An acoustic resistor or damper and method of manufacturing the same is disclosed. The damper has mesh material and mounting material attached to the mesh material. The mounting material defines an...
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6830871 |
Chemical amplification type resist composition
A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility...
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6830870 |
Acetal protected polymers and photoresists compositions thereof
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: wherein R...
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6828080 |
Pattern forming method and method of fabricating device
The inventive pattern forming method for transferring a bright line pattern to a photoresist material with a photomask having the bright line pattern includes a step of transferring the bright line...
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6828085 |
Exposure method and device manufacturing method using the same
A method of producing a semiconductor chip includes (1) a first exposure step for exposing a device range inside a chip on a substrate, to a repetition pattern including a line and a space, wherein...
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6824957 |
Resin useful for resist, resist composition and pattern forming process using the same
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using...
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