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7629093 |
Method for correcting critical dimension of mask pattern
A method for correcting a critical dimension (CD) of a mask pattern includes forming an light shielding layer over a substrate including a main cell region and a frame region at a periphery of the...
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7625679 |
Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register...
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7611810 |
Charged beam processing apparatus
A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality...
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7604907 |
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
Mask sets are provided which may be used to define a first pattern region that has a first pitch pattern and a second pattern region that has a second pitch pattern during the fabrication of a...
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7599064 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between...
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7599063 |
Method for checking alignment accuracy using overlay mark
A method for checking the alignment accuracy using an overlay mark is provided. The overlay mark includes an inner mark and an outer mark formed on a wafer. The outer mark is formed in a lower...
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7598024 |
Method and system for enhanced lithographic alignment
A method for alignment mark preservation includes a step of preparing a lower alignment mark structure on a substrate. In one configuration of the invention, the alignment mark structure includes a...
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7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer
A method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer is described. An in-situ interferometer is encoded, or augmented, with special or missing...
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7592130 |
Exposure method
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern...
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7592108 |
Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member...
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7588868 |
Method and system for reducing the impact of across-wafer variations on critical dimension measurements
First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of...
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7588869 |
Divided exposure method for making a liquid crystal display
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first...
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7573574 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology...
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7569332 |
Processing method of thin-film and manufacturing method of thin-film magnetic head
A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a...
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7566516 |
Photomask and method of manufacturing the same
A photomask for defining a photoresist layer formed on a wafer having at least an alignment mark region, wherein each alignment mark region has an alignment mark. The photomask comprises a shot...
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7564556 |
Method and apparatus for lens contamination control
The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an...
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7560224 |
Method of manufacturing liquid discharge head, and liquid discharge head
According to the present invention, there are provided an ink jet recording head capable of performing high-precision printing and recording and having a high reliability, and a method of...
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7560196 |
Mask for exposing an alignment mark, and method and computer program for designing the mask
A mask provided with an alignment mark is presented. That mask includes at least one relatively high reflectance area(s) for reflecting radiation of an alignment beam of radiation, and relatively...
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7556893 |
Self-compensating mark design for stepper alignment
A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a...
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7556898 |
Overlay target for polarized light lithography
A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second...
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7556899 |
System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device
A system for controlling an overlay includes a processing data receiving module receiving a processing data string describing a name of an exposure process for a target layer and an original...
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7556900 |
Measuring the effect of flare on line width
In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a...
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7547502 |
Exposure method
An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural...
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7541120 |
Manufacturing method of semiconductor device
After forming a resist film on a Si substrate, a circuit pattern for a semiconductor integrated circuit, a first L-shaped length measuring pattern and a cross-shaped monitor pattern for alignment...
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7538344 |
Overlay and CD process window structure
The present invention provides photolithographic device and method for photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy...
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7535549 |
System and method for improvement of alignment and overlay for microlithography
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
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7524595 |
Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment
A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7508515 |
System and method for manufacturing printed circuit boards employing non-uniformly modified images
A system and method for fabricating an electrical circuit in which a digital control image ( 46 ) is generated by non-uniformly modifying ( 44 ) a representation of an electrical circuit ( 40 ),...
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7508051 |
Wafer with optical control modules in dicing paths
In a wafer ( 1 ) with a number of exposure fields ( 2 ), each of which exposure fields ( 2 ) comprises a number of lattice fields ( 3 ) with an IC ( 4 ) located therein, two groups ( 5, 7 ) of...
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7501215 |
Device manufacturing method and a calibration substrate
The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the...
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7492443 |
Device manufacturing method, device manufactured thereby and a mask for use in the method
A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned...
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7479356 |
Aligning method
A method, wherein a plurality of first patterns are formed in an exposure region, and second patterns are formed by plural shots, with positions of alignment marks measured for said plurality of...
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7477403 |
Optical position assessment apparatus and method
An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A...
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7477390 |
Exposure method and apparatus, and device manufacturing method
An exposure method of exposing a substrate arranged on a stage, which holds the substrate and moves, to light through an original and a projection optical system. A first measurement is performed...
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7474401 |
Multi-layer alignment and overlay target and measurement method
A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern...
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7473502 |
Imaging tool calibration artifact and method
A method of determining and correcting for distortions introduced by an imaging tool. The method includes providing an imaging tool having a field of view (FOV), and creating a target pattern...
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7469638 |
Electronic devices and processes for forming the same
An electronic device includes an array. In one embodiment, a process for forming an electronic device includes the array, which includes electronic components, can include printing one or more...
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7465525 |
Reticle alignment and overlay for multiple reticle process
A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts is generated from the feature layout...
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7463333 |
Multi-exposure lithography system providing increased overlay accuracy
Multi-exposure lithography systems are provided for improved overlay accuracy. In one aspect, a method for multi-exposure lithography operates by determining overlay parameters corresponding to...
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7462428 |
Complementary masks and method of fabrication of same, exposure method, and semiconductor device and method of production of same
A complementary mask has a plurality of pattern forming regions 34 a, 34 having arranged on them complementary patterns 26, 28 obtained by dividing first circuit patterns into complementary...
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7459247 |
Lithographic apparatus and device manufacturing method
A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component...
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7456031 |
Exposure device, exposure method, and semiconductor device manufacturing method
To provide an exposure apparatus and an exposure method able to correct an image-placement error during an exposure which is unable to decrease only by correcting electron beam description data of...
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7452639 |
Photomask with photoresist test patterns and pattern inspection method
A photomask with photoresist test patterns and pattern inspection method using four test patterns on the photomask to perform the exposure on the first photoresist layer in order to adjust the...
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7449284 |
Method and structure for fabricating mechanical mirror structures using backside alignment techniques
A method for fabricating mechanical structures from bonding substrates. The method includes providing a bonded substrate structure, which includes a first substrate having a first thickness of...
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7449265 |
Scatterometry target for determining CD and overlay
The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.
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7442477 |
Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to...
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7442474 |
Reticle for determining rotational error
A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of...
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7427459 |
Recticle pattern applied to mix-and-match lithography process and alignment method of thereof
A recticle pattern applied to a mix-and-match lithography process is described. The recticle has a transparent region and a non-transparent region. The transparent region includes a device region...
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7425396 |
Method for reducing an overlay error and measurement mark for carrying out the same
A method for reducing an overlay error of structures of a layer to be patterned relative to those of a reference layer includes formation of standard measurement marks assigned to one another in...
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