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7632626 |
Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
There is provided an anti-reflective coating forming composition for lithography comprising a polymer having an ethylenedicarbonyl structure and a solvent; an anti-reflective coating formed from...
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7629110 |
Monomer for forming organic anti-reflective coating layer, polymer thereof and composition including the same
A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective...
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7622246 |
Contrast enhancing layers
Contrast enhancing layers and other materials that can be used as a conformal mask over a photoresist are discussed. In particular, methods and compositions are discussed that can be advantageous...
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7608380 |
Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred...
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7604917 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a...
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7601483 |
Anti-reflective coatings using vinyl ether crosslinkers
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups...
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7595144 |
Sulfonate-containing anti-reflective coating forming composition for lithography
There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent....
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7585613 |
Antireflection film composition, substrate, and patterning process
There is disclosed an antireflection film composition used for lithography comprising: at least
a light absorbing silicone resin with mass average molecular weight of 30,000 or less in which...
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7582411 |
Antireflective film and exposure method
An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a...
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7566527 |
Fused aromatic structures and methods for photolithographic applications
A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base...
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7566525 |
Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing...
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7541134 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the...
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7531297 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating...
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7524613 |
Material for the treatment of lithographic substrates and lithographic printing plates
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first...
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7514199 |
Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same
Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include
(a) a first polymer prepared by the reaction of a...
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7510820 |
Resist undercoat-forming material and patterning process
In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The...
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7501229 |
Anti-reflective coating containing sulfur atom
There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The...
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7482111 |
Negative radiation-sensitive resin composition
It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive...
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7470493 |
Imaging member
Provided are a silane-phenol compound, a crosslinked siloxane outmost protective layer thereof, and an electrophotographic imaging member such as photoreceptor. The silane-phenol compound comprises...
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7445882 |
Image recording material
Provided is an image recording material capable of being directly recorded by various kinds of lasers, excellent in alkali-developability by alkaline developer and capable of forming an image which...
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7442491 |
Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate
There is provided an aluminum alloy blank for a lithographic printing plate including iron in a range of 0.20 to 0.80 wt %; and the balance being aluminum, a crystal grain refining element, and...
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7439302 |
Low refractive index polymers as underlayers for silicon-containing photoresists
A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a...
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7419772 |
Mesoporous materials and methods
Mesoporous articles and methods for making mesoporous articles are disclosed.
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7399581 |
Photoresist topcoat for a photolithographic process
A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T m R3 where m is equal to 8, 10 or 12 and Q n M n R1,R2,R3 where n is equal to 8, 10...
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7390608 |
Photoresists containing Si-polymers
In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of...
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7354695 |
Producing a substrate having high surface-area texturing
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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7351513 |
Planographic printing plate precursor, substrate for the same and surface hydrophilic material
A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through...
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7341821 |
Method for manufacture of lithographic printing plate precursor no dampening water
A method for manufacturing a lithographic printing plate precursor requiring no dampening water including: a support, a light-to heat conversion layer; and a silicone rubber layer in this order....
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7326442 |
Antireflective composition and process of making a lithographic structure
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer...
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7303858 |
Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device
Disclosed herein is a photoacid generating polymer represented by Formula 1 below:
wherein R 1 is a C 1-10 hydrocarbon or a C 1-10 hydrocarbon in which the hydrogen atoms are wholly or...
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7223523 |
Demonstration kit and method for enhancing and/or demonstrating photoactive properties
A method is provided for simulating and/or demonstrating and/or enhancing photoactive properties, such as hydrophilicity, of a surface, such as a photoactive surface. One embodiment includes...
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7220486 |
Photoresist compositions
New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with...
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7217497 |
Hydroxy-amino thermally cured undercoat for 193 nm lithography
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino...
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7205091 |
Lithographic printing with printing members having primer layers
A primer layer that includes a surface-tension modifier dispersed within a polymer binder is disposed between the imaging layer and the substrate of a lithographic printing member to inhibit the...
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7198882 |
Adhesion promoting polymeric materials and planographic printing elements containing them
The present invention provides a planographic printing element suitable to receive and bond with a subsequently applied hydrophilic layer comprises a substrate layer, such as polyester film or...
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7186482 |
Multilayer imageable elements
Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in...
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7183036 |
Low activation energy positive resist
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) at low energy levels are obtained using a polymer having acrylate/methacrylate...
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7175966 |
Water and aqueous base soluble antireflective coating/hardmask materials
A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H,...
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7172849 |
Antireflective hardmask and uses thereof
Antireflective hardmask compositions and techniques for the use of antireflective hardmask compositions for processing of semiconductor devices are provided. In one aspect of the invention, an...
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7166416 |
Protecting groups in polymers, photoresists and processes for microlithography
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a...
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7163778 |
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
There is disclosed an anti-reflection film material used in lithography containing at least a polymer compound having repeating units for copolymerization represented by the following general...
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7150959 |
Heat-sensitive lithographic printing plate precursor
A heat-sensitive lithographic printing plate precursor comprising on a support, a hydrophilic layer having a protrusion structure on at least one surface thereof.
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7147988 |
Printing plate material, roll of a printing plate material and printing method
A printing plate material including: a plastic support; a hydrophilic layer on the plastic support; and a back layer on the plastic support, being provided on the opposite side to the hydrophilic...
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7122294 |
Photoacid generators with perfluorinated multifunctional anions
Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high...
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7108953 |
Dissolution inhibitors in photoresist compositions for microlithography
The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound...
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7108956 |
Thermosensitive lithographic printing plate
A thermosensitive lithographic printing plate comprising: a hydrophilic support; a lower layer comprising a water-insoluble and alkali-soluble resin; and an upper thermosensitive layer comprising a...
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7108957 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful...
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7105266 |
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
The invention includes polymers that contain a heterocyclic ring, preferably an oxygen- or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention...
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7097956 |
Imageable element containing silicate-coated polymer particle
Imageable elements that contain silicate-coated polymer particles in the imageable layer, stacks of these elements, and methods for forming images using these elements are disclosed. The elements...
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7087361 |
Support for lithographic printing plate, method of preparing the support and presensitized plate
A presensitized plate in which an image recording layer is formed on a support for a lithographic printing plate obtainable by performing a treatment with an aqueous solution containing one or more...
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