|
Match
|
Document |
Document Title |
|
|
7620931 |
Method of adding fabrication monitors to integrated circuit chips
An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit...
|
|
|
7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
A method of generating a mask is provided that optimizes the placement and shape of optical proximity correction (OPC) features such as scattering bars. According to some aspects, the method...
|
|
|
7619717 |
Method for performing a focus test and a device manufacturing method
The invention relates to a method for a focus test. The method includes performing a first projection by using a radiation beam to project a first reference mark onto a substrate to generate a...
|
|
|
7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during...
|
|
|
7617473 |
Differential alternating phase shift mask optimization
A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width....
|
|
|
7614031 |
Drawing apparatus with drawing data correction function
A data correcting apparatus is for correcting drawing data representing a drawing pattern included in a quadrangular drawing area of a drawing subject. The correction process is based on an ideal...
|
|
|
7611810 |
Charged beam processing apparatus
A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality...
|
|
|
7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including...
|
|
|
7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern...
|
|
|
7604912 |
Local flare correction
A correction of a local flare generated at a time of exposure when manufacturing a semiconductor device, wherein a substantial numerical aperture to a pattern in a region to be exposed is...
|
|
|
7604910 |
Exposure mask, method of forming resist pattern and method of forming thin film pattern
An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions...
|
|
|
7603648 |
Mask design using library of corrections
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a...
|
|
|
7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask ( 11 ) are calculated by first calculation unit ( 12 ) based on the relationship with...
|
|
|
7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a...
|
|
|
7598098 |
Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material
The aim of the invention is to create a simple monitoring or testing method for monitoring a reduction in thickness as material is removed from a bonded semiconductor wafer pair, which prevents...
|
|
|
7598007 |
Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method
A reticle of the present invention has a main pattern ( 11 ) and a monitor pattern ( 12 ) each having a different thickness of a light-shielding film ( 4 ), the light-shielding film ( 4 ) of the...
|
|
|
7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer
A method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer is described. An in-situ interferometer is encoded, or augmented, with special or missing...
|
|
|
7596420 |
Device manufacturing method and computer program product
A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose...
|
|
|
7595496 |
Optimized correction of wafer thermal deformations in a lithographic process
A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern...
|
|
|
7592106 |
Halftone type phase shift mask blank and phase shift mask thereof
A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase...
|
|
|
7592103 |
Electron beam writing method and lithography mask manufacturing method
A writing pattern to be a correcting object is divided by a rough mesh for a Foggy effect correction and a fine mesh for a proximity effect correction, a rate of an area occupied by the pattern to...
|
|
|
7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The...
|
|
|
7588870 |
Dual layer workpiece masking and manufacturing process
The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers...
|
|
|
7588869 |
Divided exposure method for making a liquid crystal display
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first...
|
|
|
7588868 |
Method and system for reducing the impact of across-wafer variations on critical dimension measurements
First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of...
|
|
|
7587702 |
Step-walk relaxation method for global optimization of masks
A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors...
|
|
|
7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets
The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing...
|
|
|
7585601 |
Method to optimize grating test pattern for lithography monitoring and control
A method of making a process monitor grating pattern for use in a lithographic imaging system comprises determining minimum resolvable pitch of a plurality of spaced, adjacent line elements, and...
|
|
|
7585600 |
Method and apparatus for performing target-image-based optical proximity correction
A system that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit is presented. The system operates by first receiving a plurality of...
|
|
|
7585596 |
Micro-sculpting using phase masks for projection lithography
Methods and systems of creating a photo-mask to form continuous relief micro-structures in photo-active material. This technology uses a basic amplitude mask or electron-beam to create a binary...
|
|
|
7583362 |
Stray light feedback for dose control in semiconductor lithography systems
A stray light feedback system and method for a lithography exposure tool. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose...
|
|
|
7580559 |
System and method for calibrating a spatial light modulator
A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an...
|
|
|
7573574 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology...
|
|
|
7571417 |
Method and system for correcting a mask pattern design
A pattern verification method includes preparing a desired pattern and a mask pattern forming the desired pattern on a substrate, defining at least one evaluation point on an edge of the desired...
|
|
|
7569332 |
Processing method of thin-film and manufacturing method of thin-film magnetic head
A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a...
|
|
|
7567344 |
Apparatus and method for characterizing defects in a transparent substrate
An apparatus and method for detecting defects in a transparent substrate by simultaneously using a combination of bright field and dark field light sources for illuminating the substrate. The...
|
|
|
7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
|
|
|
7566517 |
Feature printability optimization by optical tool
Methods and apparatus, including computer program products, implementing and using techniques for optimizing feature printability on a semiconductor wafer. A reticle with a quasi-periodic structure...
|
|
|
7566181 |
Controlling critical dimensions of structures formed on a wafer in semiconductor processing
In semiconductor processing, the critical dimensions of structures formed on a wafer are controlled by first developing photoresist on top of a film layer on a wafer using a developer tool, the...
|
|
|
7560713 |
Correction lens system for a particle beam projection device
A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between...
|
|
|
7560224 |
Method of manufacturing liquid discharge head, and liquid discharge head
According to the present invention, there are provided an ink jet recording head capable of performing high-precision printing and recording and having a high reliability, and a method of...
|
|
|
7560201 |
Patterning a single integrated circuit layer using multiple masks and multiple masking layers
A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first...
|
|
|
7557921 |
Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
Disclosed are apparatus and methods for monitoring a characteristic associated with a product feature on a semiconductor product. A proxy target formed from at least one substructure that...
|
|
|
7556900 |
Measuring the effect of flare on line width
In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a...
|
|
|
7556899 |
System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device
A system for controlling an overlay includes a processing data receiving module receiving a processing data string describing a name of an exposure process for a target layer and an original...
|
|
|
7556898 |
Overlay target for polarized light lithography
A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second...
|
|
|
7556896 |
Inspection method and photomask
An inspection method, includes obtaining a first optical characteristic of a projection optical system by transferring an image of an aberration measurement unit of a photomask on a first resist...
|
|
|
7553678 |
Method for detecting semiconductor manufacturing conditions
A method for detecting semiconductor-manufacturing conditions includes providing a photomask with a plurality of pattern areas each having a plurality of test lines with different pitches, exposing...
|
|
|
7550237 |
Systems and methods for determining width/space limits for mask layout
Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a...
|
|
|
7547884 |
Pattern defect inspection method and apparatus thereof
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam....
|