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7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R 1 to R 5 are selected from the group consisting of...
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7611827 |
Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head
A positive type photosensitive resin composition comprises a polyacrylate resin having, in the structure, at least a structural unit represented by the following general formula (1):
...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7588882 |
Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first...
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7582413 |
Substrate, method of exposing a substrate, machine readable medium
A double exposure method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a desired pattern to be printed on the substrate into...
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7582394 |
Photomask and method for forming pattern
A photomask includes, on a translucent substrate, three or more first light-shielding portions each in insular shape having a property of shielding exposure light and spaced equidistantly, a second...
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7579136 |
Microfluidic device and method of manufacturing the same
Provided is a method of manufacturing a microfluidic device in which coating film patterns made of a coupling agent are formed in microchannels. The method includes: forming the coating film...
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7569485 |
Method for an integrated circuit contact
A process is provided for forming vertical contacts in the manufacture of integrated circuits and devices. The process eliminates the need for precise mask alignment and allows the etch of the...
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7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7550383 |
Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same
There are provided methods of performing a photolithography process for forming asymmetric semiconductor patterns and methods of forming a semiconductor device using the same. These methods provide...
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7547495 |
Device manufacturing method and computer program product
In a double exposure process to print features at a reduced pitch, the critical dimension of features printed in the first exposure is measured and used as a target for the second exposure.
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7544449 |
Method and apparatus for measurement of crossfield chromatic response of projection imaging systems
A method and apparatus for measuring the chromatic response of lithographic projection imaging systems is described. An apparatus for determining the lens aberrations for a lithographic projection...
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7541120 |
Manufacturing method of semiconductor device
After forming a resist film on a Si substrate, a circuit pattern for a semiconductor integrated circuit, a first L-shaped length measuring pattern and a cross-shaped monitor pattern for alignment...
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7537866 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
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7534533 |
Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
A polarization analyzing system includes a data collector collecting information on resist patterns formed over step patterns by first and second lights, the first and second lights being polarized...
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7534337 |
Substrate before insulation, method of manufacturing substrate, method of manufacturing surface acoustic wave transducer, surface acoustic wave device, and electronic equipment
A substrate before an insulation process, which is provided with a protection film to prevent a part of a surface area, which has electrical conductivity from being insulated, the substrate...
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7527918 |
Pattern forming method and method for manufacturing a semiconductor device
A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the...
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7521312 |
Method and system for creating self-aligned twin wells with co-planar surfaces in a semiconductor device
A method and system for providing a twin well in a semiconductor device is described. The method and system include providing at least one interference layer and providing a first mask that covers...
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7507508 |
Method for manufacturing a semiconductor device
A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor...
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7501227 |
System and method for photolithography in semiconductor manufacturing
A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at...
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7501215 |
Device manufacturing method and a calibration substrate
The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the...
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7482280 |
Method for forming a lithography pattern
A method of lithography patterning includes forming a first material layer on a substrate, the first material layer being substantially free of silicon, and forming a patterned resist layer...
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7481942 |
Monolithic ink-jet printhead and method of manufacturing the same
An ink-jet printhead and a method of manufacturing the same include a substrate on which a heater and a passivation layer protecting the heater are formed, a passage plate on which an ink chamber...
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7479366 |
Method for forming pattern
In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a...
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7479356 |
Aligning method
A method, wherein a plurality of first patterns are formed in an exposure region, and second patterns are formed by plural shots, with positions of alignment marks measured for said plurality of...
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7476485 |
Resist lower layer film material and method for forming a pattern
There is disclosed a resist lower layer film material for a multilayer-resist film used in lithography which contains, at least, a polymer having a repeating unit represented by the following...
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7444196 |
Optimized characterization of wafers structures for optical metrology
A patterned structure in a wafer is created using one or more fabrication treatment processes. The patterned structure has a treated and an untreated portion. One or more diffraction sensitivity...
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7442487 |
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure...
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7438998 |
Method of manufacturing semiconductor device
In a method of manufacturing a semiconductor device including a wiring pattern in the form of a linear line having an intermediate portion with a locally different line width, the wiring pattern...
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7435536 |
Method to align mask patterns
Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the...
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7425392 |
Lithographic template and method of formation and use
A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template ( 10 ) and the method...
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7416991 |
High resolution patterning of surface energy utilizing high resolution monomolecular resist for fabrication of patterned media masters
A method for patterning and forming very small structures on a substrate such as a wafer. The process uses a difference in surface energy between a mask and the substrate to selectively deposit a...
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7416821 |
Thermally cured undercoat for lithographic application
Thermally curable undercoat composition comprising for producing a bilayer relief image comprising:
a) a polymer of Structure I comprising repeating units of Structure II, III, and IV
...
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7410736 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in...
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7405414 |
Method and apparatus for patterning a workpiece
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle...
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7405034 |
Polymeric structures, particularly microstructures, and methods for making same
Methods of adhering polymeric materials to a substrate, either directly or through linker molecules, are disclosed. Structures, for example, microstructures, including microwells and arrays of...
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7389585 |
Method of manufacturing a liquid discharging head
A method for forming an ink jet recording head includes at least a step of forming an ink flow path pattern on a substrate by a photodecomposable positive type resist resin, a step of, once...
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7384724 |
Method for fabricating optical devices in photonic crystal structures
A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist ( 9 ) is coated on a substrate ( 10 ) and exposed to an e-beam ( 11 ), to produce an...
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7380320 |
Piezoelectric device and method of manufacturing the device
A piezoelectric device includes a substrate, a buffer layer on the substrate, a lower electrode layer on the buffer layer, a piezoelectric layer on the lower electrode layer, and an upper electrode...
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7378226 |
Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads
A method for forming a big-layer lift-off mask for use in fabricating GMR read-head sensors with trackwidths of less than 0.1 microns. The mask layers are formed symmetrically on each other, each...
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7371489 |
Photomask, method for detecting pattern defect of the same, and method for making pattern using the same
There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the...
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7368226 |
Method for forming fine patterns of semiconductor device
A method for forming fine patterns of a semiconductor device is provided, the method including forming a first lower layer pattern having a width of two minimum line width and a space pattern on a...
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7368225 |
Two mask photoresist exposure pattern for dense and isolated regions
There is provided a method of making plurality of features in a first layer. A photoresist layer is formed over the first layer. Dense regions in the photoresist layer are exposed through a first...
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7368207 |
Dynamic compensation system for maskless lithography
A method for dynamically registering multiple patterned layers on a substrate ( 3 ) comprises: depositing a first layer on the substrate; printing a first pattern ( 20 ) on the first layer;...
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7365018 |
Fabrication of semiconductor device for flash memory with increased select gate width
A non-volatile memory device having memory elements with a channel length of, e.g., 45-55 nm or less, is fabricated using existing lithographic techniques. In one approach, patterns of first and...
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7364840 |
Controlled shrinkage of bilayer photoresist patterns
A technique is disclosed that combines a bilayered photoresist structure, similar to that which is already in use in the MR head industry, with a post development UV irradiation treatment which...
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7361453 |
Method for creating a pattern in a material and semiconductor structure processed therewith
A method of manufacturing a semiconductor device with precision patterning is disclosed. A structure of a small dimension is created in a material, such as a semiconductor material, using a first...
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7351519 |
Patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel
A method of improved patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel includes depositing a transparent ITO layer upon a transparent...
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7348109 |
Reticle, semiconductor die and method of manufacturing semiconductor device
The invention is directed to increasing the number of semiconductor dice obtained from one semiconductor wafer and enhancing the reliability and yield of the semiconductor dice when the...
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