|
Match
|
Document |
Document Title |
|
|
6982141 |
Semiconductor device and manufacturing method thereof
A GaAs substrate 200 is rotated, a photosensitive silicone resist 260 is applied on a surface of the GaAs substrate 200 on which an aperture of a hole 310 to be a via hole, and an inside of...
|
|
|
6982135 |
Pattern compensation for stitching
A method for transferring a pattern from a mask to a substrate (or wafer), comprises dividing a mask generation data file into a plurality of segments. The segments include a main pattern area and...
|
|
|
6982022 |
Formation of photopatterned ink jet nozzle plates by transfer methods
Disclosed is a process for forming a novel ink jet printhead which comprises: (a) providing a lower substrate in which one surface thereof has an array of drop generating elements and addressing...
|
|
|
6983444 |
Mask for reducing proximity effect
The present invention discloses a mask for reducing the proximity effect. The mask comprises a plurality of line-shaped features, a plurality of first assist features positioned between the...
|
|
|
6982138 |
Method of controlling removal of photoresist in openings of a photoresist mask
A method of controlling removal of photoresist in openings of a photoresist mask has the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a...
|
|
|
6979525 |
Method of manufacturing electronic device
A method of manufacturing an electronic device that includes the step of forming a pattern on a substrate by using a halftone phase shift mask where the halftone phase shift mask includes a...
|
|
|
6977134 |
Manufacturing method of a MOSFET gate
A manufacturing method for a MOSFET gate structure. The method comprises providing a substrate, sequentially depositing a pad layer and a dielectric layer thereon, defining a gate trench passing...
|
|
|
6977126 |
Pellicle, photomask, pellicle frame, and method for manufacturing pellicle
A pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising: a pellicle film having a...
|
|
|
6977133 |
Photomask and pattern forming method
A photomask is used for transferring a mask pattern onto a semiconductor substrate. The mask pattern includes a junction at which two line patterns are connected to each other with one line pattern...
|
|
|
6977135 |
Photosensitive material for immersion photolithography
When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure...
|
|
|
6974653 |
Methods for critical dimension and focus mapping using critical dimension test marks
Methods for using critical dimension test marks (test marks) for the rapid determination of the best focus position of lithographic processing equipment and critical dimension measurement analysis...
|
|
|
6975443 |
Multi-beam pattern generator
A scanning pattern generator and a method for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate ( 11 ), the system comprising a light source ( 1 ),...
|
|
|
6974658 |
HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula...
|
|
|
6973637 |
Process for the selective control of feature size in lithographic processing
The present invention provides a non-global process for designing an integrated circuit layout. The process comprises locating an isolated layout feature of an integrated circuit layout and...
|
|
|
6973636 |
Method of defining forbidden pitches for a lithography exposure tool
A method of identifying and defining forbidden pitches or forbidden pitch ranges for a lithographic exposure tool under a given set of exposure conditions is provided. In the method, a computer...
|
|
|
RE38900 |
Automating photolithography in the fabrication of integrated circuits
Automated photolithography of integrated circuit wafers is enabled with a processor connected to a Rayleigh derator, a form factor generator, a logic synthesizer, a layout generator, a lithography...
|
|
|
6969538 |
Method for heat processing of substrate
The present invention relates to a method for heat processing a substrate. After a coating film is formed on the substrate, the substrate is baked at a predetermined high temperature. The baking...
|
|
|
6967068 |
Method of controlling stepper process parameters based upon optical properties of incoming anti-reflecting coating layers, and system for accomplishing same
A method comprised of forming a process layer above a wafer, forming an ARC layer above the process layer, determining at least one optical characteristic of the ARC layer, and determining, based...
|
|
|
6964837 |
Utilization of beam crosslinkable polymer compositions as data recording medium
The present invention relates to the use of at least one radiation crosslinkable, preferably UV crosslinkable, polymer composition as a data recording medium, especially in the form of what are...
|
|
|
6964032 |
Pitch-based subresolution assist feature design
A method of designing a mask for imaging an integrated circuit (IC) design layout is provided to efficiently configure subresolution assist features (SRAFs) corresponding to an optimally configured...
|
|
|
6962770 |
Method of manufacturing an electroconductive film, and an apparatus including it
In a method of manufacturing an electroconductive film, a developing process is implemented on a photosensitive paste layer ( 12 ) having a height of about 13 μm in a state where exposure is...
|
|
|
6960415 |
Aberration measuring method and projection exposure apparatus
A method of measuring aberration of a projection optical system. The method includes the steps of imaging a test pattern through the projection optical system, and measuring a potential deviation...
|
|
|
6958292 |
Method of manufacturing integrated circuit
In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure...
|
|
|
6955993 |
Mask and method for making the same, and method for making semiconductor device
A mask capable of alignment by the TTR system and complementary division and having a high strength, a method of production of the same, and a method of production of a semiconductor device having...
