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9034565 Method of fabricating substrate for organic light-emitting device  
A substrate for an organic light-emitting device which can improve the light extraction efficiency of an organic light-emitting device while realizing an intended level of transmittance, a method...
9034564 Reader fabrication method employing developable bottom anti-reflective coating  
Disclosed are methods for making read sensors using developable bottom anti-reflective coating and amorphous carbon (a-C) layers as junction milling masks. The methods described herein provide an...
9023588 Resist underlayer film forming composition containing silicon having nitrogen-containing ring  
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming...
9017929 Fabrication method for pattern-formed structure  
An object of the present invention is to provide a fabrication method for pattern-formed structure having a smooth three-dimensional structure through a fewer processes. To achieve the object, the...
9012244 Method to form multiple trenches utilizing a grayscale mask  
The present disclosure relates to a method to form a plurality of openings within a substrate with a single photo exposure and a single etch process. A photoresist layer is disposed over a...
9012785 Flexible multilayer substrate  
A flexible multilayer substrate includes a multilayer body including a plurality of laminated resin layers. The multilayer body includes an innermost surface, which is a surface on an inner side...
9005877 Method of forming patterns using block copolymers and articles thereof  
A method for patterning a layered structure is provided that includes performing photolithography to provide a developed prepattern layer on a horizontal surface of an underlying substrate,...
9005878 Forming patterns using thiosulfate polymer compositions  
A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer...
9005883 Patterning process  
The invention provides a patterning process comprises the steps of: (1) forming a positive chemically amplifying type photoresist film on a substrate to be processed followed by photo-exposure and...
8999625 Silicon-containing antireflective coatings including non-polymeric silsesquioxanes  
Embodiments include a silicon-containing antireflective material including a silicon-containing base polymer, a non-polymeric silsesquioxane material, and a photoacid generator. The...
8993218 Photo resist (PR) profile control  
One or more techniques or systems for controlling a profile for photo resist (PR) are provided herein. In some embodiments, a first shield layer is formed on a first PR layer and a second PR layer...
8993221 Block co-polymer photoresist  
An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not...
8986920 Method for forming quarter-pitch patterns  
A method for forming quarter-pitch patterns is described. Two resist layers are formed. The upper resist layer is defined into first patterns. A coating that contains or generates a reactive...
8986924 Method of sequestering metals using thiosulfate polymers  
A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer...
8986918 Hybrid photoresist composition and pattern forming method using thereof  
The present invention relates to a hybrid photoresist composition for improved resolution and a pattern forming method using the photoresist composition. The photoresist composition includes a...
8986921 Lithographic material stack including a metal-compound hard mask  
A lithographic material stack including a metal-compound hard mask layer is provided. The lithographic material stack includes a lower organic planarizing layer (OPL), a dielectric hard mask...
8987142 Multi-patterning method and device formed by the method  
A multi-patterning method includes: patterning at least two first openings in a hard mask layer over a substrate using a first mask; forming spacers within two of the at least two first openings,...
8980538 Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents  
A method of forming a layered substrate comprising a self-assembled material is provided. The method includes forming a first layer of material on a substrate, forming a layer of a radiation...
8975004 Electrically conductive polymer resin and method for making same  
Disclosed are polymer resins, including polymer resin sheets, having good electroconductivity and a method for manufacturing the same. The polymer resins exhibit flexibility and show...
8968982 Chemically amplified positive resist composition and patterning process  
In a chemically amplified positive resist composition comprising a base resin and an acid generator in a solvent, the base resin contains both an alkali-insoluble or substantially alkali-insoluble...
8962747 Resist underlayer composition and process of producing integrated circuit devices using the same  
A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented...
8962224 Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrate  
Methods for providing a silicon layer on a photomask substrate surface with minimum defeats for fabricating film stack thereon for EUVL applications are provided. In one embodiment, a method for...
8962483 Interconnection designs using sidewall image transfer (SIT)  
Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the...
8951083 Method for manufacturing an organic light emitting diode display  
The present invention relates to an organic light emitting device and a manufacturing method thereof. The present invention discloses an organic light emitting device including: a plurality of...
