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7391036 |
Sample surface inspection apparatus and method
The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the...
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7390611 |
Photoresist coating composition and method for forming fine pattern using the same
A photoresist coating composition that includes a compound represented by Formula 1 and an aqueous solvent, and a method for forming a fine pattern by coating the composition on a photoresist...
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7390610 |
Color forming composition
The present disclosure discloses a color former phase. According to one exemplary embodiment discussed herein, an exemplary color former phase includes at least one color former, a radiation...
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7390609 |
Polymers and photoresists comprising same
New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more...
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7390608 |
Photoresists containing Si-polymers
In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of...
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7387865 |
Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a...
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7387857 |
Liquid crystalline di(meth)acrylate compound, phase difference film, optical film, polarizing plate, liquid crystal panel and liquid crystal display device
A phase difference film characterized in that said film is obtained by orienting and fixing, on a substrate, a composition containing a polymerizable liquid crystal monomer represented by the...
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7381518 |
Infrared-sensitive planographic printing plate precursor
An infrared-sensitive planographic printing plate precursor including: a support; a recording layer capable of forming an image through infrared irradiation provided on or above one surface of the...
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7381517 |
Curable composition and image forming material containing the same
A curable composition comprising: (A) an infrared absorber which is a cyanine dye having a structure in which hetero rings are bonded to each other via a methine chain and which has at least one...
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7381516 |
Multiphoton photosensitization system
A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising...
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7381353 |
Black conductive thick film compositions, black electrodes, and methods of forming thereof
This invention is directed to black conductive compositions, black electrodes made from such compositions and methods of forming such electrodes. In particular, the invention is directed to a...
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7378216 |
Resist material and pattern formation method
A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented...
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7375858 |
Image data control apparatus and method for image-recording device
Ablation data of a region other than an image region, which ablation data is required for a positive-type printing plate, is added at a printing plate automatic exposure device side. Thus, a...
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7374868 |
Composition for an organic bottom anti-reflective coating and method for forming pattern using the same
Disclosed are a composition for an organic bottom anti-reflective coating able to improve the uniformity of a photoresist pattern with respect to an ultra-fine pattern formation process among...
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7374860 |
Positive resist composition and pattern forming method using the same
The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the...
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7374859 |
Protective layers compatible with thick film pastes
This invention relates to novel processes comprising a protective polymer layer in the fabrication of electronic devices using thick film pastes. The protective polymer layer is fabricated from...
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7374858 |
Polymerizable compositions; polymer, resist, and lithography method
A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.
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7374857 |
Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a...
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7371783 |
Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
Provided is an alkali-soluble maleimide-based copolymer which comprises, as essential constituents, 5 to 50% by mass of a maleimide monomer unit which is at least one unit selected from the group...
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7371506 |
Positive photosensitive resin composition
A positive photosensitive resin composition comprising (A) a polyamic acid, (B) a 1,4-dihydropyridine derivative represented by the general formula (II):
wherein R 2 is a monovalent organic...
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7371505 |
Photosensitive composition and method for forming pattern using the same
A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads,...
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7371504 |
Lithographic printing plate precursor
A lithographic printing plate precursor capable of forming an image upon irradiation with an infrared laser comprising a support, a first layer containing as the main component an alkali-soluble...
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7371503 |
Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution,...
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7371500 |
Positive photosensitive insulating resin composition and cured product thereof
Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group,...
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7371454 |
Imageable element comprising sulfated polymers
Sulfated polymers, imageable elements containing these polymers, and methods for preparing images useful as lithographic printing plates from these imageable elements are disclosed. The sulfate...
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7368217 |
Multilayer image, particularly a multicolor image
The invention relates to a process for the production of a multi-layer image, preferably a multi-color image. A transfer film which is applied to a paper ubstrate and which is treated with laser...
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7368215 |
On-press developable IR sensitive printing plates containing an onium salt initiator system
The present invention provides a radiation sensitive composition suitable for us in on-press developable printing plates. The radiation sensitive composition comprises an initiator system including...
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7365115 |
Composition for antireflection coating and method for forming pattern
An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an...
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7364835 |
Developer-soluble materials and methods of using the same in via-first dual damascene applications
Wet-recess (develop) gap-fill and bottom anti-reflective coatings based on a polyamic acid or polyester platform are provided. The polyamic acid platform allows imidization to form a polyimide when...
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7364833 |
Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same
The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the...
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7364831 |
Positive resist composition and resist pattern formation method
A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the...
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7364829 |
Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern,...
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7364671 |
Optical component, orientation layer, and layerable polymerisable mixture
A polymerisable mixture that can be applied as a layer, an orientation layer of the mixture, and an optical component, such as a retarder or a liquid crystal display, having a layer of which the...
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7361718 |
Alkali-soluble gap fill material forming composition for lithography
There is provided a gap fill material forming composition for lithography that is used in dual damascene process and contributes toward an improvement in production efficiency. Concretely, it is a...
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7361448 |
Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during...
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7361446 |
Positive resist composition
A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group...
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7361444 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose...
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7361437 |
Thermal transfer donor element with a carboxylated binder and a hydroxylated organic compound
The invention provides a thermal transfer donor element comprising a support layer and a transfer layer supported by the support layer and comprising a binder containing carboxylic acid groups. The...
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7361288 |
Components for high-frequency technology
The present invention relates to switchable components for high-frequency technology, in particular microwave technology, which use liquid-crystalline dielectrics, to the liquid-crystal materials,...
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7358302 |
Composition for light-scattering film and light-scattering film using the same
A composition for a light-scattering film contains fluorine-containing resin fine particles each including a copolymer of a first ethylenically unsaturated monomer containing fluorine with other...
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7358034 |
Method of processing on-press developable lithographic printing plate
A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain...
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7358032 |
Planographic printing plate precursor
A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared...
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7358030 |
Process for producing ether compound
The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of...
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7358029 |
Low activation energy dissolution modification agents for photoresist applications
A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution...
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7358028 |
Chemically amplified positive photo resist composition and method for forming resist pattern
The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a...
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7354965 |
Azo compound, colorant-containing curable composition, and color filter and method of producing the same
The present invention provides a novel azo compound, a curable composition comprising a colorant superior in the light-fastness and heat resistance of a dye, pattern-forming characteristics...
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7354808 |
Resist composition and method for manufacturing semiconductor device using the same
An object of the invention is to provide a resist composition which is possible to form a film by using a drawing means and which functions as a protective film used at the time of etching, adding...
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7354698 |
Imprint lithography
An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the...
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7354693 |
Polymer, resist protective coating material, and patterning process
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the...
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7354692 |
Photoresists for visible light imaging
A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably...
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