|
Match
|
Document |
Document Title |
|
|
7534550 |
Positive resist composition and process for formation of resist patterns
A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an...
|
|
|
7534553 |
Method for fabricating semiconductor device
A method for fabricating a semiconductor device is provided. The method includes: preparing a substrate defined as active regions and inactive regions and provided with a plurality of conductive...
|
|
|
7534552 |
Lithographic apparatus and device manufacturing method
In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus...
|
|
|
7534555 |
Plating using copolymer
Method of plating using a polymeric barrier layer including a polyphenolic polymer which has a repeating unit of the formula:
wherein R 1 , R 2 , R 3 , R 4 , and R 5 are individually hydrogen,...
|
|
|
7531287 |
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its...
|
|
|
7531294 |
Method for forming film pattern, method for manufacturing semiconductor device, liquid crystal television, and EL television
An object of the invention is to provide a method for manufacturing a semiconductor device having a semiconductor element with a minute structure, which can reduce a cost and improve throughput due...
|
|
|
7531295 |
Method and apparatus for lithographic imaging using asymmetric illumination
According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a...
|
|
|
7531297 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating...
|
|
|
7527917 |
Exposure method and exposure apparatus
For each of pattern projection regions, a mask and a substrate are moved in synchronization with each other in an X direction while projecting a portion of a mask pattern through an optical...
|
|
|
7527442 |
Process for forming resist pattern, and resist coating and developing apparatus
A process for forming a resist pattern according to the invention is a process for forming a resist pattern in which a photoresist is coated on a first substrate, the coated photoresist is exposed...
|
|
|
7524616 |
Applications of semiconductor nano-sized particles for photolithography
Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications,...
|
|
|
7524618 |
Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
In immersion exposure, a resist pattern forming method suppressing resist pattern defects comprises mounting a substrate formed a resist film thereon and a reticle formed a pattern thereon onto an...
|
|
|
7524593 |
Exposure mask
An exposure mask provided with a semi-transparent film, capable of forming a resist in which a convex portion is not formed in an end portion and the end portion has gentle shape. In an exposure...
|
|
|
7524591 |
Photomask and manufacturing method thereof, fabrication process of an electron device
A photomask made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip...
|
|
|
7521156 |
Photo mask and method of correcting the transmissivity of a photo mask
A photo mask for use in forming a pattern, such as a photoresist pattern, is corrected to compensate for discrepancies in the transmissivity of the photo mask which results in the pattern having a...
|
|
|
7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
|
|
|
7517632 |
Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed
An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of...
|
|
|
7517639 |
Seal ring arrangements for immersion lithography systems
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing...
|
|
|
7517618 |
Mask, exposure method and production method of semiconductor device
A mask capable of improving accuracy of transferring a pattern by making the configuration of a beam portion regular and simple, an exposure method using the mask and a production method of a...
|
|
|
7517633 |
Composition for forming gap-filling material for lithography
A composition for forming a gap-filling material for lithography which, as a gap-filling material for lithography superior in planarization ability on a substrate having irregularities such as...
|
|
|
7517621 |
Exposure method and method for manufacturing semiconductor device
An exposure method includes preparing a photomask having first and second main openings by which corresponding patterns are to be formed in a photo resist and first and second assist openings by...
|
|
|
7517637 |
Method of producing self-aligned mask in conjunction with blocking mask, articles produced by same and composition for same
A method of forming a self aligned pattern on an existing pattern on a substrate including applying a coating of a solution containing a masking material in a carrier, the masking material being...
|
|
|
7517638 |
Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line width
When a hole pattern is formed on a film to be processed, a matching deviation margin at a lithography step is reserved by making a diameter of a bottom of a hole substantially equal to a diameter...
|
|
|
7518128 |
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a...
|
|
|
7517636 |
Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
A photosensitive resin composition is here disclosed which satisfies the following (1) and (2):
(1) when a 1.0 wt % aqueous sodium carbonate solution is sprayed by a spray on a layer of the...
|
|
|
7514200 |
Hard mask composition for lithography process
An inorganic hard mask composition, which is useful in the manufacture of semiconductor devices. When an underlying layer pattern of a semiconductor device is formed, an inorganic hard mask film...
|
|
|
7514699 |
Method and device for irradiating spots on a layer
For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of...
|
|
|
7514199 |
Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same
Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include
(a) a first polymer prepared by the reaction of a...
