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8183123 |
Method of forming mark in IC-fabricating process
A method of forming a mark in an IC fabricating process is described. Two parts of the mark each including a plurality of linear patterns are respectively defined by two exposure steps that either...
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8137875 |
Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an...
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8129097 |
Immersion lithography
A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The...
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8119310 |
Mask-shift-aware RC extraction for double patterning design
A method includes providing a layout of an integrated circuit design, and generating a plurality of double patterning decompositions from the layout, with each of the plurality of double patterning...
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8107079 |
Multi layer alignment and overlay target and measurement method
A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern...
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8105736 |
Method and system for overlay correction during photolithography
A method of performing overlay error correction includes forming a photoresist layer over a substrate and exposing a first set of apertures to incident radiation. The method also includes...
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8102507 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a...
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8092961 |
Position aligning apparatus, position aligning method, and semiconductor device manufacturing method
A position aligning apparatus performs position alignment of a pattern in a current process of a pattern exposure process by using a pattern formed before the current process. The position aligning...
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8088539 |
Exposure aligning method and exposure apparatus
In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second...
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8043797 |
Lithographic apparatus and device manufacturing method
A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase...
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8043772 |
Manufacturing method and manufacturing system of semiconductor device
In an exposure process forming a predetermined circuit pattern of a semiconductor device on a wafer, a resist dimension of the resist pattern formed on a wafer and a focus position in the exposure...
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8040497 |
Method and test structure for estimating focus settings in a lithography process based on CD measurements
By encoding process-related non-uniformities, such as different height levels, which may be caused by CMP or other processes during the fabrication of complex device levels, such as metallization...
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8039181 |
Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario
By taking into consideration the combination of the substrate holders in various lithography tools used during the imaging to two subsequent device layers, enhanced alignment accuracy may be...
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8034515 |
Pattern forming method, pattern designing method, and mask set
A pattern designing method according to an embodiment of the present invention includes: designing a first pattern for inspection formed by arraying a plurality of first mark rows, in which...
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8029953 |
Lithographic apparatus and device manufacturing method with double exposure overlay control
A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a...
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8029947 |
Systems and methods for implementing and manufacturing reticles for use in photolithography tools
Methods, systems, and tool sets involving reticles and photolithography processing. Several embodiments of the invention are directed toward obtaining qualitative data from within the pattern area...
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8029952 |
Magnetic recording medium, method for manufacturing the same, and magnetic recording/reproducing apparatus
There is provided a method for fabricating a magnetic recording medium that provides high throughput, low manufacturing cost, and no degradation in accuracy in pattern size in fine pattern...
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8021804 |
Photomask manufacturing method
A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an...
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8007959 |
Photomask and pattern formation method using the same
A photomask includes a transparent substrate having a transparent property against exposing light and a halftone portion formed on the transparent substrate. In the halftone portion, a first...
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7998641 |
Photomask and pattern formation method using the same
A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the...
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7999399 |
Overlay vernier key and method for fabricating the same
An overlay vernier key includes a semiconductor substrate on which a cell region and a scribe lane region are defined, and a plurality of vernier patterns which are formed in the scribe lane region...
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7968258 |
System and method for photolithography in semiconductor manufacturing
A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a...
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7952696 |
Exposure measurement method and apparatus, and semiconductor device manufacturing method
An exposure measurement apparatus is configured by including a size measurer measuring respective sizes of at least a pair of transferred patterns having mutually different optimal focus positions...
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7951512 |
Reticle for projection exposure apparatus and exposure method using the same
In order to provide a reticle capable of increasing the number of chips per wafer and of enabling highly accurate alignment, and an exposure method using the reticle, a first alignment mark...
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7947429 |
Long length flexible circuits and method of making same
Disclosed is a method for making long flexible circuits. Some of the long circuits may be made using a single photoimaging mask. Also disclosed are flexible circuits made by this method.
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7947433 |
Exposure method
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern...
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7941232 |
Control method, control system, and program
By repeatedly executing a predetermined measurement at set intervals, data on a predetermined performance (a best focus position) of a predetermined apparatus and data on variation factors of the...
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7935464 |
System and method for self-aligned dual patterning
A system and a method for self-aligned dual patterning are described. The system includes a platform for supporting a plurality of process chambers. An etch process chamber coupled to the platform....
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7933015 |
Mark for alignment and overlay, mask having the same, and method of using the same
A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern...
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7927768 |
Alignment mark of mask
A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and...
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7914958 |
Semiconductor device manufacturing method
A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the...
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7916276 |
Lithographic apparatus and device manufacturing method with double exposure overlay control
A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a...
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7916284 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component...
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7911612 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic...
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7906258 |
Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device
In a photomask in which a device pattern, an alignment mark and a superimposition inspection mark are formed on a light transmitting base, each of the alignment mark and the superimposition...
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7892712 |
Exposure method
An exposure method suitable for a photolithography process is described. First, a wafer with a group of alignment marks formed thereon is provided. A first alignment step is conducted by using the...
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7887997 |
Manufacturing method for conducting films on two surfaces of transparent substrate of touch control circuit
A manufacturing method for conducting films on two opposite surfaces of a transparent substrate of a touch control circuit, includes: contacting a first photoresist layer having photosensitive and...
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7890203 |
Wiring forming system and wiring forming method for forming wiring on wiring board
A wiring forming system comprises: maskless exposure unit which directly exposes an unexposed board by using exposure data generated based on design data relating to an wiring board;...
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7883823 |
Photomask and method for manufacturing a semiconductor device using the photomask
A method of manufacturing a semiconductor device that includes: a first exposing step using a photomask in a first area of a semiconductor substrate; and a second exposing step using the photomask...
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7880152 |
Device and method for producing resist profiled elements
The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis...
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7879515 |
Method to control semiconductor device overlay using post etch image metrology
A method of determining positioning error between lithographically produced integrated circuit patterns on at least two different lithographic levels of a semiconductor wafer comprising. The method...
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7879514 |
Lithographic method and patterning device
A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark...
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7875409 |
Method of manufacturing semiconductor device, mask and semiconductor device
A method of manufacturing a semiconductor device answerable to refinement of circuits by correctly connecting adjacent small patterns with each other with excellent reproducibility in connective...
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7876439 |
Multi layer alignment and overlay target and measurement method
A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern...
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7871744 |
Near-field exposure apparatus and near-field exposure method
A near-field exposure apparatus includes a near-field exposure mask and a mechanism places a substrate, to be exposed, opposed to the near-field exposure mask. A mechanism performs relative...
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7871745 |
Exposure method
The invention provides an exposure method for manufacturing a device. The method includes providing a wafer having several exposure regions with a photoresist layer covering thereon. A feedback...
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7867692 |
Method for manufacturing a microstructure, exposure device, and electronic apparatus
Aspects of the invention can provide a method for manufacturing a microstructure, including forming a photosensitive film above a work piece, exposing the photosensitive film, as a first exposure,...
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7862756 |
Imprint lithography
A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material,...
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7858404 |
Measurement of overlay offset in semiconductor processing
A method of semiconductor manufacturing including forming an overlay offset measurement target including a first feature on a first layer and a second feature on a second layer. The first feature...
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7855035 |
Exposure mask, manufacturing method of electronic device, and checking method of exposure mask
According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first...
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