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7022607 |
Mask and its manufacturing method, and method for manufacturing semiconductor device
To provide a mask able to reduce the thickness of a membrane and maintain the mask strength and a method of producing a semiconductor device able to form a fine pattern with a high accuracy and a...
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7022558 |
Method of manufacturing an active matrix substrate and an image display device using the same
The present invention provides a manufacturing method of a high performance active matrix substrate at a high throughput with a less expensive apparatus, and an image display device using the...
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7022462 |
Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board
A photosensitive resin composition comprising (A) a carboxyl group-containing binder polymer which contains styrene or a styrene derivative as a copolymerized constituent, (B) a...
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7022464 |
Integral plated resistor and method for the manufacture of printed circuit boards comprising the same
An integral plated resistor having an improved range of resistance is produced by uniformly dispersing an effective amount of various particles in an electroless nickel phosphorus plating...
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7022455 |
Photoacid-labile polymers and photoresists comprising same
The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an...
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7018753 |
Variable mask field exposure
A method of fabricating integrated circuits according to a first design by imaging a first layer on a substrate using a first mask having a block of first patterns in common with a second design,...
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7018781 |
Method for fabricating a contact hole plane in a memory module
Disclosed is a method for fabricating a contract hole plane in a memory module with an arrangement of memory cells each having a selection transistor. The methods can be utilized during the...
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7018481 |
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first...
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7016015 |
Lithographic apparatus and device manufacturing method
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate...
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7014986 |
Writing device and writing method
A writing device is provided which, in simple processes, can write in two dimensions and three dimensions, and which can form highly accurate patterns. An exposure head, a conductive material...
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7014962 |
Half tone alternating phase shift masks
A structure, a method of fabricating and a method of using a phase shift mask (PSM) having a first phase shifted section, a half tone section, and a second phase shifted section. The first phase...
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7011923 |
Negative photoresist and method of using thereof
A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The negative photoresist composition comprises a radiation sensitive...
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7011931 |
Electrode for plasma display panel and process for producing the same
A process for forming an electrode pattern for a plasma display panel, the process including coating a photosensitive conductive paste on a film to form a pattern forming layer, laminating the film...
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7011929 |
Method for forming multiple spacer widths
A method of forming pluralities of gate sidewall spacers each plurality comprising different associated gate sidewall spacer widths including providing a plurality of gate structures formed...
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7011936 |
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools
A method for structuring photoresists and a corresponding photolithography mask utilize a principal structure and an auxiliary structure. In addition to the principal structure to be imaged, the...
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7008754 |
Method for forming image on object surface including circuit substrate
By using a novel method, the exposure time of the photosensitive paste layer is reduced and the exposure fineness of the layer is improved, thereby developing a highly fine circuit substrate of...
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7008733 |
Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle
A method of forming a plurality of isolated and closed patterns arranged in an array in a photoresist layer. A phase shift mask is provided. A plurality of first phase shift transparent regions, a...
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7008749 |
High resolution resists for next generation lithographies
The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic...
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7008756 |
Method of fabricating an X/Y alignment vernier
A two dimensional vernier is provided along with a method of fabrication. The two dimensional vernier has a reference array patterned into a substrate, or a material overlying the substrate. An...
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7008866 |
Large-scale trimming for ultra-narrow gates
Large-scale trimming for forming ultra-narrow gates for semiconductor devices is disclosed. A hard mask layer on a semiconductor wafer below a patterned soft mask layer on the semiconductor wafer...
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7008758 |
Method of forming a patterned film of surface-modified carbon nanotubes
Disclosed herein is a method of forming a negative pattern of carbon nanotubes through: modifying the surfaces of carbon nanotubes to have double bond-containing functional group capable of...
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7008731 |
Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask
A method of manufacturing a photomask includes determining dimensions of a pattern in a photomask, determining an exposure latitude on the basis of the dimensions of the mask, and judging if the...
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7005219 |
Defect repair method employing non-defective pattern overlay and photoexposure
A method for repairing a defective photomask having contained therein a minimum of one defect within a defective pattern employs a non-defective photomask for purposes of photoexposing a...
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7005228 |
Polymers, resist compositions and patterning process
A ternary copolymer comprising units of α-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of α-trifluoromethylacrylic carboxylate having adhesive groups...
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7005240 |
Method for forming a hard mask in a layer on a planar device
A hard mask is produced from spacer structures. The spacer structures are formed from a conformal deposition on elevated structures produced lithographically in a projection process. The conformal...
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7005241 |
Process for making circuit board or lead frame
A process for making a circuit board comprises the following steps of: half-etching a metal layer formed on an insulating substrate by means of a first masking which is positioned on an upper...
