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8182975 |
Positive resist composition and pattern forming method using the same
A positive resist composition, includes: (A) a resin that has a group having absorption at 248 nm at a main chain terminal of the resin (A), and a pattern forming method uses the composition.
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8182977 |
Polymer and positive-tone radiation-sensitive resin composition
A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to...
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8182976 |
Positive resist composition, method of forming resist pattern, and polymeric compound
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which...
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8182978 |
Developable bottom antireflective coating compositions especially suitable for ion implant applications
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
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8178277 |
Electromagnetic radiation or thermally sensitive composition
The present invention provides coating compositions comprising (i) a) a compound containing a free carbonyl group and b) a nucleophile or (ii) a compound containing a free carbonyl group, which...
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8178198 |
Adhesive sheet
An adhesive sheet includes a substrate and an energy-ray curable adhesive layer formed on the substrate. The energy-ray curable adhesive layer includes an energy-ray curable acrylic copolymer and a...
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8178282 |
Heat-sensitive imaging element
A heat-sensitive imaging element includes an IR dye, and more particularly a heat-sensitive lithographic printing plate precursor includes the IR dye. A method for making the lithographic printing...
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8178278 |
Miniaturized microparticles
A system and method for encoded microparticles is described. One embodiment includes an encoded microparticle comprising a plurality of segments, wherein the plurality of segments form a spatial...
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8173353 |
Sulfonium compound
The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a...
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8173348 |
Method of forming pattern and composition for forming of organic thin-film for use therein
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or...
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8173347 |
Micropatterning of molecular surfaces via selective irradiation
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to...
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8173346 |
Printing members having permeability-transition layers and related methods
Affinity transitions from hydrophobic to hydrophilic states, rather than ablation mechanisms, facilitate the creation of an imagewise lithographic pattern on a printing plate. In various...
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8173354 |
Sulfonium salt, resist composition, and patterning process
A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to...
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8173351 |
Compound and radiation-sensitive composition
A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the...
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8173356 |
Three dimensional scaffold and method of fabricating the same
A three dimensional scaffold having a three dimensional structure is easily fabricated by employing a lithography process used in a semiconductor manufacturing process. A method of fabricating the...
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8173358 |
Method of forming fine patterns of a semiconductor device
A method of forming fine patterns of a semiconductor device includes forming a plurality of first mask patterns on a substrate such that the plurality of first mask patterns are separated from one...
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8173352 |
Resist composition
A resist composition comprising: (A) a resin comprising a structural unit having an acid-labile group in its side chain and a structural unit represented by the formula (I): wherein R1 represents a...
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8173350 |
Oxime compound and resist composition containing the same
An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a...
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8173349 |
Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device
A polymer compound is provided which is excellent in heat resistance and insulating property, and a photosensitive resin composition is provided which includes the polymer compound, and may form a...
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8168368 |
Miniaturized microparticles
A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system...
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8168378 |
Substrate treatment system, substrate treatment method, and computer readable storage medium
In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In...
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8168369 |
Photoactive compound and photosensitive resin composition containing the same
The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification,...
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8168375 |
Patterning method
Disclosed is a patterning method including: forming a first film on a substrate; forming a multi-layered film including a resist film on the first film; forming a patterned resist film having a...
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8168366 |
Low activation energy photoresist composition and process for its use
The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable...
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8168367 |
Resist composition and patterning process
The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist,...
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8168689 |
High optical contrast pigment and colorful photosensitive composition employing the same and fabrication method thereof
A high optical contrast pigment and colorful photosensitive composition employing the same are disclosed. The composition comprises a solvent, an alkali-soluble resin, reactive monomer, and a...
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8168371 |
Positive photosensitive resin composition
It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface...
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8168690 |
Solvent-free photocurable resin composition for protective film
A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the...
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8163463 |
Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a...
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8163461 |
Photoacid generator compounds and compositions
The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also...
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8163462 |
Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device
The present invention relates to a photosensitive composition, which is capable of being irradiated with high energy beam having a wave length of 1 to 300 nm band. The photosensitive composition...
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8163465 |
Ablatable elements for making flexographic printing plates
Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is from about 300 to about 4,000 μm in thickness. The ...
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8163466 |
Method for selectively adjusting local resist pattern dimension with chemical treatment
A method forms a first patterned mask (comprising rectangular features and/or rounded openings) on a planar surface and forms a second patterned mask on the first patterned mask and the planar...
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8163464 |
Propanoates and processes for preparing the same
A process for preparing proponates which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed...
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8163460 |
Underlayer coating forming composition for lithography containing polysilane compound
There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no...
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8158338 |
Resist sensitizer
Methods and compositions for enhancing the sensitivity of a resist composition are disclosed. In one aspect, compositions for use with a matrix material (e.g., a lithographically sensitive...
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8158328 |
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same
A composition for forming an anti-reflection film on a resist film is provided, which is superior in handling characteristics, and is not accompanied by generation of deposits and the like after...
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8158022 |
Polarizing film
The present invention provides a polarizing film containing an azo compound represented by the following formula (1): in which X is a hydrogen atom, a halogen atom, a nitro group, a cyano group, an...
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8158327 |
Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group...
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8158329 |
Compound and chemically amplified resist composition containing the same
The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group...
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8158308 |
Negative curable composition, color filter, and method of producing the same
The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein...
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8158981 |
Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film
The present invention provides a photosensitive resin composition comprising a component (a): a siloxane resin obtained by hydrolyzing and condensing a silane compound comprising a compound...
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8158330 |
Resist protective coating composition and patterning process
A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl) acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second ...
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8158326 |
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition conta...
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8158325 |
Compositions and processes for photolithography
Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
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8153347 |
Flexographic element and method of imaging
A relief (or flexographic) printing precursor has first and second radiation-sensitive layers, or a plurality of radiation-sensitive layers. The first radiation-sensitive layer is sensitive to a...
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8153344 |
Methods for producing photosensitive microparticles, aqueous compositions thereof and articles prepared therewith
Described are aqueous compositions of an effective amount of at least one photosensitive material and at least one polymerizable component that are adapted to at least partially form photosensitive...
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8153345 |
Laser induced thermal imaging apparatus and laser induced thermal imaging method
A laser induced thermal imaging apparatus for imaging an imaging layer of a donor film on an acceptor substrate. The laser induced thermal imaging apparatus includes: a substrate stage having an...
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8153836 |
Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
In a mixture of silsesquioxane compounds comprising silsesquioxane units having a side chain including a direct bond between a silicon atom and a norbornane skeleton and having a degree of...
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8153201 |
Method of manufacturing light-emitting device, and evaporation donor substrate
The present invention provides a method of manufacturing a light-emitting device and an evaporation donor substrate, by which the precision of patterning of an EL layer of each color can be...
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