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7323288 |
Layers in printing plates, printing plates and method of use of printing plates
A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of...
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7323284 |
Negative type radiation sensitive resin composition
A negative type radiation sensitive resin composition comprising:
(A) an alkali-soluble resin containing the polymerized unit of a polymerizable unsaturated compound having a phenolic...
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7320854 |
Radiation sensitive refractive index changing composition, pattern forming method and optical material
There is provided a radiation sensitive refractive index changing composition containing an inorganic oxide particle, a polymerizable compound, a radiation sensitive decomposer and an escapable...
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7318992 |
Lift-off positive resist composition
A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating...
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7318991 |
Heterocycle-bearing onium salts
The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and...
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7316887 |
Photosensitive lithographic printing plate and method for making a printing plate
A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of...
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7316891 |
Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
A method of making a lithographic printing plate is disclosed which comprises the steps of
providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic...
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7316874 |
Process and donor elements for transferring thermally sensitive materials to substrates by thermal imaging
Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate...
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7316885 |
Method of forming resist pattern, positive resist composition, and layered product
There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the...
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7316886 |
Protective film-forming composition for immersion exposure and pattern-forming method using the same
A protective film-forming composition for immersion exposure comprises a water-insoluble and alkali-soluble resin comprising a repeating unit derived from a monomer having an acid dissociation...
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7316884 |
5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is...
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7314700 |
High sensitivity resist compositions for electron-based lithography
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the...
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7314699 |
Radiation-sensitive mixture and recording material produced therewith
The present invention relates to a radiation-sensitive mixture which contains an acrylate or methacrylate monomer and/or oligomer capable of free radical polymerization and having at least two...
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7314701 |
Radiation-sensitive resin composition
A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or...
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7314702 |
Composition for a bottom-layer resist
A composition for a bottom-layer resist, having superior anti-refractivity and dry-etch resistance for use in a bi-layer resist process employing a light source at a wavelength of 193 nm or below,...
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7314703 |
Chemically amplified resist material and pattern formation method using the same
In a pattern formation method, a resist film made of a chemically amplified resist material including a first polymer having hemiacetal or hemiketal is formed on a substrate. Then, with a liquid...
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7312018 |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port...
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7312015 |
Process for refining crude resin for electronic material
A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this...
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7312014 |
Resist compositions
The present invention relates to a resist composition for practical use with high resolution, high sensitivity, superior pattern profile and no outgas in energy irradiation under high vacuum,...
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7312287 |
Fluorinated polymers useful as photoresists, and processes for microlithography
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically...
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7312016 |
Chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline...
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7312006 |
Pigment dispersion composition for color filter, production method thereof, and color filter for display
The present invention is to provide a pigment dispersion composition for a color filter having the excellent pigment dispersing property and dispersion stability, good developing property and...
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7312013 |
Photoreactive composition
This invention provides a photoreactive composition in which reaction of a hydrolyzable metal compound takes place by irradiation of light. A photoreactive composition, which comprises a...
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7309559 |
Resist pattern, process for producing same, and utilization thereof
A resist pattern having a film thickness of 1 to 100 μm and an aspect ratio (ratio of the line width to the film thickness of the resist pattern) of 3.5 or higher is provided in accordance with...
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7309560 |
Composition for forming anti-reflective coating
There is provided a composition for forming anti-reflective coating for use in a lithography process with irradiation light from F2 excimer laser (wavelength 157 nm) which has a high effect of...
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7309750 |
Cyanoadamantyl compounds and polymers
Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are...
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7306899 |
Method for manufacturing photoresist having nanoparticles
An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions ( 211 ); adding a sulfide...
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7306890 |
Aluminum alloy plate for lithographic printing form and method for production thereof and lithographic printing form
The present invention provides an aluminum alloy plate for use as a lithographic printing plate having an improved uniformity of a surface roughened by electrolytic etching and wherein streaking...
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7306897 |
Preparation method of printing plate material and printing plate material
A method for preparing a printing plate material containing a substrate having thereon a hydrophilic layer, comprising the steps of (i) applying on the substrate an aqueous coating solution for the...
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7307687 |
Lithographic apparatus, device manufacturing method and substrate
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation...
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7307123 |
Photocurable compositions containing reactive particles
A photocurable composition, including (a) a photocurable monomer, e.g. a cationically curable monomer and/or a radically curable monomer; (b) reactive particles comprising a crosslinked elastomeric...
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7303852 |
Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method
The invention provides a high-resolution resist material comprising an acid generator that has high sensitivity and high resolution with respect to high-energy rays of 300 nm or less, has small...
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7303853 |
3-D structures with smoothly-varying topographical features in photo-sensitive epoxy resists
3-D structures which are fabricated by gray-tone exposure of a class of thick negative photo-sensitized epoxy resists from the substrate side of a transparent substrate, using development methods...
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7303854 |
Electrode-forming composition for field emission type of display device, and method using such a composition
A composition utilized in and a method for forming an electrode used in field emission type of display devices said composition is a photosensitive copper conductive composition comprising: a...
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7304175 |
Salt suitable for an acid generator and a chemically amplified resist composition containing the same
The present invention provides a salt of the formula (I)
wherein X represents —OH or —Y—OH, n shows an integer of 1 to 9, A + represents an organic counter ion, Y represents a divalent...
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7300741 |
Advanced chemically amplified resist for sub 30 nm dense feature resolution
The present invention discloses a chemically amplified (CA) resist composition for printing features having a dimension of about 30 nm or less and a method of forming a material structure having a...
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7300727 |
Method for forming temporary image
An image forming method composed of: (a) providing a reimageable medium composed of a substrate and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an...
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7300747 |
Photobase generator and curable composition
The photobase generator of the invention is represented by the following formula 1:
wherein Ar, R, A + and X − are as defined in the specification. Since the photobase generator of the...
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7300743 |
Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a...
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7300694 |
Multilayer body with a first laser-sensitive layer and a second laser-sensitive layer and method for generation of a multilayer image in said multilayer body
Described is a multi-layer body having two laser-sensitive layers 4, 32 . The multi-layer body is a body laminated from the overlay films 30, 32 , the inlets 90, 90 and the further overlay...
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7300880 |
Methods for forming fine photoresist patterns
A method of forming a fine pattern by a tri-layer resist process to overcome a bi-layer resist process is disclosed. When a fine pattern is formed using a silicon photoresist, a gas protection film...
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7297465 |
Heat-sensitive lithographic printing plate precursor
According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a...
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7297466 |
Method of forming a photoresist pattern and method for patterning a layer using a photoresist
An organic anti-reflective coating (ARC) is formed over a surface of a semiconductor substrate, and a resist layer including a photosensitive polymer is formed on the ARC. The photoresistive...
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7297463 |
Photosensitive polymer and chemically amplified photoresist composition including the same
A photosensitive polymer for forming high-resolution fine circuit patterns with an exposure light source of a short wavelength, and a chemically amplified photoresist composition including the...
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7297464 |
Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component...
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7297460 |
Radiation curable ink compositions suitable for ink-jet printing
A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO 1.5 )] n ...
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7294449 |
Radiation patternable functional materials, methods of their use, and structures formed therefrom
Materials, compounds and compositions for radiation patternable functional thin films, methods of synthesizing such materials and compounds, and methods for forming an electronically functional...
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7294450 |
Chemical amplification-type resist composition and production process thereof
A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating...
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7294448 |
Composition sensitive to visible light
The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing...
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7294447 |
Positive-working lithographic printing plate precursor
A lithographic printing plate precursor is disclosed which comprises (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer and (ii) a coating provided thereon,...
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