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5340686 |
Positive-type photoresist composition
A positive-type photoresist composition is described as including: (1) an alkali-soluble phenol novolak having a degree of dispersion of from 1.5 to 4.0; (2) a 1,2-quinone diazide compound;...
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5340683 |
Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound
A PS plate comprises a surface-grained and anodized aluminum plate provided thereon with a light-sensitive layer of a composition comprising a light-sensitive substance and an alkali-soluble resin...
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5340688 |
Positive type photoresist composition
Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy...
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5340687 |
Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol
An alkali-soluble binder resin made by a condensation reaction of hydroxy styrene moiety having formulae (I) or (II): ##STR1## wherein x is an integer from 2 to 300; with a monomethylolated...
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5340684 |
Photosensitive composition and resin-encapsulated semiconductor device
A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a...
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5338653 |
Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in...
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5338643 |
O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye
Disclosed herein is a photosensitive composition comprising: (A) 5 to 60 wt % of an o-quinonediazide compound; (B) 0.05 to 10 wt % of an s-triazine compound (C) 0.01 to 10 wt % of a dye...
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5336583 |
Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone
A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group...
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5326665 |
Positive type resist composition
A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation...
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5324620 |
Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde
A radiation-sensitive composition dissolved in a solvent comprising: (A) a photoactive compound; (B) an alkali-soluble novolak binder resin made by the condensation reaction of a mixture of...
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5322757 |
Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
Improved photoresist compositions having high resolution and high thermal resistance, produced from certain novolak polymers and diazoquinone photosensitizers. The useful novolak polymers are...
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5316884 |
Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in...
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5314782 |
Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer...
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5308744 |
Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
A new photoacid generator having the formula ##STR1## wherein R=hydrogen, hydroxyl, or the --O--S(O) 2 --Q moiety; R 1 =CH 2 OS(O) 2 --Q, or --NO 2 ; R 2 =CH 2 OS(O) 2 --Q,...
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5306595 |
Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith
The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at...
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5306596 |
Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate
Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the...
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5306594 |
Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): ##STR1## wherein R 1 =hydrogen, lower alkyl group having 1-4...
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5302688 |
Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions
Block phenolic oligomers of the formula (I): ##STR1## These may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin...
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5302490 |
Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin
The invention relates to radiation sensitive compositions having high uniformity when deposited as thick films. The compositions of the invention comprise a radiation sensitive component and a...
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5302488 |
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a...
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5300396 |
Process of making naphthoquinone diazide esters using lactone solvents
A method of preparing a photosensitizer condensate comprising: condensing a phenolic compound with a diazo sulfonyl chloride, wherein from about 50 to 100 mole percent of the diazo moiety is...
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5296330 |
Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive
Positive photoresist compositions comprising, in an organic solvent, at least a) one alkali-soluble resin, b) one photosensitive quinone diazide, c) one aromatic hydroxy compound of...
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5294521 |
Positive photoresists employing an isomeric mixture of two hexahydroxybenzophenone esters of diazonaphthoquinone sensitizers
Positive photoresists formulations for producing positive photoresist images having improved thermal stability yet which allow a wide variation in resin to photoactive sensitizer compound without...
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5290656 |
Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y 1 , Y 2 , Y 3 and Y 4 are the same or different and each a hydrogen atom, an alkyl group,...
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5288588 |
Positive photosensitive polyimide resin composition comprising an o-quinone diazide as a photosensitive compound
A positive photosensitive polyimide resin composition which comprises 100 parts by weight of an organic solvent-soluble polyimide resin and 1-100 parts by weight of an ο-quinonediazide compound,...
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5286609 |
Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
A negative resist pattern is formed using a resist containing a diazoquinone sensitizer. An imagewise exposed area of a layer of the resist is subjected to heat treatment with a water-containing...
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5283155 |
Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR1## wherein Y 1 , Y 2 , Z...
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5283374 |
Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount...
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5283324 |
Process for preparing radiation sensitive compound and positive resist composition
A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10...
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5281508 |
Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol
A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g., VLSIs, with high fidelity is proposed. The composition comprises 100 parts...
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5279918 |
Photoresist composition comprising a quinone diazide sulfonate of a novolac resin
A photoresist composition useful for the preparation of semiconductors and to be irradiated by light with a wavelength of from 330 to 450 nm, which comprises (1) an alkali-soluble resin, (2) a...
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5279922 |
Light-sensitive coating liquid
A light-sensitive coating liquid, comprising, as an organic solvent, at least one substance represented by the formulae (I) to (III) shown below: ##STR1## wherein R 1 represents an alkyl group...
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5279917 |
Light-sensitive composition comprising a fluorine copolymer surfactant
A light-sensitive composition comprises a light-sensitive compound, an alkali soluble resin and a fluorine-containing surfactant. The surfactant is a copolymer of a (poyoxyalkylene)acrylate or...
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5278021 |
O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles
A radiation sensitive mixture comprising an alkali-soluble binder resin and at least one photoactive compound comprising a compound of formula (I): ##STR1## wherein each R is individually selected...
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5275910 |
Positive radiation-sensitive resist composition
A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): ##STR1## wherein...
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5275911 |
Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount...
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5275909 |
Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective absorbance increasing amount...
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5273856 |
Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid...
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5272036 |
Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method
Disclosed is a pattern forming contrast enhanced material comprising (a) a water soluble photosensitive compound selected from the group consisting of a water soluble aliphatic photosensitive...
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5268252 |
Radiation-sensitive ester and process for its preparation
The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone...
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5266440 |
Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons
A photoresist comprising a light sensitive component and an essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and...
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5264319 |
Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
Disclosed herein is a photosensitive resin composition composed mainly of an alkali-soluble organometallic polymer and a photosensitive dissolution inhibitor. The composition is used as a positive...
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5260162 |
Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
A photosensitizer composition comprising a diazo fluorinated ester containing the hexafluoroisopropylidene group, said photosensitizer selected from hexafluoro-bis-phenols having the following...
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5256522 |
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2...
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5254440 |
Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images
A methylol-substituted trihydroxybenzophenone of the formula (I): ##STR1## This methylol-substituted trihydroxybenzophenone may be reacted with selected phenolic monomers during or after the...
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5250669 |
Photosensitive compound
Photosensitive compounds having preferably a functional group such as --SO 2 Cl, --SO 3 H, --SO 3 R, ##STR1## (R, R', R" being alkyl) on a terminal benzene or naphthalene ring connected via a...
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5248585 |
Polyphosphazene binder resins for photoresists comprising as photosensitizers o-quinone diazide esters
This invention relates to novel radiation sensitive compositions. More particularly the invention relates to photoresists containing phosphorus and nitrogen linked polymers; i.e., polyphosphazenes,...
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5248582 |
Positive-type photoresist composition
A positive type photoresist composition which comprises an alkali soluble novolak resin and at least one light-sensitive material represented by the following general formulae (I) to (IV) to...
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5246818 |
Developer composition for positive working color proofing films
A developer composition for positive color proofing films containing a) sodium, potassium or ammonium octyl sulfate; sodium, potassium or ammonium lauryl sulfate; sodium decyl sulfate; or sodium...
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5242780 |
Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide...
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