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6455226 |
Photoresist polymers and photoresist composition containing the same
The present invention provides photoresist polymers and photoresist compositions comprising the same. In one aspect, the photoresist polymer is of the Formula: where Y, R 1 , a, b and c are as...
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6455206 |
Image forming method, image forming apparatus and image recording material
An image forming method comprising the following steps, a step for imagewise exposing a recording material having an image forming layer to a laser beam light based on an image information and...
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6455205 |
Method and apparatus for determining phase shifts and trim masks for an integrated circuit
A method and apparatus for deep sub-micron layout optimization is described. Components of an integrated circuit (IC) design (e.g., gates) can be identified and manufactured using a phase shifting...
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6455231 |
Dry film photoimageable compositions
Dry film resists of the invention in general comprise a photoactive component, a highly viscous or solid (at room temperature, ca. 25° C.) crosslinker component, and preferably a flexibilizing...
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6456358 |
Surface-treatment apparatus for forming a photoresist-isolating wall on a panel
The present invention provides a surface-treatment apparatus for forming a plurality of photoresist-isolating walls on an organic electroluminescent panel. The surface-treatment apparatus has a...
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6455233 |
Micromachining using high energy light ions
Structures of microminiature dimensions are formed by scanning a nearly parallel beam of high energy light ions across the surface of a resist material such as PMMA in a predetermined pattern. The...
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6455227 |
Multilayer resist structure, and method of manufacturing three-dimensional microstructure with use thereof
A multilayer resist structure is irradiated more than one time with ultraviolet rays through a photomask. Each time the structure is irradiated, ultraviolet rays of a little greater quantity of...
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6451511 |
Method for forming-photoresist mask
Multiple exposure of a photoresist layer having an exposure depth depending upon the amount of exposure energy applied are executed at different respective exposure energy amounts through a...
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6447983 |
Smart photolithography
A photolithography method includes applying to a substrate a coating of a film forming composition containing a bonding resin and a film forming material and drying to form a film; selectively...
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6444406 |
Method for forming photoresist pattern and manufacturing method of magnetoresistive effect thin-film magnetic head
A method for forming a photoresist pattern, includes a step of forming a photoresist pattern having a certain width, and a step of performing thereafter ion milling with respect to side walls of...
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6444410 |
Method of improving photoresist profile
A method of improving a photoresist profile. After a photoresist layer is developed, a hard bake is performed at a temperature lower than a glass transition temperature of the photoresist layer....
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6440645 |
Production of microstructures for use in assays
A process for the production of a device having a surface microstructure of wells or channels. In the process one or more steps of screen-printing the microstructure as a curable material onto a...
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6440613 |
Method of fabricating attenuated phase shift mask
The invention comprises methods of fabricating attenuated phase shift masks. In but one implementation, a method of fabricating an attenuated phase shift mask having a circuitry pattern area and a...
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6440644 |
Planarization method and system using variable exposure
A method and system for planarization is disclosed. The system includes a mask including a medium density, sub-resolution region which allows less than the full intensity of the exposing radiation...
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6436610 |
Method for selectively exposing a light pattern to a photosensitive work surface
A maskless exposure system for selectively exposing a photosensitive work surface, such as a photoresist layer, includes a semiconductor substrate having an elongated aperture. A series of shutters...
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6423479 |
Cleaning carbon contamination on mask using gaseous phase
In one embodiment, the present invention relates to a method of processing a lithography mask, involving the steps of exposing a lithography substrate with actinic radiation through the lithography...
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6423241 |
Ink jet print head and a method of producing the same
Disclosed is an ink jet print head and a method of producing the same, the ink jet print head including a plurality of ink ejecting orifices which are formed with a desired shape and a uniform size...
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6423379 |
Method of making an artistic medium
The present invention is directed to a mineral-based coating composition that can be used on a wide range of substrate surfaces. The composition is comprised of a mineral extender, such as a...
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6420098 |
Method and system for manufacturing semiconductor devices on a wafer
The invention relates to a system and a method for manufacturing semiconductor devices on a wafer with the steps of: coating ( 201 ) a photoresist onto said wafer, heating ( 202 ) said wafer to a...
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6420094 |
Optical exposure method
An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base...
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6420097 |
Hardmask trim process
An improved method of forming circuit structures having linewidths which are smaller than what is achievable by conventional UV lithographic techniques on ultra-thin resist layers is provided. The...
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6413701 |
Lithographic projection apparatus
A lithographic projection apparatus includes, a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table...
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6406834 |
Lithographic projection method
A method of projecting an image onto a plurality of target areas on a substrate whereby use is made of a lithographic projection apparatus comprising: a radiation system for supplying a projection...
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6403289 |
Developer for photosensitive polyimide resin composition
The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): ...
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6403287 |
Process for forming a photoresist pattern improving resistance to post exposure delay effect
The present invention relates to a process for forming a photoresist pattern which improves its resistance to the harmful effects of post exposure delay. More specifically, it relates to an...
