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7498116 |
Resist composition and pattern formation method using the same
A resist composition includes: (A) a resin that includes: a repeating unit represented by a following formula (I), and a repeating unit represented by a following formula (II); and (B) a compound...
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7498123 |
Infrared dye compositions
Disclosed are novel aminium, diimonium, and polymethine borate dyes that have at least one absorption maximum in the infrared spectral region between about 700 and 2000 nm and that are useful as...
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7498393 |
Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film
A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the...
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7498115 |
Photoresist compositions
Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes...
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7494762 |
Positive resist composition for immersion lithography and method for forming resist pattern
Provided are a positive resist composition for immersion lithography, and a method for forming a resist pattern using the same, wherein the positive resist composition comprises a resin component...
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7494763 |
Polyhydric phenol compound and chemically amplified resist composition containing the same
The present invention provides a polyhydric phenol compound represented by the formula (I):
wherein at least one selected from R 1 , R 2 , R 3 , R 4 , and R 5 is a group represented by the...
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7494761 |
Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition
A photoresist film is formed on an object layer of a semiconductor device by coating the object layer with a photoresist composition including about 7 percent to about 14 percent by weight of a...
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7494759 |
Positive resist compositions and process for the formation of resist patterns with the same
A positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the component (A) is a copolymer which comprises constituent units (a1) derived from a...
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7491484 |
Photoresist compositions and methods of forming a pattern using the same
In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a...
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7491482 |
Photoactive compounds
The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF 2 CF 2 OCF 2 CF 2 —SO 3 − . The compounds are useful...
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7491485 |
Resist composition and method of forming resist pattern
This resist composition according to the present invention includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid...
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7491483 |
Polymers, positive resist compositions and patterning process
A polymer is composed of recurring units of hydroxyvinylnaphthalene, (meth)acrylic units having a lactone ring fused to a bridged ring, and (meth)acrylic units having acid labile groups. A positive...
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7488566 |
Positive type radiation-sensitive resin composition
A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer...
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7488569 |
Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1):
is contained in a structure of the...
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7488568 |
Resist composition, method of forming resist pattern, compound and acid generator
A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by...
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7488565 |
Photoresist compositions comprising diamondoid derivatives
Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane...
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7485405 |
Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film
The present invention relates to a photocurable resin composition, wherein the composition comprises:(A) a polyimide resin having one or more primary alcoholic groups with an alcoholic equivalent...
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7485404 |
Nonsolvate-form crystal of polymethine compound and process for producing the same
A novel nonsolvate-form crystal of polymethine compound is provided which has good stability in solution, shows a high gram extinction coefficient, is excellent in storage stability, is easy to...
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7485403 |
Laser-markable compositions
A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.
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7485408 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Fluorine-containing silicon compounds having the general formula (1):
wherein X 1 , X 2 , and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6...
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7485406 |
Photostorage solid drawing medium
The invention provides a photostorage solid drawing medium comprising a solvent, a resin soluble in the solvent, a photostorage pigment and a gelling agent, wherein the photostorage pigment...
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7485413 |
Photosensitive composition and method for forming pattern using same
The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating...
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7485407 |
Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition
Disclosed are a siloxane compound, a photoresist composition using the same, and a method of forming a pattern, wherein the siloxane compound is having a general formula:
wherein R1 is a...
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7482108 |
Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
The invention provides a polymer compound capable of forming a positive resist composition that can form a high-resolution pattern with a reduced level of LER, an acid generator formed from such a...
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7481954 |
Composition for a light filtering material
A composition for a filter material includes a dye and possibly a polymer host. The dye includes a Co(II) compound, a Ni(II) compound or a mixture thereof. Filter material can have a transmittance...
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7482107 |
Photoresist composition
Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a...
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7479361 |
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
An objective of this invention is to prevent resist poisoning and sensitivity deterioration in a chemically amplified resist. The chemically amplified resist comprises a base resin, a photoacid...
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7479364 |
Copolymer for use in chemical amplification resists
A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent...
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7479362 |
UV decomposable molecules and a photopatternable monomolecular film formed therefrom
Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for...
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7476492 |
Low activation energy photoresist composition and process for its use
The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable...
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7476485 |
Resist lower layer film material and method for forming a pattern
There is disclosed a resist lower layer film material for a multilayer-resist film used in lithography which contains, at least, a polymer having a repeating unit represented by the following...
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7476487 |
Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
Semiconductor nanocrystals surface-coordinated with a compound containing a photosensitive functional group, a photosensitive composition comprising semiconductor nanocrystals, and a method for...
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7476484 |
Photocrosslinkable polyurethanes
Linear crosslinkable polyurethanes obtained from (a) at least one diisocyanate having 2 to 30 carbon atoms, (b) at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose...
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7473515 |
Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use
Described herein are novel thermally reactive near-infrared absorbing acetal copolymers that undergo chemical and physical changes upon exposure to near-infrared radiation. Also described are the...
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7473448 |
Photoalignment of liquid crystals using poly(vinylstilbazolium) polymers
The present invention relates to a photoalignable material comprising a photoactive stilbazolium-containing polymer of formula I:
wherein,
M a , M b , M c are monomer units making up the...
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7473514 |
Sulfur-containing dispersant and sulfide phosphor paste composition comprising the same
A sulfide phosphor paste composition comprising a sulfur-containing dispersant, and a fluorescent film prepared therefrom, are provided. The sulfur-containing dispersant has a dual head structure...
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7473512 |
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition...
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7473749 |
Preparation of topcoat compositions and methods of use thereof
A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that...
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7470499 |
Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R 1 and R 2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the...
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7470500 |
Organic bottom antireflective polymer compositions
The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a...
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7468237 |
Integrated optical circuits having drop-in locations for optical circuit elements
A plurality of mask images defines an optical circuit image in photoresist. Each of the mask images comprises parts of the optical circuit and the totality of all mask images together defines an...
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7467587 |
Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working...
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7468236 |
Amine compound, chemically amplified resist composition and patterning process
Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication...
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7468234 |
Planographic printing plate precursor
The planographic printing plate precursor according to the present invention includes: a support; and a photosensitive layer provided on the support and containing a polymer having the structural...
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7468235 |
Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions
Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer...
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7468228 |
Light shielding film for display device, production process thereof, metal-particle-containing composition, photosensitive transfer material, substrate for display device, and color filter
A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for...
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7468227 |
Method of reducing the average process bias during production of a reticle
We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing...
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7465529 |
Radiation sensitive material and method for forming pattern
A copolymer expressed by the following structural formula
was obtained by loading adamantyl methacrylate monomer and t-butyl acrylate monomer by 1:1, then conducting polymerization, adding AIBN...
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7465527 |
Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same
The resist material contains a photo-acid generator having an absorption peak to exposure light having a wavelength of less than 300 nm, and a second photo-acid generator having an absorption peak...
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7465530 |
Inorganic resist material and nano-fabrication method by utilizing the same
An inorganic resist material is provided, which is an incomplete oxide of a phase-change material. The oxygen content in the inorganic resist material is lower than the stoichiometric oxygen...
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