|
|
|
6953643 |
Mask shaping using temporal and spatial coherence in ultra high resolution lithography
Mask Shaping using temporal and spatial Coherence for Ultra High Resolution Lithographic imaging and printing refers to methods and apparatus that can be adopted to print near-ideal images of basic...
|
|
|
6951708 |
Method of forming photosensitive film pattern
The present invention relates to a method of forming a photosensitive film pattern. It provides a method of forming a photosensitive film pattern capable of performing a photolithography process by...
|
|
|
6952818 |
Method and system for optical proximity correction
A computer implemented method for OPC includes: storing an improper OPC pattern and a corrective treatment for the improper OPC pattern in a library storage medium; reading a layout pattern; and...
|
|
|
6949325 |
Negative resist composition with fluorosulfonamide-containing polymer
A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae:
...
|
|
|
6946666 |
Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
An exposure apparatus for irradiating exposure light onto a surface of an object to be exposed applied with a resist to form a pattern on the surface, wherein near-field light is used as the...
|
|
|
6942958 |
Modifying circuitry features in radiation sensitive layers with active secondary exposure masks
A mask having a pattern to modify a circuitry feature that has been exposed in a radiation sensitive layer by transmitting modifying radiation to a region of the radiation sensitive layer...
|
|
|
6939649 |
Fabrication method of semiconductor integrated circuit device and mask
A method of fabrication of a semiconductor integrated circuit device uses a mark having, on a first main surface of a mask substrate, a first light transmitting region, a second light transmitting...
|
|
|
6939664 |
Low-activation energy silicon-containing resist system
Inventive silsesquioxane polymers are provided, and resist compositions that contain such silsesquioxane polymers are provided in which at least a portion of the silsesquioxane polymer contains...
|
|
|
6939665 |
System and methods for manufacturing a molecular film pattern
The invention provides an organic silane molecular film, having a thickness of 3 nm or less and an aromatic hydrocarbon group as a part of the molecular structure of the film that is formed on the...
|
|
|
6938238 |
Method of manufacturing electronic device
In a method of forming a circuit pattern including fine pattern features and fine space, a hard mask layer is patterned with a first pattern defined by eliminating the fine space for merging the...
|
|
|
6936402 |
MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a...
|
|
|
6936407 |
Thin-film electronic device module
In an embodiment of this invention, an encapsulated electronic thin-film device includes a substrate and an active area is fabricated on the substrate. The active area is comprised of at least one...
|
|
|
6936405 |
Organic polymeric antireflective coatings deposited by chemical vapor deposition
An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing...
|
|
|
6933098 |
Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
This invention relates to an electrophoretic display or a liquid crystal display and novel processes for its manufacture. The electrophoretic display (EPD) of the present invention comprises...
|
|
|
6933247 |
Method for forming a minute pattern and method for manufacturing a semiconductor device using the same
A method for forming a minute pattern includes forming a mask layer on an object being patterned. The mask layer is patterned to form a first mask pattern having a first width larger than a...
|
|
|
6928746 |
Drying resist with a solvent bath and supercritical CO2
A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath...
|
|
|
6929896 |
Onium salts and the use therof as latent acids
A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as...
|
|
|
6930757 |
Managing method of exposure apparatus, managing method of mask, exposure method, and manufacturing method of semiconductor device
There is disclosed a managing method of an exposure apparatus comprising selecting one or more exposure apparatuses out of a plurality of the exposure apparatuses for each a predetermined partial...
|
|
|
6929900 |
Tamper-responding encapsulated enclosure having flexible protective mesh structure
A structure and method for forming a tamper respondent electronic circuit enclosure that includes an integrated circuit structure, a mesh structure surrounding the integrated circuit structure, and...
|
|
|
6927012 |
Polyamic acid resin composition
Provided is a polyamic acid resin composition for formation of a bank, which provides excellent film characteristics and adhesion to a substrate, which can undergo patterning with use of a positive...
|
|
|
6924078 |
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being...
|
|
|
6924090 |
Method of recording identifier and set of photomasks
A method of recording different identifiers, each including at least one character, on multiple plate-type members, involves the use of a photomask of a first type and at least two photomasks of a...
|
|
|
6921626 |
Nanopastes as patterning compositions for electronic parts
The present invention provides methods of making an electronic part in which a nanopaste composed of inorganic nanoparticles and a carrier is applied onto a surface of a substrate. The composition...
|
|
|
6919158 |
Conductive pattern material and method for forming conductive pattern
There are provided a conductive pattern material and a pattern-forming method by which a fine pattern having a high resolution and no wire breakage is obtained. The conductive pattern material is...
|
|
|
6919153 |
Dose monitoring method and manufacturing method of semiconductor device
There is disclosed a dose monitor method comprising illuminating a mask with illumination light, which is disposed in a projection exposure apparatus and in which a dose monitor pattern is formed,...
|
|
|
6919146 |
Planar reticle design/fabrication method for rapid inspection and cleaning
A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material.
|