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7005221 |
Method and apparatus to easily measure reticle blind positioning with an exposure apparatus
A method, exposure apparatus, and printed wafer such that a design is printed within a peripheral portion of the wafer. The peripheral portion of the wafer is between an outer boundary of an active...
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7005245 |
Plasma deposited optical waveguide
An optical element, such as a waveguide, is formed by utilizing a plasma deposited precursor optical material wherein the plasma deposition is a two-component reaction comprising a silicon donor,...
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7005239 |
Method of forming metal line
A method of forming a metal line includes the steps of forming a metal layer on a substrate in a chamber while maintaining a chamber pressure for a plasma to be equal to or smaller than 0.8 Pa, and...
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7005249 |
Apparatus for processing substrate and method of processing the same
A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition...
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7001709 |
Method of drawing a pattern on a base material by scanning a beam
A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam...
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6998220 |
Method for the production of thin layer chip resistors
A method for manufacturing thin-film chip resistors, in which method a resistor layer ( 14 ) and a contact layer ( 15, 16 ) are applied onto the upper surface of a substrate ( 10 ) and structured...
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6994939 |
Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
A method and system of making a mask with a transparent substrate thereon is provided. A first resolution enhancement structure is formed on the first portion of the transparent substrate. A second...
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6991893 |
Controlling resist profiles through substrate modification
Photoresists may be formed over a structure that has been modified so as to poison a lower layer of the photoresist. Then, when the photoresist is patterned, it is only patterned down to the...
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6989230 |
Producing low k inter-layer dielectric films using Si-containing resists
In a process of producing low k inter-layer dielectric film in an interconnect structure on a semiconductor body, the improvement of preventing resist poisoning effects, comprising:
a)...
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6986983 |
Method for forming a reflection-type light diffuser
A reflection-type light diffuser is fabricated on a glass substrate, which has a pixel matrix array disposed thereon. The pixel matrix array includes a plurality of adjacent pixel regions, and each...
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6984473 |
Method of patterning a mask blank
A light-block film is formed on a substrate, and a chemically amplified resist film is then formed on the light-block film. The chemically amplified resist film includes a photosensitive acid...
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6979521 |
Method of making grayscale mask for grayscale DOE production by using an absorber layer
The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask...
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6977138 |
Reactive polymer coatings
A method for coating of variable substrates with highly reactive polymers. Its combination with microcontact printing is used for generating several devices such as patterned arrays of ligands for...
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6977137 |
Direct writing of optical devices in silica-based glass using femtosecond pulse lasers
The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing...
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6974657 |
Compositions for microlithography
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and...
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6969569 |
Method of extending the stability of a photoresist during direct writing of an image
In photomask making, the environmental sensitivity of a chemically amplified photoresist is eliminated, or at least substantially reduced, by overcoating the photoresist with a thin coating...
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6967067 |
Patterning methods and systems using reflected interference patterns
A method for patterning a layer on a substrate can include projecting coherent radiation toward a reflector surface so that the coherent radiation is reflected off the reflector surface to provide...
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6967054 |
Coating thickness control using surface features
A uniform coating is provided using surface features. Multiple ridges or other shapes are fabricated near an area of interest to allow for uniform coating in between the ridges. Areas at either...
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6964837 |
Utilization of beam crosslinkable polymer compositions as data recording medium
The present invention relates to the use of at least one radiation crosslinkable, preferably UV crosslinkable, polymer composition as a data recording medium, especially in the form of what are...
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6962767 |
Acetal compound, polymer, resist composition and patterning process
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH 2 ) m — in which one hydrogen atom may be...
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6958207 |
Method for producing large area antireflective microtextured surfaces
A method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of...
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6953654 |
Process and apparatus for removing a contaminant from a substrate
Contaminant removal from a substrate can be performed using a supercritical fluid. An apparatus can be configured to operate at conditions that take advantage of higher solubility of a contaminant...
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6949319 |
Method for determining depth of focus
A depth of focus determination method for finding an upper limit value of depth of focus during exposure, when a resist layer that has been formed on a substrate surface is at least exposed by...
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6946238 |
Process for fabrication of optical waveguides
A method for manufacturing an optical waveguide device in accordance with the present invention includes the steps of depositing a lower cladding layer; coating a photoresist layer directly on the...
