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7622240 |
Low blur molecular resist
A molecular resist composition and method of use is disclosed wherein the composition includes no silicon containing material, no polymeric material, and a substituted oligosaccharide, wherein the...
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7618769 |
Textured chamber surface
A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is...
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7615336 |
Method of fabricating a display device by using a stepped halftone mask to form a three-step photoresist pattern on a material layer for etching and ashing
The present application relates to a method of fabricating a display device, including the steps of forming at least one to-be-patterned material layer on a substrate and forming a photo-resist...
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7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R 1 to R 5 are selected from the group consisting of...
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7608390 |
Top antireflective coating composition containing hydrophobic and acidic groups
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base...
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7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including...
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7604926 |
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device, comprises forming a first mask pattern on an under-layer region, forming a plurality of dummy-line patterns on the under-layer region, the...
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7604925 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7598024 |
Method and system for enhanced lithographic alignment
A method for alignment mark preservation includes a step of preparing a lower alignment mark structure on a substrate. In one configuration of the invention, the alignment mark structure includes a...
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7598023 |
Process for fabricating micro-display
A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an...
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7598020 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7597813 |
Element substrate and method of manufacturing the same
A method of manufacturing an element substrate including: forming a release layer on a first support substrate; forming a metal layer having a predetermined pattern on the release layer; disposing...
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7595145 |
Method of forming pattern of semiconductor device
A method of forming a pattern of a semiconductor device includes forming a hard mask layer over a semiconductor substrate and forming a photoresist film pattern over the hard mask layer. An outer...
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7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about...
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7592127 |
Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
The present invention provides a resist pattern thickening material and the like which can thicken a resist pattern and form a fine space pattern. The resist pattern thickening material contains: a...
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7588883 |
Method for forming a gate and etching a conductive layer
A method for forming a gate and a method for etching a conductive layer are provided. First, a substrate is provided, including a dielectric layer and a conductive layer on its surface in order....
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7588882 |
Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first...
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7588881 |
Method of making thin film transistor liquid crystal display
A thin film transistor liquid array substrate includes forming a plurality of amorphous silicon thin film transistors and storage capacities on a transparent substrate, wherein the amorphous...
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7588870 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
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7585613 |
Antireflection film composition, substrate, and patterning process
There is disclosed an antireflection film composition used for lithography comprising: at least
a light absorbing silicone resin with mass average molecular weight of 30,000 or less in which...
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7579137 |
Method for fabricating dual damascene structures
A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist...
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7579136 |
Microfluidic device and method of manufacturing the same
Provided is a method of manufacturing a microfluidic device in which coating film patterns made of a coupling agent are formed in microchannels. The method includes: forming the coating film...
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7573052 |
Exposure apparatus, exposure method, and device manufacturing method
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is...
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7572572 |
Methods for forming arrays of small, closely spaced features
Methods of forming arrays of small, densely spaced holes or pillars for use in integrated circuits are disclosed. Various pattern transfer and etching steps can be used, in combination with...
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7569332 |
Processing method of thin-film and manufacturing method of thin-film magnetic head
A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a...
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7566527 |
Fused aromatic structures and methods for photolithographic applications
A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base...
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7566525 |
Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing...
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7563723 |
Critical dimension control for integrated circuits
Methods of etching substrates with small critical dimensions and altering the critical dimensions are disclosed. In one embodiment, a sulfur oxide based plasma is used to etch an amorphous carbon...
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7563563 |
Wet developable bottom antireflective coating composition and method for use thereof
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is...
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7560222 |
Si-containing polymers for nano-pattern device fabrication
A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially...
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7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7557769 |
Electromagnetic interference protection for radomes
A radome, and corresponding method of making, comprising an electro-optic transparent substrate, a semiconductor coating on the substrate, and a frequency selective surface embedded in the coating.
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7556916 |
Method for burying resist and method for manufacturing semiconductor device
A resist film is applied to an entire surface and subjected to patterning substantially in the same form as an opening to bury the resist film inside the opening. When a positive resist is used, a...
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7556915 |
Process to form an isolated trench image in photoresist
An isolated hole in a photoresist layer is formed by surrounding it with additional, somewhat narrower, dummy hole features. The ratio of feature width to resist thickness is adjusted so that,...
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7553770 |
Reverse masking profile improvements in high aspect ratio etch
A method of improving high aspect ratio etching by reverse masking to provide a more uniform mask height between the array and periphery is presented. A layer of amorphous carbon is deposited over...
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7553610 |
Method of forming fine patterns
It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause...
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7553608 |
Resist pattern forming method including uniform intensity near field exposure
A resist pattern forming method includes preparing a photomask for generating near-field light having an intensity distribution. The photomask has a light-transmissible base member, and a...
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7550247 |
Resist composition and patterning process
A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic...
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7547503 |
Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of...
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7541117 |
Mask pattern generating method
Disclosed herein is a mask pattern generating method for generating a mask pattern to be formed in a Levenson phase shift mask used in a light exposure process for exposing a photoresist film...
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7537883 |
Method of manufacturing nano size-gap electrode device
Provided is a method of manufacturing a nano size-gap electrode device. The method includes the steps of: disposing a floated nano structure on a semiconductor layer; forming a mask layer having at...
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7537866 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7534555 |
Plating using copolymer
Method of plating using a polymeric barrier layer including a polyphenolic polymer which has a repeating unit of the formula:
wherein R 1 , R 2 , R 3 , R 4 , and R 5 are individually hydrogen,...
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7534554 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the...
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7531296 |
Method of forming high etch resistant resist patterns
A method for forming an etch-resistant photoresist pattern on a semiconductor substrate is provided. In one embodiment, a photoresist layer is formed on the substrate. The photoresist layer is...
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7531294 |
Method for forming film pattern, method for manufacturing semiconductor device, liquid crystal television, and EL television
An object of the invention is to provide a method for manufacturing a semiconductor device having a semiconductor element with a minute structure, which can reduce a cost and improve throughput due...
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7531293 |
Radiation sensitive self-assembled monolayers and uses thereof
The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group...
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7527918 |
Pattern forming method and method for manufacturing a semiconductor device
A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the...
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7527913 |
Photoacid generators, photoresist composition including the same and method of forming pattern using the same
A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a...
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7524432 |
Metal pattern forming method
A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a...
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