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9040225 Developable bottom antireflective coating composition and pattern forming method using thereof  
The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first...
9040219 Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate  
The invention provides an infrared-sensitive positive-working image forming material which provides excellent development latitude, image formability and image region strength, and in which...
9029069 Resist underlayer film-forming composition and method for forming pattern  
A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to...
9029075 Resist-protective film-forming composition and patterning process  
A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a...
9005873 Composition for forming resist underlayer film for EUV lithography  
A method for producing a semiconductor device includes the steps of: applying a composition for forming a resist underlayer film for EUV lithography including a novolac resin containing a halogen...
8999631 Primer and pattern forming method for layer including block copolymer  
An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin...
8999624 Developable bottom antireflective coating composition and pattern forming method using thereof  
The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first...
8962234 Resist underlayer film forming composition and method for forming resist pattern using the same  
A resist underlayer film forming composition for lithography, includes: a polymer including a structure of formula (1) below at a terminal of a polymer chain; a cross-linking agent; a compound...
8956810 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Primer and pattern forming method for layer including block copolymer
 
An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin...
8956799 Photoacid generator and photoresist comprising same  
A photoacid generator includes those of formula (I): wherein each Ra in formula 1 is independently H, F, a C1-10 nonfluorinated organic group, C1-10 fluorinated organic group, or a combination...
8951711 Patterning process and composition for forming silicon-containing film usable therefor  
The invention provides a patterning process for forming a negative pattern by lithography, comprising at least the steps of: using a composition for forming silicon-containing film, containing...
8945813 Mask forming imageable material and use  
An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent...
8940472 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the...
8932797 Photoacid generators  
A photoacid generator compound has formula (I): G+Z− (I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or...
8927681 Coating composition for use with an overcoated photoresist  
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating...
8916327 Underlayer coating forming composition containing dextrin ester compound  
There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the...
8906590 Antireflective coating composition and process thereof  
The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer...
8906592 Antireflective coating composition and process thereof  
The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least...
8900797 Developable bottom anti-reflective coating  
The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom...
8900794 Photoacid generator and photoresist comprising same  
A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3−Z+ (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or...
8895224 Lithographic printing plate precursors and processes for preparing lithographic printing plates  
Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance...
8895225 Method of forming patterns  
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of...
8889334 Spin-on anti-reflective coatings for photolithography  
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable...
8889338 Flexographic printing forme precursor for laser engraving  
A method of making a flexographic printing form precursor for laser engraving including the steps of (i) providing at least one layer of a curable composition on a substrate; (ii) curing the at...
8889340 Method for making a lithographic printing plate  
A method for making a lithographic printing plate is disclosed which comprises the steps of: (1) providing a heat-sensitive lithographic printing plate precursor comprising on a support having a...
8889341 Negative-working lithographic printing plate precursors and use  
A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at...
8889344 Coating compositions  
In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium,...
8889337 Film forming method, film forming apparatus and pattern forming method  
Such a film forming method is provided that can prevent peeling of surface films including a resist film from a substrate during immersion exposure. The film forming method includes the steps of...
8883407 Coating compositions suitable for use with an overcoated photoresist  
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a diene/dienophile reaction product. In another aspect, organic coating...
8883379 Resist-protective film-forming composition and patterning process  
A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a protective film-forming...
8877422 Resist underlayer film composition and patterning process using the same  
There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following...
8859185 Resist underlayer film-forming composition  
A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to...
8846292 Radiation-sensitive composition  
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good...
8841062 Positive working photosensitive material  
Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
8835099 Lithographic printing plate precursor  
The present invention provides a lithographic printing plate precursor which exhibits satisfactory ink cleanup and restart toning characteristics during printing. Disclosed is a lithographic...
8835092 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative  
There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile...
8835522 Polyurethane polymer having bisphenol group and photoimageable composition containing the same  
The present invention provides a polymer having the structure of formula (I) wherein n, R1, R2, R3, R4, R5, R6, a, b and c are as defined in the specification. The present invention also provides...
8828646 Lithographic printing plate precursor and method of producing thereof  
To provide a lithographic printing plate precursor which is excellent in the gum development property, running processing property and scratch resistance and a lithographic printing plate...
8822138 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring  
There is provided a resist underlayer film having both heat resistance and etching selectivity. A composition for forming a resist underlayer film for lithography, comprising a reaction product...
8808968 Method of improving surface cure in digital flexographic printing plates  
A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support...
8802355 Lithographic printing plate precursor and plate making method thereof  
A lithographic printing plate precursor includes a support, and an image-recording layer, the image-recording layer contains a urethane resin having a polyalkylene oxide chain represented by the...
8795950 Method of improving print performance in flexographic printing plates  
A method of making a relief image printing element from a photosensitive printing blank is provided. The method comprising the steps of: 1) providing a photosensitive printing blank comprising a...
8795951 Material for forming resist sensitization film and production method of semiconductor device  
A material for forming a resist sensitization film contains a metal salt, a resin and, a solvent. A method for producing a semiconductor device contains applying such material (or a resist) onto a...
8790861 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer  
A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile,...
8778593 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition  
A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl...
8771926 Slip film for relief image printing element  
A method of preparing a photosensitive printing blank, the method comprising the steps of: a) coating a slip film onto a coversheet and drying the slip film; and depositing at least one layer of...
8748081 Organic anti reflective layer composition  
Disclosed is an organic antireflective film composition which includes a monomer containing two or more thiol groups and a monomer containing two or more vinyl groups, as crosslinking agents. When...
8748080 Compositions and processes for photolithography  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
8741540 Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern  
A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the...
8741553 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern  
Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a...