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7611818 |
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated bond, (C) a photopolymerization initiator and (D) a compound...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7588884 |
Method for enhancing wafer alignment marks
A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for...
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7585614 |
Sub-lithographic imaging techniques and processes
A method of patterning which provides images substantially smaller than that possible by lithographic techniques is provided. In the method of the invention, a substrate has a memory layer and a...
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7582412 |
Multilayer photoresist systems
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing...
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7575853 |
Method of forming thin film pattern and method of forming magnetoresistive element
The present invention provides a thin film pattern forming method capable of forming a thin film pattern having small dimensions at higher precision. A thin film pattern forming method of the...
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7569334 |
Method of manufacturing for conductive pattern substrate
In the present invention, the problem of stability deterioration of the obtained conductive pattern substrate at the time of forming a conductive pattern by an additive method when a layer having...
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7569333 |
Wiring line structure and method for forming the same
The wiring line structure comprises a transparent substrate, a barrier layer, a metal layer, and a photosensitive protecting layer. The barrier layer and a metal layer are successively disposed on...
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7569332 |
Processing method of thin-film and manufacturing method of thin-film magnetic head
A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a...
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7569330 |
Method for manufacturing pattern of light shielding layer and pattern forming body of light shielding layer
A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base...
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7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7553610 |
Method of forming fine patterns
It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7537884 |
Method for forming self-synthesizing conductive or conjugated polymer film and application
The present invention discloses a method by utilizing chemical reaction or specific attractive forces (complexation or hydrogen bonding) for forming self-synthesizing conductive or conjugated...
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7537866 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7534553 |
Method for fabricating semiconductor device
A method for fabricating a semiconductor device is provided. The method includes: preparing a substrate defined as active regions and inactive regions and provided with a plurality of conductive...
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7524595 |
Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment
A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two...
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7521094 |
Method of forming polymer features by directed self-assembly of block copolymers
Disclosed herein is a method of forming polymer structures comprising applying a solution of a diblock copolymer assembly comprising at least one diblock copolymer that forms lamellae, to a neutral...
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7504199 |
Method of forming metal pattern having low resistivity
Disclosed herein is a method for forming a metal pattern with a low resistivity. The method comprises the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic...
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7501215 |
Device manufacturing method and a calibration substrate
The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the...
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7498120 |
Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating
Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating such components and devices are disclosed. Embodiments of the...
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7476412 |
Method for the metalization of an insulator and/or a dielectric
The invention relates to a process for the metallization of an insulator and/or a dielectric, wherein the insulator is firstly activated, it is subsequently coated with another insulator and the...
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7459699 |
Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method
A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the...
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7452659 |
Methods of patterning a surface using single and multilayer molecular films
Surface features are fabricated using a single layer or multi-layer molecular resist. The resist is preferably a selective adsorption resist. Selective adsorption resist is a resist that allows a...
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7444196 |
Optimized characterization of wafers structures for optical metrology
A patterned structure in a wafer is created using one or more fabrication treatment processes. The patterned structure has a treated and an untreated portion. One or more diffraction sensitivity...
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7419769 |
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition...
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7399582 |
Material for forming fine pattern and method for forming fine pattern using the same
In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer...
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7399579 |
Fabrication of metallic microstructures via exposure of photosensitive composition
A method of forming microstructures. An article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of...
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7378228 |
Positive type photosensitive epoxy resin composition and printed circuit board using the same
A printed circuit board comprising an insulating layer prepared with the aid of a positive type photosensitive epoxy resin composition comprising (a) an epoxy resin having two or more epoxy groups...
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7378227 |
Method of making a printed wiring board with conformally plated circuit traces
A PWB or multilayer board with circuit traces is treated by a process that serves to reduce the incident of failure of the board. The process includes the steps of applying a thin commoning layer...
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7378225 |
Method of forming a metal pattern on a substrate
The invention relates to a method of providing two distinct photoimageable film compositions, in particular, two distinct dry film compositions, on a substrate. Each of the two photoimageable film...
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7368227 |
Method to print photoresist lines with negative sidewalls
It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by...
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7347953 |
Methods for forming improved self-assembled patterns of block copolymers
A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block...
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7344970 |
Plating method
Photoresist compositions and methods suitable for depositing a very thick photoresist layer in a single coating process are provided. Such photoresist layers are particularly suitable for use in...
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7338752 |
Method for forming metal pattern and electromagnetic interference filter using pattern formed by the method
Disclosed herein are a method for forming a highly electrically conductive metal pattern and an electromagnetic interference filter (EMI filter) using a metal pattern formed by the method. The...
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7338751 |
Process for producing printed wiring board and photosensitive resin composition used in the same
An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring...
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7338750 |
Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof
A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for...
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7335462 |
Method of depositing an amorphous carbon layer
A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert...
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7329480 |
Radiation-sensitive negative-type resist composition for pattern formation method
The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the...
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7313858 |
Method for manufacturing a magnetic head coil structure and/or pole tip structure
A Damascene process is provided for manufacturing a coil structure for a magnetic head. During the manufacturing process, an insulating layer is initially deposited after which a photoresist layer...
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7312287 |
Fluorinated polymers useful as photoresists, and processes for microlithography
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically...
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7306742 |
Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111 . This method comprises the steps of: bringing the...
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7300730 |
Creating an optically tunable anti-reflective coating
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the...
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7297470 |
Image transfer process for thin film component definition
A method for fabricating a thin film component includes forming a wafer having a thin film layer, a release layer, and a patterned layer of photoresist. The pattern of the layer of photoresist is...
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7297469 |
Method of patterning a thick-film paste material layer, method of manufacturing cold- cathode field emission device, and method of manufacturing a cold-cathode field emission display
In a method of manufacturing a cold cathode field emission device, a cathode electrode 11 , an insulating layer 12 and a gate electrode 13 are formed; an opening portion 14 is formed through...
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7294453 |
Electronic device manufacture
Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen...
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7291427 |
Surface graft material, conductive pattern material, and production method thereof
A surface graft material including a substrate and a surface graft polymer chain, wherein the surface graft polymer chain includes a photocleavable moiety at one of its terminals, and the surface...
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7282324 |
Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating...
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7276327 |
Silicon-containing compositions for spin-on arc/hardmask materials
Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic...
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