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8182969 |
Lithographic processing method, and device manufactured thereby
A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test...
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8183544 |
Correcting substrate for charged particle beam lithography apparatus
A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon...
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8183123 |
Method of forming mark in IC-fabricating process
A method of forming a mark in an IC fabricating process is described. Two parts of the mark each including a plurality of linear patterns are respectively defined by two exposure steps that either...
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8178263 |
Method for a lithographic apparatus
A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a...
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8181126 |
Differential alternating phase shift mask optimization
A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width....
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8173335 |
Beam ablation lithography
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires,...
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8175736 |
Method and system for performing a chemical oxide removal process
A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and...
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8171433 |
Method of calculating pattern-failure-occurrence-region, computer program product, pattern-layout evaluating method, and semiconductor-device manufacturing method
Method of calculating pattern-failure-occurrence-region comprising calculating a pattern failure occurrence region using relation information and a layout used for forming a convex section, the...
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8169590 |
Exposure apparatus and device fabrication method
An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure...
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8168451 |
Optical inspection methods
Inspection methods. A method includes adhering an optical blocking layer directly onto and in direct mechanical contact with a semiconductor process wafer, the blocking layer being substantially...
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8163448 |
Determination method, exposure method, device fabrication method, and storage medium
The present invention provides a method of determining a structure of an antireflection coating formed on a substrate as an exposure target of an exposure apparatus, the method comprising steps of...
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8158311 |
Method for managing light exposure mask and light exposure mask
An object of the present invention is to provide a method for managing a light exposure mask wherein: a mask inspection or a wafer inspection, in order to manage a contamination of a light exposure...
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8158312 |
Exposure method using charged particle beam
A charged particle beam exposure method that includes preparing of exposure data for a plurality of device patterns; obtaining of an integral of forward scattering components in an exposure...
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8161425 |
Method and system for implementing timing aware metal fill
An improved approach for implementing metal fill on an electrical device without causing creating cross-coupling capacitance problems is disclosed. Timing aware metal fill insertion is performed to...
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8156450 |
Method and system for mask optimization
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include...
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8151222 |
Method for decomposing designed pattern layout and method for fabricating exposure mask using the same
A method for decomposing a designed pattern layout and a method for fabricating an exposure mask using the same. After the designed pattern layout is automatically decomposed to obtain a plurality...
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8142964 |
Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method
In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the...
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8145342 |
Methods and systems for adjusting operation of a wafer grinder using feedback from warp data
Processing a wafer using a double side grinder having a pair of grinding wheels. Warp data is obtained by a warp measurement device for measuring warp of a wafer as ground by the double side...
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8146024 |
Method and system for process optimization
A method and apparatus for process optimization is provided. Process optimization improves parametric and functional yield post mask manufacturing.
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8145337 |
Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment
A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a...
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8142966 |
Substrate matrix to decouple tool and process effects
A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix,...
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8142960 |
Exposure method, mask data producing method, and semiconductor device manufacturing method
An exposure method has irradiating a mask with light based on an exposure performing condition, a first mask pattern and a second mask pattern being formed in the mask, and projecting images of the...
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8142965 |
Method and system for measuring in patterned structures
A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a...
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8141007 |
Method and apparatus for identifying and correcting phase conflicts
One embodiment of the present invention provides a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the layout phase-assignable....
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8137870 |
Method of manufacturing photomask
A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and...
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8137875 |
Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an...
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8137871 |
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which...
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8129080 |
Variable resist protecting groups
A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality...
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8129097 |
Immersion lithography
A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The...
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8124300 |
Method of lithographic mask correction using localized transmission adjustment
A method of correcting a lithographic mask is disclosed. The method can include detecting a location of the mask that corresponds to a wafer location having a structure that is printed with a...
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8119312 |
Manufacturing method for a semiconductor device
In a manufacturing method for divisionally exposing a wafer, a focus correction processing is performed after a shot is moved to a position where the focus correction processing for all foci is...
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8119313 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device, includes: supplying a liquid resist containing a water-repellent additive to a surface of a rotating semiconductor wafer fixed to a rotary support...
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8119310 |
Mask-shift-aware RC extraction for double patterning design
A method includes providing a layout of an integrated circuit design, and generating a plurality of double patterning decompositions from the layout, with each of the plurality of double patterning...
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8111398 |
Method of measurement, an inspection apparatus and a lithographic apparatus
According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with...
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8110325 |
Substrate treatment method
A substrate treatment method including a first treatment process (S13 to S16) for exposing, heating, and developing a substrate on which a first resist is formed, thereby forming a first resist...
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8112726 |
Phase-shifting masks with sub-wavelength diffractive optical elements
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a...
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8107079 |
Multi layer alignment and overlay target and measurement method
A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern...
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8105738 |
Developing method
Disclosed is a developing method that performs a developing for forming a second resist pattern after forming and exposing a resist film on a surface of a substrate on which a first resist pattern...
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8105736 |
Method and system for overlay correction during photolithography
A method of performing overlay error correction includes forming a photoresist layer over a substrate and exposing a first set of apertures to incident radiation. The method also includes...
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8105737 |
Method of correcting patterns for semiconductor device
A method of correcting patterns includes attaining a correcting amount distribution map using a photo mask, the photo mask including a transparent substrate having first and second surfaces...
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8105757 |
Method of making a semiconductor device
Disclosed is a method of making a semiconductor device in which a main pattern is formed through a photolithography process over a low-density pattern area having a relatively small number of...
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8102507 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a...
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8103980 |
Beam dose computing method and writing method and record carrier body and writing apparatus
A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different...
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8092960 |
Exposing mask and production method therefor and exposing method
An exposure mask forms a three-dimensional shape in simple structure and obtainable sufficient number of gray scales by exposure. In an exposure mask (M) for use in an exposure apparatus (S), the...
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8095897 |
Methods and systems for layout and routing using alternating aperture phase shift masks
A method of laying out features for alternating aperture phase shift masks. The method includes defining features on a grid of a uniform basic pitch, orienting the features such that those of the...
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8092961 |
Position aligning apparatus, position aligning method, and semiconductor device manufacturing method
A position aligning apparatus performs position alignment of a pattern in a current process of a pattern exposure process by using a pattern formed before the current process. The position aligning...
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8088539 |
Exposure aligning method and exposure apparatus
In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second...
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8084194 |
Substrate edge treatment for coater/developer
A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to...
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8086973 |
Pattern management method and pattern management program
A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types...
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8081294 |
Method of evaluating optical beam source of exposure device, method of designing illumination shape of exposure device, and software for optimizing illumination shape of exposure device
A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing...
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