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8178280 Self-contained proximity effect correction inspiration for advanced lithography (special)  
A lithography method is disclosed. An exemplary lithography method includes providing an energy sensitive resist material on a substrate; providing a desired pattern; performing a lithography...
8178281 Method for improving sensitivity of resist  
It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The...
8173347 Micropatterning of molecular surfaces via selective irradiation  
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to...
8173335 Beam ablation lithography  
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires,...
8168947 Electrostatic latent image evaluation device, electrostatic latent image evaluation method, electrophotographic photoreceptor, and image forming device  
An electrostatic latent image evaluation device includes an optical scanner configured to irradiate laser light of a wavelength of 400 nm-800 nm on a photoreceptor sample, and form an electrostatic...
8168353 Method of curing color filter for electronic display using electron-beam and method of fabricating color filter for electronic display using the same  
Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not...
8158312 Exposure method using charged particle beam  
A charged particle beam exposure method that includes preparing of exposure data for a plurality of device patterns; obtaining of an integral of forward scattering components in an exposure...
8137871 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area  
In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which...
8124319 Semiconductor lithography process  
A semiconductor lithography process. A photoresist film is coated on a substrate. The photoresist film is subjected to a flood exposure to blanket expose the photoresist film across the substrate...
8110322 Method of mask forming and method of three-dimensional microfabrication  
The invention provides a method for forming a selective mask on a surface of a layer of AlXGaYIn1-X-YAsZP1-Z or AlXGaYIn1-X-YNZAs1-Z (0≦X≦1, 0≦Y≦1, 0≦Z≦1), which is a method for forming a mask with...
8105753 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules  
A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures,...
8105754 Functionalized fullerenes for nanolithography applications  
A method for electron beam nanolithography without the need for development step involves depositing a film of a resist comprising functionalized fullerenes on a substrate, and writing features by...
8101337 Method of synthesizing ITO electron-beam resist and method of forming ITO pattern using the same  
Provided is a method of synthesizing an ITO electron beam resist and a method of forming an ITO pattern. The ITO electron beam resist is synthesized by dissolving indium chloride tetrahydrate and...
8101857 Organic devices, organic electroluminescent devices and organic solar cells  
An organic device, including an organic compound having charge-transporting ability (i.e., transporting holes and/or electrons) and/or including organic light emissive molecules capable of emitting...
8067147 Removable pellicle for immersion lithography  
A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the...
8062813 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography  
In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on...
8057970 Method and system for forming circular patterns on a surface  
A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a...
8057972 Constant current multi-beam patterning  
The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is...
8057965 Mask and method of fabricating the same  
The invention relates to a mask and a method of fabricating the same. When a mask pattern is formed using E-Beam, the size of the divisional region obtained by a fracturing process can not be...
8043798 Method of forming fine patterns  
It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns thereon made of a photoresist composition which is sensitive to high energy light rays...
8039176 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography  
In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed,...
8030626 Apparatus and method for charged-particle beam writing  
An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation σ of the blocks with respect to the average write speed M is ...
8031436 Electron beam writing method for magnetic recording medium  
When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam...
8017289 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography  
A method is disclosed in which a plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface. In this method some shots within the plurality of shots overlap each...
8017218 Micro and nano structures in an elastomeric material  
The invention relates to an elastomeric device (105), wherein the elastomeric device contains a relief structure with indentations with respect to the base (110), (102) and wherein selected ones of...
8017286 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography  
In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on...
8017288 Method for fracturing circular patterns and for manufacturing a semiconductor device  
A method for manufacturing a semiconductor device using a photomask and optical lithography is disclosed, wherein circular patterns on the semiconductor wafer are formed by using circular patterns...
8017918 Charged-particle beam instrument  
A charged-particle beam instrument (such as a transmission electron microscope) which facilitates modifying the diameters of aperture stops installed above and below (on the beam entrance and exit...
8012418 Apparatus for and method of processing substrate subjected to exposure process  
A specified time is determined which is a worst-case (or the longest) time period assumed as a time interval required between the instant at which an interface block receives an exposed substrate...
8011807 Method for enabling transmission of substantially equal amounts of energy  
The invention relates to a method for enabling transmission of substantially equal amounts of energy from at least one light source (LS) comprising intensity variations in time to at least two...
7998658 Pattern forming method  
A first resist film is formed on a substrate, and first pattern exposure is performed such that the first resist film is irradiated with exposure light through a first mask. Then, the first resist...
7993813 Apparatus and method for conformal mask manufacturing  
A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer....
7989768 Scanning electron microscope  
A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not...
7985514 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots  
In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed,...
7981575 Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography  
A method for optical proximity correction (OPC) of a desired pattern for a substrate is disclosed in which a plurality of variable shaped beam (VSB) shots are determined which can form on a surface...
7977018 Exposure data preparation method and exposure method  
In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of:...
7972764 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium  
When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape...
7972751 Reflection photolithography mask, and process for fabricating this mask  
The invention relates to an extreme ultraviolet photolithography mask, operating in reflection, the mask comprising a substrate, a mirror structure deposited uniformly on the substrate, and an...
7968843 Method and apparatus for simultaneous SEM and optical examination  
Method and apparatus capable of observing a liquid sample. An optical image of the sample and an image using a primary beam, such as an electron beam or charged-particle beam, can be obtained at...
7968259 Semiconductor device, method for manufacturing semiconductor device, and computer readable medium  
In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is...
7965606 Information recording method and information recording apparatus  
To provide a new recording method and recording apparatus with respect to an optical recording medium, the recording method and recording apparatus being able to deal with a high density of an...
7939246 Charged particle beam projection method  
A deposition energy distribution when a charged particle beam is made incident upon a resist film, is approximated by a sum of element distributions having Gaussian distributions. A pattern area...
7938990 Pattern drawing method, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium  
A pattern drawing apparatus which is capable of reducing manufacturing costs of information recording media. A partial drawing process is executed in response to output of a reference signal, for...
7914970 Mixed lithography with dual resist and a single pattern transfer  
An inorganic electron beam sensitive oxide layer is formed on a carbon based material layer or an underlying layer. The inorganic electron beam sensitive oxide layer is exposed with an electron...
7914954 Stencil, stencil design system and method for cell projection particle beam lithography  
Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them...
7910292 Lithographic process  
The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked...
7902528 Method and system for proximity effect and dose correction for a particle beam writing device  
A method of particle beam lithography includes selecting at least two cell patterns from a stencil, correcting proximity effect by dose control and by pattern modification for the at least two cell...
7901850 Method and system for design of a reticle to be manufactured using variable shaped beam lithography  
A method for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle is disclosed in which a plurality of variable shaped beam (VSB) shots...
7901848 Method of fabricating a photomask using self assembly molecule  
A method of fabricating a photomask includes includes forming a light blocking layer over a transparent substrate, and forming a hard mask pattern over the light blocking layer. The hard mask...
7897308 Method for transferring a predetermined pattern reducing proximity effects  
A method for transferring a predetermined pattern onto a flat support performed by direct writing by means of a particle beam comprises at least: deposition of a photoresist layer on a free surface...
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