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6939650 |
Method of patterning photoresist on a wafer using a transmission mask with a carbon layer
A photoresist layer on a semiconductor wafer is patterned using a mask with an absorbing layer that has been repaired by using an additional light-absorbing carbon layer that collects ions that are...
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6936405 |
Organic polymeric antireflective coatings deposited by chemical vapor deposition
An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing...
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6933085 |
Transparent phase shift mask for fabrication of small feature sizes
In one exemplary embodiment, a resolution enhancement phase shift mask comprises a transparent substrate having a first clear region, a second clear region and a third clear region. An opaque film,...
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6933082 |
Photomask with dust-proofing device and exposure method using the same
It is an object of the present invention to provide a photomask equipped with a dust-proofing device which has high ultraviolet transmittance in a short wavelength region and high light resistance...
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6929904 |
Positive tone lithography with carbon dioxide development systems
A process of forming a resist image in a microelectronic substrate, the process comprises the steps of: (a) providing a substrate having a polymer coating thereon, wherein the polymer is insoluble...
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6929901 |
Method for reworking a lithographic process to provide an undamaged and residue free arc layer
A method of removing resinous organic material over a semiconductor process surface including providing a semiconductor wafer having a process surface comprising a resinous organic material; and,...
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6926953 |
Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
Copolymer structures are formed by exposing a substrate with an imaging layer thereon to two or more beams of selected wavelengths to form interference patterns at the imaging layer to change the...
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6926574 |
Plasma display panel that is operable to suppress the reflection of extraneous light, thereby improving the display contrast
A plasma display device having a front substrate and a rear substrate is provided. The front substrate is constituted from a transparent first insulating substrate, and a plurality of stripe-shaped...
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6924079 |
Resist resin, chemical amplification type resist, and method of forming of pattern with the same
The present invention relates to a resist resin having an acid-decomposable group, which gives rise to decomposition of the acid-decomposable group to show an increased solubility to an aqueous...
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6924070 |
Composite patterning integration
Method and structure for masking are disclosed. In one embodiment, a thin layer of radiation sensitive material is combined with another layer of radiation opaque material with different etch...
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6921626 |
Nanopastes as patterning compositions for electronic parts
The present invention provides methods of making an electronic part in which a nanopaste composed of inorganic nanoparticles and a carrier is applied onto a surface of a substrate. The composition...
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6921630 |
Photoresist substrate having robust adhesion
A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO 2 . The SiO 2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm...
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6921615 |
High-resolution overlay alignment methods for imprint lithography
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of...
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6919162 |
Method for producing high-structure area texturing of a substrate, substrates prepared thereby and masks for use therein
A method is provided for preparing high-surface area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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6916592 |
Esters, polymers, resist compositions and patterning process
A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast...
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6916585 |
Method of varying template dimensions to achieve alignment during imprint lithography
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of...
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6916584 |
Alignment methods for imprint lithography
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with...
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6917411 |
Method for optimizing printing of an alternating phase shift mask having a phase shift error
Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis...
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6913872 |
Dual-wavelength exposure for reduction of implant shadowing
A method for generating a photoresist structure is disclosed in which a layer of photoresist is deposited over a semiconductor substrate. In a first exposure, the layer of photoresist is exposed to...
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6913871 |
Fabricating sub-resolution structures in planar lightwave devices
Optical gratings are fabricated on a scale that may be smaller than the resolution of the lithographic system used to generate the grating pattern. Parallel ridges are formed using lithographic...
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6911297 |
Photoresist compositions
Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:
a) a first photoacid generator compound which comprises one or more compounds of the structure (A);...
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6908723 |
Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication
A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels...
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6905621 |
Method for preventing the etch transfer of sidelobes in contact hole patterns
A method is provided for removing sidelobes that are formed when patterning a positive photoresist layer with an Att. PSM, Alt. PSM or a binary mask with scattering bars. A water soluble negative...
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6902870 |
Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer
For patterning an opening through a patterned material, a coating material, a slow-etch material, and a photoresist material are deposited over the patterned material. The opening is patterned...
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6902871 |
Method for manufacturing polymer microstructures and polymer waveguides
A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying...
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6899992 |
Polymerizable compounds with quadruple hydrogen bond forming groups
QHB-Modified free radical polymerizable compounds and free radical polymerizable compositions that comprise these compounds are disclosed. A QBH-modified free radical polymerizable compound has at...
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