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7005236 |
Maintaining photoresist planarity at hole edges
Maintaining photoresist thickness and uniformity over a substrate that includes various cavities presents problems, such as preventing distortion of features in the resist image close to cavity...
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7005237 |
Method of making information storage devices by molecular photolithography
A photolithographic method of making an information storage device having different storage characteristics at a plurality of discrete memory locations thereon, comprises the steps of: (a)...
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7001713 |
Method of forming partial reverse active mask
A method of forming a partial reverse active mask. A mask pattern comprising a large active region pattern with an original dimension and a small active region pattern is provided. The large active...
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7001853 |
Flow control of photo-polymerizable resin
This invention provides methods and systems, e.g., to control the flow of photo-polymerizable resins. In the method, e.g., flow of a photo-polymerizable resin is restricted from illuminated resin...
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7002165 |
Apparatus and method for repairing resist latent images
A method and an apparatus for repairing resist latent image on a wafer are disclosed. In the method, an image scanner equipped with a first and a second wafer carrier, and a primary imaging column...
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6998215 |
Negative resist process with simultaneous development and chemical consolidation of resist structures
A process for producing amplified negative resist structures that includes exposing and contrasting of a resist then simultaneously developing and amplifying the resist to form the amplified resist...
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6998225 |
Method of producing compound semiconductor device
A method of producing a compound semiconductor device using a lift-off process. The lift-off process includes forming a resist mask having an electrode opening on an active layer of a compound...
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6998221 |
Method for forming a via in a substrate
The present invention provides a method for forming a via (e.g., a trench, via or contact) in a substrate. The method, in one embodiment of the invention, includes patterning an opening 220 in a...
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6998226 |
Method of forming patterned photoresist layer
A method of forming a patterned photoresist layer. First, an anti-reflection coating layer is formed on a substrate. Next, a first bake is performed. A photoresist layer is then formed on the...
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6998220 |
Method for the production of thin layer chip resistors
A method for manufacturing thin-film chip resistors, in which method a resistor layer ( 14 ) and a contact layer ( 15, 16 ) are applied onto the upper surface of a substrate ( 10 ) and structured...
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6998222 |
Producing an electrically-conductive structure on a non-planar surface
A method for producing an electrically conductive structure on a non-planar surface includes depositing a photosensitive resist coating onto the non-planar surface, exposing the photosensitive...
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6994948 |
Aqueous developable photoimageable thick film compositions
A photoimageable composition comprising finely divided particles of inorganic material comprising coated silver particles that are at least partially coated with at least one surfactant and...
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6995830 |
Lithographic projection apparatus and device manufacturing method
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection...
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6994939 |
Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
A method and system of making a mask with a transparent substrate thereon is provided. A first resolution enhancement structure is formed on the first portion of the transparent substrate. A second...
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6994950 |
Method for integrating micro- and nanoparticles into MEMS and apparatus including the same
MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate,...
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6992753 |
Projection optical system
Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values H D for lenses and at least one lens made of a material having...
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6989229 |
Non-resolving mask tiling method for flare reduction
Photoresist on a wafer is exposed using tiles on a mask that improve flare performance. Features that are not to be exposed on the photoresist correspond to features on the mask. The various...
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6989228 |
Method and apparatus for processing samples
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for...
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6986971 |
Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same
An EUV mask ( 10 ) includes an opening ( 26 ) that helps to attenuate and phase shift extreme ultraviolet radiation using a subtractive rather than additive method. An etch stop layer ( 20 ) may be...
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6982141 |
Semiconductor device and manufacturing method thereof
A GaAs substrate 200 is rotated, a photosensitive silicone resist 260 is applied on a surface of the GaAs substrate 200 on which an aperture of a hole 310 to be a via hole, and an inside of...
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6982135 |
Pattern compensation for stitching
A method for transferring a pattern from a mask to a substrate (or wafer), comprises dividing a mask generation data file into a plurality of segments. The segments include a main pattern area and...
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6982022 |
Formation of photopatterned ink jet nozzle plates by transfer methods
Disclosed is a process for forming a novel ink jet printhead which comprises: (a) providing a lower substrate in which one surface thereof has an array of drop generating elements and addressing...
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6983444 |
Mask for reducing proximity effect
The present invention discloses a mask for reducing the proximity effect. The mask comprises a plurality of line-shaped features, a plurality of first assist features positioned between the...
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6982138 |
Method of controlling removal of photoresist in openings of a photoresist mask
A method of controlling removal of photoresist in openings of a photoresist mask has the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a...
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