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6399282 |
Method for forming conductive pattern and producing ceramic multi-layer substrate
A method for forming a conductive pattern includes: applying a photosensitive conductive paste to a support 1 to thereby form a film 2, which paste contains an organic binder having an acidic...
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6395433 |
Photomask for projection lithography at or below about 160 nm and a method thereof
An attenuated phase shift mask for use in a lithography process includes a masking film made of at least one material with at least a silicon component which provides a transmission above about 0.5...
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6391500 |
Photomask for obtaining a graded pattern profile on a photoresist
A photomask for use in a photolithography technique includes a transparent portion for transmitting light from a light source, an opaque portion coated with an opaque material for interrupting the...
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6391524 |
Article having imagable coatings
A heat-sensitive composition, for example a coating on a lithographic printing plate, comprises a carboxylic acid derivative of a cellulosic polymer. The composition may contain a radiation...
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6387605 |
Co-developers for black-and-white photothermographic elements
Novel co-developer compounds are useful in combination with hindered phenol developers to produce high contrast black-and-white photothermographic elements. The co-developer compounds have the...
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6387597 |
Method for exposing features on non-planar resists
A method for imaging a non-planar resist uses a non-integrating resist. The resist may be a thermoresist which changes from an unexposed state to an exposed state upon heating to a threshold...
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6384894 |
Developing method and developing unit
The present invention is a method for developing a substrate by supplying a developing solution from a developing solution supply nozzle onto a surface of the substrate mounted on a predetermined...
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6379874 |
Using block copolymers as supercritical fluid developable photoresists
Block copolymers containing block having pendant fluoro-containing groups and block having pendant hydrolyzable ester containing groups is developed at lower pressures and temperatures than random...
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6376130 |
Chromeless alternating reticle for producing semiconductor device features
An alternating phase shift reticle for a capacitor layout scheme for a memory device and a method for its fabrication is disclosed. The alternating phase shift mask has regions of 0 and 180 degree...
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6372414 |
Lift-off process for patterning fine metal lines
The present invention relates to a process for providing a pattern on a substrate for use in a metal lift-off process, the process comprising: 1) coating a substrate with a liquid positive...
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6372411 |
Polymer pattern forming method
A polymer pattern forming method including the steps of (a) generating radicals in a pattern forming region of a matrix layer which uniformly contains a radical generating agent, thereby forming a...
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6368775 |
3-D photo-patterning of refractive index structures in photosensitive thin film materials
A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in...
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6361928 |
Method of defining a mask pattern for a photoresist layer in semiconductor fabrication
A method of defining a mask pattern for a photoresist layer in semiconductor fabrication. The method coats a photoresist layer containing an additive on a dielectric layer. The photoresist layer...
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6355503 |
Method for producing square contact holes utilizing side lobe formation
An array of small square contact holes, on the order of magnitude of the exposing light wavelength, are formed by selecting the partial coherence and numerical aperture of the exposing light source...
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6352818 |
Photoresist development method employing multiple photoresist developer rinse
A method for forming within a deep ultraviolet (DUV) sensitive photosensitive layer formed upon a substrate employed within a microelectronics fabrication a pattern with attenuated defects and...
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6350559 |
Method for creating thinner resist coating that also has fewer pinholes
In one embodiment, the present invention relates to a method of forming a thin photoresist layer having a low defect density, involving the steps of depositing a photoresist layer having a...
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6348299 |
RIE etch resistant nonchemically amplified resist composition and use thereof
Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The...
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6344303 |
Image forming material and preparation method thereof
A preparation method of an image forming material comprising a support having thereon at least an image forming layer is desclosed, comprising subjecting one side of the support to a treatment to...
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6344309 |
Polysilane composition for forming a coating suitable for bearing a metal pattern, metal pattern forming method, wiring board preparing method
A metal pattern is prepared by applying a polysilane composition comprising a polysilane, a carbon functional silane, and a solvent onto a substrate to form a patterned coating of the polysilane...
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6337175 |
Method for forming resist pattern
An object is to enhance focus latitude and to suppress variations of widths due to different intervals in a resist pattern. A positive resist is applied on a substrate ( 1 ) and then a first...
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6335151 |
Micro-surface fabrication process
A lithographic process for creation and replication of well-controlled surfaces of arbitrary profiles on a sub-micron scale. The surfaces are defined by a mathematical function using a binary mask,...
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6333129 |
Method of fabricating phase shift mask
A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A...
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6326107 |
Phase shift mask and process for manufacturing the same
A phase-shifting mask includes a transparent substrate and a pattern formed of a translucent film on the transparent substrate. One of two regions of the substrate along both sidewalls of a trace...
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6309799 |
Process for producing a printing form
The invention relates to a process for producing a printing form, in which a covering layer (5) is applied to a first radiation-sensitive layer (4) arranged on a carrier (1), the applied covering...
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6309805 |
Method for securing and processing thin film materials
To secure a thin film to a rigid carrier for subsequent exposure to processing chemicals, the thin film is initially adhered to the rigid carrier with a light adhesive from which the thin film may...
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