8951425 Curved plate and method of forming the same  
A method of forming at least one curved plate having first and second layers, the first layer being formed of a first material and the second layer being formed of a second material, the method...
8951715 Method of forming patterned film on a bottom and a top-surface of a deep trench  
A method of forming a patterned film on both a bottom and a top-surface of a deep trench is disclosed. The method includes the steps of: 1) providing a substrate having a deep trench formed...
8945800 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program  
In a multiple patterning techniques, where two or more exposures are used to form a single layer of a device, the splitting of features in a single layer between the multiple exposures is carried...
8945808 Self-topcoating resist for photolithography  
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid...
8945820 Silicon-containing resist underlayer film-forming composition and patterning process  
The present invention is a silicon-containing resist underlayer film-forming composition containing a condensation product and/or a hydrolysis condensation product of a mixture comprising: one or...
8921034 Patterned bases, and patterning methods  
Some embodiments include methods of patterning a base. First and second masking features are formed over the base. The first and second masking features include pedestals of carbon-containing...
8916337 Dual hard mask lithography process  
A first metallic hard mask layer over an interconnect-level dielectric layer is patterned with a line pattern. At least one dielectric material layer, a second metallic hard mask layer, a first...
8916054 High fidelity patterning employing a fluorohydrocarbon-containing polymer  
A stack of a hard mask layer, a soft mask layer, and a photoresist is formed on a substrate. The photoresist is patterned to include at least one opening. The pattern is transferred into the soft...
8911932 Photo-imageable hardmask with positive tone for microphotolithography  
Disclosed are the deactivation mechanism and chemistry platforms that make high-silicon hardmask films photo-imageable like positive-tone photoresist for microphotolithography. The deactivation...
8906591 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same  
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic...
8906595 Method for improving resist pattern peeling  
A method of fabricating a mask is described. The method includes receiving receiving an integrated circuit (IC) design layout that has a first pattern layer including a first feature and has a...
8900799 Thin film patterning method and method of manufacturing semiconductor device using the thin film patterning method  
A thin film patterning method may include forming a thin film by coating a precursor solution containing a precursor of metal oxide onto a substrate, soft baking the thin film, exposing the thin...
8895227 Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern  
A developing solution is disclosed with which it is possible to develop a photoresist disposed on a substrate including a conductive polymer. Also disclosed is a method for forming a resist...
8895232 Mask material conversion  
The dimensions of mask patterns, such as pitch-multiplied spacers, are controlled by controlled growth of features in the patterns after they are formed. A pattern of mandrels is formed overlying...
8881353 Method of producing piezoelectric/electrostrictive film type device  
Provided is a method of producing a piezoelectric/electrorestrictive film type device including a vibrating laminate obtained by laminating electrode films and piezoelectric/electrorestrictive...
8883403 Method of semiconductor integrated circuit fabrication  
A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate having two different topography areas adjacent to each other. A step-forming...
8883395 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same  
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic...
8877430 Methods of producing structures using a developer-soluble layer with multilayer technology  
Methods of forming microelectronic structures using multilayer processes are disclosed. The methods comprise the use of a developer-soluble protective layer adjacent the substrate surface in a...
8877425 Silicon-containing resist underlayer film forming composition having fluorine-based additive  
A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more...
8871429 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same  
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic...
8871642 Method of forming pattern and developer for use in the method  
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a...
8857020 Actuators and methods of making the same  
A method of forming an actuator includes depositing a photoimageable material to form a first photoimageable layer on a piezoelectric layer; patterning the first photoimageable layer to form an...
8852852 Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet  
A method for manufacturing a narrow frame touch input sheet includes forming and stacking transparent conductive films, light-excluding conductive electrode films, and first resist layers...
8846304 Method of forming a pattern in a semiconductor device and method of forming a gate using the same  
A method of forming a pattern in a semiconductor device is described. A substrate divided into cell and peripheral regions is provided, and an object layer is formed on a substrate. A buffer...
8846292 Radiation-sensitive composition  
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good...
8846301 Orthogonal processing of organic materials used in electronic and electrical devices  
An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the...