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9040227 Microstructure manufacturing method  
A microstructure manufacturing method includes forming a layer of a photosensitive resin on a substrate surface having an electrical conductivity, forming a structure of the photosensitive resin...
9034562 Pattern improvement in multiprocess patterning  
Improved fidelity to an integrated circuit pattern design in a semiconductor structure ultimately produced is achieved by modeling material removal and deposition processes in regard to materials,...
9034570 Methods of forming patterns  
Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending...
9029071 Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed thereby  
The present invention provides a silicon oxynitride film formation method capable of reducing energy cost, and also provides a substrate equipped with a silicon oxynitride film formed thereby....
9005878 Forming patterns using thiosulfate polymer compositions  
A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer...
9005854 Electroless plating method using halide  
A conductive pattern is formed using a reactive polymer comprising pendant tertiary alkyl ester groups, a compound that provides an acid upon exposure to radiation, and a crosslinking agent. A...
9005883 Patterning process  
The invention provides a patterning process comprises the steps of: (1) forming a positive chemically amplifying type photoresist film on a substrate to be processed followed by photo-exposure and...
8986920 Method for forming quarter-pitch patterns  
A method for forming quarter-pitch patterns is described. Two resist layers are formed. The upper resist layer is defined into first patterns. A coating that contains or generates a reactive...
8980525 Chemically amplified positive resist composition and patterning process  
A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional...
8980538 Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents  
A method of forming a layered substrate comprising a self-assembled material is provided. The method includes forming a first layer of material on a substrate, forming a layer of a radiation...
8975004 Electrically conductive polymer resin and method for making same  
Disclosed are polymer resins, including polymer resin sheets, having good electroconductivity and a method for manufacturing the same. The polymer resins exhibit flexibility and show...
8962224 Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrate  
Methods for providing a silicon layer on a photomask substrate surface with minimum defeats for fabricating film stack thereon for EUVL applications are provided. In one embodiment, a method for...
8951715 Method of forming patterned film on a bottom and a top-surface of a deep trench  
A method of forming a patterned film on both a bottom and a top-surface of a deep trench is disclosed. The method includes the steps of: 1) providing a substrate having a deep trench formed...
8945816 Method for forming resist pattern, semiconductor device and production method thereof  
A method for producing a semiconductor device includes forming a resist pattern by coating a resist pattern thickening material to cover the surface of the resist pattern, baking the resist...
8936890 Electroless plating method  
A pattern is formed in a polymeric layer comprising (a) a reactive polymer comprising -A- recurring units comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon...
8932803 Pattern forming process  
A pattern is formed by coating a first chemically amplified positive resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn soluble in...
8927201 Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition  
A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the...
8927200 Double patterning method  
A double patterning method includes providing a first resist film on a substrate using a first photoresist composition. The first resist film is exposed. The exposed first resist film is developed...
8883403 Method of semiconductor integrated circuit fabrication  
A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate having two different topography areas adjacent to each other. A step-forming...
8877641 Line-edge roughness improvement for small pitches  
A method for mitigating line-edge roughness on a semiconductor device. The method includes line-edge roughness mitigation techniques in accordance with embodiments of the present invention. The...
8869391 Producing method of wired circuit board  
A method for producing a wired circuit board includes the steps of preparing a metal supporting layer, forming an insulating layer on the metal supporting layer so as to form an opening, forming a...
8846301 Orthogonal processing of organic materials used in electronic and electrical devices  
An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the...
8828252 Method and materials for reverse patterning  
A silsesquioxane resin is applied on top of the patterned photo-resist and cured to produce a cured silsesquioxane resin on top of the pattern surface. Subsequently, an aqueous base stripper or a...
8822133 Underlayer composition and method of imaging underlayer  
A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an...
8815495 Pattern forming method and manufacturing method of semiconductor device  
A disclosed mask pattern forming method includes isotropically coating a surface of a resist pattern array having a predetermined line width with a silicon oxide film, embedding a gap in the...
