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7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask ( 11 ) are calculated by first calculation unit ( 12 ) based on the relationship with...
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7603001 |
Method and apparatus for providing back-lighting in an interferometric modulator display device
Methods and apparatus for providing light in an interferometric modulator device are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent...
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7601486 |
Ultra dark polymer
A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark...
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7601466 |
System and method for photolithography in semiconductor manufacturing
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer...
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7601485 |
Exposure method
An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the...
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7598023 |
Process for fabricating micro-display
A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an...
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7598021 |
High resolution printing technique
A pattern having exceptionally small features is printed on a partially fabricated integrated circuit during integrated circuit fabrication. The pattern is printed using an array of probes, each...
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7598020 |
Exposure apparatus and method
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the...
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7598019 |
Method for cleavage of labile functional groups from chemical compounds
The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical...
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7598022 |
Positive and negative dual function magnetic resist lithography
The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist...
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7595144 |
Sulfonate-containing anti-reflective coating forming composition for lithography
There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent....
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7595145 |
Method of forming pattern of semiconductor device
A method of forming a pattern of a semiconductor device includes forming a hard mask layer over a semiconductor substrate and forming a photoresist film pattern over the hard mask layer. An outer...
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7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about...
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7595496 |
Optimized correction of wafer thermal deformations in a lithographic process
A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern...
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7595136 |
Method of fabricating chrome-less phase shift mask
An embodiment of a method of fabricating a chrome-less phase shift mask includes forming a hard mask film on a surface of a mask body having a trench circuit area and a mesa circuit area. The hard...
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7595141 |
Composition for coating over a photoresist pattern
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for...
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7595142 |
Pattern formation method
In a pattern formation method, a resist film is formed on a substrate, an alkali-soluble first barrier film is formed on the resist film and an alkali-insoluble second barrier film is formed on the...
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7592130 |
Exposure method
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern...
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7592129 |
Method for forming photoresist pattern and method for manufacturing semiconductor device
With the objective of suppressing resist pattern collapse generated at dry etching, energy rays are applied to a photoresist structure including an antireflection film provided on a base and a...
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7592124 |
Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the...
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7592119 |
Photosensitive polyimide resin composition
The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even...
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7592127 |
Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
The present invention provides a resist pattern thickening material and the like which can thicken a resist pattern and form a fine space pattern. The resist pattern thickening material contains: a...
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7594216 |
Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
A method of forming a mask pattern comprises the following steps. A second cell library is prepared by making process proximity effect correction with respect to cell patterns stored in a first...
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7592132 |
Method for fine pattern formation
In a method of effectively miniaturizing a resist pattern, a super fine pattern-forming method of restricting a film thickness of a crosslinked film and also preventing developing defects is...
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7588878 |
Inkless printing paper and method
An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photoacid generator and an acid-base indicator. In...
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7588870 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
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7588877 |
Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a...
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7588795 |
Manufacturing method of OLED display and apparatus for manufacturing the OLED display
A manufacturing method of an active matrix organic light emitting diode (AMOLED) display and an apparatus for manufacturing the AMOLED display, where the display has improved surface flatness and...
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7588865 |
Photo mask and method for manufacturing patterns using the same
A photo mask, which has subsidiary patterns added into holes formed through a plurality of ring gate patterns having vertically symmetrical structures used in a semiconductor exposure step, such...
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7588883 |
Method for forming a gate and etching a conductive layer
A method for forming a gate and a method for etching a conductive layer are provided. First, a substrate is provided, including a dielectric layer and a conductive layer on its surface in order....
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7588867 |
Reflection mask, use of the reflection mask and method for fabricating the reflection mask
A reflection mask that includes a structure ( 20 ) for lithographically transferring a layout onto a target substrate, in particular for use in EUV lithography, and a reflective multilayer...
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7588879 |
Graded spin-on organic antireflective coating for photolithography
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a...
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7588881 |
Method of making thin film transistor liquid crystal display
A thin film transistor liquid array substrate includes forming a plurality of amorphous silicon thin film transistors and storage capacities on a transparent substrate, wherein the amorphous...
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7588884 |
Method for enhancing wafer alignment marks
A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for...
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7585113 |
Micro-electro mechanical systems switch and method of fabricating the same
A MEMS switch and a method of manufacturing the same are disclosed. The MEMS switch includes: a substrate including a trench, a ground line and a signal line having an opened portion; a moving...
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7585615 |
Composite photoresist for modifying die-side bumps
A composite photoresist comprises a photoresist material and a filler material dispersed within the photoresist material, wherein the filler material includes a plurality of nanoparticles. The...
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7585596 |
Micro-sculpting using phase masks for projection lithography
Methods and systems of creating a photo-mask to form continuous relief micro-structures in photo-active material. This technology uses a basic amplitude mask or electron-beam to create a binary...
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7585614 |
Sub-lithographic imaging techniques and processes
A method of patterning which provides images substantially smaller than that possible by lithographic techniques is provided. In the method of the invention, a substrate has a memory layer and a...
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7582884 |
Charged particle beam exposure method and charged particle beam exposure device
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block...
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7582404 |
Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP comprising the PDP electrode
A photosensitive paste composition is provided. The photosensitive paste composition contains conductive powder, an inorganic binder, and an organic vehicle, wherein, assuming that 10% by weight of...
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7582394 |
Photomask and method for forming pattern
A photomask includes, on a translucent substrate, three or more first light-shielding portions each in insular shape having a property of shielding exposure light and spaced equidistantly, a second...
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7582411 |
Antireflective film and exposure method
An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a...
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7582412 |
Multilayer photoresist systems
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing...
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7579135 |
Lithography apparatus for manufacture of integrated circuits
An immersion lithographic system 10 comprises an optical surface 51 , an immersion fluid 60 contacting at least a portion of the optical surface, and a semiconductor structure 80 having a...
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7579138 |
Method for forming micropattern
The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be...
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7575848 |
Image recording media and image layers
Imaging layers, image recording media, and methods of preparation of each, are disclosed.
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7575847 |
Low refractive index composition comprising fluoropolyether urethane compound
Antireflective films and low refractive index compositions are described. The low refractive index layer comprises the reaction product of a composition comprising at least one free-radically...
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7575853 |
Method of forming thin film pattern and method of forming magnetoresistive element
The present invention provides a thin film pattern forming method capable of forming a thin film pattern having small dimensions at higher precision. A thin film pattern forming method of the...
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7575852 |
Method of optically transferring a pattern from a mask having advanced oriented assist features for integrated circuit hole patterns
An oriented assist feature is described that permits transferring of a lithographic pattern corresponding to an integrated circuit from a mask onto a semiconductor substrate. The oriented assist...
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