|
|
|
7514115 |
Method of forming thin film of organometallic compound, thin film of organometallic compound, method of manufacturing organoelectronic device equipped with the same, organoelectronic device, method of manufacturing organic electroluminescence, organic electroluminescence, and electronic apparatus
Aspects of the invention can provide a method of fabricating an organometallic compound film capable, by stably forming a film with the organometallic compound, of increasing bonding forces of...
|
|
|
7510816 |
Silicon-containing resist composition and patterning process
A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution...
|
|
|
7507520 |
Composition for forming a conjugated polymer pattern and process of forming a conjugated polymer pattern using the same
The present invention relates to a composition for forming a conjugated polymer pattern and a pattern formation process. More specifically, the present invention relates to a composition for...
|
|
|
7507519 |
Pattern forming method, wiring pattern forming method, electro-optical device, and electronic apparatus
Aspects of the invention can provide a patterning forming method capable of patterning a thin film by a simple and inexpensive device. The thin film can be provided on a base member including a...
|
|
|
7509623 |
Manufacturing method of semiconductor device
A pattern correction method executed by a computer includes a first correction and a second correction. The first correction is executed by calculating a correction value, in consideration for an...
|
|
|
7504194 |
Positive resist composition and pattern making method using the same
A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when...
|
|
|
7504191 |
Photosensitive resin composition and method for the formation of a resin pattern using the composition
A photosensitive resin composition and a method for the formation of a resin pattern using the photosensitive resin composition are provided. The photosensitive resin composition contains, as a...
|
|
|
7504198 |
Methods for enhancing resolution of a chemically amplified photoresist
Methods are provided for enhancing resolution of a chemically amplified photoresist. A film comprising a photoacid generator and a polymer comprising functional groups bonded to protecting moieties...
|
|
|
7504038 |
System, method, and apparatus for mechanically releasable slider processing including lapping, air bearing patterning, and debonding
A mechanically releasable slider process utilizes silicone rubber or PDMS to take the function of a planarization material for individual sliders or slider rows. Mechanical debonding takes...
|
|
|
7501215 |
Device manufacturing method and a calibration substrate
The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the...
|
|
|
7501226 |
Immersion lithography system with wafer sealing mechanisms
An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a...
|
|
|
7498124 |
Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process
A method and apparatus for developing a resist on a substrate in which a sacrificial surfactant-containing liquid is first applied to a resist as a pretreatment to reduce developing process defects...
|
|
|
7498118 |
Apparatus for removing liquid in immersion lithography process and method of immersion lithography
An apparatus for removing an immersion lithography liquid and a method of immersion lithography are disclosed, that rapidly and easily remove liquid from a wafer before development and after...
|
|
|
7498737 |
Method of manufacturing an organic electronic device and organic electronic device
The invention discloses a method for manufacturing an organic electro-luminescent display device, the method comprising the steps of: providing a light-permeable substrate; arranging a plurality of...
|
|
|
7498119 |
Process for forming a feature by undercutting a printed mask
A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask,...
|
|
|
7498105 |
Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask
A method for checking a phase shift angle of a PSM is described. A calibration curve of a characteristic value of lithography performance with respect to the phase shift angle of a type of PSM is...
|
|
|
7494759 |
Positive resist compositions and process for the formation of resist patterns with the same
A positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the component (A) is a copolymer which comprises constituent units (a1) derived from a...
|
|
|
7494765 |
Method for patterning photoresist pillars using a photomask having a plurality of chromeless nonprinting phase shifting windows
A method for patterning a photoresist using a photomask to form an integrated circuit, the photomask including a first area transmitting light in a first phase surrounded by a second area, the...
|
|
|
7491648 |
Method of patterning a photoresist film using a lithographic
Method for patterning a photoresist film in lithographic process including the steps of: coating the photoresist film on a substrate provided with an under layer; exposing the substrate; firstly...
|
|
|
7488569 |
Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1):
is contained in a structure of the...
|
|
|
7485410 |
Method of manufacturing thick dielectric pattern and method of manufacturing image displaying apparatus
A method of manufacturing a thick dielectric pattern disposed on a substrate. A first precursor layer is formed by imparting a first photosensitive dielectric paste, including a dielectric...
|
|
|
7485573 |
Process of making a semiconductor device using multiple antireflective materials
A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the...
|