8802566 Method for producing semiconductor components on a substrate, and substrate comprising semiconductor components  
A method for producing semiconductor components on a substrate including photolithographic patterning steps, in which method, on the substrate, a first layer to be patterned is applied and a...
8790863 Electron beam processing with condensed ice  
In a method for imaging a solid state substrate, a vapor is condensed to an amorphous solid water condensate layer on a surface of a solid state substrate. Then an image of at least a portion of...
8765359 Method of fabricating patterned functional substrates  
Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods...
8758985 Method of fabricating nanostructure array and device including nanostructure array  
Provided are a method of fabricating a nanostructure array and a device including the nanostructure array. Nanoscale patterning is caused at an interface of a resist layer by light passed through...
8748083 Method for forming wires with narrow spacing  
A method for forming wires with a narrow spacing is provided. The method includes the steps of: sequentially forming a first metal layer and a protective layer on a substrate; using a first...
8728335 Method and materials for double patterning  
A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin...
8728715 Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate  
A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist...
8728716 Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern  
There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition...
8703395 Pattern-forming method  
A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes...
8703397 Method for providing side shields for a magnetic recording transducer  
A method for fabricating a side shield for a magnetic transducer is described. The magnetic transducer has a nonmagnetic layer and a pole on the nonmagnetic layer. The pole has sidewalls and an...
8703396 Methods of forming patterns  
Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending...
8697342 Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure  
Disclose herein is a method of modifying a positive-type chemically amplified resist pattern, including the steps of, applying to a surface of a resist pattern, an aqueous solution of a modifier...
8642249 Micro-fluid ejection devices with a polymeric layer having an embedded conductive material  
Micro-fluid ejection devices, methods for making a micro-fluid ejection device, and methods for reducing a size of a substrate for a micro-fluid ejection head. One such micro-fluid ejection device...
8609323 System for producing patterned silicon carbide structures  
A method of forming ceramic pattern structures of silicon carbide film includes depositing an electron-beam resist or a photo-resist onto a substrate. A portion of the resist is selectively...
8574816 Positive resist composition and patterning process  
The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a...
8568961 Methods for protecting a die surface with photocurable materials  
In a first aspect of the present invention, a method for manufacturing a flip chip package is provided comprising the steps of a) providing a chip having electrically conductive pads on an active...
8557507 Fabrication of nano-twinned nanopillars  
Nanopillars with nanoscale diameters are provided where the nanopillar has uniformly aligned nano-twins either perpendicular or inclined by 1-90° to the pillar-axis with no grain-boundaries or any...
8535571 Water-soluble electrically conductive polymers  
Water-soluble electrically conductive polymers and a composition comprising such polymers are provided. Also, an electrically conductive layer or film formed from the composition, and articles...
8501392 Photosensitive element, method for formation of resist pattern, and method for production of print circuit board  
A photosensitive element comprises a support, a photosensitive layer and a protective film laminated in that order, wherein the photosensitive layer is composed of a photosensitive resin...
8492077 Method for providing a conductive material structure on a carrier  
An exemplary method for providing a conductive material structure on a carrier generally includes applying a photo sensitive material on the carrier and applying a mask on the photo sensitive...
8486611 Semiconductor constructions and methods of forming patterns  
Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An...
8461678 Structure with self aligned resist layer on an interconnect surface and method of making same  
A structure is provided with a self-aligned resist layer on a surface of metal interconnects for use in forming air gaps in an insulator material and method of fabricating the same. The...
8455577 Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method  
A halogen-free and flame-resistant photosensitive resin composition is provided, which has properties necessary for a solder resist (insulative property, solder heat resistance, alkali...
8420299 Forming method of resist pattern and manufacturing method of thin-film magnetic head  
It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal...
8420300 Method of producing multilayer printed wiring board and photosensitive dry film used therefor  
A method of producing a multilayer printed wiring board by attaching a photosensitive dry film onto an interlaminar resin insulating layer having a thin-film conductor layer and conducting a light...