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7354965 |
Azo compound, colorant-containing curable composition, and color filter and method of producing the same
The present invention provides a novel azo compound, a curable composition comprising a colorant superior in the light-fastness and heat resistance of a dye, pattern-forming characteristics...
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7354692 |
Photoresists for visible light imaging
A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably...
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7354693 |
Polymer, resist protective coating material, and patterning process
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the...
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7351515 |
Positive resist composition and pattern-forming method using the same
A positive resist composition includes:
(A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid...
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7351518 |
Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer
A composition is specified which forms an electrically conductive resist layer and comprises a resin that can be crosslinked to form a base polymer, an organic compound that can be crosslinked to...
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7351294 |
Surface cleaner
The present invention relates to methods of use for photocatalytic cleaning compositions and photocatalytic cleaning compositions effective to degrade soils deposited on a surface, to reduce the...
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7351523 |
Photographic materials having improved keeping properties
The use of a red-sensitising trinuclear merocyanine dye and an osmium dopant according to formula (I): [Os(NZ)L 5 ] r wherein Z is sulphur or oxygen, L is a ligand and r is 0, −1, −2 or −3,...
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7351362 |
Photochromic material
A photochromic material comprising a styrene-based oligomer having a weight average molecular weight of from 200 to 6000 and a photochromic compound selected from the group consisting of...
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7351506 |
Polymerization-encapsulated cholesteric liquid crystal for bistable reflective displays
A liquid crystal polymer dispersion is formed where liquid crystal encapsulation is produced by a process in which a reactive additive formulation is mixed and photo-polymerized. The polymerizable...
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7348128 |
Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound
A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under...
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7348126 |
Negative working, heat-sensitive lithographic printing plate precursor
A negative-working lithographic printing plate precursor is disclosed comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an...
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7344821 |
Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same
A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment...
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7344820 |
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same
The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising...
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7341818 |
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent...
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7341817 |
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific...
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7341816 |
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic...
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7341828 |
Thiol compound, photopolymerization initiator composition and photosensitive composition
A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α-...
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7341819 |
Method of manufacture of photosensitive material packaging body and photosensitive material packaging body
Several sheets of sheet-shaped photosensitive material 1 are stacked on a paper tray container 2 prepared by press-forming stencil paper sheet, the photosensitive material 1 stacked on said...
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7338744 |
Positive resist composition and pattern forming method using the same
The invention provides a positive resist composition suitably usable at the time of using an ArF excimer laser light as the exposure light source, assured of excellent performance in view of resist...
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7338741 |
Lithographic printing plate precursor and lithographic printing method
A lithographic printing plate precursor comprises: an aluminum support that has been subjected to an alkali metal silicate treatment; and an image-recording layer comprising (A) an infrared...
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7338751 |
Process for producing printed wiring board and photosensitive resin composition used in the same
An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring...
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7338740 |
Positive resist composition
A positive resist composition comprising (A) a resin comprising at least one kind of acrylate derivative repeating units, repeating units having lactone structures and repeating units having...
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7338619 |
Resin member and method of manufacturing the same
A fuel cap 10 maintains high sealing even when subjected to external force; is easy to operate; and requires minimal space for accommodation. The cap device comprises a casing body 20 for...
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7335455 |
Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same
A method of forming an underlayer of a bi-layer resist including forming a blended material by blending a polymer having an aromatic group and a methacrylate polymer, and coating a substrate with...
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7335464 |
Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The...
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7335454 |
Positive resist composition
A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a...
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7335458 |
Chemically amplified positive resist composition and patterning process
A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a...
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7335585 |
Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole
A method for manufacturing a semiconductor device which, on performing a via first Dual Damascene process, inhibits or prevents the formation of a void in a bottom anti-reflective coating filling a...
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7335456 |
Top coat material and use thereof in lithography processes
A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of...
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7335457 |
Positive-tone radiation-sensitive resin composition
A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is...
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7332262 |
Photolithography scheme using a silicon containing resist
A method for forming a patterned amorphous carbon layer in a semiconductor stack, including forming an amorphous carbon layer on a substrate and forming a silicon containing photoresist layer on...
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7332257 |
Composition for optical film, and optical film
A composition for an optical film comprising a stabilized cyanine dye and a quencher compound, wherein the stabilized cyanine dye comprises a cation and a quencher anion, and the cation is selected...
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7332258 |
Positive resist composition and process for forming pattern using the same
A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined...
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7332259 |
Aluminum support for planographic printing plate, its manufacturing process, and planographic printing plate material
Disclosed is a process for manufacturing an aluminum support for a light sensitive planographic printing plate material, the process comprising the steps of surface-roughening an aluminum plate,...
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7329478 |
Chemical amplified positive photo resist composition and method for forming resist pattern
To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an...
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7329477 |
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present...
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7329630 |
Stabilizers and anti-fade agents for use in infrared sensitive leuco dye compositions
Compositions and methods for production of color images having increased light stability and reduced browning are described. The color forming composition can include a leuco dye, an infrared...
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7326442 |
Antireflective composition and process of making a lithographic structure
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer...
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7326519 |
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition
In a photosensitive resin, a photoresist composition including the photosensitive resin and a method of forming a photoresist pattern using the photoresist composition, the photosensitive resin...
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7326510 |
Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
Mixed carbocycle derivatives containing at least two carbocycles per molecule from the group of anthracenes, adamantanes and steroids with functionalized carbon chains are synthesized and used as...
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7326520 |
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in...
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7326509 |
Composition for forming anti-reflective coating for use in lithography
There is provided a composition for forming anti-reflective coating for use in a lithography which has a high effect of inhibiting reflected light, causes no intermixing with resist layers, affords...
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7326514 |
Organoelement resists for EUV lithography and methods of making the same
Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the...
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7326513 |
Positive working resist composition
A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2)...
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7326512 |
Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound
Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base...
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7326517 |
Planographic printing plate material and preparing process of planographic printing plate
A photosensitive composition containing: (A) a sensitizing dye; (B) a photopolymerization initiator; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) a polymer binder,...
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7326511 |
Sulfonate derivatives and the use thereof as latent acids
Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a...
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7326516 |
Resist composition for immersion exposure and pattern formation method using the same
A resist composition for immersion, comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a photoacid generator; and (C) a mixed solvent...
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7326518 |
Photoresist compositions
Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced...
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7323286 |
Photosensitive composition, compound used in the same, and patterning method using the same
A photosensitive composition, comprises (A) a sulfonium salt represented by formula (I);
wherein Y 1 , Y 2 and Y 3 each independently represents a nitrogen-containing heteroaryl group, an...
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