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7396636 |
Segmented resist islands for photolithography on single sliders
A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that...
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7393404 |
Pigment dispersants and their use
A pigment dispersant contains the following component (a) alone or the following components (a) and (b) in combination: Component (a): a composite pigment formed of a diketopyrrolopyrrole pigment...
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7390614 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a...
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7387869 |
Method of forming pattern for semiconductor device
A method of forming a pattern for a semiconductor device is disclosed. According to the method, a lower photoresist layer is formed on a lower layer and an upper photoresist pattern including a...
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7387854 |
Method of forming an isolated line pattern using photolithography
A method of forming an isolated line on a wafer is disclosed. The disclosed method comprises preparing a first mask comprising an isolated line pattern and dummy patterns, the dummy patterns being...
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7387871 |
Mask complementary multiple exposure technique
A method for creating a pattern on an exposure site of a material blank using an exposure apparatus includes providing a mask having a first mask pattern. The mask is positioned between the...
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7381507 |
Photo-patterned light polarizing films
This invention relates to methods for preparing photo-patterned mono- or polychromatic, polarizing films. The polarizer can be pixelated into a number of small regions wherein some of the regions...
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7378224 |
Method for forming pattern, and optical element
There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding...
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7379154 |
Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The...
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7374868 |
Composition for an organic bottom anti-reflective coating and method for forming pattern using the same
Disclosed are a composition for an organic bottom anti-reflective coating able to improve the uniformity of a photoresist pattern with respect to an ultra-fine pattern formation process among...
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7374869 |
Lithographic processing method and device manufactured thereby
A lithographic double exposure processing method for providing to a device layer a pattern comprises the steps of expanding each feature of a first mask pattern and second mask pattern with a...
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7374858 |
Polymerizable compositions; polymer, resist, and lithography method
A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.
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7374867 |
Enhancing photoresist performance using electric fields
Electric fields may be advantageously used in various steps of photolithographic processes. For example, prior to the pre-exposure bake, photoresists that have been spun-on the wafer may be exposed...
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7371509 |
Resist pattern and reflow technology
A reflow stabilizing solution for treating photoresist patterns and a reflow technology are disclosed. The reflow stabilizing solution comprises a polymer and is applied after the photoresist...
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7369217 |
Method and device for immersion lithography
The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic...
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7368229 |
Composite layer method for minimizing PED effect
A novel composite layer structure method which is suitable for reducing post-exposure delay (PED) effects associated with fabricating a photolithography reticle or mask and eliminating or at least...
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7368228 |
Multilayer MEMS device and method of making same
A method of creating a microelectromechanical systems (MEMS) device includes applying a layer of photoresist to a lower layer to create a multilayer MEMS device. The method includes transferring...
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7363854 |
System and method for patterning both sides of a substrate utilizing imprint lithography
Provided are a method and system for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. A method includes deforming the surfaces of the first and second...
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7364840 |
Controlled shrinkage of bilayer photoresist patterns
A technique is disclosed that combines a bilayered photoresist structure, similar to that which is already in use in the MR head industry, with a post development UV irradiation treatment which...
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7364839 |
Method for forming a pattern and substrate-processing apparatus
A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a...
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7358507 |
Liquid removal in a method and device for irradiating spots on a layer
For irradiating a layer ( 3 ) a radiation beam ( 7 ) is directed and focused to a spot ( 11 ) on the layer ( 3 ), relative movement of the layer ( 3 ) relative to the optical element ( 59 ) is...
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7354698 |
Imprint lithography
An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the...
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7354695 |
Producing a substrate having high surface-area texturing
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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7354700 |
Method for manufacturing insulating resin layer, substrate for electro-optical devices, method for manufacturing electro-optical device, and electro-optical device
The invention provides a method for manufacturing an insulating layer for electro-optical devices, wherein the insulating layer contains an insulating material used for electro-optical devices and...
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7354699 |
Method for producing alignment mark
A method for producing an alignment mark is performed such that the alignment mark can be removed from the surface of a substrate without leaving any trace thereof after the alignment mark has been...
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7344989 |
CMP wafer contamination reduced by insitu clean
Reducing CMP wafer contamination by in-situ clean is disclosed herein. The invention can be employed in a method in which a conductive layer is formed on a surface of a semiconductor wafer. After a...
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7344827 |
Fine contact hole forming method employing thermal flow process
Provided is a contact hole forming method, wherein in a thermal flow step the contact hole size can be fixed after thermal flow even if the resist material lot changes, or, wherein at the same bake...
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7341823 |
System and method for printing a pattern
A system and method for printing a pattern, using third harmonic generation. The method includes: (i) determining an illumination scheme in response to the pattern; and (ii) directing, in response...
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7335462 |
Method of depositing an amorphous carbon layer
A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert...
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7332264 |
Photo-definable self-assembled materials
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for...
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7331283 |
Method and apparatus for imprint pattern replication
Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a...
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7326509 |
Composition for forming anti-reflective coating for use in lithography
There is provided a composition for forming anti-reflective coating for use in a lithography which has a high effect of inhibiting reflected light, causes no intermixing with resist layers, affords...
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7326310 |
Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet
The invention relates to a so-called ceramic green sheet used for manufacturing multilayer ceramic electronic parts. The invention is directed to formation of an insulating layer or a like layer...
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7323291 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
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7318997 |
Exposure apparatus and method for forming fine patterns of semiconductor device using the same
Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus...
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7316893 |
Modular containment cell arrangements
Modular containment cell arrangements, including modular containment cells to contain an item and at least one processing material associated with processing of the item.
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7314700 |
High sensitivity resist compositions for electron-based lithography
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the...
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7315033 |
Method and apparatus for reducing biological contamination in an immersion lithography system
Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting...
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7312018 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port...
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7312020 |
Lithography method
A lithography method for forming a plurality of patterns in a photoresist layer. A phase shift mask including a plurality of transparent main features, a plurality of first phase shift transparent...
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7309563 |
Patterning using wax printing and lift off
A method for performing a liftoff operation involves printing a liftoff pattern using low-resolution patterning techniques to form fine feature patterns. The resulting feature size is defined by...
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7306743 |
Recording medium, method of manufacturing recording medium and recording apparatus
A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to...
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7303861 |
Apparatus and method for making a forming structure
A method for making a forming structure having columnar protrusions extending therefrom comprising the steps of exposing a liquid photosensitive resin to light having an activating wavelength...
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7303862 |
Microfabrication methods and devices
Microfabrication methods and devices in which microscale structural elements are provided in an intermediate polymer layer between two planar substrates. Preferred aspects utilize photoimagable or...
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7300741 |
Advanced chemically amplified resist for sub 30 nm dense feature resolution
The present invention discloses a chemically amplified (CA) resist composition for printing features having a dimension of about 30 nm or less and a method of forming a material structure having a...
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7300730 |
Creating an optically tunable anti-reflective coating
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the...
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7285378 |
Juxtaposed island manufacturing method by means of self-organised deposition on a substrate and structure obtained using said method
The invention relates to a structure composed of a substrate wherein a surface supports juxtaposed islands, characterized in that the islands rest on a periodic network of terraces composed of the...
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7284324 |
Method of making photolithographically-patterned out-of-plane coil structures
An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate plane without requiring...
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7279265 |
Positive resist composition and pattern formation method using the same
A positive resist composition comprising (A) a resin capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin contains a repeating unit originated in...
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7279270 |
Manufacturing method of composite film, composite film, color filter made of composite film, display apparatus provided with color filter
A color filter includes a black matrix and a color section. The black matrix has a plurality of partition sections extended alongside each other with a gap region therebetween. The color section is...
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