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9046792 Projection exposure tool for microlithography and method for microlithographic imaging  
A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine...
9040212 Endpoint detection for photolithography mask repair  
A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is...
9034542 Method and system for forming patterns with charged particle beam lithography  
In a method for fracturing or mask data preparation or mask process correction for charged particle beam lithography, a plurality of shots are determined that will form a pattern on a surface,...
9029050 Method for repairing a mask  
The present disclosure provides a method of repairing a mask. The method includes inspecting the mask using a mask inspection tool to identify a defect on a circuit pattern of the mask; repairing...
9032340 Layout decomposition method and method for manufacturing semiconductor device applying the same  
A layout decomposition method and a method for manufacturing a semiconductor device applying the same are provided. According to the layout decomposition method, a design layout is received by the...
9032342 Method and apparatus for alignment optimization with respect to plurality of layers  
A method of patterning a plurality of layers of a work piece in a series of writing cycles in one or a plurality of write machines, the workpiece being deviced to have a number of N layers and...
9021405 Layout method and method of manufacturing semiconductor device  
A plurality of gate electrode patterns to be laid out in parallel are alternately set as first patterns to be formed in a first exposure step of double patterning and as second patterns to be...
9017904 Methods of providing photolithography patterns using feature parameters  
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a...
9017903 Mask overlay control  
Some embodiments of the present disclosure relate to a method of patterning a workpiece with a mask, wherein a scale factor between a geometry of the mask and a corresponding target shape of the...
9005882 Reticle defect correction by second exposure  
Correction of reticle defects, such as EUV reticle defects, is accomplished with a second exposure. Embodiments include obtaining a reticle with a first pattern corresponding to a design for a...
8999627 Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp  
The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly...
8999628 Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems  
The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly...
8997027 Methods for modifying an integrated circuit layout design  
Methods for modifying a layout design of an integrated circuit using model-based retargeting are provided. In one embodiment, a method for modifying an integrated circuit layout design includes...
8986922 Adjusting optical properties of optical thin films  
An optical thin film can have a refractive index variation along a dimension that is perpendicular to its thickness. Two areas that have equal physical thicknesses can have different optical...
8984452 Long-range lithographic dose correction  
A method of quantifying a lithographic proximity effect and determining a lithographic exposure dosage is disclosed. In an exemplary embodiment, the method for determining an exposure dosage...
8984449 Dynamically generating jog patches for jog violations  
Systems, methods, and other embodiments associated with dynamically generating jog patches are described. In one embodiment, a method includes determining a virtual edge within metal of a design...
8984453 Method and system for creation of binary spatial filters  
Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial...
8976355 Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods  
A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction...
8972910 Routing method  
A method includes generating one or more routes usable for implementing a conductive path of an integrated circuit. A corresponding cost function value for the one or more routes is calculated...
8966409 Methods of forming a mask and methods of correcting intra-field variation across a mask design used in photolithographic processing  
A method of forming a mask includes creating a difference map between a desired intra-field pattern that is to be formed on substrates and an intra-field signature pattern. The intra-field...
8956791 Exposure tolerance estimation method and method for manufacturing semiconductor device  
According to one embodiment, an exposure tolerance estimation method is disclosed. The method can include setting a plurality of regions along a first surface of a substrate. The method can form a...
8956789 Methods for fabricating integrated circuits including multi-patterning of masks for extreme ultraviolet lithography  
Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes patterning a first photoresist layer overlying a mask blank that...
8959465 Techniques for phase tuning for process optimization  
Techniques are provided for determining how thick or how deep to make the phased regions of a lithography mask. One example embodiment provides a method that includes: providing a first mask...
8951698 Method for forming pattern and method for producing original lithography mask  
A method forming a pattern includes a process in which self-assembly material is formed on the substrate where on which a fiducial mark is formed, and the self-assembly material is separated in...
8954900 Multi-patterning mask decomposition method and system  
A portion of a layout of a single layer of an integrated circuit is to be multi-patterned. The patterns are divided into first and second groups, to be patterned on the single layer by a first...
8945803 Smart subfield method for E-beam lithography  
The present disclosure provides a method of improving a layer to layer overlay error by an electron beam lithography system. The method includes generating a smart boundary of two subfields at the...
8945801 Method for creating mask data, program, information processing apparatus, and method for manufacturing mask  
Data regarding a first corrected patterns on a single cell corrected such that an evaluation value of a pattern formed on a substrate after an image of a pattern of the single cell is projected...
8945800 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program  
In a multiple patterning techniques, where two or more exposures are used to form a single layer of a device, the splitting of features in a single layer between the multiple exposures is carried...
8949750 Method and system for forming a diagonal pattern using charged particle beam lithography  
A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots,...
8945802 Flare-measuring mask, flare-measuring method, and exposure method  
A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a...
8946631 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching...
8935639 Natively color-aware double patterning technology (DPT) compliant routing  
A route technique includes: receiving an input specifying a plurality of semiconductor device components and their logical connections; determining route information pertaining to a plurality of...
8921017 Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate  
The present invention relates to a multilayer substrate containing a substrate and a multilayer film provided on the substrate, in which a concave or convex fiducial mark that indicates a fiducial...
8921016 Methods involving color-aware retargeting of individual decomposed patterns when designing masks to be used in multiple patterning processes  
One illustrative method disclosed herein includes the steps of decomposing an initial overall target exposure pattern into at least a first decomposed sub-target pattern and a second decomposed...
8921013 System and method for test pattern for lithography process  
A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second...
8918744 Substrate-topography-aware lithography modeling  
Described herein is a method for simulating an image formed within a resist layer on a substrate resulting from an incident radiation, the substrate having a first feature and a second feature...
8916316 Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank  
The present invention relates to a reflective mask blank containing in this order, a substrate, a multilayer reflective film that reflects exposure light, and an absorber layer that absorbs the...
8916315 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography  
In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed,...
8910091 Method, program product and apparatus for performing double exposure lithography  
A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process is disclosed. The...
8906585 Method of manufacturing semiconductor device and exposure device  
A method of manufacturing a semiconductor device in which the alignment accuracy of an immersion exposure device is maintained even when exposure steps are carried out intermittently. In the...
8900777 Apparatus and method for lithography patterning  
An apparatus and method for lithography patterning is disclosed. An exemplary method includes receiving a first mask. The method further includes receiving a defect map, the defect map identifying...
8900778 Method for forming circular patterns on a surface  
A method for forming patterns on a surface using charged particle beam lithography is disclosed, in which a stencil is provided comprising first and second apertures, where circular or...
8904316 Method and apparatus for printing high-resolution two-dimensional periodic patterns  
A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping...
8895212 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages  
In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein...
8890099 Radiation source and method for lithographic apparatus for device manufacture  
A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of...
8887104 Correction for flare effects in lithography system  
A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic...
8883375 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes  
In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a...
8883380 Film exposure method  
On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored...
8877410 Data process for E-beam lithography  
The present disclosure provides a dithering method of increasing wafer throughput by an electron beam lithography system. The dithering method generates an edge map from a vertex map. The vertex...
8871409 Lithographic targets for uniformity control  
A photo mask having a first set of patterns and a second set of patterns is provided in which the first set of patterns correspond to a circuit pattern to be fabricated on a wafer, and the second...