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5725975 |
Gradation mask and process for producing the same
A gradation mask having spatially stepped transmittance in at least three steps including substantially 0% and substantially 100%, the transmittance being regulated stepwise by varying the...
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5725972 |
Mask with gradual increase in transmittance from opaque to transparent region
An exposure mask includes a transparent region and an opaque region defined on a transparent substrate, with a transition region formed between he transparent region and the opaque region by a...
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5725996 |
Energy sensitive composition and a process for device fabrication using this composition
A novel resist composition is disclosed. The resist composition is used in a lithographic process for device fabrication. The resist composition contains a polymer with phosphorus ester moieties....
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5721074 |
Method for fabricating a light exposure mask comprising the use of a process defect inspection system
A method for fabricating a light exposure mask, including forming a pattern on a wafer by use of a primary light exposure mask formed with a light shield film pattern in accordance with a design...
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5716738 |
Dark rims for attenuated phase shift mask
A mask for use in semiconductor fabrication which includes a light transparent substrate, preferably glass, having a border and light semitransparent material having light transmissivity preferably...
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5712063 |
Phase shift mask comprising light shielding regions having a multiple box structure
A phase shift mask for forming contact holes in the fabrication of highly integrated semiconductor devices. The phase shift mask includes a transparent substrate, a plurality of light exposure...
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5705246 |
Master disc for an optical disc and method for manufacturing the master disc
An exposure master disc includes a photoresist laminate formed on a glass substrate. The photoresist laminate includes an i-line type, first photoresist layer and a g-line type, second photoresist...
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5700606 |
Photomask and a manufacturing method thereof
A half-tone film, a light-shielding film and resist are formed on a transparent substrate in this order, and the resist is removed by adjusting the dosage of exposure for each area so that...
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5700605 |
Mask for light exposure and process for production of the same
There is disclosed a mask for light exposure which comprises being provided with a light transparent substrate and a mask pattern formed on the light transparent substrate, the mask pattern...
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5698350 |
Light exposure method for the fabrication of semiconductor devices
A light exposure method for fabrication of a semiconductor device and a dummy mask used therefor, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting...
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5698347 |
Reticle for off-axis illumination
A reticle for off-axis illumination which has spaces with different sizes wherein subsidiary patterns are formed at space patterns which are larger in size than the space of maximal focus latitude...
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5695896 |
Process for fabricating a phase shifting mask
A simplified process for forming a phase shifting mask is disclosed. A chrome layer is formed on a transparent substrate and patterned. A resist layer is patterned to define the phase shifting...
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5688617 |
Phase shift layer-containing photomask, and its production and correction
The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps...
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5686383 |
Method of making a color filter array by colorant transfer and lamination
A method for preparing a color filter array element is disclosed which includes coating an image receiving layer on one surface of a thin support, with the thin support being rigid in the...
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5686208 |
Process for generating a phase level of an alternating aperture phase shifting mask
A process for generating the phase level pattern of an alternating aperture phase shifting mask is provided. All polygons having both X and Y dimensions greater than a predetermined value are...
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5682056 |
Phase shifting mask and method of manufacturing same
A phase shifting mask has a light shielding region and a light transmitting region including a light transmitting area and a first phase shifting area which is disposed between the light...
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5679484 |
Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask
An exposure mask having an excellent alignment accuracy between patterns, which is prepared by first forming on a light transmissive substrate a light shielding film or a semi-transparent film...
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5679483 |
Embedded phase shifting photomasks and method for manufacturing same
The present invention phase shifting photomask is fabricated by means of a structured modification to the surface of a mask blank suitable for photolithography. Ion implantation, diffusion or...
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5672450 |
Method of phase shift mask fabrication comprising a tapered edge and phase conflict resolution
A method for forming a phase shifting photomask is provided. The method includes forming a transparent substrate having a pattern of opaque features and determining areas of phase conflicts between...
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5670280 |
Optically controlled imaging phase mask element
An optical element includes a phase mask made of a nonlinear material. The element uses the nonlinearity to produce an intensity dependent lens which controls the imaging properties. The invention...
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5667919 |
Attenuated phase shift mask and method of manufacture thereof
An attenuated Phase Shift Mask (PSM) blank and an attenuated Phase Shift Mask (PSM), and a method by which the attenuated Phase Shift Mask (PSM) blank and the attenuated Phase Shift Mask (PSM) may...
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5665496 |
Method for producing color filter
A method for producing a color filter involves (a) forming a positive photosensitive coating film on a transparent electrically conductive layer of a transparent substrate; (b) forming a...
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5663018 |
Pattern writing method during X-ray mask fabrication
A pattern writing method for X-ray mask fabrication including forming a uniform membrane layer on an X-ray absorbing layer and forming an etch mask on the layer of X-ray absorbing material...
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5658695 |
Method for fabricating phase shift mask comprising the use of a second photoshield layer as a sidewall
A method is provided for fabricating a phase shift mask of the out rigger sub-resolution type capable of accurately fabricating an ultra-fine semiconductor circuit. The method includes the steps of...
