Match Document Document Title
7390611 Photoresist coating composition and method for forming fine pattern using the same  
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist...
7384730 Top coating composition for photoresist and method of forming photoresist pattern using same  
Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a...
7378223 Photoresist resin composition  
The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane...
7374859 Protective layers compatible with thick film pastes  
This invention relates to novel processes comprising a protective polymer layer in the fabrication of electronic devices using thick film pastes. The protective polymer layer is fabricated from...
7371510 Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern  
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following...
7371504 Lithographic printing plate precursor  
A lithographic printing plate precursor capable of forming an image upon irradiation with an infrared laser comprising a support, a first layer containing as the main component an alkali-soluble...
7364835 Developer-soluble materials and methods of using the same in via-first dual damascene applications  
Wet-recess (develop) gap-fill and bottom anti-reflective coatings based on a polyamic acid or polyester platform are provided. The polyamic acid platform allows imidization to form a polyimide when...
7364832 Wet developable hard mask in conjunction with thin photoresist for micro photolithography  
A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the...
7358035 Topcoat compositions and methods of use thereof  
A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene,...
7351517 Lithographic printing with printing members including an oleophilic metal and plasma polymer layers  
Printing members that include a plasma polymer layer exhibit enhanced tolerance for high imaging-power densities. The plasma polymer layer may contain or be adjacent to an oleophilic metal such as...
7341821 Method for manufacture of lithographic printing plate precursor no dampening water  
A method for manufacturing a lithographic printing plate precursor requiring no dampening water including: a support, a light-to heat conversion layer; and a silicone rubber layer in this order....
7338746 Lithographic printing plate precursor and lithographic printing method  
A lithographic printing plate precursor comprising: a support; an image recording layer comprising (A) an actinic ray absorber, (B) a polymerization initiator, and (C) a polymerizable compound,...
7335456 Top coat material and use thereof in lithography processes  
A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of...
7335455 Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same  
A method of forming an underlayer of a bi-layer resist including forming a blended material by blending a polymer having an aromatic group and a methacrylate polymer, and coating a substrate with...
7332262 Photolithography scheme using a silicon containing resist  
A method for forming a patterned amorphous carbon layer in a semiconductor stack, including forming an amorphous carbon layer on a substrate and forming a silicon containing photoresist layer on...
7329477 Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same  
The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present...
7326525 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same  
Disclosed herein are top anti-reflective coating polymers used in a photolithography process, methods for preparing the anti-reflective coating polymer, and anti-reflective coating compositions...
7316886 Protective film-forming composition for immersion exposure and pattern-forming method using the same  
A protective film-forming composition for immersion exposure comprises a water-insoluble and alkali-soluble resin comprising a repeating unit derived from a monomer having an acid dissociation...
7316874 Process and donor elements for transferring thermally sensitive materials to substrates by thermal imaging  
Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate...
7314702 Composition for a bottom-layer resist  
A composition for a bottom-layer resist, having superior anti-refractivity and dry-etch resistance for use in a bi-layer resist process employing a light source at a wavelength of 193 nm or below,...
7303858 Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device  
Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R 1 is a C 1-10 hydrocarbon or a C 1-10 hydrocarbon in which the hydrogen atoms are wholly or...
7303856 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer  
A light-sensitive sheet comprises a support, a first light-sensitive layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently...
7303854 Electrode-forming composition for field emission type of display device, and method using such a composition  
A composition utilized in and a method for forming an electrode used in field emission type of display devices said composition is a photosensitive copper conductive composition comprising: a...
7300743 Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing  
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a...
7294447 Positive-working lithographic printing plate precursor  
A lithographic printing plate precursor is disclosed which comprises (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer and (ii) a coating provided thereon,...
7291440 Bakeable multi-layer imageable element  
Thermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises...
7285373 Polymer and chemically amplified resist composition containing the same  
A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent. The chemically amplified resist can form a resist pattern that is excellent in...
7285372 Radiation-sensitive elements and their storage stability  
Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the...
7282256 Photosensitive resin laminate for sign boards  
A photosensitive resin laminate for a sign board is provided, which laminate has a support and a photosensitive resin layer having a thickness of not less than 500 μm formed at least on the...
7279266 Photosensitive composition and lithographic printing plate precursor using the same  
A photosensitive composition comprising: (A) a polymerizable compound represented by the following formula (I): A—{O—[(CH(—R...
7270937 Over-coating composition for photoresist and process for forming photoresist pattern using the same  
Overcoating compositions for a photoresist and methods of using the same are disclosed. More specifically, overcoating compositions for a photoresist comprising materials which can weaken acid...
7267928 Printing plate material and printing process  
Disclosed is a printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer containing a blocked isocyanate compound, which is...
RE39835 UV-absorbing support layers and flexographic printing elements comprising same  
The present invention provides a method for producing direct-imaged flexographic printing elements such that both the front and back exposure times are economically efficient for the manufacturer....
7264918 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith  
A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i)...
7255967 Image forming method used in liquid crystal display device for both reflection and transmission modes  
The present invention provides an image forming method comprising the steps (1) to (5): (1) forming a first negative photosensitive resin layer on a substrate; (2) forming a barrier layer on the...
7241537 Method for producing an exposed substrate  
Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image...
7238462 Undercoating material for wiring, embedded material, and wiring formation method  
This invention provides an undercoating layer material and a filler material containing a resin component having at least a substituent group which is capable of releasing a terminal group to form...
7235346 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates  
The present invention relates to a photosensitive flexographic printing element for the production of flexographic newspaper printing plates, comprising at least a flexible, metallic support, an...
7235345 Agent for forming coating for narrowing patterns and method for forming fine pattern using the same  
It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing...
7232649 Method for thermally processing photosensitive printing sleeves  
An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer)...
7223527 Immersion lithography process, and structure used for the same and patterning process  
An immersion lithography process is described. First, a photoresist layer on a material layer is formed. Then, an acid compensation layer is formed on the photoresist layer. An immersion exposure...
7223523 Demonstration kit and method for enhancing and/or demonstrating photoactive properties  
A method is provided for simulating and/or demonstrating and/or enhancing photoactive properties, such as hydrophilicity, of a surface, such as a photoactive surface. One embodiment includes...
7217498 Heat-sensitive lithographic printing plate precursor  
A heat-sensitive lithographic printing plate precursor comprising a support having thereon two image-forming layers each containing a polymer insoluble in water and soluble in an aqueous alkaline...
7213516 Method of processing laser sensitive lithographic printing plate  
A method of developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or...
7205093 Topcoats for use in immersion lithography  
A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the...
7205092 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith  
A photosensitive resin printing plate precursor including: a photosensitive resin layer (A) containing a water-soluble or water-dispersible resin and an ultraviolet-curable monomer; and a...
7205091 Lithographic printing with printing members having primer layers  
A primer layer that includes a surface-tension modifier dispersed within a polymer binder is disposed between the imaging layer and the substrate of a lithographic printing member to inhibit the...
7198887 Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same  
Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I, its preparation method and an organic anti-reflective coating composition with...
7198876 Method of preparation of lithographic printing plates  
A method for preparation of a lithographic printing plate, which comprises the steps of: imagewise recording on a lithographic printing plate precursor comprising a support having a hydrophilic...
7192690 Process of preparing planographic printing plate  
Disclosed is a process of preparing a planographic printing plate from a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, an image...