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8182978 |
Developable bottom antireflective coating compositions especially suitable for ion implant applications
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
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8173348 |
Method of forming pattern and composition for forming of organic thin-film for use therein
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or...
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8158328 |
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same
A composition for forming an anti-reflection film on a resist film is provided, which is superior in handling characteristics, and is not accompanied by generation of deposits and the like after...
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8158331 |
Method of improving print performance in flexographic printing plates
A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one...
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8158330 |
Resist protective coating composition and patterning process
A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl) acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second ...
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8158325 |
Compositions and processes for photolithography
Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
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8153347 |
Flexographic element and method of imaging
A relief (or flexographic) printing precursor has first and second radiation-sensitive layers, or a plurality of radiation-sensitive layers. The first radiation-sensitive layer is sensitive to a...
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8142980 |
Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
It is disclosed an over-coating agent for forming fine-line patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing...
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8142987 |
Method of producing a relief image for printing
The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation....
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8137897 |
Processless development of printing plate
On-press development of an imaged printing plate on a plate cylinder, in which ink is applied by an ink form roll, a blanket roll is in contact with the plate, a rubber roll is opposed to the...
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8137874 |
Organic graded spin on BARC compositions for high NA lithography
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a...
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8137895 |
Structure and method for improving photoresist pattern adhesion
An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains.
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8133658 |
Non-chemical development of printing plates
A solvent-soluble, radiation-polymerizable, oleophilic resin coating non-ionically adhered on a hydrophilic substrate can be imagewise exposed to polymerizing radiation and then directly processed...
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8127675 |
Lithographic printing plate precursor and lithographic printing method
A lithographic printing plate precursor comprising a support and an image recording layer capable of drawing an image by exposure with an infrared laser, wherein the image recording layer contains...
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8124318 |
Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing...
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8124312 |
Method for forming pattern, and material for forming coating film
A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a...
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8124327 |
Method for using compositions containing fluorocarbinols in lithographic processes
The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol...
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8119325 |
Method for forming resist pattern, semiconductor device and production method thereof
It is an object of the present invention to provide a method for forming a resist pattern, in which ArF excimer laser light can be utilized as the exposure light for the patterning, the resist...
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8119324 |
Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film
A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the...
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8119326 |
Lithographic-printing plate precursor and image forming method using the same
To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties...
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8114575 |
Plate making method of lithographic printing plate precursor
A plate making method of a lithographic printing plate precursor includes: exposing a lithographic printing plate precursor including an image-recording layer and a support; and developing the...
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8114568 |
Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between...
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8114573 |
Topography based patterning
A mask having features formed by self-organizing material, such as diblock copolymers, is formed on a partially fabricated integrated circuit. Initially, a copolymer template, or seed layer, is...
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8105751 |
Planographic printing plate precursor and pile of planographic printing plate precursors
The invention has a support, a recording layer provided on the support, and a protective layer containing a hydrophilic polymer and silica-coated organic resin fine particles provided as the...
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8105764 |
Patterning process
A pattern is formed through positive/negative reversal by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin, a photoacid generator, and an...
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8100055 |
Developing method for laser sensitive lithographic printing plate
A method of developing a laser sensitive lithographic printing plate is described. The plate comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution...
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8101333 |
Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method
The present invention provides a method for miniaturizing a pattern without seriously increasing the production cost or impairing the production efficiency. This invention also provides a fine...
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8101340 |
Method of inhibiting photoresist pattern collapse
A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer;...
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8097397 |
Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film
Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the...
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8097398 |
Method for manufacturing semiconductor device
In the method for manufacturing a semiconductor device, a resist film is formed on a substrate and is processed to be provided with openings to form a first resist pattern. Additive-containing...
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8097401 |
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble...
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8088537 |
Resist top coat composition and patterning process
The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a...
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8088560 |
Method of making a lithographic printing plate
A method of making a lithographic printing plate includes the steps of: (a) providing a lithographic printing plate precursor including a support having a hydrophilic surface or which is provided...
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8088557 |
Method of forming patterns
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with...
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8088548 |
Bottom antireflective coating compositions
Developable bottom antireflective coating compositions are provided.
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8084193 |
Self-segregating multilayer imaging stack with built-in antireflective properties
A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective...
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8084186 |
Hardmask process for forming a reverse tone image using polysilazane
The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a...
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8080364 |
Pattern formation method
After forming a resist film made from a chemically amplified resist material pattern exposure is carried out by selectively irradiating the resist film with exposing light while supplying, onto the...
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8076053 |
Upper layer-forming composition and photoresist patterning method
An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming...
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8076052 |
Positive-working imageable elements with chemical resistance
Single- and multi-layer positive-working imageable elements include a first polymeric binder that is soluble in an alkaline developer upon exposure to imaging radiation and a radiation absorbing...
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8057981 |
Resist composition, resist protective coating composition, and patterning process
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an...
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8053163 |
Method of fine patterning semiconductor device
For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block...
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8043792 |
Composition for formation of antireflection film and pattern formation method using the same
The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser...
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8043795 |
Method of forming resist pattern
Disclosed is a method of forming a resist pattern, including: applying a positive resist composition on a support 1 to form a first resist film 2; selectively exposing the first resist film 2...
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8039195 |
Si device making method by using a novel material for packing and unpacking process
A method of lithography patterning includes forming a resist pattern on a substrate, the resist pattern including at least one desired opening and at least one padding opening therein on the...
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8039196 |
Method of forming fine patterns using a block copolymer
A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a...
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8034538 |
Negative-working imageable elements
Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a λmax in the range of from about 450 to about ...
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8034532 |
High contact angle topcoat material and use thereof in lithography process
A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer...
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8029969 |
Material and method for photolithography
A photosensitive material for use in semiconductor manufacture comprises a copolymer that includes a plurality of photoresist chains and a plurality of hydrophobic chains, each hydrophobic chain...
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8026043 |
Method of making a lithographic printing plate
A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is...
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