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5637424 |
Fine pattern lithography with positive use of interference
A mask for forming a desired pattern on the image plane is divided into a number of cell areas. Each cell is assigned a uniform characteristic. Each cell area is assigned a particular light...
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5635338 |
Energy sensitive materials and methods for their use
A class of silicon-containing materials display excellent sensitively in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds....
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5635314 |
Phase shift mask comprising micro spaces in peripheral opaque regions
The present invention relates to a phase shift mask for modifying blackout patterns at the peripheral sites of the mask, thereby capable of compensating the differences in the light intensity at...
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5633101 |
Mask and projection exposure method
An exposure mask formed with a predetermined pattern for exposure on a substrate to be subjected to exposure comprises a glass substrate and a heat conductive film having a thermal conductivity...
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5629113 |
Photomask used by photolithography and a process of producing same
A photomask used by photolithography and a process for producing same which allows a single exposure to make a photomask, thereby simplifying the photomask making process, and facilitating the...
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5624791 |
Pattern forming method using mask
A mask includes a transparent layer which is transparent with respect to a light which is used for an exposure, and a mask pattern layer which is formed on the transparent layer. At least a portion...
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5624790 |
Papermaking belt and method of making the same using differential light transmission techniques
A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the...
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5624773 |
Resolution-enhancing optical phase structure for a projection illumination system
In an optical projection system for use in projection printing of masks to wafers, comprising an illumination system including a light source and a mask positioned in the optical path of the...
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5620817 |
Fabrication of self-aligned attenuated rim phase shift mask
This invention provides a method of forming an attenuating phase shifting rim type photomask and an attenuating phase shifting rim type photomask for use in projection type lithographic apparatus....
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5618643 |
Embedded phase shifting mask with improved relative attenuated film transmission
A method and apparatus for fabricating a mask for use in patterning a radiation sensitive layer in a lithographic printer. An embedded phase shifting layer is disposed over a substantially...
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5609977 |
Reflection phase shifting mask and method of forming a pattern using the same
A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase...
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5604081 |
Method for producing a surface structure with reliefs
A method for producing relief surface structures comprises the step of providing a photoresist layer having a relief surface structure on a surface of a substrate, the relief structure of the...
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5604060 |
Halftone phase shift photomask comprising a single layer of halftone light blocking and phase shifting
The invention provides a halftone phase shift photomask that is of much more simplified structure and so can be fabricated much more easily, which comprises a transparent substrate 10 and a single...
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5601954 |
Attenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewalls
An attenuated phase shift mask comprises a first layer having a thickness to provide a transmission in the range of about 3 to 10% formed on a transparent substrate and a second layer comprising a...
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5597667 |
Photomask and photomask blank
A photomask used in photolithography is characterized in that the photomask is provided with a transparent substrate having two opposite main surfaces and a light-shielding pattern formed on one...
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5595857 |
Method of forming a pattern and projection exposure apparatus
A novel method of pattern formation and a projection exposure apparatus are disclosed, in which the pupil of a projection lens of the projection exposure apparatus used for forming an LSI pattern...
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5593801 |
Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask
An attenuating type phase shifting mask and semiconductor device manufactured by using the mask according to the present invention includes an attenuating type phase shifting pattern, and an...
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5591550 |
Phase shift mask and method for forming phase shift mask
A halftone phase shift mask and a method for forming a halftone phase shift mask. The method includes: forming a halftone pattern material layer on a substrate; defining positions for forming more...
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5589304 |
Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond
Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding...
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5589303 |
Self-aligned opaque regions for attenuating phase-shifting masks
An attenuating phase-shifting optical lithographic mask is fabricated, in a specific embodiment of the invention, by first depositing a uniformly thick molybdenum silicide layer on a top planar...
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5585210 |
Mask pattern of a semiconductor device and a method of manufacturing fine patterns using the same
A mask pattern for manufacturing a resist pattern of a semiconductor device through photolithography is provided with an additional mask pattern whose size is such that resist patterns are not...
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5582939 |
Method for fabricating and using defect-free phase shifting masks
A method for forming a defect-free phase shift mask includes forming a mask blank having a substrate, an etch stop layer, a phase shift layer and an opaque layer. The etch stop layer and phase...
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5582938 |
Phase shift mask
A phase shift mask capable of preventing the formation of a ghost image caused by diffraction and interference of light with the phase of 0° and light with the phase of 180° meeting upon forming...
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5578360 |
Thin film reinforcing structure and method for manufacturing the same
The invention relates to a reinforcing structure for a thin film, particularly for an ultrathin film permeable to X-ray and ultraviolet radiation, and a method for manufacturing a reinforcing...
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5576126 |
Phase shifting mask
An improved method of fabricating a phase shifting mask suitable for semiconductor manufacture includes the steps of identifying phase conflict areas in a desired mask pattern and forming phase...
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5576124 |
Phase shift mask and method for fabricating the same
A phase shift mask capable of achieving a variation in phase at the boundary between a light transmitting film and a phase shift film and thereby preventing formation of an undesirable pattern, and...
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