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7619716 |
Exposure method
An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on...
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7618767 |
Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method
There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional...
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7618751 |
RET for optical maskless lithography
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.
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7616383 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively...
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7615335 |
Imaging methods
An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work...
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7615332 |
Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R 1 to R 5 are selected from the group consisting of...
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7614146 |
Method for fabricating circuit board structure
The present invention provides a circuit board structure and a method of fabricating circuit board structure the same, the circuit board structure consisting of a carrier board having a first...
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7612864 |
Exposure apparatus and method
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first...
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7611826 |
Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more...
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7611825 |
Photolithography method to prevent photoresist pattern collapse
A method comprises forming a BARC layer on a substrate, treating the BARC layer to make its surface hydrophilic, forming a photoresist layer on the treated BARC layer, exposing the photoresist...
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7611820 |
Positive resist composition and pattern-forming method using the same
A positive resist composition comprises:
(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; (B) a compound...
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7611819 |
Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
The present invention provides a resist composition which enables uniformly thickening a resist pattern with a resist pattern thickening material, regardless of the direction, spacing variations of...
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7611818 |
Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated bond, (C) a photopolymerization initiator and (D) a compound...
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7608390 |
Top antireflective coating composition containing hydrophobic and acidic groups
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7608386 |
Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
The present invention can provide a resist cover film-forming material which is suitably used for a resist cover film for liquid immersion exposure and can transmit ArF excimer laser lights and...
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7608383 |
UV radiation blocking protective layers compatible with thick film pastes
This invention relates to novel compositions comprising a protective polymer layer and a UV blocking agent. This is used in the fabrication of electronic devices using thick film pastes. The...
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7605390 |
Programmable photolithographic mask based on semiconductor nano-particle optical modulators
Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used...
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7604928 |
Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas...
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7604927 |
Methods of patterning using photomasks including shadowing elements therein and related systems
A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking...
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7604926 |
Method of manufacturing a semiconductor device
A method of manufacturing a semiconductor device, comprises forming a first mask pattern on an under-layer region, forming a plurality of dummy-line patterns on the under-layer region, the...
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7604925 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7604922 |
Process of surface treatment, surface treating device, surface treated plate, and electro-optic device, and electronic equipment
A process of providing a hydrophobic property to the surface of a plate, and a process of providing a hydrophilic property to the surface by irradiating energy light (radiation) on the surface of...
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7604912 |
Local flare correction
A correction of a local flare generated at a time of exposure when manufacturing a semiconductor device, wherein a substantial numerical aperture to a pattern in a region to be exposed is...
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7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern
An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions...
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7604909 |
Method for improved manufacturability and patterning of sub-wavelength contact hole mask
A method of applying optical proximity correction features to a mask having a target pattern comprising a plurality of features to be imaged. The method includes the steps of defining a set of...
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7604908 |
Fine pattern forming method
A fine pattern forming method includes the first step of depositing a plasma reaction products on a sidewall of a patterned mask layer to increase a pattern width thereof, the second step of...
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7604906 |
Films for prevention of crystal growth on fused silica substrates for semiconductor lithography
Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask...
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7603001 |
Method and apparatus for providing back-lighting in an interferometric modulator display device
Methods and apparatus for providing light in an interferometric modulator device are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent...
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7601486 |
Ultra dark polymer
A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark...
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7601485 |
Exposure method
An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the...
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7601483 |
Anti-reflective coatings using vinyl ether crosslinkers
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups...
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7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask ( 11 ) are calculated by first calculation unit ( 12 ) based on the relationship with...
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7601466 |
System and method for photolithography in semiconductor manufacturing
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer...
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7598023 |
Process for fabricating micro-display
A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an...
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7598022 |
Positive and negative dual function magnetic resist lithography
The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist...
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7598021 |
High resolution printing technique
A pattern having exceptionally small features is printed on a partially fabricated integrated circuit during integrated circuit fabrication. The pattern is printed using an array of probes, each...
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7598020 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7598019 |
Method for cleavage of labile functional groups from chemical compounds
The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical...
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7595496 |
Optimized correction of wafer thermal deformations in a lithographic process
A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern...
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7595145 |
Method of forming pattern of semiconductor device
A method of forming a pattern of a semiconductor device includes forming a hard mask layer over a semiconductor substrate and forming a photoresist film pattern over the hard mask layer. An outer...
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7595144 |
Sulfonate-containing anti-reflective coating forming composition for lithography
There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent....
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7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about...
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7595142 |
Pattern formation method
In a pattern formation method, a resist film is formed on a substrate, an alkali-soluble first barrier film is formed on the resist film and an alkali-insoluble second barrier film is formed on the...
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7595141 |
Composition for coating over a photoresist pattern
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for...
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7595136 |
Method of fabricating chrome-less phase shift mask
An embodiment of a method of fabricating a chrome-less phase shift mask includes forming a hard mask film on a surface of a mask body having a trench circuit area and a mesa circuit area. The hard...
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7594216 |
Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
A method of forming a mask pattern comprises the following steps. A second cell library is prepared by making process proximity effect correction with respect to cell patterns stored in a first...
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7592132 |
Method for fine pattern formation
In a method of effectively miniaturizing a resist pattern, a super fine pattern-forming method of restricting a film thickness of a crosslinked film and also preventing developing defects is...
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7592130 |
Exposure method
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern...
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