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7611827 |
Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head
A positive type photosensitive resin composition comprises a polyacrylate resin having, in the structure, at least a structural unit represented by the following general formula (1):
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7608309 |
Resin composition, film and image display device utilizing the resin composition
A resin composition containing a polymer comprising a repeating unit having a spiro structure and/or a cardo structure. The resin composition has superior heat resistance and is utilized to produce...
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7608381 |
Polymer compound, positive resist composition and process for forming resist pattern
The positive resist composition of the present invention is a polymer compound comprising at least one constituent unit (a1) selected from the group consisting of constituent units represented by...
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7608382 |
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic...
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7608380 |
Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred...
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7608383 |
UV radiation blocking protective layers compatible with thick film pastes
This invention relates to novel compositions comprising a protective polymer layer and a UV blocking agent. This is used in the fabrication of electronic devices using thick film pastes. The...
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7608389 |
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and...
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7608386 |
Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
The present invention can provide a resist cover film-forming material which is suitably used for a resist cover film for liquid immersion exposure and can transmit ArF excimer laser lights and...
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7605439 |
Antireflective hard mask compositions
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a...
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7604918 |
Photosensitive polymer and photoresist composition having the same
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the...
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7604919 |
Monomer, polymer and composition for photoresist
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
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7604911 |
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device
A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formed on the resist pattern, wherein the...
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7604924 |
Negative-working imageable elements and methods of use
A negative-working imagable composition and element includes an initiator composition, an infrared radiation absorbing compound, a polymeric binder, and a stabilizing composition. The imaged...
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7604920 |
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:
wherein R 1 represents a...
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7604916 |
Donor films with pattern-directing layers
Laser induced thermal imaging (LITI) donor films, and methods of preparing them, having a substrate, a light-to-heat conversion layer, and a pattern-directing layer. The pattern-directing layer can...
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7604917 |
Polymer, top coating layer, top coating composition and immersion lithography process using the same
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a...
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7601479 |
Polymer, resist composition and patterning process
A polymer comprising recurring units of formulae (1) to (4) wherein R 1 , R 3 , R 4 and R 7 are hydrogen or methyl, R 2 is an acid labile group, R 5 and R 6 are hydrogen or hydroxyl, and R 8 ...
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7601819 |
Azo dye, colored curable composition, color filter and producing method therefor
A dye represented by the following formula (1-1), a colored curable composition using the same, and a colored curable composition including a dye represented by the following formula (1) and at...
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7601486 |
Ultra dark polymer
A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark...
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7601480 |
Photoactive compounds
The present application relates to a compound of formula
where X is selected from the group CF 3 SO 3 , C 4 F 9 SO 3 , N(SO 2 C 2 F 5 ) 2 , N(SO 2 CF 3 SO 2 C 4 F 9 ), N(SO 2 C 3 F 7 ) 2 , N(SO...
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7601478 |
Bicyclo compound, method for producing fused aromatic compound using the same and method for forming film of the same
There is provided a method for producing highly purified fused aromatic ring compounds with high yield by a simpler method. A method for producing a fused aromatic ring compound comprising...
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7598182 |
Anti-reflective coating forming composition containing polyamic acid
There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for...
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7598016 |
Resist composition and patterning process
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic...
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7598017 |
Negative resist composition and method of forming resist pattern
A negative resist composition including:
a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural...
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7598009 |
Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at...
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7598019 |
Method for cleavage of labile functional groups from chemical compounds
The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical...
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7598022 |
Positive and negative dual function magnetic resist lithography
The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist...
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7598014 |
Thick film photoresist composition and method of forming resist pattern
A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a...
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7598015 |
Polymer, resist composition and patterning process
A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A...
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7595143 |
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about...
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7595141 |
Composition for coating over a photoresist pattern
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for...
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RE40920 |
Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g.,...
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7592118 |
Positive resist composition and pattern forming method using the same
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to...
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7592124 |
Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the...
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7592119 |
Photosensitive polyimide resin composition
The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even...
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7592127 |
Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
The present invention provides a resist pattern thickening material and the like which can thicken a resist pattern and form a fine space pattern. The resist pattern thickening material contains: a...
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7592123 |
Resin for photoresist composition, photoresist composition and method for forming resist pattern
A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a...
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7592131 |
Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly...
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7592132 |
Method for fine pattern formation
In a method of effectively miniaturizing a resist pattern, a super fine pattern-forming method of restricting a film thickness of a crosslinked film and also preventing developing defects is...
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7592122 |
Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition
A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen...
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7592126 |
Positive resist composition and pattern forming method using the resist composition
A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali...
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7592407 |
Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
A polymerizable fluorinated compound having formula (2a) or (2b) wherein R 1 and R 2 are H or C 1 -C 20 alkyl or fluoroalkyl, R 3 is H, F or C 1 -C 4 alkyl or fluoroalkyl, and R is H or a...
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7592121 |
Antireflection film, polarizing plate and display device
An antireflection film that has sufficient antireflection capability and antifouling property and is improved in scratch resistance, and a process for producing an antireflection film with...
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7592125 |
Photoresist compositions comprising resin blends
New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero...
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7592052 |
Substrate structures, liquid crystal display devices and methods for fabricating liquid crystal display devices
Substrate structures, liquid crystal display devices and methods of fabricating liquid crystal display devices. A substrate structure comprises a transparent substrate having an electrode layer...
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7588878 |
Inkless printing paper and method
An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photoacid generator and an acid-base indicator. In...
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7588877 |
Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a...
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7588876 |
Resist material and pattern formation method
A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1:
wherein R 1 , R 2 and R 3 are the same or...
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7589242 |
Use of highly purified hydrocarbons in vacuum ultraviolet applications
The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements,...
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7585611 |
Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof
A photocurable and thermosetting resin composition comprising (A) a carboxylic acid-containing photosensitive resin having at least one carboxyl group and at least two ethylenically unsaturated...
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