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7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary...
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7608387 |
Method for fabricating mold core
An exemplary method for fabricating a mold core includes the following steps. First, a substrate is provided. Second, a photo resist layer is formed on the substrate, the photo resist layer has a...
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7608368 |
Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including...
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7605383 |
Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern...
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7598022 |
Positive and negative dual function magnetic resist lithography
The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist...
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7592103 |
Electron beam writing method and lithography mask manufacturing method
A writing pattern to be a correcting object is divided by a rough mesh for a Foggy effect correction and a fine mesh for a proximity effect correction, a rate of an area occupied by the pattern to...
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7582884 |
Charged particle beam exposure method and charged particle beam exposure device
When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7562336 |
Contrast based resolution enhancement for photolithographic processing
A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to...
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7556749 |
Electron source
To provide an electron source to be used for a surface analyzer such as a scanning or transmission electron microscope or an Auger electron spectroscope, or an electron beam lithography machine,...
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7553606 |
Methods of forming patterns in semiconductor devices using photo resist patterns
Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are...
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7550747 |
Parallel electron beam lithography stamp (PEBLS)
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips...
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7550251 |
Liquid transfer articles and method for producing the same using digital imaging photopolymerization
A liquid transfer article is provided including a support assembly and an imaged surface formed directly on the surface of the support assembly by digital photopolymerization. The support assembly...
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7541131 |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or...
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7535001 |
Method and system for focusing a charged particle beam
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
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7534552 |
Lithographic apparatus and device manufacturing method
In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus...
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7531293 |
Radiation sensitive self-assembled monolayers and uses thereof
The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7511282 |
Sample preparation
Methods of extracting a TEM sample from a substrate include milling a hole on the sample and inserting a probe into the hole. The sample adheres to the probe, and can be processed on transferred...
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7498591 |
Critical dimension effects correction in raster pattern generator
A method for generating a flash. The method includes computing dose correction multipliers taking into account fogging scattering effects, backscattering effects and fast secondary scattering...
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7485879 |
Electron beam writing apparatus and writing method
A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of...
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7482604 |
Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device
According to an aspect of the invention, there is provided an electron beam lithography apparatus including a first setting unit configured to set a drawing position on a semiconductor substrate...
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7476880 |
Writing a circuit design pattern with shaped particle beam flashes
A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary...
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7476879 |
Placement effects correction in raster pattern generator
A method for generating a charged particle beam flash. The method includes computing an array of dose correction multipliers, based, at least in part, on a resist sensitivity correction factor, and...
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7468227 |
Method of reducing the average process bias during production of a reticle
We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing...
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7462428 |
Complementary masks and method of fabrication of same, exposure method, and semiconductor device and method of production of same
A complementary mask has a plurality of pattern forming regions 34 a, 34 having arranged on them complementary patterns 26, 28 obtained by dividing first circuit patterns into complementary...
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7456033 |
Method of evaluating semiconductor device
The present invention provides a semiconductor device having an active region bent at right angles, wherein an interval between patterns for the active region and a gate is set larger than an arc...
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7449700 |
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
An electron beam exposure apparatus has a first shaping aperture having a plurality of rectangular openings, each having sizes different from each other and shaping a beam shape of an electron...
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7442924 |
Repetitive circumferential milling for sample preparation
A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it....
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7435517 |
Method for reducing the fogging effect
A method for reducing the fogging effect in an electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing which conforms to design...
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7425396 |
Method for reducing an overlay error and measurement mark for carrying out the same
A method for reducing an overlay error of structures of a layer to be patterned relative to those of a reference layer includes formation of standard measurement marks assigned to one another in...
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7419764 |
Method of fabricating nanoimprint mold
Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL)...
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7414240 |
Particle remover, exposure apparatus having the same, and device manufacturing method
A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting...
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7407738 |
Fabrication and use of superlattice
This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some...
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7407736 |
Methods of improving single layer resist patterning scheme
Methods for improving a single layer resist (SLR) patterning scheme, and in particular, its SLR layer and anti-reflective coating (ARC) etch selectivity, are disclosed. In one method, a patterned...
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7390614 |
Lithographic apparatus and device manufacturing method
A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a...
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7388216 |
Pattern writing and forming method
A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam...
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7385209 |
Micromachining process, system and product
Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy...
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7384724 |
Method for fabricating optical devices in photonic crystal structures
A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist ( 9 ) is coated on a substrate ( 10 ) and exposed to an e-beam ( 11 ), to produce an...
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7384711 |
Stencil mask having main and auxiliary strut and method of forming the same
A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an...
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7384710 |
Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device
A method of forming an exposure mask pattern providing edge division points P at edges of a design pattern ( 1 ) by predetermined intervals and correcting edge positions for each divided edge...
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7374868 |
Composition for an organic bottom anti-reflective coating and method for forming pattern using the same
Disclosed are a composition for an organic bottom anti-reflective coating able to improve the uniformity of a photoresist pattern with respect to an ultra-fine pattern formation process among...
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7371483 |
Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device
Disclosed is a method for manufacturing a mask for focus monitoring, comprising forming a first opening portion and a second opening portion in a surface region of a transparent substrate, the...
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7368735 |
Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method
Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data)...
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7348130 |
Electron exposure to reduce line edge roughness
The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to...
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7348129 |
Electron beam processing method and apparatus
An organic material film formed on a surface of an object to be processed is cured by electron beams irradiated thereon through a hydrocarbon radical generating gas. By employing the electron beams...
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7344821 |
Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same
A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment...
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7332252 |
Method of forming a mask layout and layout formed by the same
A mask layout forming method includes designing an original layout in which a diagonal pattern of a first polygon is repeatedly arranged in a diagonal direction relative to a vertical-axis...
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7329883 |
Electron beam lithography device and drawing method using electron beams
In an electron beam lithography apparatus, when a plotting pattern is an isolated fine pattern, an exposure energy upon plotting lacks. In the prior art set forth above, dimension dependent...
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7326940 |
Exposure apparatus, exposure method and semiconductor device production method
An exposure method and a semiconductor device production method that control a rise in temperature of a mask irradiated by a charged particle beam. A displacement of the position of a pattern...
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